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DED Dissimilar-Metal Interface Patent Snapshot 2026

DED Dissimilar-Metal Interface Patent Snapshot 2026
Evidence Snapshot
DED Dissimilar-Metal Interface Patent Snapshot in 2026

The patent corpus for directed energy deposition (DED) at dissimilar-metal interfaces is nascent, comprising 9 patent families, all filed in India and all held by Indian academic institutions. Activity is concentrated in the 2025–2026 window, signalling very early-stage formalisation of research output rather than an established competitive field.

9
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
India
Leading jurisdiction
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Published byPatsnap Insights Team··5 min readVerified by Patsnap Eureka data
Overview

Nine families, all academic, all Indian — a field at its very earliest stage

Every one of the 9 patent families in scope is held by an Indian academic institution, with Delhi Technological University, NIT Calicut, PDPM IIITDM, Asansol Engineering College, Easwari Engineering College, Swami Vivekananda University, IIT (ISM) Dhanbad, Chennai Institute of Technology, and SRM Institute of Science and Technology each holding one family.

The top five filers account for 56% of the combined total among the ranked applicants visible in this query — a high share that reflects the field’s extreme smallness rather than deliberate strategic concentration by any commercial player.

Leading applicants
#ApplicantPatent familiesShare
1Delhi Technological University1
2National Institute of Technology Calicut1
3PDPM INDIAN INST OF INFORMATION TECH DESIGN & MFG …1
4Asansol Engineering College1
5Easwari Engineering College1
6Swami Vivekananda University1
7Indian Institute of Technology (Indian School of Mines) Dhanbad1
8Chennai Institute of Technology1
9SRM INST OF SCI & TECH (RAMAPURAM CAMPUS)1
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The absence of industrial or multinational assignees suggests that DED dissimilar-metal interface innovation has not yet attracted corporate patent activity; the evidence snapshot is effectively an academic pre-competitive research zone, presenting both an open entry path and a signal that commercial development remains early.

Filings from 2025 and 2026 are subject to publication lag and likely undercount activity in those years; the true recent volume may be higher than the indexed figures reflect. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

All filing activity concentrated in 2025–2026; welding-process classes dominate the technology mix

The annual trend and IPC composition together describe a field that produced no indexed output before 2025 and whose technology framing is anchored firmly in welding and brazing process science, with additive manufacturing and powder metallurgy classes appearing as secondary branches.

Annual filing trend

Zero filings appear for 2017 through 2024; 5 families are indexed in 2025 and 4 in 2026. Because both years sit within the publication-lag window, these counts should be treated as floor estimates. The step-change from zero to non-zero output marks the emergence of formal patenting in this niche.

Annual filing trendAnnual values from 2017 to 2026, peaking at 5 in 2025.02017020180201902020020210202202023020245202542026↗ Hover for values · click a bar to ask Eureka

Technology composition

B23K (welding, soldering, and brazing) covers all 9 families, confirming that process-level joining science is the primary framing. B22F (powder metallurgy) and B33Y (additive manufacturing) each appear in 3 families, reflecting the DED process context. B23P, C22C, and G01N each appear in only 1 family, identifying the thinnest technical branches in the corpus.

Technology compositionB23K · Welding, soldering & brazing leads with 9; B22F · Powder metallurgy 3.B23K · Welding, solderin…9B22F · Powder metallurgy3B33Y · Additive manufact…3B23P · Metal working (ge…1C22C · Alloys1G01N · Material analysis…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
IN202631018177APublished 2026-03-06

Intelligent wire arc additive manufacturing system…

Swami Vivekananda University

An intelligent wire arc additive manufacturing system (100) with adaptive energy input and in-situ diagnostics is described herein for scalable fabrication and repair of metallic components via layer by layer deposition. The system (100) includes: an arc-based deposition unit (10) operating at 80-350 A current and 15-35 V voltage for stable molten pool… (excerpt from the patent abstract)

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Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Delhi Technological University

Delhi Technological University

Delhi Technological University holds 1 patent family, classified across B22F 10 (powder metallurgy processing), B23K 103 (welding material classification), and B23K 20 (pressure welding), indicating a focus on solid-state and powder-based dissimilar-metal joining. Applicant momentum data is not available; the filing is part of the 2025–2026 emergence cluster.

Families: 1
Challenger · NIT Calicut

National Institute of Technology Calicut

NIT Calicut holds 1 patent family spanning B23K 9 (arc welding), B33Y 10 (additive manufacturing processes), and B33Y 30 (additive manufacturing apparatus), making it one of the few applicants that explicitly bridges DED process equipment with welding science. Applicant momentum data is not available.

Families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
IIT (ISM) DhanbadSRM Institute of Science and Technology (Ramapuram Campus)+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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