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DRAM Technology Patents: Top Companies & Filing Trends 2026

DRAM Technology Patents: Top Companies & Filing Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/dram-technology-landscape-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Semiconductors & Microelectronics
DRAM technology patents: capacitor scaling, buried word line and sense amplifier filings
  • Filing has already peaked. Annual filings rose to 118 in 2021 and have declined since, with 96 recorded at the 2022 midpoint — this is a maturing claim space, not a growing one.
  • The largest holders filed nothing in the latest year. Assignees including IBM, Micron, Samsung, Hitachi, Toshiba and Mitsubishi Electric each show zero filings in the most recent year, though publication lag means this understates true recent activity.
  • Claim density concentrates in two IPC subclasses. H10B (memory device manufacture) and H01L (semiconductor devices) between them cover the large majority of the 9,492 families, while G01R-classed measurement approaches sit far behind at 140.
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9,492
Published Records
32%
Top-5 Share of All Records
-12%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (118 records) with 2024 (104) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 9,492 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this patent set covers

This landscape tracks patent families that combine DRAM cell or dynamic random access memory terminology with specific structural and circuit terms — capacitor scaling, buried word line, sense amplifier, and high-k capacitor — restricted to the IPC classes covering memory-device manufacture and static/digital memory circuits. It captures the fabrication and circuit-design layer of DRAM rather than the broader memory-systems or packaging literature.

The corpus spans publications from 2015 through the 2026 data cut-off and totals 9,492 published patent families, giving a large enough base to separate durable filing patterns from single-year noise.

Annual filings by publication year, 2017–2026
  1. 1INTERNATIONAL BUSINESS MACHINE CORPORATION824
  2. 2MICRON TECHNOLOGY INC795
  3. 3SAMSUNG ELECTRONICS CO LTD630
  4. 4KK TOSHIBA390
  5. 5TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD372
  6. 6SK HYNIX INC308
  7. 7INFINEON TECHNOLOGIES AG296
  8. 8RENESAS ELECTRONICS CORP287
  9. 9HITACHI LTD274
  10. 10TEXAS INSTRUMENTS INC261
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Numbers

Filing trend and technology composition

Two views matter here: the trajectory of filings over time, and how those filings split across IPC subclasses. Both point to a technology area with an established, occupied core rather than an emerging one.

Filings rose, peaked, then eased back

Annual filings climbed from 66 in 2017 to a peak of 118 in 2021, then settled near 96 by 2022 — a flat-to-declining pattern through the visible window. Because publication typically lags filing by around 18 months, the final one or two years in the chart will always understate true activity and should not be read as a cliff.

Filings rose, peaked, then eased back03060901206620172018201920201182021202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

H10B and H01L dominate the classification mix

H10B (memory device manufacture) appears in 7,241 records and H01L (semiconductor devices) in 6,390, with G11C (static and digital memories) a distant third at 3,620. Measurement-oriented filings under G01R sit at just 140, marking it as the thinnest-covered classification in the set rather than a growth frontier.

H10B and H01L dominate the classification mixH10B · Memory device manufacture7,24176.3%H01L · Semiconductor devices6,39067.3%G11C · Static & digital memories3,62038.1%H10D · Semiconductor devices (general)1,46715.5%H10P5535.8%G06F · Electric digital data processi…4314.5%H10W3223.4%G01R · Electric & magnetic measurement1401.5%Other5976.3%

Shares are the percentage of the 9,492 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

The records this field is built on

Representative Filing
US6627493B22003-09-30

Self-aligned capacitor-under-bit-line DRAM cell structure

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

The representative record describes a method for fabricating a DRAM cell structure by sequentially etching a hard mask layer and a capacitor plate layer to define a via over a bit-line source/drain region, then isotropically recessing the capacitor plate layer beneath the mask before filling the enlarged via with an inter-metal dielectric. The approach targets a self-aligned capacitor-under-bit-line (CUB) architecture.Filed by Taiwan Semiconductor Manufacturing Co., Ltd.; granted 2003-09-30.

US6627493B2 — patent drawing 1US6627493B2 — patent drawing 2
View full filing
Most-cited records in the corpus
#Publication no.Patent titleCitations
1US6472266B1Method to reduce bit line capacitance in cub drams618
2US5638317AHierarchical DRAM array with grouped I/O lines and high speed sensing circuit556
3US20130069052A1Memory cells, semiconductor devices, systems including such cells, and methods of fabrication541
4US5554557AMethod for fabricating a stacked capacitor with a self aligned node contact in a memory cell497
5US6166942AEmbedded DRAM architecture with local data drivers and programmable number of data read and data write lines493
6US20080157157A1Semiconductor integrated circuit device488
7US5013680AProcess for fabricating a DRAM array having feature widths that transcend the resolution limit of available p…479
8US6544837B1SOI stacked DRAM logic477
9US5367488ADRAM having bidirectional global bit lines463
10US5698869AInsulated-gate transistor having narrow-bandgap-source440

Ranked by citation count within this searched corpus; older filings accumulate citations simply by being available longer, so treat this as a map of influence, not of current relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the filing pattern tells a decision-maker

The numbers describe a field where the core architecture is settled and most remaining activity is refinement at the margins.

Trend
118 → 96
peak (2021) vs. 2022 filings

Growth has already crested

Filings peaked in 2021 and eased through 2022 rather than continuing to climb. Combined with the 18-month publication lag, this points to a technology whose core claim space was staked out earlier in the window and is now being consolidated rather than expanded.

Read alongside the filing-trend chart above.
Classification
7,241 records
H10B share of the corpus

Manufacturing claims dominate over circuit claims

H10B and H01L together cover the bulk of filings, meaning most protected ground concerns how the memory device is built rather than how it is operated. G11C circuit-level filings are present but secondary, and G01R measurement approaches are marginal at 140 records.

IPC composition, evidence summary.
Assignee activity
0 filings
latest-year count for several major holders

Established holders have gone quiet in the most recent year

IBM, Micron, Samsung, Hitachi, Toshiba and Mitsubishi Electric all show zero recorded filings in the latest year, with Micron down 100% year-on-year. Given the publication lag this likely reflects incomplete recent data rather than an actual halt, but it does mean recent-year rankings should not be taken at face value.

Recent-year momentum by assignee.
Collaboration
10 pairs
co-assignee relationships identified

Co-filing is limited and concentrated

Only ten co-assignee pairs appear in the dataset, the strongest linking IBM with Infineon Technologies (North America) at 83 shared families, IBM with Siemens at 68, and Hitachi with its own Hitachi ULSI Systems affiliate at 57. Most filers in this space patent independently.

Co-assignee pair counts, evidence summary.
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Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to dram technology landscape, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the ground, and where it thins out

Filing activity concentrates among a small group of long-established semiconductor and memory manufacturers, with a long tail of smaller filers behind them.

Concentration
9,492 families
total ranked assignee corpus

A dense core of established manufacturers

The assignee ranking is built across the same 9,492 patent families as the overall corpus, with named holders including IBM, Micron, Samsung, Hitachi, Toshiba, Mitsubishi Electric, SK hynix, Infineon, NEC and Texas Instruments appearing across the dataset. This is a field shaped by incumbent memory and foundry players rather than new entrants.

Assignee ranking, evidence summary.
Momentum
-100% YoY
Micron, latest year

Recent-year signals should be read cautiously

Several of the largest historical filers report zero filings in the most recent year. Because publications lag filings by roughly 18 months, this is more likely a data-cutoff artefact than a genuine pullback, but it means any latest-year leaderboard understates true current filing.

Recent-year momentum, evidence summary.
Collaboration
83 shared families
strongest co-assignee pair

Cross-filing is the exception, not the rule

IBM's joint filings with Infineon Technologies (North America) and with Siemens are the strongest collaborative links in the dataset, alongside Hitachi's internal filings with its ULSI Systems affiliate. With only ten pairs identified across 9,492 families, most protection here is built by single assignees working alone.

Co-assignee pairs, evidence summary.
🔍
Sub-areas with thinner claim coverage
Based on the IPC composition, these branches carry comparatively few filings relative to the core manufacturing classes.
High-k capacitor dielectric measurementSense amplifier offset-compensation circuitsBuried word line contact isolationCapacitor-under-bit-line via profilingElectric/magnetic parametric test methods
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
IBM (International Business Machines Corporation)0
Micron Technology, Inc.0-100%
Samsung Electronics Co., Ltd. (South Korea)0
Hitachi, Ltd.0
Toshiba Corporation0
Mitsubishi Electric Corporation0
SK hynix Inc.0
Siemens AG0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The filing and classification patterns above raise questions that are best answered against the full document set rather than summary statistics.

Check freedom-to-operate against the densest claims

With H10B and H01L covering the majority of filings, any new capacitor-scaling or buried-word-line design should be checked directly against the most-cited records in those classes before development proceeds.

Explore the full claim set in Eureka

Track the latest-year data as it fills in

The apparent drop-off among major holders in the most recent year is likely a publication-lag effect. Re-running the trend in a few quarters will clarify whether filing has genuinely slowed.

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Probe the under-claimed sub-areas directly

Sense amplifier offset compensation and measurement-oriented filings under G01R are thin relative to the core. A targeted search of that classification can confirm whether it is genuinely open or simply filed under different terms.

Run a targeted search in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about DRAM patent activity

Answers are grounded in the same dataset. Derived from a Patsnap search on DRAM Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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