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DED Design for Additive Manufacturing Patent Snapshot

DED Design for Additive Manufacturing Patent Snapshot
Evidence Snapshot
DED Design for Additive Manufacturing Patent Snapshot in 2026

The directed energy deposition (DED) design-for-AM patent space is a small, highly concentrated field dominated by Relativity Space Inc, which holds one-third of all identified patent families. The field is in a growth phase on a multi-year basis, with annual volume having eased from its 2023 peak and the most recent filing years further understated by publication lag.

12
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
Europe (EPO)
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Relativity Space leads a concentrated, early-stage field

Relativity Space Inc holds 4 patent families, making it the clear front-runner in a corpus of 12 patent families. The next-ranked filer, Northwestern University, holds 2 patent families, and all remaining ranked applicants hold 1 each.

The top five filers account for 82% of the combined output of the ranked applicants visible in this query, an exceptionally high concentration signal for such a small field. The tier gap between rank 1 and rank 2 is meaningful: Relativity Space’s portfolio is twice the size of its nearest rival.

Leading applicants
#ApplicantPatent familiesShare
1Relativity Space Inc4
2Northwestern University2
3Nanyang Technological University1
4Hamilton Sundstrand Corporation1
5University of Coimbra1
6Board of Regents, The University of Texas System1
7Battelle Energy Alliance LLC1
↗ Hover a row · click a company to ask Eureka

The composition of leaders — a commercial aerospace-AM startup alongside four academic and research institutions — indicates that foundational IP is still being established, with no broad industrial incumbent yet staking a visible position.

The most recent filing years (20242025) are likely under-counted due to standard patent publication lag; apparent softness in those years should not be read as a real-activity decline. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Multi-year growth with a 2023 filing peak and a broad AM-process core

Two views together characterise the field: a filing timeline showing when interest accelerated and a technology-class breakdown showing which engineering domains are covered.

Annual filing trend

Activity was negligible before 2018, grew intermittently through 2022, then surged to a four-family peak in 2023. The three-year recent window sits 250% above the prior three-year window, confirming genuine multi-year growth. Figures for 2024 and 2025 are preliminary due to publication lag and should not be read as a slowdown.

Annual filing trendAnnual values from 2017 to 2026, peaking at 4 in 2023.02017220181201902020120212202242023120241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

The visible IPC classes are B33Y (additive manufacturing, 11 records) and B22F (powder metallurgy, 10 records), confirming a process-centric focus. B23K (welding, soldering and brazing, 4 records) reflects the energy-deposition mechanism. Lower-density branches — B23P, C22C, F02K, B22C, C21C, F16C, F23R and G05B — reveal that materials, propulsion, structural and control dimensions are each covered by only one or two records.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 11; B22F · Powder metallurgy 10.B33Y · Additive manufact…11B22F · Powder metallurgy10B23K · Welding, solderin…4B23P · Metal working (ge…2C22C · Alloys2F02K · Jet & reaction pr…2B22C · Foundry moulding1C21C · Steelmaking1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20230191495A1Published 2023-06-22

Methods of forming a multi-principal element alloyl

Battelle Energy ALLIANCE, LLC

A method of forming a multi-principal element alloy may include selecting a targeted composition, the targeted composition defining two or more elements and their respective proportions, determining a theoretical relative feed rate of two or more feedstock materials, determining a series of feedstock relative feed rates based on the theoretical relative… (excerpt from the patent abstract)

Methods of forming a multi-principal element alloyl — patent drawingMethods of forming a multi-principal element alloyl — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Systems and methods for global thermal control of …28
2Methods and apparatus for cognitive robotic additi…7
3Additively manufactured combustion chambers, manif…1

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Relativity Space Inc

Relativity Space Inc

Relativity Space holds 4 patent families — the largest portfolio in the corpus — concentrated in powder metallurgy (B22F) and additive manufacturing process and product classes (B33Y). Its applicant momentum is recorded as a new entrant, meaning all activity falls within the most recent window, consistent with a company that has pivoted its entire manufacturing strategy to large-scale AM. The focus on B22F powder processes alongside B33Y product and method claims reflects end-to-end rocket-grade component IP.

families: 4
Challenger · Northwestern University

Northwestern University

Northwestern University holds 2 patent families, focused on welding and brazing mechanisms (B23K 15 and B23K 26) combined with B33Y additive manufacturing methods — a combination that directly addresses the energy-deposition process at the core of DED. No prior-window baseline is available, so momentum direction is evidence pending beyond the new-entrant classification.

families: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Nanyang Technological UniversityBattelle Energy Alliance LLC+ more
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Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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