Book a demo

DED Digital Twin Patent Snapshot 2026

DED Digital Twin Patent Snapshot 2026
Evidence Snapshot
DED Digital Twin Patent Snapshot in 2026

The patent corpus for DED (Directed Energy Deposition) Digital Twin is extremely nascent, with only 4 patent families in scope and no single dominant route. Activity is fragmented across academic institutions and aerospace suppliers, with India holding the most patent records and additive manufacturing (B33Y) accounting for every family.

4
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
India
Leading jurisdiction
↗ Tap any metric to explore the underlying patents and uncover deeper insights in Patsnap Eureka
Published byPatsnap Insights Team··4 min readVerified by Patsnap Eureka data
Overview

A fragmented, early-stage field with no clear leader

Six distinct applicants each hold a single patent record, making JB Institute of Inventors Association, Hamilton Sundstrand Corp, RVR & JC College of Engineering, Goodrich Corp, University of Coimbra, and Goodrich Aerospace Canada Ltd co-equal at the top of the ranking.

The top five filers collectively account for 83% of the ranked applicants visible in this query’ combined total — a very high concentration figure, but one that reflects the microscopic scale of the corpus rather than any structural dominance. There is effectively no tier gap between applicants at this stage.

Leading applicants
#ApplicantPatent recordsShare
1JB Institute of Inventors Association1
2Hamilton Sundstrand Corporation1
3RVR & JC COLLEGE OF ENG1
4Goodrich Corporation1
5University of Coimbra1
6Goodrich Aerospace Canada Ltd1
↗ Hover a row · click a company to ask Eureka

The absence of an established leader means the field is open: no single incumbent has built a defensible position, and first-mover advantages are still available to any organization that can sustain a focused filing programme.

The corpus covers global filings through mid-2026; the most recent 18–24 months are subject to publication lag and may under-represent actual activity. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Sparse filing history with a possible uptick in 2025

The annual filing trend and technology composition charts together reveal a field that has barely moved for most of the decade, with isolated activity only since 2021. Additive manufacturing is the unambiguous technical anchor.

Annual filing trend

No filings were recorded from 2017 through 2020; a single record appeared in 2021, followed by a gap through 2023, one record in 2024, and two records attributed to 2025. Because the most recent 18–24 months are affected by publication lag, the 2025 figure should be treated as a floor, not a ceiling.

Annual filing trendAnnual values from 2017 to 2026, peaking at 2 in 2025.02017020180201902020120210202202023120242202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B33Y (Additive manufacturing / 3D printing) covers all four families, confirming it as the defining branch. B23K (Welding, soldering and brazing) and G06N (AI-based computing) each appear in two records, indicating that process-control and machine-learning angles are early secondary themes. A61B (Diagnosis and surgery), B22F (Powder metallurgy), and G05B (Control and regulating systems) each appear in one record, reflecting exploratory cross-domain work.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 4; B23K · Welding, soldering & brazing 2.B33Y · Additive manufact…4B23K · Welding, solderin…2G06N · Computing based o…2A61B · Diagnosis & surgery1B22F · Powder metallurgy1G05B · Control & regulat…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2022090983A1Published 2022-05-05

Methods and apparatus for cognitive robotic additi…

Universidade De Coimbra

The present disclosure describes a new method and platform for adaptive and controlled material deposition based on directed energy deposition (DED) technology that facilitates development of modern metallic components at a lower cost and waste rate, while increasing the quality, precision and user-friendliness. The platform transforms robotic Direct Energy… (excerpt from the patent abstract)

Methods and apparatus for cognitive robotic additi… — patent drawingMethods and apparatus for cognitive robotic additi… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Methods and apparatus for cognitive robotic additi…7

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Goodrich Corporation / Goodrich Aerospace Canada

Goodrich / BF Goodrich (Aerospace)

Goodrich Corp and its affiliate Goodrich Aerospace Canada Ltd each hold one patent record, and BF Goodrich (US) is identified as a new entrant with one recent record — marking it as the only applicant showing measurable momentum. Their technology focus clusters around B23K 9 (arc welding processes), B33Y 30 (additive manufacturing equipment), and B33Y 50 (data and control for additive manufacturing), pointing to process-level digital-twin integration for aerospace DED components. Their combined presence across the Goodrich family makes them the closest thing to a leader in this nascent corpus.

patent records: 1 (each entity)
Challenger · University of Coimbra

University of Coimbra

The University of Coimbra holds one patent record with a focus on B22F 10 and B22F 12 (powder metallurgy process routes) and B33Y 30 (additive manufacturing equipment), indicating a materials-science approach to DED digital twins. As an academic filer, its trajectory is harder to extrapolate than a commercial entity’s, but its presence in PCT and European contexts adds international reach that the India-based academic filers currently lack.

patent records: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Hamilton Sundstrand CorpRVR & JC College of Engineering+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

Still have questions? Patsnap Eureka answers them from patent and research data.Ask Eureka →

Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Explore in Eureka ↗
Powered by Patsnap Eureka

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.