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Power Integrity Simulation Patents: Leaders, Trends & Gaps 2026

Power Integrity Simulation Patents: Leaders, Trends & Gaps 2026
https://www.patsnap.com/resources/blog/rd-blog/eda-and-chip-design-power-integrity-simulation-patent-landscape-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Semiconductors & Microelectronics · Patent Landscape
EDA & Chip Design Power Integrity Simulation Patents
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14
Published Records
0%
Filing Growth 2021→2024
US
Leading Jurisdiction
11
Active Filers Ranked

Filing growth compares 2021 (2 records) with 2024 (2) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field.

Published byPatsnap Research··6 min readSourced from Patsnap Eureka
Landscape Overview

A narrow, method-heavy filing field

Power integrity simulation sits at the boundary between chip design tooling and physical verification: patent claims here describe how engineers model, measure and correct voltage noise and power delivery issues on and around a semiconductor die before it is manufactured. The scope defined by this dataset is small — 14 published records — but the composition is telling: the overwhelming majority of claims fall under G06F, the digital-data-processing class, meaning the field is dominated by simulation methods and software workflows rather than new physical structures.

Filing has been flat rather than growing across the only complete comparison window the data supports, and the assignee field is fragmented across 11 ranked companies with no single filer holding a commanding position. That combination — small record count, method-heavy claims, fragmented ownership — points to a field still being actively defined at the claim level rather than one already settled by an incumbent.

Records by receiving office and technology class
  1. 1SEAGATE TECH LLC3
  2. 2ANSYS INC3
  3. 3INTEL CORP2
  4. 4GUANGZHOU FASTPRINT CIRCUIT TECH CO LTD1
  5. 5IND TECH RES INST1
  6. 6HONEYWELL INTERNATIONAL INC1
  7. 7NANJING RES INST OF ELECTRONICS TECH1
  8. 8SHENZHEN FASTPRINT CIRCUIT TECH1
  9. 9ZHENGZHOU YUNHAI INFORMATION TECH CO LTD1
  10. 10SAMSUNG ELECTRONICS CO LTD1
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Filing Data

Filing trend and technology composition

The 14 records in scope span 2015 through the partial 2026 year, with technology claims concentrated in a small number of IPC subclasses.

Filing activity, 2017-2026

Filings peaked at 4 in 2018. The three-year comparison the dataset supports, 2021 (2) against 2024 (2), shows flat filing volume — 0% growth — over that span. Because publication trails filing by roughly 18 months, 2025 and 2026 figures are still incomplete and should not be read as a decline.

Filing activity, 2017-2026012343201742018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Where the claims sit

G06F digital-data-processing claims appear in 85.7% of the 14 records, confirming that most activity is simulation-method work rather than new device structures. H01L semiconductor-device claims (28.6%) and G05F variable-control claims (21.4%) form the next tier, with G01R, G11C and H04B each present in only one record (7.1%).

Where the claims sitG06F · Electric digital data processi…1285.7%H01L · Semiconductor devices428.6%G05F · Electric/magnetic variable con…321.4%H03K · Pulse technique & logic circui…214.3%H10N · Other electric solid-state dev…214.3%G01R · Electric & magnetic measurement17.1%G11C · Static & digital memories17.1%H04B · Transmission (general)17.1%

Shares are the percentage of the 14 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Filings

The most-cited and most representative filings

Representative Filing
KR1020110099966A2011-09-09

KR1020110099966A — Apparatus for generating current source in integrated circuit electromagnetic model and the method

SAMSUNG ELECTRONICS CO., LTD.

Filed by Samsung Electronics on 2011-09-09, this filing describes a method for generating a current source within an Integrated Circuit Electromagnetic Model (ICEM) — the power-source model used for power integrity and EMI simulation of semiconductor ICs. The method is built to apply varied input data patterns, including patterns carrying skew between them, so that PI/EMI simulation can proceed efficiently across different design cases.Abstract text is drawn directly from the filing as published.

KR1020110099966A — patent drawing 1KR1020110099966A — patent drawing 2
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Most-cited records in this landscape
#Publication no.Patent titleCitations
1CN109508505A一种印刷电路板电源完整性的仿真方法19
2US20200134116A1Simulation system and method8
3US10599798B1Double glitch capture mode power integrity analysis6
4CN107644122A一种ODB++文件修改方法、装置及可读存储介质6
5US20190370425A1On-die decoupling capacitor area optimization4
6US20210327801A1Platform power integrity design including package standard power integrity model and compact voltage regulato…3
7KR1020110099966AApparatus for generating current source in integrated circuit electromagnetic model and the method3
8US20200184135A1Double glitch capture mode power integrity analysis1

Ranked by citation count within the 14 records in scope; older filings tend to lead simply by having had more time to be cited.

Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Publication numbers are shown where the record carries one (8 of 8 rows); clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Signal Check

What the numbers actually indicate

Three findings stand out once the record counts, citation data and filing timeline are read together.

Filing Trend
0% growth
2021 → 2024

Volume is flat, not declining

The dataset's only valid complete-year comparison shows 2 filings in 2021 and 2 in 2024. The apparent drop-off after 2024 is a publication-lag artefact, not a real decline, since publication trails filing by roughly 18 months.

Peak year on record: 2018, at 4 filings.
Technology Mix
85.7%
of 14 records carry G06F

Claims cluster on method, not structure

Digital-data-processing claims dominate the record set, well ahead of the H01L device class (28.6%) and G05F control class (21.4%). Most competitive activity is on simulation workflow, not new physical hardware.

Classes overlap; shares do not sum to 100%.
Ownership
11 companies
in the ranked leaders

No single gatekeeper

The leader holds 3 filings; the field drops quickly to single-filing entrants by fifth place and beyond. This is a fragmented landscape rather than one controlled by a dominant incumbent.

Ranking counted in records, not families.
Citations
19 citations
highest in the set

Older simulation-method filings carry the most influence

CN109508505A leads the citation count at 19, followed by US20200134116A1 at 8. Both are simulation-method filings, suggesting the field's most referenced claim territory is computational rather than physical.

Citation counts favour older filings in any bounded corpus.
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Cross-border collaboration signal
AssigneeCo-assigneeShared families
YANG YIHONGWANG LONG2
YANG YIHONGTHOTA SRINIVAS2
YANG YIHONGSAM SU MI2
YANG YIHONGQIAN WEI2
YANG YIHONGCHEN JUE2
YANG YIHONGCHEN CHUNG HAO JOSEPH2
YANG YIHONGCHEN CHI TE2
YANG YIHONGCAI XING JIAN2

Co-assignee pairing in this dataset is limited to 10 pairs, with the strongest recurring pairing appearing twice across different collaborators — a modest but real signal of shared inventorship rather than purely single-assignee filing.

Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this analysis

This landscape flags the shape of the field; the next steps depend on whether the goal is clearance, monitoring, or filing strategy.

Verify freedom to operate on simulation methods

Since most claims cluster on G06F simulation workflows rather than device structures, a clearance search should focus on method claims first, particularly around the highest-cited filings.

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Track the fragmented assignee field

With 11 companies in the ranking and no dominant leader, new entrants and shifts in filing activity are easy to miss without ongoing monitoring.

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Test claim language in the under-claimed branches

G01R, G11C and H04B each appear in only one of the 14 records, leaving room to test claim scope before the space fills in.

Draft and check claims in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on EDA & Chip Design: Power Integrity Simulation Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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