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Fault Isolation Patents: Who Leads, Where the Gaps Are 2026

Fault Isolation Patents: Who Leads, Where the Gaps Are 2026
https://www.patsnap.com/resources/blog/rd-blog/fault-isolation-and-failure-localization-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Semiconductor Failure Analysis
Fault Isolation and Failure Localization Patents
  • One clear leader, then a long tail. the top-ranked assignee holds 19 records against a fifth-place count of 4 and a tenth-place count of 2, across 28 ranked companies.
  • Filings are accelerating, not fading. 2021 to 2024 filings grew +400%, and 2022 remains the peak year at 7 filings so far.
  • Measurement and materials classes dominate claim space. G01R and G01N each cover more than a third of the 66 records in scope, with H01L close behind at 31.8%.
Get a prior-art report on your approach
66
Published Records
+400%
Filing Growth 2021→2024
US
Leading Jurisdiction
28
Active Filers Ranked

Filing growth compares 2021 (1 records) with 2024 (5) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

Fault isolation and failure localization sits at the intersection of electrical measurement, materials analysis and semiconductor device engineering. The search set combines core technique terms — photon emission microscopy, lock-in thermography, laser stimulation — with the physical-access problem every technique eventually runs into: backside access and sample preparation. That pairing is deliberate. A method claim for detecting a defect is only useful if it also survives contact with a real, packaged die.

The scope covers 66 published records filed between 2015 and 2026, with the most recent year necessarily undercounted because publication typically lags filing by around 18 months. The assignee ranking behind this page lists 28 companies, not a top-50 or top-100 cut — it is the complete set the data endpoint returns for this search.

Filing activity and technology composition, 2015-2026
  1. 1INTEL CORP19
  2. 2FEI EFA INC16
  3. 3FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV12
  4. 4BROWN UNIV RES FOUND INC5
  5. 5ULTRA TEC MFG4
  6. 6FEI CO4
  7. 7IHP GMBH INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS LEIBNIZ INSTITUT FÜR INNOVATIVE MIKROELEKTRONIK3
  8. 8ROBINSON JOSEPH C3
  9. 9CRYPTOGRAPHY RESEARCH INC2
  10. 10QUALCOMM INC2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Numbers

Filing trend and technology composition

Two views of the same 66-record set: how filing activity has moved year over year, and which IPC subclasses carry the claim density.

Filing trend: acceleration after a slow start

Annual filings ran at 5 in 2017, rose unevenly, and peaked at 7 in 2022. The evidence set also shows a sharper recent signal: 2021 (1 filing) to 2024 (5 filings) is a +400% increase over that three-year span, using 2024 as the last year that can be treated as complete before publication lag thins out the count.

Filing trend: acceleration after a slow start024685201720182019202020217202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

IPC composition: measurement and materials analysis lead

G01R (electric and magnetic measurement) appears in 40.9% of the 66 records and G01N (material analysis and testing) in 36.4%, with H01L (semiconductor devices) at 31.8%. Because a single record can carry several IPC classes, these shares add to more than 100% by design; H01J, H10W, H10D, H10N and H10P each sit in the 9-17% band, marking narrower but still active claim territory around electron-tube instrumentation and general semiconductor device structures.

IPC composition: measurement and materials analysis leadG01R · Electric & magnetic measurement2740.9%G01N · Material analysis & testing2436.4%H01L · Semiconductor devices2131.8%H01J · Electron & discharge tubes1116.7%H10W913.6%H10D · Semiconductor devices (general)69.1%H10N · Other electric solid-state dev…69.1%H10P69.1%Other3045.5%

Shares are the percentage of the 66 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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This page is one run against one query. Ask Eureka your own question about fault isolation and failure localization and every answer comes back with the patent numbers behind it.

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Key Patents

The most-cited records and a recent representative filing

Representative Recent Filing
US20240219460A12024-07-04

US20240219460A1 — Enhanced e-beam apparatus with nano-scale probe tips for fault isolation

INTEL CORPORATION

This disclosure describes systems, methods, and devices related to electron beam and nanoprobing techniques with probe tips for fault isolation in integrated circuits. A method may include generating a signal at a circuit device under test while a probe tip electrically interacts with a transistor of the circuit device under test; detecting, based on the signal and the laser at the transistor, an electrical output of the circuit device under test; and identifying, based on the electrical output, a location of a fault at the circuit device under test.Filed by Intel Corporation, published 2024-07-04.

US20240219460A1 — patent drawing 1US20240219460A1 — patent drawing 2
View full record
Most-cited records in this landscape
#Publication no.Patent titleCitations
1US20060012385A1Integration of photon emission microscope and focused ion beam85
2US20040207396A1Scanning magnectic microscope having improved magnetic sensor77
3US7145330B2Scanning magnetic microscope having improved magnetic sensor54
4US20110297829A1Three-dimensional hot spot localization41
5WO2011156527A1Three-dimensional hot spot localization35
6US20130174301A1Method and apparatus for in SITU preparation of serial planar surfaces for microscopy23
7US6245586B1Wire-to-wire bonding system and method23
8US8742347B2Three-dimensional hot spot localization21
9US20080142711A1Methods and systems of performing device failure analysis, electrical characterization and physical character…21
10US7842920B2Methods and systems of performing device failure analysis, electrical characterization and physical character…18

Citation counts inside a searched corpus favour older filings that have had more time to accumulate references — read them as a signal of influence on the field, not a ranking of current relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the data means for a filing decision

Three read-outs from the numbers above, framed around where claim space is occupied and where it is thinning out.

Concentration
19 vs 4
leader vs fifth place, records

One assignee well ahead, then a sharp drop-off

The leading assignee's 19 records are nearly five times the fifth-ranked company's 4, and the tenth-ranked company holds only 2. That gap suggests a single filer has built a defensive perimeter around core technique claims, while the rest of the 28 ranked companies are filing narrower, more opportunistic applications rather than competing head-on.

Based on the 28-company assignee ranking
Momentum
+400%
2021 to 2024 filings

Growth is real, but 2025-26 will read low until data catches up

Filings rose from 1 in 2021 to 5 in 2024, a genuine acceleration rather than noise. Treat 2025 and 2026 counts as provisional: publication lag means recent applications are still working through the pipeline, not that activity has cooled.

2022 remains the single peak year at 7 filings
Claim density
40.9%
of 66 records carry G01R

Measurement and materials classes are the most contested

G01R and G01N together anchor the bulk of filing activity, with H01L close behind. Any new filing targeting core electrical or thermal measurement methods is filing into the densest part of the landscape; the narrower H10-series classes, each under 14%, are comparatively open.

Shares sum to over 100% because records carry multiple IPC classes
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Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to fault isolation and failure localization, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the activity has gone quiet

The ranking spans 28 companies, from one clearly dominant filer down to single-digit entrants; recent-year momentum shows most of the top names have paused rather than withdrawn.

Leader
19 records
top-ranked assignee

Intel holds the deepest portfolio in this set

Intel's record count is well clear of the rest of the field, spanning both core fault-isolation methods and the representative 2024 e-beam probing filing. Its recent-year momentum shows 1 new filing in the latest year, indicating continued but no longer accelerating activity.

Recent-year momentum: 1 filing
Co-filing pattern
10 pairs
co-assignee pairs identified

One partnership dominates the collaboration graph

Fraunhofer and FEI EFA appear together 10 times, the strongest co-assignee link in the dataset by a wide margin over the next pairs, each at 3. That points to a sustained joint research programme around photon-emission and laser-stimulation techniques rather than one-off co-filings.

Next-strongest pairs each recur 3 times
Momentum check
0 in latest year
for most top-5 assignees

Recent activity has gone quiet across most named leaders

Outside Intel's single latest-year filing, the other tracked assignees — including Fraunhofer, FEI EFA, Brown University's research foundation, Cryptography Research and Ultra Tec — show 0 filings in the latest year. Given publication lag, this reads as a reporting gap rather than confirmed withdrawal from the field.

Momentum figures reflect publication-lag-affected recent years
🔍
Under-claimed branches worth a closer look
Sub-areas where filing density is visibly thinner than the core measurement classes.
defect-depth estimation modellingbackside sample preparation for advanced packaginge-beam nanoprobing tip designlock-in thermography signal processing3D hot-spot localization for stacked die
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Intel Corporation1
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.0
FEI EFA Inc.0
Brown University Research Foundation0
Cryptography Research Inc.0
ULTRA TEC MFG0
FEI Company0
SCHMIDT CHRISTIAN0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The landscape points to a concentrated core and a thinner periphery; the next steps depend on whether you are clearing a filing or scouting a gap.

Check freedom-to-operate against the leader's portfolio

With one assignee holding nearly five times the fifth-place count, any new filing in core photon-emission or laser-stimulation methods should be checked against that portfolio specifically, not just the field average.

Run a freedom-to-operate check in Eureka

Explore the under-claimed branches directly

Backside sample preparation and defect-depth estimation show thinner claim density than the core measurement classes. A first claim there has more room to stand on its own.

Explore white space in Eureka

Track the Fraunhofer/FEI EFA collaboration pattern

The strongest co-assignee pair in this dataset signals an active joint research line; monitoring its continuation is a low-cost way to anticipate the next wave of filings.

Set up assignee monitoring in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on Fault Isolation and Failure Localization covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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