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AlScN FBAR Technology Landscape 2026 — PatSnap Eureka

AlScN FBAR Technology Landscape 2026 — PatSnap Eureka
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RF Filter Intelligence

AlScN FBAR Technology Landscape 2026

Scandium-doped AlN piezoelectric layers raise electromechanical coupling (Keff²) from ~3% to ~17.8%, enabling 5G filter bandwidths that pure AlN cannot achieve. This dataset snapshot maps the patent and literature landscape from 2003 to 2025.

17.8%
Peak Keff² achieved at 30% Sc doping, 4.75 GHz (2023 literature)
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FOM 62
Figure of merit for Al₀.₈Sc₀.₂N FBAR at 4.24 GHz (2022 literature)
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2003–2025
Coverage span of patent and literature records in this dataset
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10+
Distinct patent records from NSIC assignee in this dataset
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Published byPatSnap Insights Team··12 min readVerified by PatSnap Eureka Data
Technology Overview

From Pure AlN to AlScN: The Piezoelectric Shift Defining 5G RF Filters

Film bulk acoustic resonators (FBARs) convert electrical energy into bulk acoustic waves at GHz frequencies using a piezoelectric thin film sandwiched between two metal electrodes, acoustically isolated by an air cavity or a solidly mounted Bragg reflector. Core performance metrics are electromechanical coupling coefficient (Keff²), quality factor (Q), and figure of merit (FOM = Keff² × Q).

The substitution of scandium-doped AlN (AlScN) for pure AlN is the central innovation axis documented in this dataset. Sc atoms substituting for Al in the wurtzite lattice distort crystal symmetry, increasing piezoelectric constant e₃₃ while reducing elastic stiffness c₃₃, yielding a substantially higher Keff². A 2017 literature record established Keff² ~12% for ScAlN versus ~3% for pure AlN, at the cost of Q reduction from ~300 to ~100.

AlScN FBAR Patent Filing Activity by Top Assignees (Dataset Snapshot)
AlScN FBAR patent filing counts by top assignees: NSIC 10+, Samsung Electro-Mechanics 4, Murata 2, Wuhan Memsonics 4, AAC Acoustic Technologies 2Horizontal bar chart showing relative patent filing volumes for the top five assignees in the AlScN FBAR dataset snapshot, sourced from retrieved patent records 2003–2025.Top Assignees by Filing Volume (Dataset Snapshot)NSIC10+Samsung Electro-Mechanics4Wuhan Memsonics4Murata Manufacturing2↗ Click bars to explore

Recent results push Keff² further: a 2022 study on Al₀.₈Sc₀.₂N demonstrated Keff² of 14.5% with a FOM of 62 and a 4.24 GHz center frequency, while a 2023 study at 30% Sc doping achieved Keff² of 17.8% at 4.75 GHz with a border frame structure for lateral mode suppression. These results directly target 5G sub-6 GHz bands requiring fractional bandwidths exceeding 5%.

Patent records in this dataset span 2003 to 2025 across three maturity phases: foundational FBAR architecture (2003–2010), systematic Sc doping introduction and SMR maturation (2011–2020), and an acceleration phase (2021–2025) dominated by AlScN-specific 5G innovations. In retrieved records, NSIC, Samsung Electro-Mechanics, Murata, and Wuhan Memsonics collectively account for the large majority of filings in this dataset.

PatSnap Eureka Filing counts are approximate and derived from retrieved patent records in this dataset only; they do not represent total industry output.Explore the data ↗
Performance & Filing Trends

Keff² Progression and Filing Acceleration Across Three Technology Phases

Data extracted from retrieved patent and literature records illustrates both the performance trajectory of AlScN FBARs—from Keff² ~3% for pure AlN to 17.8% at 30% Sc doping—and a clear acceleration in filing activity post-2020 targeting 5G bands.

Keff² Performance by Sc Concentration and Technology Generation

In this dataset, reported Keff² values rise from ~3% for pure AlN (pre-2010 baseline) to 12% at unspecified Sc content (2017), 14.5% at 20% Sc (2022), and 17.8% at 30% Sc (2023), reflecting a consistent performance improvement trajectory in retrieved records.

Keff² performance progression: pure AlN 3%, ScAlN 2017 12%, Al0.8Sc0.2N 2022 14.5%, 30% Sc 2023 17.8%Vertical bar chart showing electromechanical coupling coefficient Keff² values at different Sc concentrations and years, sourced from literature records in the AlScN FBAR dataset.Keff² by Sc Concentration & Year (Literature Records)20%15%10%5%0%3%Pure AlNPre-201012%ScAlN201714.5%20% Sc202217.8%30% Sc2023↗ Click bars to explore

AlScN FBAR Patent Filing Volume by Technology Phase (Dataset Snapshot)

In this dataset, filing activity across three identified phases shows clear acceleration post-2020, with the 2021–2025 acceleration phase producing the highest concentration of AlScN-specific records targeting 5G applications in retrieved records.

AlScN FBAR filing phases: Foundational 2003–2010 low, Development 2011–2020 medium, Acceleration 2021–2025 high concentrationHorizontal bar chart showing relative patent filing concentration across three technology phases identified in the AlScN FBAR dataset snapshot.Filing Concentration by Technology Phase (Dataset Snapshot)Foundational(2003–2010)LowDevelopment(2011–2020)MediumAcceleration(2021–2025)HighRelative filing concentration — dataset snapshot only↗ Click bars to explore
PatSnap Eureka All performance values and filing phase characterizations are derived from retrieved patent and literature records in this dataset; they do not represent comprehensive industry output.Explore the data ↗
Application Domains

Where AlScN FBARs Are Being Deployed: Four Key Application Areas

Retrieved patent and literature records identify four distinct application domains for AlScN FBAR technology, ranging from 5G RF front-end filters to biosensing, each with distinct Sc concentration and structural requirements documented in the dataset.

Sub-6 GHz · BAW Filter · N77 Band

5G RF Front-End Filter Modules

The dominant application domain in retrieved records. A 2022 study on Al₀.₈Sc₀.₂N demonstrated a BAW filter centered at 4.24 GHz with a −3 dB bandwidth of 215 MHz and Keff² of 14.5%. A separate 2022 literature record demonstrated an N77 sub-band filter using AlN/Al₀.₈Sc₀.₂N composite films via finite element method modeling and MEMS fabrication. Wuhan Memsonics Technologies and Wuhan Yanxi Micro Components explicitly position FBAR products for high-frequency RF communication filters in their patent filings.

RF Communications
DC Bias Tuning · Stiffness Modulation · Multi-Band

Frequency-Tunable Reconfigurable RF Modules

A 2022 literature record on Sc-doped AlN FBARs demonstrated that applying a negative DC electric bias opposing the c-axis direction shifts the resonant frequency downward by modifying effective stiffness and piezoelectric coefficients. This enables tunable filter functionality without mechanical reconfiguration. The application is explicitly positioned as relevant to software-defined radios and multi-band RF front ends in the same study.

Reconfigurable RF
SMR Architecture · Mass-Sensitive · 3.5 GHz

Biosensing and Gas Sensing Devices

The solidly mounted resonator (SMR) variant is highlighted for biosensing and gas sensing in multiple literature records. A 2021 study fabricated a 3.5 GHz SMR using 15% Sc-doped AlScN via RF magnetron sputtering, characterizing its mass-sensitive performance. A 2023 simulation study demonstrated FBAR gas-sensing operation in the 1–2.5 GHz range. The 2017 foundational ScAlN review explicitly identifies solidly mounted ScAlN FBARs as offering “exciting opportunities as biological or gas sensors.”

MEMS Sensing
Single-Crystal Architecture · High-Q · Miniaturized

Single-Crystal BAW Communication Devices

A 2024 US patent from Heyuan Aifo Light Communication Technology Co., Ltd. addresses single-crystal FBAR structures targeting miniaturized, high-frequency wireless communication devices. Single-crystal architectures promise higher crystalline quality and lower defect density than polycrystalline AlScN, with potentially higher Q. This record signals an emerging trajectory beyond polycrystalline AlScN documented in the dataset, positioning single-crystal BAW as a longer-term competitive direction.

Next-Gen Communication
PatSnap Eureka Application domain characterizations are derived from retrieved patent and literature records in this dataset only.Explore insights ↗
Key Assignees

Leading Patent Assignees in AlScN FBAR Technology — Dataset Snapshot

In this dataset, NSIC, Samsung Electro-Mechanics, Murata Manufacturing, and Wuhan Memsonics collectively account for the large majority of patent records in retrieved records, spanning fabrication processes, piezoelectric composition engineering, and structural design innovations from 2016 to 2025.

AlScN FBAR Top Assignees by Filing Count in Retrieved Records (Dataset Snapshot)

Top AlScN FBAR assignees by filing count: NSIC 10+, Samsung Electro-Mechanics 4, Wuhan Memsonics 4, AAC Acoustic Technologies 2, Murata Manufacturing 2Horizontal bar chart of top five assignees by approximate patent filing count in the AlScN FBAR dataset snapshot.Ningbo Semiconductor International Corporation10+Samsung Electro-Mechanics Co., Ltd.4Wuhan Memsonics Technologies Co., Ltd.4AAC Acoustic Technologies (Shenzhen) Co., Ltd.2Murata Manufacturing Co., Ltd.2↗ Click bars to explore
Cavity Formation · Wafer Bonding · Packaging

Ningbo Semiconductor International Corporation

The single most active patent filer in this dataset, with at least 10 distinct patent records spanning fabrication processes, device structures, and packaging. Filings span 2017 to 2024, predominantly in the US jurisdiction, covering sacrificial-layer cavity formation, wafer-bonding approaches, and hermetic packaging with through-wafer vias. Notable records include a 2017 US FBAR fabrication method, a 2021 wafer-bonding cavity patent, and two 2024 packaging patents featuring elastic bonding material layers and conductive via interconnection.

China — CN / US Filings
AlScN Composition · RTA Process · Leakage Control

Samsung Electro-Mechanics Co., Ltd.

Holds multiple US patent records directly covering AlScN BAW resonator compositions, specifying Sc content between 10 and 25 wt% and limiting leakage current density to ≤1 μA/cm² for electrical reliability. A 2021 US patent specifically addresses AlScN film crystallinity improvement via rapid thermal annealing (RTA), while a 2022 US patent covers Sc content specification and fabrication methods. Filing activity spans 2018 to 2022 in the US jurisdiction in this dataset.

South Korea — KR / US Filings
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Unlock Full Assignee Profiles for Murata, Wuhan Memsonics, and More
Murata’s 2016 foundational patent claiming 5–43 at% Sc represents a potential blocking position across the AlScN field. Wuhan Memsonics holds multiple 2022–2025 filings on Q-enhancement frame structures in US and SG jurisdictions.
Murata ScAlN blocking patent Wuhan Memsonics frame IP + more
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PatSnap Eureka Filing counts are approximate and derived from retrieved patent records in this dataset only.Explore players ↗
Emerging Directions

Five Emerging Technology Directions in AlScN FBAR (2023–2025)

The most recent filings and publications in this dataset (2023–2025) signal five distinct emerging directions, ranging from structural Q-recovery architectures to single-crystal piezoelectric layers and advanced hermetic packaging.

Advanced Frame Structures for Q Recovery at High Sc Concentrations

Three independent assignees—AAC Acoustic Technologies, Wuhan Memsonics, and JWL (Zhejiang) Semiconductor—each filed US patents in 2025 targeting novel frame structures to address Q degradation at higher Sc concentrations. Approaches include interdigital protrusion frames (AAC), air wing/air bridge combinations with cavity geometry in the lower electrode (Wuhan Memsonics), and dual-passivation-layer frames that suppress parasitic transverse waves while reducing structural stress (JWL). This convergence across independent filers indicates the field is treating structural Q recovery as a required design response to high-Keff² AlScN.

Very High Sc Concentration (30%+) at Super-High Frequencies

A 2023 literature record demonstrated operation at 4.75 GHz with Keff² of 17.8% using 30% Sc doping, including a border frame structure for lateral mode suppression and a temperature coefficient of frequency (TCF) management strategy. This result pushes the previously documented performance boundary and signals that the field is actively exploring Sc concentrations at or beyond 30% for even wider 5G band coverage. The study targets wideband applications specifically requiring fractional bandwidths that AlN cannot provide.

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Unlock Single-Crystal BAW and Composite Stacking Emerging Trend Profiles
A 2024 Heyuan Aifo patent on single-crystal FBAR and 2022 literature on AlN/AlScN composite stacking for Keff² tunability represent two additional emerging directions documented in this dataset.
Single-crystal BAW trajectoryComposite AlN/AlScN stacking+ more
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PatSnap Eureka Emerging direction characterizations are derived from patent and literature records dated 2023–2025 in this dataset only.Explore emerging trends ↗
Technology Comparison

AlScN FBAR vs. Pure AlN FBAR: Key Dimension Comparison

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DimensionAlScN FBAR (ScAlN)Pure AlN FBAR
Keff² (electromechanical coupling)~12% (unspecified Sc, 2017); 14.5% at 20% Sc (2022); 17.8% at 30% Sc (2023)~3% (baseline, pre-2010 foundational records)
Quality Factor (Q)~100 (reduced due to increased damping losses from Sc substitution)~300 (higher Q, lower damping losses)
Figure of Merit (FOM = Keff² × Q)Up to 62 demonstrated for Al₀.₈Sc₀.₂N (2022 literature)Lower FOM due to lower Keff² despite higher Q
Operating Frequency4.24 GHz (2022 study); 4.75 GHz at 30% Sc (2023 study)Sub-4 GHz typical for conventional FBAR filters
Sc Content Range (patent claims)5–43 at% claimed (Murata, 2016); 10–25 wt% specified (Samsung Electro-Mechanics, 2022)N/A — no Sc doping
Spurious Mode ChallengeMore severe at high Sc%; addressed by frame structures, air wings, air bridges (2025 patents)Less severe; conventional electrode geometry sufficient
Temperature Coefficient of Frequency (TCF)−19.2 ppm/°C reported for Al₀.₈Sc₀.₂N (2022 literature)Typically more stable TCF vs. high-Sc AlScN
Primary Application (dataset)5G sub-6 GHz RF filters (N77 band, 4.24 GHz, 4.75 GHz); biosensing (SMR variant)Earlier-generation RF filters; foundational FBAR products
PatSnap Eureka All comparative values are derived from patent and literature records in this dataset; they do not represent comprehensive industry benchmarks.Compare in Eureka ↗
Frequently asked questions

Frequently Asked Questions: AlScN FBAR Technology

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Data and insights on this page are based on a limited patent and literature dataset and are for reference only. Figures may not represent the complete technology landscape.

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