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DED Thermal & Melt-Pool Modeling Patent Snapshot 2026

DED Thermal & Melt-Pool Modeling Patent Snapshot 2026
Evidence Snapshot
DED Thermal & Melt-Pool Modeling Patent Snapshot in 2026

The DED thermal and melt-pool modeling patent space is small and highly concentrated, with BAE Systems PLC holding the dominant position among a field of 13 patent families. Activity peaked in 2021 and has since eased, leaving adjacent technical branches — particularly welding-process simulation and computational chemistry — with minimal coverage and potential entry room.

13
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

BAE Systems leads a concentrated, single-tier field

BAE Systems PLC is the clear leader, ranking first among all applicants and commanding a disproportionate share of filings. Northwestern University ranks second, followed by a cluster of single-record filers including the University of Science and Technology Beijing, Hamilton Sundstrand Corp, and Goodrich Corp.

The top five filers account for 69% of the combined total across the ranked applicants visible in this query — an unusually high concentration for an emerging manufacturing-process modeling topic. There is no meaningful second tier; beyond BAE Systems and Northwestern University, all remaining applicants hold a single patent record each.

Leading applicants
#ApplicantPatent recordsShare
1BAE Systems PLC6
2Northwestern University2
3UNIV OF SCI & TECH BEIJING1
4Hamilton Sundstrand Corporation1
5Shanghai Shenjian Precision Machinery Technology Co., Ltd.1
6Shaoxing University1
7Goodrich Corporation1
8Hankaisi Intelligent Technology Co., Ltd. (Guizhou)1
9ZHEJIANG PROVINCE INST OF ARCHITECTURAL DESIGN & RES1
10Goodrich Aerospace Canada Ltd.1
↗ Hover a row · click a company to ask Eureka

BAE Systems’ lead reflects deliberate IP strategy in additive manufacturing simulation, likely tied to defense and aerospace qualification workflows. The absence of major process-equipment OEMs or tier-1 automotive suppliers from the ranking suggests the industrial mainstream has not yet committed significant IP resources here.

Patent publications typically lag filings by 18–24 months, so the most recent period may understate true activity levels. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

A 2021 activity spike followed by a pullback; simulation and process control dominate the technology mix

Filing volume was negligible before 2018, surged to six records in 2021, then retreated sharply. The technology composition reveals a dual focus: process-side additive manufacturing and powder metallurgy classes on one hand, and digital/computational classes on the other.

Annual filing trend

The 2021 peak — driven primarily by BAE Systems filings — stands out clearly. Post-2021 volumes are low in absolute terms; given the 18–24 month publication lag, 2024–2025 data should be treated as provisional and likely undercounted.

Annual filing trendAnnual values from 2017 to 2026, peaking at 6 in 2021.02017220180201912020620210202212023120242202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B33Y (additive manufacturing) and B22F (powder metallurgy) lead the IPC mix, reflecting the process-physics core of this field. G06F (digital data processing) and G05B (control systems) together indicate a strong computational and closed-loop control thread, while G06N (AI/ML) appears at the same frequency as G05B — signaling early-stage machine-learning integration into thermal modeling workflows.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 8; B22F · Powder metallurgy 6.B33Y · Additive manufact…8B22F · Powder metallurgy6B29C · Shaping of plastics5G06F · Electric digital …5G05B · Control & regulat…4G06N · Computing based o…4B23K · Welding, solderin…3A61F · Implants & prosth…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20260178789A1Published 2026-06-25

Real-time simulation and model prediction method f…

Shaoxing University

The present application relates to a real-time simulation and model prediction method for wire arc additive manufacturing based on event sequences, including: in the real-time process of wire arc additive manufacturing of metal structures, activating elements in real time through event sequences and guiding the heat source in real time; setting heat source… (excerpt from the patent abstract)

Real-time simulation and model prediction method f… — patent drawingReal-time simulation and model prediction method f… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Systems and methods for global thermal control of …28
2Structural simulation of additively manufactured c…12
3一种电弧熔丝增材制造底盘结构设计方法4
4Method for simulating properties of an additively …4
5一种线弧增材制造热历史的预测方法2
6Structural simulation of additively manufactured c…2

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · BAE Systems PLC

BAE Systems PLC

BAE Systems PLC holds six patent records — the largest position in this corpus — concentrated in B22F (powder metallurgy), B29C (plastics shaping), and B33Y (additive manufacturing) subclasses, reflecting a systems-level view of DED process simulation and control. No momentum trend data is available for BAE Systems in the applicant momentum evidence, suggesting its position reflects accumulated filings rather than a recent acceleration.

Patent records: 6
Challenger · Northwestern University

Northwestern University

Northwestern University holds two patent records, both anchored in B23K (welding, soldering, and brazing) and B33Y (additive manufacturing) subclasses — positioning it as the primary academic voice on welding-process physics within DED thermal modeling. No momentum trend is recorded for Northwestern University in the applicant momentum evidence, consistent with a steady research-output pace rather than a recent filing surge.

Patent records: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Hamilton Sundstrand CorpGoodrich Corp+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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