https://www.patsnap.com/resources/blog/rd-blog/ceramic-metallization-by-thick-film-and-plating-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Ceramic Substrates
Ceramic metallization patents: thick film and plating routes mapped by assignee, geography and technology class
  • 28.5% of all 1,983 records sit with the five leading assignees, with a long tail of single- and low-filing entrants behind them.
  • Filings fell 63% from 2021 to 2024 (35 to 13), the steepest sustained pull-back in the trend window, though 2025-26 counts are still filling in.
  • H05K printed circuits dominate at 37.7% of records, ahead of coating deposition (C23C, 28.0%) and semiconductor devices (H01L, 20.7%).
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1,983
Published Records
29%
Top-5 Share of All Records
-63%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (35 records) with 2024 (13) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 1,983 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

Ceramic metallization is the set of processes that turn an insulating ceramic body into a surface that can carry a solder joint, a wire bond or a hermetic seal. The two dominant routes in this dataset are thick-film metallization — screen-printed molybdenum-manganese or silver pastes fired onto the ceramic — and electroless or electrolytic plating, typically a nickel barrier layer applied after an activation or roughening step. Both routes chase the same three failure modes: adhesion strength at the ceramic interface, glass migration through the metal layer, and hermetic-seal integrity over thermal cycling.

The 1,983 records in scope span 2015 through the 2026 cut-off, drawn from filings that explicitly combine a metallization or plating method with one of these reliability concerns. Because publication trails filing by roughly 18 months, counts for the most recent one to two years understate actual filing activity and should be read as provisional.

Filing activity and technology mix, 2015–2026
  1. 1IBIDEN CO LTD331
  2. 2RESONAC CORP77
  3. 3ATOTECH DEUT GMBH & CO KG60
  4. 4TORAY INDUSTRIES INC50
  5. 5PANASONIC HOLDINGS CORP48
  6. 6KK TOSHIBA47
  7. 7APPLIED MATERIALS INC38
  8. 8TOSHIBA TEC KK32
  9. 9CANON KK26
  10. 10DAI NIPPON PRINTING CO LTD25
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

Two views of the same 1,983-record corpus: how filing volume has moved year over year, and which IPC subclasses carry the claims.

Filing trend, 2017-2026

Filings peaked at 49 in 2019 and held near that level before falling from 35 in 2021 to 13 in 2024, a 63% drop over three years. The 2025-26 figures are not yet complete because of publication lag, so the apparent tail-off past 2024 should not be read as continued decline.

Filing trend, 2017-2026013253850482017201849201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

IPC subclass distribution

H05K (printed circuits and assemblies) leads at 37.7% of the 1,983 records, followed by C23C (coating and surface deposition) at 28.0% and H01L (semiconductor devices) at 20.7%. C25D (electroplating and electroforming) and B32B (layered products) sit further down at 10.8% and 8.0%. Because records can carry multiple IPC classes, these shares sum to well over 100% and should not be added together.

IPC subclass distributionH05K · Printed circuits & assemblies74737.7%C23C · Coating & surface deposition55528.0%H01L · Semiconductor devices41120.7%C25D · Electroplating & electroforming21510.8%B32B · Layered products & laminates1598.0%H10W1306.6%H10P1165.8%C04B · Ceramics, cement & refractories1035.2%Other1,79490.5%

Shares are the percentage of the 1,983 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

Go deeper on Ceramic Metallization by Thick Film and Plating with Eureka

This page is one run against one query. Ask Eureka your own question about ceramic metallization by thick film and plating and every answer comes back with the patent numbers behind it.

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Key patents

Representative filing and most-cited prior art

Representative record
US20110192316A12011-08-11

Electroless plating solution for providing solar cell electrode

E-CHEM ENTERPRISE CORP.

An electroless nickel plating solution for solar cell electrodes patterned with SiNx and Si, built from a nickel ion, a reducing agent, two chelating agents and water. The formulation is described as achieving high selectivity between Si and SiNx while remaining harmless to the aluminium-based layer beneath it.Filed by E-CHEM ENTERPRISE CORP., published 2011-08-11 as US20110192316A1.

US20110192316A1 — patent drawing 1US20110192316A1 — patent drawing 2
View full record
Most-cited records in this corpus
#Publication no.Patent titleCitations
1US5935143AUltrasonic knife638
2US5648125AElectroless plating process for the manufacture of printed circuit boards442
3US5695510AUltrasonic knife419
4US5155336ARapid thermal heating apparatus and method380
5US20020006687A1Integrated IC chip package for electronic image sensor die315
6US6396148B1Electroless metal connection structures and methods301
7US20200012081A1Camera module, method of manufacturing the same, and electronic apparatus285
8US6616967B1Method to achieve continuous hydrogen saturation in sparingly used electroless nickel plating process275
9US5478462AProcess for forming polyimide-metal laminates270
10US4297607ASealed, matched piezoelectric transducer246

Citation counts favour older filings simply because they have had more time to accumulate citations inside this searched corpus — treat them as a signal of influence on subsequent filers, not as a ranking of present-day importance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for a filing decision

Three read-outs from the concentration, class and geography data, framed for where a team should and shouldn't spend claim-drafting effort.

Concentration
28.5% / 5 assignees
of 1,983 records

The top of the field is dense, the rest is thin

The five leading assignees hold 566 of 1,983 records between them, but the tenth-ranked assignee sits at only 25 records against a leader at 331. That gap means most of the ranked field is defending narrow, specific claim positions rather than broad platform patents.

Ranking covers 100 assignees, counted in records.
Filing momentum
-63%, 2021→2024
35 to 13 filings

Volume has pulled back from its 2019 peak

After peaking at 49 filings in 2019, the corpus shows a sustained decline through the last complete filing year. This reads as consolidation around established routes rather than continued invention pressure, though 2025-26 figures are still incomplete.

2024 is the most recent year treated as complete.
Technology mix
37.7% H05K
of 1,983 records

Circuit assembly claims outweigh pure ceramics claims

H05K (printed circuits and assemblies) carries more records than C04B (ceramics, cement and refractories) at 5.2%, meaning most of the activity in this dataset is about integrating metallized ceramic into a larger circuit or package, not about ceramic material chemistry itself.

Records can carry multiple IPC classes; shares do not sum to 100%.
Geography
767 US filings
of the receiving-office totals

US and EPO offices carry the bulk of filings

The United States (767) and EPO (436) together outpace Japan (405), with WIPO PCT filings at 102. A filer clearing freedom-to-operate should treat US and European coverage as the baseline check, not an afterthought.

Germany (49) and Austria (38) are smaller but present national-phase pools.
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to ceramic metallization by thick film and plating, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the gaps sit

The ranked assignees cluster around printed-circuit integration and coating deposition; recent-year momentum has flattened across the leaders shown in this dataset, consistent with the broader 2021-2024 pull-back.

Leader
331 records
leading assignee

One assignee holds a clear first position

The leading assignee's 331 records sit well above the fifth-place figure of 48, a gap wide enough to suggest a sustained, multi-generation filing programme rather than a single product push.

Compare against 25 records at tenth place.
Mid-field
48 vs 25
5th vs 10th place

The mid-field narrows quickly

Filing counts fall from 48 at fifth place to 25 at tenth, a steeper drop than the gap between first and fifth. Positions six through ten are contestable with a moderate, well-targeted filing programme.

Ranking spans 100 assignees total.
Collaboration
10 co-assignee pairs
identified

Co-filing is rare and concentrated

Only ten co-assignee pairs appear across the corpus, and the strongest of them links a parent electronics group to its own subsidiary rather than an external partner, suggesting most development here happens in-house.

Strongest pair recorded at 29 shared filings.
🔍
Under-claimed sub-areas worth checking before filing
These sit adjacent to the dense claim clusters in H05K and C23C but carry comparatively few dedicated records.
surface roughening pre-treatment for plating uptakeglass-migration barrier layers in fired thick filmhermetic seal testing methods for multilayer ceramicelectroless nickel plating uniformity controlmolybdenum-manganese adhesion at ceramic-metal interface
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Ibiden Co., Ltd.0—
Resonac Corporation0—
Atotech Deutschland GmbH & Co. KG0-100%
Toshiba Corporation0—
Panasonic Holdings Corporation0—
Toray Industries, Inc.0—
Applied Materials, Inc.0—
Toshiba Tec Corporation0—
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this analysis

The dataset points to specific next steps depending on whether the goal is freedom-to-operate, portfolio benchmarking, or identifying a filing gap.

Check freedom-to-operate against the leader's portfolio

With one assignee holding 331 of 1,983 records, any new filing in thick-film or plating metallization should start with a clearance search against that portfolio specifically, not the field average.

Run a clearance search in Eureka

Track the mid-field before it consolidates

The drop from 48 records at fifth place to 25 at tenth marks a contestable band. A monitoring watch on those assignees would catch new filings while positions are still open.

Set up assignee monitoring in Eureka

Validate the white-space sub-areas with a fresh search

Surface roughening, glass migration barriers and plating uniformity control appear thin in this corpus relative to H05K and C23C volumes. Confirm with a targeted claim-language search before committing R&D time.

Explore white space in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on ceramic metallization patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Ceramic Metallization by Thick Film and Plating covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Research Ceramic Metallization by Thick Film and Plating in depth with Eureka

Go past this page: query the whole ceramic metallization by thick film and plating corpus yourself, in your own scope.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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