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Bonding & 3D Integration Patents: Leaders, Trends, White Space 2026

Bonding & 3D Integration Patents: Leaders, Trends, White Space 2026
https://www.patsnap.com/resources/blog/rd-blog/bonding-and-3d-integration-technology-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Semiconductor Patent Landscape
Bonding and 3D Integration Technology Patents: Who Files, Where Filings Have Flattened, and What Remains Open
  • Filing peaked in 2018 at 38 records and has not returned to that level since, with the 2022 midpoint at 30 — a pattern of flat-to-declining activity rather than sustained growth.
  • Recent-year momentum has gone quiet across the biggest names TSMC and Applied Materials both show -100% YoY with zero filings in the latest year, though publication lag understates the true 2025-2026 picture.
  • US filings dominate the receiving-office mix at 278 records well ahead of PCT (87) and EPO (65), meaning most enforceable rights in this space are being built inside a single jurisdiction first.
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488
Published Records
30%
Top-5 Share of All Records
+124%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
Published byPatsnap Research··8 min readSourced from Patsnap Eureka
Field Overview

What this patent set covers

This landscape tracks patent families whose title or abstract references hybrid bonding, wafer bonding or 3D integration semiconductor technology, narrowed to filings that also address overlay accuracy, surface preparation, void-free bonding, annealing condition or bond strength in their claims or description, and classified under the core semiconductor-device IPC groups H01L21, H01L25 and H01L23. The result is a set of 488 patent families spanning 2015 through mid-2026, concentrated on the process engineering that determines whether two wafers or die actually bond cleanly rather than the downstream device architectures that sit on top of them.

The IPC spread shows this is fundamentally a semiconductor-device story — 484 of 488 records sit in H01L — with meaningful overlap into MEMS manufacturing (B81B, B81C) and a smaller tail touching welding/brazing and mechanical-vibration generation, reflecting bonding's role as a shared process step across device categories.

Filing activity and technology composition, 2015-2026
  1. 1TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD49
  2. 2CORNING INC30
  3. 3TOKYO ELECTRON LTD24
  4. 4ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC22
  5. 5SKORPIOS TECHNOLOGIES INC20
  6. 6APPLIED MATERIALS INC19
  7. 7THE BOEING CO18
  8. 8ACORN SEMI LLC17
  9. 9G RAY SWITZERLAND SA14
  10. 10RAYTHEON CO11
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The Numbers

Filing trend and technology composition

Two views of the same 488-family dataset: how filing activity has moved year over year, and how those filings distribute across IPC subclasses.

A flat-to-declining filing curve since 2018

Filings rose to a peak of 38 in 2018, sat at 30 by the 2022 midpoint, and the trend line does not show a renewed climb toward the data cut-off. Because publication lags filing by roughly 18 months, the most recent one to two years are undercounted here and should not be read as an actual falloff in R&D activity — but the multi-year plateau through the mid-2020s is a genuine signal.

A flat-to-declining filing curve since 201801020304020201738201820192020202120222023382024202502026Most recent year is partial — publication lag means later filings are not yet visible.

H01L dominates; MEMS and joining processes are secondary

H01L covers all but four of the 488 records, confirming this is a semiconductor-device-centric field. H10P and H10D appear as substantial secondary groupings, while B81B/B81C (MEMS) and the smaller B23K/B06B counts show bonding process claims reaching into adjacent manufacturing domains rather than being confined to pure IC fabrication.

H01L dominates; MEMS and joining processes are secondaryH01L · Semiconductor devices48499.2%H10P14128.9%H10D · Semiconductor devices (general)6713.7%H10W6112.5%B81B · Microstructural devices (MEMS)387.8%B81C · MEMS manufacturing285.7%B23K · Welding, soldering & brazing112.3%B06B · Generating mechanical vibratio…91.8%Other12325.2%

Shares are the percentage of the 488 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Foundational Filings

The patents setting the citation baseline

Representative Filing
US8822817B22014-09-02

Direct Wafer Bonding — US8822817B2 (The Boeing Company)

THE BOEING COMPANY

The disclosure provides for a direct wafer bonding method including providing a bonding layer upon a first and second wafer, and directly bonding the first and second wafers together under heat and pressure. The method may be used for directly bonding an GaAs-based, InP-based, GaP-based, GaSb-based, or Ga(In)N-based device to a GaAs device by introducing a highly doped (Al)(Ga)InP(As)(Sb) layer between the devices. The bonding layer material forms a bond having high bond strength, low electrical resistance, and high optical transmittance.Filed by an aerospace assignee rather than a pure-play semiconductor company, illustrating how direct-bonding claims for compound-semiconductor material systems cut across industry lines.

US8822817B2 — patent drawing 1US8822817B2 — patent drawing 2
View full filing
Most-cited records in this dataset
#Publication no.Patent titleCitations
1US5877070AMethod for the transfer of thin layers of monocrystalline material to a desirable substrate937
2US5376580AWafer bonding of light emitting diode layers682
3US20030199105A1Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer split…396
4US20040009649A1Wafer bonding of thinned electronic materials and circuits to high performance substrates314
5US5502316AWafer bonding of light emitting diode layers314
6US7470142B2Wafer bonding method307
7US8802538B1Methods for hybrid wafer bonding294
8US7632738B2Wafer bonding method268
9US6180496B1In situ plasma wafer bonding method267
10US8809123B2Three dimensional integrated circuit structures and hybrid bonding methods for semiconductor wafers265

Citation counts favour older filings simply because they have had more time to accumulate references within the searched corpus — treat this table as a map of foundational influence, not current competitive strength.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Reading the Data

What the filing pattern signals

Three findings that shape how a freedom-to-operate or whitespace review should be scoped in this field.

Filing Trajectory
38 → 0
peak (2018) to latest year

Growth has stalled, not accelerated

The 2018 peak of 38 filings has not been matched since, and the 2022 midpoint of 30 confirms a plateau rather than a dip. Combined with the near-total drop-off among the largest assignees in the most recent year, this reads as a maturing claim space rather than an emerging one — though the last one to two years are understated by publication lag.

Filing trend, 2017-2026
Jurisdictional Concentration
278 of 458 office filings
filed at the USPTO

Rights are being built US-first

United States filings (278) outnumber PCT (87) and EPO (65) combined at more than two to one. For a competitor building a global blocking position, that concentration means US prosecution is the primary arena to monitor, with PCT filings serving as the leading indicator of where international coverage will follow.

Receiving office distribution
Collaboration Pattern
10 co-assignee pairs
identified across the dataset

Joint filing is limited and pairwise

Co-assignee activity is thin — ten pairs total, with the strongest links tied to a small number of corporate-subsidiary or corporate-inventor relationships rather than broad industry consortia. This suggests bonding IP in this set is largely built in-house rather than through joint development programmes.

Co-assignee pair analysis
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Corporate-subsidiary filing pairs dominate co-assignment
AssigneeCo-assigneeShared families
Tokyo Electron LimitedTokyo Electron U.S. Holdings, Inc.7
Corning IncorporatedGADKAREE KISHOR P5
Corning IncorporatedMACH JOSEPH F3
Corning IncorporatedVALLON SOPHIE A2
Corning IncorporatedUSENKO ALEXANDER2
Corning IncorporatedSTOCKER MARK A2
Corning IncorporatedMOORE MICHAEL J2
Corning IncorporatedLEHUEDE PHILIPPE2

The strongest co-assignee pair links a parent semiconductor-equipment maker to its regional holding entity, and a second recurring pair links a materials company to named individual inventors — patterns consistent with internal R&D structuring rather than cross-company alliances.

Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Assignee Landscape

Who holds the filings, and where their momentum stands

Filing activity concentrates among a recognizable group of semiconductor equipment, foundry and materials companies, but the most recent-year signal from that same group has gone flat.

Momentum Signal
-100% YoY
TSMC and Applied Materials

Largest filers show zero latest-year activity

Both TSMC and Applied Materials recorded 0 filings in the latest year with -100% YoY change, alongside zero-filing latest years for Corning, TEL, Skyworks-adjacent entities and Boeing. Given the 18-month publication lag, this is as likely to reflect filings still in the pipeline as an actual pullback — but it means the visible leaderboard is not currently being refreshed.

Recent-year momentum by assignee
Citation Base
937 citations
on the top-cited record

Foundational patents predate the current filer set

The most-cited record in the dataset, US5877070A on thin-layer transfer to a substrate, carries 937 citations and dates to well before the 2015-2026 window tracked here. Current assignees are filing on top of, and around, IP established by an earlier generation of layer-transfer and LED-bonding patents.

Most-cited records table
Filing Base
488 families
total in the ranking

A moderate-sized, identifiable field

At 488 total families, this is a tractable landscape to map fully rather than sample — every major assignee's position can be checked individually rather than inferred from a subset, which matters for freedom-to-operate work in a plateaued field where new blocking claims are less likely but existing ones are well established.

Total records in ranking
🔍
Sub-areas with thin claim density
Based on the IPC composition and process-condition search terms, these branches carry fewer dedicated filings relative to the core H01L bonding claims:
MEMS-specific bonding interfaces (B81B/B81C)Bond-strength characterization for compound semiconductorsVibration-assisted bonding processes (B06B)Solder/braze hybrid bonding (B23K crossover)Post-anneal void inspection methods
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Taiwan Semiconductor Manufacturing Company (TSMC)0-100%
Corning Incorporated0
Tokyo Electron Limited0
Scorpio Technologies Limited0
Applied Materials, Inc.0-100%
The Boeing Company0
Adeia Semiconductor Bonding Technologies Inc.0-100%
International Business Machines Corporation (IBM)0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this analysis

The dataset points to specific follow-up work depending on whether the goal is freedom-to-operate, whitespace filing, or competitive tracking.

Check the foundational patent family status

The highest-cited records date to before this dataset's window and may be near or past expiry in key jurisdictions — confirming their current legal status changes what freedom-to-operate actually requires.

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Model the under-claimed sub-areas as first-filing targets

MEMS-specific bonding interfaces and vibration-assisted process claims show thinner density than the core wafer-bonding claims — worth scoping as a first-claim opportunity before the plateau reverses.

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Track whether the flat trend reverses post-lag

Because publication lag understates 2025-2026, the real test of whether this field is declining or just paused arrives once those filings publish — set a monitor rather than concluding now.

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Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Frequently Asked

Common questions on bonding and 3D integration patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Bonding and 3D Integration Technology covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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