https://www.patsnap.com/resources/blog/rd-blog/cmos-image-sensor-process-automation-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Sensors & MEMS
CMOS Image Sensor Process Automation Patents
  • Filing peaked in 2017 at 11 records and has not returned to that level since, with the 2022 midpoint at just 3 filings — this is a mature, not a growing, claim space.
  • 78 of 86 families sit in H01L semiconductor device classifications, while control-systems classification G05B accounts for only 7, showing automation logic itself is thinly claimed relative to device structure.
  • The most-cited record, US6618084B1, has 100 citations against a corpus of 86 families, meaning a single defect-correction patent from 2003 still anchors prior art searches in this area.
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86
Published Records
47%
Top-5 Share of All Records
+300%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this patent set covers

This landscape tracks patent families at the intersection of CMOS image sensor fabrication and process automation — wafer fab automation, packaging automation, hybrid bonding automation and process control — filed against IPC classes covering semiconductor devices (H01L27/146), general semiconductor processing (H01L21/00) and programmable controllers (G05B19/418). The 86 families identified span publication years 2015 through the partial 2026 cut-off, with filing activity concentrated in the mid-2010s.

Because publication lags filing by roughly 18 months, the 2025 and 2026 figures in any trend line understate true filing activity; treat the most recent one to two years as a floor, not a ceiling.

Filing activity by year, 2017–2026
  1. 1CANON KK12
  2. 2TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD9
  3. 3STMICROELECTRONICS INC8
  4. 4JBT MAREL CORPORATION6
  5. 5SEMICON MFG INT (BEIJING) CORP5
  6. 6SEMICON MFG INT (SHANGHAI) CORP5
  7. 7SOITEC SA4
  8. 8STMICROELECTRONICS SRL4
  9. 9OMNIVISION TECHNOLOGIES INC4
  10. 10SEMICON COMPONENTS IND LLC4
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The data

Filing trend and technology composition

Two views of the same 86-family corpus: how filing volume has moved year over year, and which IPC subclasses carry the claim weight.

A peak year that has not been repeated

Filings hit 11 in 2017, the high point of the entire window, then fell toward the 2022 midpoint of 3. That pattern — a sharp early peak followed by a decade-long plateau below it — points to a technology area where the foundational claim space filled early and later entrants are filing incrementally rather than opening new ground.

A peak year that has not been repeated0369121120172018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Device structure dominates over control logic

H01L (semiconductor devices) covers 78 of 86 records, and H04N (pictorial communication) covers 34, but G05B (control and regulating systems) covers only 7. The imaging device itself is heavily claimed; the automation and process-control layer that manufactures it is comparatively open. G06T (image data processing) matches G05B at 7, and A22C — an unrelated meat and fish processing class picked up by the search string's broad TACD terms — appears at 5, a reminder to sanity-check outlier classes before citing them as signal.

Device structure dominates over control logicH01L · Semiconductor devices7890.7%H04N · Pictorial communication (video…3439.5%H10P2023.3%G05B · Control & regulating systems78.1%G06T · Image data processing & genera…78.1%A22C · Meat & fish processing55.8%H10N · Other electric solid-state dev…33.5%G01J · Radiation & light measurement22.3%Other1011.6%

Shares are the percentage of the 86 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key patents

The records other filings build on

Representative record
US6618084B12003-09-09

US6618084B1 — Pixel correction system and method for CMOS imagers

STMICROELECTRONICS SRL

Disclosed is a fault tolerant CMOS image sensor that includes circuitry for identifying defective pixels and masking them during image generation. Masking may involve, in one example, replacing the output of a given pixel with an average of the output of surrounding non-faulty pixels. Thus, while image sensors may be fabricated with some number of faulty pixels, the images produced by such sensors will not have undesirable bright or dark spots.Filed by STMicroelectronics S.r.l., granted 2003-09-09. With 100 citations inside this corpus, it is the single most-referenced record and a mandatory freedom-to-operate check for any defect-masking or pixel-correction design.

US6618084B1 — patent drawing 1US6618084B1 — patent drawing 2
View full record
Most-cited records in this corpus
#Publication no.Patent titleCitations
1US6618084B1Pixel correction system and method for CMOS imagers100
2US5889277APlanar color filter array for CCDs with embedded color filter elements89
3US4901129ABulk charge modulated transistor threshold image sensor elements and method of making68
4US20020048837A1Fabrication of a high-precision blooming control structure for an image sensor47
5US20170040357A1Image sensor and method for fabricating the same41
6US9147708B2Solid-state image sensor and camera35
7US6188056B1Solid state optical imaging pixel with resistive load33
8US20040095488A1Pixel correction system and method for CMOS imagers26
9EP0917358A1Pixel correction system and method for CMOS imagers25
10US9276027B2Solid-state image sensor and camera22

Citation counts are drawn from the searched corpus only and favour older filings; treat them as a measure of influence on later claims, not of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for a filing decision

Three signals from this corpus matter more than the raw family count when deciding where to file next.

Filing momentum
11 → 0
peak year 2017 to latest year

The window that mattered has closed

Filing volume ran from a peak of 11 in 2017 down through a midpoint of 3 in 2022. Recent-year momentum tables show zero new filings in the latest year across every tracked assignee, including established names. Discount the very last year or two for publication lag, but the multi-year decline predates that effect.

Source: filing trend, 2017–2026
Classification concentration
78 of 86
records classed under H01L

Device claims crowd out process claims

Semiconductor device structure (H01L) accounts for the overwhelming majority of records, while control and regulating systems (G05B) accounts for only 7. Automation logic that governs wafer fab or hybrid bonding steps is far less densely claimed than the sensor structures it produces.

Source: IPC composition table
Citation anchor
100 citations
on the top-cited record

One 2003 patent still frames the art

US6618084B1 carries 100 citations against a corpus of 86 families — more citations than there are records in the set. Any defect-correction or pixel-masking filing in this space should expect examiners to raise it.

Source: most-cited records table
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to cmos image sensor process automation, with the prior art for and against each one.

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Co-filing is rare
AssigneeCo-assigneeShared families
Semiconductor Manufacturing International (Beijing) Corporation (SMIC Beijing)Semiconductor Manufacturing International (Shanghai) Corporation (SMIC Shanghai)5
SoitecMAZURE CARLOS1
SoitecBOURDELLE KONSTANTIN1

Only 3 co-assignee pairs appear across the corpus, the strongest linking two SMIC entities on 5 shared records. Cross-company collaboration on process automation claims is the exception, not the norm, in this data set.

Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the claim space — and where it is open

Recent-year momentum shows every tracked assignee, from foundries to equipment makers, at zero new filings in the latest year. That flatness across the board — not a single company pulling ahead — is itself the finding.

Momentum check
0
latest-year filings, all tracked assignees

No one is currently accelerating

Canon, TSMC, STMicroelectronics, JBT Marel, Soitec and SMIC's Beijing entity all show zero filings in the latest tracked year, with JBT Marel down 100% year over year. This is consistent with the broader trend decline rather than a company-specific pullback.

Source: recent-year momentum by assignee
Co-filing pattern
3 pairs
co-assignee relationships in 86 families

SMIC's two entities file jointly most often

The strongest co-assignee link — SMIC's Beijing and Shanghai manufacturing entities on 5 shared records — reflects internal corporate structure more than external collaboration. Soitec appears twice as a co-assignee, each time on a single record with an individual inventor.

Source: co-assignee pairs
Filing venue
48 of 86
records filed at the USPTO

US filings dominate the receiving-office split

The United States accounts for 48 of the tracked records, more than the next four receiving offices — EPO, WIPO, China and Canada — combined. A US-first filing strategy is the norm for this technology area, with EPO as the clear secondary venue at 13.

Source: receiving offices
🔍
Under-claimed branches worth a closer look
Process-control and image-processing classes trail device-structure classes by a wide margin, suggesting these specific sub-areas remain comparatively open:
Hybrid bonding process-control loopsAutomated wafer-level defect classification logicIn-line blooming control calibrationProgrammable controller integration for packaging automationCross-fab process-parameter feedback systems
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Canon Inc.0
Taiwan Semiconductor Manufacturing Company (TSMC)0
STMICROELECTRONICS INC0
JBT Marel0-100%
Soitec0
Semiconductor Manufacturing International (Beijing) Corporation (SMIC Beijing)0
Semiconductor Manufacturing International (Shanghai) Corporation (SMIC Shanghai)0
OmniVision Technologies0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this

The trend and assignee data point to specific next steps depending on what you are trying to decide.

Run a freedom-to-operate check on defect correction

With US6618084B1 carrying 100 citations in this corpus, any pixel-masking or defect-correction filing should map its claims against it before drafting.

Check claim overlap in Eureka

Test the process-control white space

G05B and G06T each cover only 7 of 86 records against 78 for H01L. A first claim drafted around automated process-control logic for hybrid bonding or wafer-level calibration is filing into comparatively open space.

Explore the gap in Eureka

Watch for the publication-lag catch-up

Zero filings in the latest year across every tracked assignee is partly a lag artefact. Re-run this trend in 12–18 months before concluding the space is fully dormant.

Set a monitoring alert in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on CMOS Image Sensor Process Automation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.