Bonding & 3D Integration Patents: Leaders, Trends, White Space 2026
- Filing peaked in 2018 at 38 records and has not returned to that level since, with the 2022 midpoint at 30 — a pattern of flat-to-declining activity rather than sustained growth.
- Recent-year momentum has gone quiet across the biggest names TSMC and Applied Materials both show -100% YoY with zero filings in the latest year, though publication lag understates the true 2025-2026 picture.
- US filings dominate the receiving-office mix at 278 records well ahead of PCT (87) and EPO (65), meaning most enforceable rights in this space are being built inside a single jurisdiction first.
What this patent set covers
This landscape tracks patent families whose title or abstract references hybrid bonding, wafer bonding or 3D integration semiconductor technology, narrowed to filings that also address overlay accuracy, surface preparation, void-free bonding, annealing condition or bond strength in their claims or description, and classified under the core semiconductor-device IPC groups H01L21, H01L25 and H01L23. The result is a set of 488 patent families spanning 2015 through mid-2026, concentrated on the process engineering that determines whether two wafers or die actually bond cleanly rather than the downstream device architectures that sit on top of them.
The IPC spread shows this is fundamentally a semiconductor-device story — 484 of 488 records sit in H01L — with meaningful overlap into MEMS manufacturing (B81B, B81C) and a smaller tail touching welding/brazing and mechanical-vibration generation, reflecting bonding's role as a shared process step across device categories.
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Filing trend and technology composition
Two views of the same 488-family dataset: how filing activity has moved year over year, and how those filings distribute across IPC subclasses.
A flat-to-declining filing curve since 2018
Filings rose to a peak of 38 in 2018, sat at 30 by the 2022 midpoint, and the trend line does not show a renewed climb toward the data cut-off. Because publication lags filing by roughly 18 months, the most recent one to two years are undercounted here and should not be read as an actual falloff in R&D activity — but the multi-year plateau through the mid-2020s is a genuine signal.
H01L dominates; MEMS and joining processes are secondary
H01L covers all but four of the 488 records, confirming this is a semiconductor-device-centric field. H10P and H10D appear as substantial secondary groupings, while B81B/B81C (MEMS) and the smaller B23K/B06B counts show bonding process claims reaching into adjacent manufacturing domains rather than being confined to pure IC fabrication.
Shares are the percentage of the 488 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
Go deeper on Bonding and 3D Integration Technology with Eureka
This page is one run against one query. Ask Eureka your own question about bonding and 3d integration technology and every answer comes back with the patent numbers behind it.
Try EurekaThe patents setting the citation baseline
Direct Wafer Bonding — US8822817B2 (The Boeing Company)
The disclosure provides for a direct wafer bonding method including providing a bonding layer upon a first and second wafer, and directly bonding the first and second wafers together under heat and pressure. The method may be used for directly bonding an GaAs-based, InP-based, GaP-based, GaSb-based, or Ga(In)N-based device to a GaAs device by introducing a highly doped (Al)(Ga)InP(As)(Sb) layer between the devices. The bonding layer material forms a bond having high bond strength, low electrical resistance, and high optical transmittance.Filed by an aerospace assignee rather than a pure-play semiconductor company, illustrating how direct-bonding claims for compound-semiconductor material systems cut across industry lines.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US5877070A | Method for the transfer of thin layers of monocrystalline material to a desirable substrate | 937 |
| 2 | US5376580A | Wafer bonding of light emitting diode layers | 682 |
| 3 | US20030199105A1 | Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer split… | 396 |
| 4 | US20040009649A1 | Wafer bonding of thinned electronic materials and circuits to high performance substrates | 314 |
| 5 | US5502316A | Wafer bonding of light emitting diode layers | 314 |
| 6 | US7470142B2 | Wafer bonding method | 307 |
| 7 | US8802538B1 | Methods for hybrid wafer bonding | 294 |
| 8 | US7632738B2 | Wafer bonding method | 268 |
| 9 | US6180496B1 | In situ plasma wafer bonding method | 267 |
| 10 | US8809123B2 | Three dimensional integrated circuit structures and hybrid bonding methods for semiconductor wafers | 265 |
Citation counts favour older filings simply because they have had more time to accumulate references within the searched corpus — treat this table as a map of foundational influence, not current competitive strength.
Each row carries its publication number; clicking a row searches Eureka by that number.
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Browse MCP servers →What the filing pattern signals
Three findings that shape how a freedom-to-operate or whitespace review should be scoped in this field.
Growth has stalled, not accelerated
The 2018 peak of 38 filings has not been matched since, and the 2022 midpoint of 30 confirms a plateau rather than a dip. Combined with the near-total drop-off among the largest assignees in the most recent year, this reads as a maturing claim space rather than an emerging one — though the last one to two years are understated by publication lag.
Rights are being built US-first
United States filings (278) outnumber PCT (87) and EPO (65) combined at more than two to one. For a competitor building a global blocking position, that concentration means US prosecution is the primary arena to monitor, with PCT filings serving as the leading indicator of where international coverage will follow.
Joint filing is limited and pairwise
Co-assignee activity is thin — ten pairs total, with the strongest links tied to a small number of corporate-subsidiary or corporate-inventor relationships rather than broad industry consortia. This suggests bonding IP in this set is largely built in-house rather than through joint development programmes.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to bonding and 3d integration technology, with the prior art for and against each one.
| Assignee | Co-assignee | Shared families |
|---|---|---|
| Tokyo Electron Limited | Tokyo Electron U.S. Holdings, Inc. | 7 |
| Corning Incorporated | GADKAREE KISHOR P | 5 |
| Corning Incorporated | MACH JOSEPH F | 3 |
| Corning Incorporated | VALLON SOPHIE A | 2 |
| Corning Incorporated | USENKO ALEXANDER | 2 |
| Corning Incorporated | STOCKER MARK A | 2 |
| Corning Incorporated | MOORE MICHAEL J | 2 |
| Corning Incorporated | LEHUEDE PHILIPPE | 2 |
The strongest co-assignee pair links a parent semiconductor-equipment maker to its regional holding entity, and a second recurring pair links a materials company to named individual inventors — patterns consistent with internal R&D structuring rather than cross-company alliances.
Who holds the filings, and where their momentum stands
Filing activity concentrates among a recognizable group of semiconductor equipment, foundry and materials companies, but the most recent-year signal from that same group has gone flat.
Largest filers show zero latest-year activity
Both TSMC and Applied Materials recorded 0 filings in the latest year with -100% YoY change, alongside zero-filing latest years for Corning, TEL, Skyworks-adjacent entities and Boeing. Given the 18-month publication lag, this is as likely to reflect filings still in the pipeline as an actual pullback — but it means the visible leaderboard is not currently being refreshed.
Foundational patents predate the current filer set
The most-cited record in the dataset, US5877070A on thin-layer transfer to a substrate, carries 937 citations and dates to well before the 2015-2026 window tracked here. Current assignees are filing on top of, and around, IP established by an earlier generation of layer-transfer and LED-bonding patents.
A moderate-sized, identifiable field
At 488 total families, this is a tractable landscape to map fully rather than sample — every major assignee's position can be checked individually rather than inferred from a subset, which matters for freedom-to-operate work in a plateaued field where new blocking claims are less likely but existing ones are well established.
| Assignee | Recent year | YoY |
|---|---|---|
| Taiwan Semiconductor Manufacturing Company (TSMC) | 0 | -100% |
| Corning Incorporated | 0 | — |
| Tokyo Electron Limited | 0 | — |
| Scorpio Technologies Limited | 0 | — |
| Applied Materials, Inc. | 0 | -100% |
| The Boeing Company | 0 | — |
| Adeia Semiconductor Bonding Technologies Inc. | 0 | -100% |
| International Business Machines Corporation (IBM) | 0 | — |
Where to take this analysis
The dataset points to specific follow-up work depending on whether the goal is freedom-to-operate, whitespace filing, or competitive tracking.
Check the foundational patent family status
The highest-cited records date to before this dataset's window and may be near or past expiry in key jurisdictions — confirming their current legal status changes what freedom-to-operate actually requires.
Run a status check in EurekaModel the under-claimed sub-areas as first-filing targets
MEMS-specific bonding interfaces and vibration-assisted process claims show thinner density than the core wafer-bonding claims — worth scoping as a first-claim opportunity before the plateau reverses.
Explore whitespace in EurekaTrack whether the flat trend reverses post-lag
Because publication lag understates 2025-2026, the real test of whether this field is declining or just paused arrives once those filings publish — set a monitor rather than concluding now.
Set up monitoring in EurekaCommon questions on bonding and 3D integration patents
In this dataset, hybrid bonding filings are identified by title/abstract references to hybrid bonding, wafer bonding or 3D integration semiconductor technology, combined with process-condition language such as void-free bonding, overlay accuracy or annealing condition, and classified under H01L21, H01L25 or H01L23. This captures the process-engineering layer of bonding — surface preparation, alignment and thermal treatment — rather than every patent that merely mentions a bonded structure in passing. Most records also fall under H10P and H10D subclasses, reflecting overlap with general semiconductor-device claims.
The dataset's assignee ranking is led by a recognizable group of foundry, equipment and materials companies, but the notable finding is not who leads — it is that the largest filers, including TSMC and Applied Materials, show zero filings in the latest tracked year with -100% year-over-year change. That drop is likely inflated by publication lag rather than a genuine halt in R&D, since patent publications trail actual filing dates by roughly 18 months. Anyone tracking competitive position should treat the current leaderboard as a snapshot of past activity, not a live signal.
Filing activity peaked in 2018 at 38 records and has not returned to that level since, with the 2022 midpoint sitting at 30 — a pattern best described as flat to declining rather than growing. This does not necessarily mean the underlying technology is stagnant; it more likely means the core claim space around bonding process conditions is becoming occupied, pushing new filings toward narrower or adjacent sub-areas. The most recent one to two years in any such trend are always undercounted because of publication lag, so a definitive read on the current trajectory requires waiting for those filings to publish.
Based on IPC composition, the core H01L bonding claims are dense while MEMS-specific bonding interfaces (B81B/B81C), vibration-assisted bonding processes (B06B), and bond-strength characterization methods for compound semiconductors carry comparatively thinner filing density. These are not unclaimed categories, but they show fewer dedicated filings relative to the volume in core wafer-bonding process claims. A first-claim strategy in these areas would need to address a specific interface geometry or measurement method rather than restate general bonding process steps, since the broad process claims are already well covered.
Not necessarily — a high filing density in a sub-area means that particular claim space is occupied, not that the underlying technology has stopped evolving or is commercially proven. It does mean that a new filer entering that same claim space faces a denser prior-art landscape and needs a more specific, differentiated claim to get through examination. Conversely, a thin filing count in an adjacent sub-area can reflect either genuine white space or simply that the search terms used to build this dataset do not fully capture how that sub-area is described in patent text, so it is worth checking both possibilities before concluding a gap is real.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.