It covers methods and devices addressing damage created by ion implantation into semiconductor substrates, and the techniques used to manage or repair that damage during subsequent annealing. This includes transient enhanced diffusion of dopants, interstitial cluster formation, amorphization thresholds, solid phase epitaxy regrowth, carbon co-implantation as a diffusion suppressant, and the resulting leakage current effects in finished devices. The 1,512 records in this dataset were identified using search terms spanning both the damage mechanisms and the specific mitigation techniques, so the scope is mechanism-and-remedy paired rather than a single keyword.

The ranked list covers 100 companies, with the leading assignee holding 68 records and the fifth-place company holding 44. Semiconductor manufacturers, equipment makers and a small number of specialist annealing and implantation firms appear across the top ranks. No single company dominates outright — the top 5 combined account for 17.6% of the 1,512 records in scope, meaning most of the field’s filings sit outside the leading group.

Based on complete-year data, filing activity has declined: 2021 saw 28 filings, falling to 8 by 2024, a -71% drop over that span. The overall peak in the dataset was 2017, at 55 filings. That said, publication typically lags actual filing by around 18 months, so figures for 2025 and 2026 are still incomplete and should not be read as confirmation the field has stalled further than the 2021-2024 data already shows.