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Electron Beam Melting Patents: Who Leads, Filing Trends 2026

Electron Beam Melting Patents: Who Leads, Filing Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/electron-beam-melting-process-monitoring-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Additive Manufacturing · Patent Landscape
Electron Beam Melting Process Monitoring Patents: Who Holds the Core Claims
  • Filing peaked in 2021 at 24 records and has since eased toward 15 by 2022, marking flat-to-declining claim activity rather than sustained growth in this window.
  • B22F and B33Y anchor 79 and 72 of 100 families while control systems, optics and AI-based computing each sit in single digits to low double digits — the clearest under-claimed ground.
  • General Electric and Concept Laser form the strongest co-assignee pair filing jointly 11 times, the single most concentrated blocking position in the dataset.
Get a prior-art report on your approach
100
Published Records
-58%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
15
Active Filers Ranked
Published byPatsnap Research··6 min readSourced from Patsnap Eureka
Overview

What this patent landscape covers

This landscape covers 100 patent families filed between 2015 and 2026 that combine electron beam powder bed fusion or related additive manufacturing with in-process monitoring — melt pool sensing, electron-optical monitoring, or embedded defect detection. The corpus is dominated by powder-bed apparatus claims rather than standalone sensing technology, with B22F and B33Y together touching the large majority of records.

Filing rose from 4 records in 2017 to a peak of 24 in 2021 before easing toward 15 at the 2022 midpoint, and receiving-office data shows the United States as the dominant jurisdiction at 57 records, ahead of the EPO at 24 and WIPO/PCT filings at 7. Publication lags filing by roughly 18 months, so the most recent year understates true activity.

Filing trend and IPC composition, 2015-2026
  1. 1GENERAL ELECTRIC CO42
  2. 2CONCEPT LASER19
  3. 3SMITH & NEPHEW INC14
  4. 4RENISHAW PLC11
  5. 5THE RES FOUNDATION FOR THE STATE UNIV OF NEW YORK6
  6. 6NIKON SLM SOLUTIONS AG5
  7. 7EOS GMBH ELECTRO OPTICAL SYST4
  8. 8SIEMENS ENERGY GLOBAL GMBH & CO KG2
  9. 9GE AVIO SRL2
  10. 10ARCAM AB2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Filing Activity

How filing activity and technology focus have shifted

The filing trend and IPC composition together show where claim density has built up and where the field's growth has already cooled.

Filing trend: a peak, then a pullback

Filings rose from 4 in 2017 to a peak of 24 in 2021, then eased to 15 by the 2022 midpoint — a pattern of flat-to-declining activity rather than sustained growth. The most recent year is partial and will read low regardless, since publication typically lags filing by around 18 months.

Filing trend: a peak, then a pullback0613192542017201820192020242021202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

Technology composition: powder-bed and additive manufacturing dominate

B22F (powder metallurgy) and B33Y (additive manufacturing) anchor the field at 79 and 72 records respectively, with B29C (plastics shaping) a distant third at 43. Control systems, optics and AI-based computing each sit in single digits to low double digits, marking them as the thinner, less-claimed branches of the same technology space.

Technology composition: powder-bed and additive manufacturing dominateB22F · Powder metallurgy7979.0%B33Y · Additive manufacturing (3D pri…7272.0%B29C · Shaping of plastics4343.0%B23K · Welding, soldering & brazing1515.0%A61B · Diagnosis & surgery1212.0%G05B · Control & regulating systems1010.0%G02B · Optical elements & systems99.0%G06N · Computing based on AI models88.0%Other3636.0%

Shares are the percentage of the 100 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

The families setting the boundaries of this field

Representative Recent Filing
US20260208267A12026-07-23

Systems and Methods for Simulating Process Monitoring

NIKON SLM SOLUTIONS AG

Describes a system that simulates process monitoring by a sensor system during an additive layer manufacturing process, taking in real sensor data alongside input parameters relating to the process and apparatus to generate a modelled monitoring output, rather than performing live monitoring itself.Filed by Nikon SLM Solutions AG, published 2026-07-23 — the most recent record in this dataset.

US20260208267A1 — patent drawing 1US20260208267A1 — patent drawing 2
View full filing
Most-cited records in the corpus
#Publication no.Patent titleCitations
1WO2017085468A1An additive manufacturing method and apparatus79
2US20170027624A1DMLS orthopedic intramedullary device and method of manufacture77
3US20190022946A1An additive manufacturing method and apparatus58
4US20200333295A1Enhanced non-destructive testing in directed energy material processing41
5US20190388128A1DMLS orthopedic intramedullary device and method of manufacture20
6US20210283717A1Systems and methods for compression, management, and analysis of downbeam camera data for an additive machine19
7US20180185959A1System and methods for fabricating a component based on local thermal conductivity of a build material19
8WO2015157703A2DMLS orthopedic intramedullary device and method of manufacture18
9US20230062971A1Apparatus, systems, and methods for monitoring, analyzing, and adjusting additive machine and build health an…14
10WO2023111542A1Defect identification in additive manufacturing based on time series in-process parameter data13

Citation counts favour older, earlier-filed records within this searched corpus; treat them as a measure of influence on later filings, not of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Signals

What the filing data signals for R&D and IP strategy

Three patterns stand out once families are read alongside citation weight and recent-year momentum.

Citation Concentration
79 cites
WO2017085468A1

Two early apparatus families anchor the prior art

WO2017085468A1 and US20170027624A1, cited 79 and 77 times respectively, function as the reference points nearly everything downstream has to design around. Both predate most monitoring-specific filings in this corpus.

Read as: freedom-to-operate work should start here, not with the newest filings.
Filing Momentum
24 → 15
2021 peak to 2022

Growth has already cooled from its peak

Filing rose steadily to 24 in 2021 before easing toward 15 at the 2022 midpoint. Combined with several major assignees showing zero filings in the latest year, this reads as a field consolidating around established positions rather than expanding.

The most recent year is partial; publication lag understates it further.
Claim Density
79 / 100
records in B22F

Powder-bed hardware claims dominate the classification

B22F and B33Y between them touch the large majority of families, meaning most granted and pending claims tie monitoring methods directly to powder-bed apparatus rather than treating sensing as a standalone technology.

Thinner branches — G06N, G02B, G05B — carry the open claim space.
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to electron beam melting process monitoring, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where activity is slowing

Ranking by family count shows a small set of repeat filers and a long tail of single-appearance assignees, with recent-year momentum tilting toward inactivity even among the largest holders.

Joint Filer
11 filings
co-assignee pair

General Electric and Concept Laser

The strongest co-assignee relationship in the dataset, with 11 joint filings concentrated in powder-bed apparatus claims — the deepest single blocking position identified in this corpus.

A second, smaller pair links General Electric with GE Avio.
Recent Filer
1 filing
latest year

Nikon SLM Solutions

The only assignee in the momentum data with a filing in the latest year, via the simulation-of-monitoring family US20260208267A1 — a narrower, downstream claim relative to the core sensing apparatus art.

Filed 2026-07-23, the most recent record in the dataset.
Established Holders
0 in latest year
multiple assignees

Major holders have gone quiet recently

General Electric, Concept Laser, Smith & Nephew and Renishaw all show zero filings in the latest year, with General Electric down -100% year-on-year — consistent with the broader post-2021 filing decline.

Reads as consolidation around existing claims, not withdrawal from the field.
🔍
Under-claimed sub-areas worth watching
Based on IPC subclasses with low record counts relative to the core apparatus classes
AI-based defect classificationclosed-loop beam-parameter correctionelectron-optical acquisition opticsin-build non-destructive testing integration
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Nikon SLM Solutions AG1
General Electric Company0-100%
Concept Laser GmbH0
Smith & Nephew, Inc.0
Renishaw plc0
THE RES FOUNDATION FOR THE STATE UNIV OF NEW YORK0-100%
EOS GmbH Electro Optical Systems0
University of Pittsburgh – Of the Commonwealth System of Higher Education0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The filing and citation patterns point to specific next steps depending on whether the goal is freedom-to-operate, white space filing, or competitive tracking.

Run a freedom-to-operate check against the core apparatus claims

Start with the two most-cited families rather than the newest filings — WO2017085468A1 and US20170027624A1 anchor the prior art that most later monitoring claims had to work around.

Check claim overlap in Eureka

Draft around the thinner IPC branches

G06N, G02B and G05B carry a fraction of the records that B22F and B33Y do, leaving room for claims that tie AI-based defect classification directly to closed-loop parameter correction.

Map white space in Eureka

Track assignee momentum, not just cumulative counts

Several major holders show zero filings in the latest year; watching who resumes filing first is a better early signal than the historical ranking alone.

Set up assignee alerts in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on electron beam melting process monitoring patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Electron Beam Melting Process Monitoring covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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