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DED Melt-Pool Sensors Patent Snapshot 2026

DED Melt-Pool Sensors Patent Snapshot 2026
Evidence Snapshot
DED Melt-Pool Sensors Patent Snapshot in 2026

The directed-energy deposition melt-pool sensor patent space is nascent and tightly held, with 7 patent families on record and Rolls-Royce Corp alone accounting for the largest single share. Aerospace OEMs and one university form the entire identifiable applicant base, signalling that the technology is still in early-stage proprietary development rather than broad industry diffusion.

7
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatsnap Insights Team··5 min readVerified by Patsnap Eureka data
Overview

Rolls-Royce leads a highly concentrated, aerospace-dominated field

Rolls-Royce Corp holds the top position in the applicant ranking, followed by GE Avio S.r.l. and Northwestern University each in second place, together accounting for the majority of activity among the largest filers.

The top five filers collectively represent 69% of the combined total of the ranked applicants visible in this query — an unusually high concentration for a technology in active development, indicating that a small cluster of aerospace-adjacent organisations has defined the field so far.

Leading applicants
#ApplicantPatent recordsShare
1Rolls-Royce Corp3
2GE Avio S.r.l.2
3Northwestern University2
4Rolls-Royce PLC1
5MR AJAY M1
6DR N KARTHI1
7MR DEEPAK S R1
8MR DHANUSHH M S1
9NOVA University Lisbon1
↗ Hover a row · click a company to ask Eureka

The dominance of Rolls-Royce Corp and GE Avio S.r.l. reflects the direct relevance of melt-pool sensing to high-value turbine component manufacturing, where process control quality has immediate commercial consequences. Northwestern University’s co-presence suggests that foundational sensor-and-control research is still being conducted in academic settings and has not yet been fully absorbed by industry.

Records from the most recent 18–24 months are likely under-counted due to patent publication lag, so the apparent absence of 20252026 filings should not be read as a slowdown. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Sporadic early filings, with activity clustering in 2018 and 2023–2024

The annual filing trend and technology composition charts together reveal a field that has produced filings in two distinct pulses, anchored primarily in additive manufacturing and powder metallurgy classifications.

Annual filing trend

Filings first appeared in 2018 with two records, went silent through 2022, then recovered to two records in 2023 and three in 2024. The gap years likely reflect the narrow applicant base rather than declining interest; the 2023–2024 uptick coincides with all tracked applicants entering as new entrants. The 2025–2026 zeros are publication-lag artefacts and should not be interpreted as inactivity.

Annual filing trendAnnual values from 2017 to 2026, peaking at 3 in 2024.02017220180201902020020210202222023320240202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B33Y (additive manufacturing) is the visible classification, followed by B22F (powder metallurgy) and B23K (welding, soldering and brazing). Lower-count branches — G05B (control and regulating systems), F01D (turbines), and G06N (AI-based computing) — represent adjacent or application-layer coverage that remains sparsely populated relative to the process-hardware core.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 9; B22F · Powder metallurgy 6.B33Y · Additive manufact…9B22F · Powder metallurgy6B23K · Welding, solderin…5B29C · Shaping of plastics3G05B · Control & regulat…2F01D · Turbines & non-po…1G06N · Computing based o…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US10406760B2Published 2019-09-10

Neuro-fuzzy logic for controlling material additio…

ROLLS-ROYCE Corporation

A method may include controlling, by a computing device, a directed energy deposition material addition (DED MA) technique based at least in part on a thermal model. The thermal model may define a plurality of default operating parameters for the DED MA technique. The method also may include detecting, by at least one sensor, at least one parameter related… (excerpt from the patent abstract)

Neuro-fuzzy logic for controlling material additio… — patent drawingNeuro-fuzzy logic for controlling material additio… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Systems and methods for global thermal control of …28
2Neuro-fuzzy logic for controlling material additio…5
3Neuro-fuzzy logic for controlling material additio…5
4Additive manufacturing systems and methods for com…3
5Wire and arc additive manufacturing (WAAM) system …2

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Rolls-Royce Corp

Rolls-Royce Corp

Rolls-Royce Corp holds 3 patent records — the largest single count in this corpus — concentrated in B33Y (additive manufacturing) and B22F (powder metallurgy) classifications. The applicant momentum trend is marked as a new entrant, indicating all of its filing activity falls within the recent tracking window. The intra-group co-filing with Rolls-Royce PLC (1 record) suggests coordinated IP strategy across the group’s entities.

patent records: 3
Challenger · GE Avio S.r.l.

GE Avio S.r.l.

GE Avio S.r.l. holds 2 patent records, focused on B29C (shaping of plastics), B33Y additive manufacturing processes, and B33Y apparatus classifications. Its momentum trend is also new entrant, placing its filings entirely within the recent period. GE Avio’s focus on process and apparatus classes, rather than powder metallurgy, suggests a distinct technical approach to melt-pool monitoring from Rolls-Royce Corp.

patent records: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Northwestern UniversityUNIV NOVA DE LISBOA+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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