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Focused Ion Beam Prep Patents: Top Companies & Trends 2026

Focused Ion Beam Prep Patents: Top Companies & Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/focused-ion-beam-sample-preparation-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Electron Microscopy
Focused Ion Beam Sample Preparation Patents: Who Leads and Where the Claim Space Is Still Open
  • 59.2% of all 360 records sit with the top five assignees combined, so most of the working claim space in FIB sample prep is already staked out by a small group.
  • Filing held steady, not surged, with 2021-to-2024 growth at +5% after a 2022 peak of 30 filings — this is a mature, not a rising, field.
  • H01J and G01N dominate at 51.4% and 25.0% of records respectively, while image processing (G06T) sits at just 6.7% — a comparatively thin layer given how central automation has become to lamella throughput.
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360
Published Records
59%
Top-5 Share of All Records
+5%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (22 records) with 2024 (23) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 360 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Field Overview

What focused ion beam sample preparation patents actually cover

Focused ion beam (FIB) sample preparation spans the hardware and process claims around milling, lifting out and thinning specimens for electron microscopy — gallium implantation control, milling angle geometry, curtaining artifact mitigation, and cryo transfer of frozen biological or battery samples. The 360 records in scope run from 2015 through the partial 2026 year, with the technology’s centre of gravity in electron-optical column and stage hardware rather than downstream software.

Because publication trails filing by roughly 18 months, the most recent one to two years in any trend understate real activity — a filing made in 2025 may not surface in the public record until well into 2026 or later.

Filing activity, 2017–2026
  1. 1FEI CO120
  2. 2CARL ZEISS SMT GMBH42
  3. 3HENNYZ BV19
  4. 4HITACHI GLOBAL STORAGE TECHNOLOGIES INC19
  5. 5E A FISCHIONE INSTR13
  6. 6THE PROVOST FELLOWS FOUNDATION SCHOLARS AND THE OTHER MEMBERS OF BOARD OF THE COLLEGE OF THE HOLY AND UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN11
  7. 7ULTRA SMALL FIBERS LLC8
  8. 8MAGNETIC PERIPHERALS INC7
  9. 9CANON KK6
  10. 10SEAGATE TECH LLC5
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Numbers

Filing trend and technology composition

Two views of the same 360-record corpus: how filings have moved year over year, and how the technology splits across IPC subclasses.

A steady field, not a growth story

Filings rose from 3 in 2017 to a peak of 30 in 2022, then settled to a modest +5% climb from 22 in 2021 to 23 in 2024 — the last year that can be read as complete. Treat 2025 and 2026 figures as still filling in rather than as a slowdown.

A steady field, not a growth story0815233032017201820192020202130202220232024202522026Most recent year is partial — publication lag means later filings are not yet visible.

Hardware claims outweigh software claims

H01J (electron and discharge tubes) touches 51.4% of the 360 records and G01N (material analysis and testing) another 25.0%, confirming that most claim activity sits in the instrument and process layer. G06T (image data processing) covers only 6.7% of records — thin, given how much automation now matters to preparation throughput.

Hardware claims outweigh software claimsH01J · Electron & discharge tubes18551.4%G01N · Material analysis & testing9025.0%H01L · Semiconductor devices8623.9%G03F · Photolithography & photomechan…5715.8%H10P4913.6%G11B · Information storage (magnetic/…3910.8%C23C · Coating & surface deposition256.9%G06T · Image data processing & genera…246.7%Other29180.8%

Shares are the percentage of the 360 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

The records other filings build on

Representative Recent Filing
US20240288370A12024-08-29

Real-time fluorescence monitoring for cryo-FIB milling

INSTITUTE OF BIOPHYSICS, CHINESE ACADEMY OF SCIENCES

Filed by the Institute of Biophysics, Chinese Academy of Sciences, this 2024 application describes a cryo-FIB device combining a vacuum chamber, ion beam system and a fluorescence imaging system arranged beneath a cryo stage. The fluorescence system performs real-time optical imaging on a frozen sample carrying a fluorescent marker during processing, giving the operator a live readout of target location as milling proceeds.Filed 2024-08-29 · Institute of Biophysics, Chinese Academy of Sciences

US20240288370A1 — patent drawing 1US20240288370A1 — patent drawing 2
View full record
Most-cited records in the corpus
#Publication no.Patent titleCitations
1US8171618B1Tunable pole trim processes for fabricating trapezoidal perpendicular magnetic recording (PMR) write poles148
2US6570170B2Total release method for sample extraction from a charged-particle instrument134
3US20040151991A1Photolithography mask repair89
4US5901432AMethod for making a thin film inductive write head having a pedestal pole tip and an electroplated gap69
5US5472566ASpecimen holder and apparatus for two-sided ion milling system66
6US20130216779A1Nanostructures from Laser-Ablated Nanohole Templates64
7US7442924B2Repetitive circumferential milling for sample preparation63
8WO2021180600A1Method of cross-section imaging of an inspection volumes in wafer56
9US20020121614A1Total release method for sample extraction from a charged-particle instrument56
10US20120112062A1Environmental Cell for Charged Particle Beam System48

Citation counts favour older filings inside a searched corpus — read them as a signal of influence on later work, not as a measure of current importance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the data means for filing strategy

Three read-outs from the corpus that matter more for a filing decision than the raw counts alone.

Concentration
59.2% of 360 records
top 5 combined share

The top of the field is crowded

The five leading assignees between them hold 213 of the 360 records in scope. A new filer entering core milling-angle or gallium-implantation claim territory is filing directly against instrument makers who have been building continuation families there for years.

Top 5 vs. all 360 records
Momentum
+5% 2021→2024
three-year filing growth

Growth is real but modest

The 2021-to-2024 span shows filing volume moving from 22 to 23, a +5% change after the field's 2022 peak of 30. That is consistent with an established technology being refined at the margins, not one being reinvented.

2021 = 22, 2024 = 23
Composition
6.7% of 360 records
G06T image processing share

Automation claims are thin relative to hardware

G06T (image data processing and generation) covers just 24 of the 360 records against H01J's 185. Given how much preparation throughput now depends on automated scripting and image-guided milling decisions, the software layer looks comparatively under-claimed.

G06T 24 records vs. H01J 185 records
Jurisdictions
163 US filings
leading receiving office

Filing is US- and EPO-centred

The United States receives 163 of the tracked filings, with the EPO at 80 and WIPO/PCT routes at 47. Germany, Austria and the UK each sit in the low teens, marking Europe as a secondary but active filing region for this technology.

US 163 · EPO 80 · WIPO 47
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Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to focused ion beam sample preparation, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the claim space

The assignee ranking covers 79 companies across the 360 records in scope — not a top-50 or top-100 cut, but the full set the data endpoint returns.

Leader
120 records
leading assignee

One filer sits well ahead of the field

The leading assignee's 120 records dwarf the fifth-place count of 13, showing a single dominant instrument maker rather than a tight cluster of comparable-sized filers at the very top.

Leader 120 vs. 5th place 13
Long tail
10th place: 5 records
entry point into the ranking

A long tail of smaller filers

By tenth place the count has fallen to 5 records, and the ranking runs to 79 companies total — most of them holding only a handful of families each. That tail includes university and instrument-service filers alongside the large manufacturers.

79 companies ranked, counted in records
Momentum
-80% YoY
leading tracked assignee, latest year

Recent-year activity has cooled among top filers

Several of the most active historical assignees show zero filings in the latest tracked year, and the one still filing is down 80% year over year. Given the 18-month publication lag, this reads as a data-visibility gap for 2025–2026 rather than confirmed withdrawal from the field.

Latest-year filings across leading assignees
🔍
Under-claimed sub-areas worth watching
Branches where filing density is comparatively low relative to the technology's role in current FIB workflows.
cryo transfer stage automationcurtaining artifact correction algorithmsautomated milling-angle scriptinggallium implantation depth controlimage-guided lamella endpoint detection
Rank all filers by momentum →
Filing momentum by assignee
AssigneeRecent yearYoY
Carl Zeiss SMT GmbH1-80%
FEI Company0
International Business Machines Corporation (IBM)0
Hennyz BV0
E A FISCHIONE INSTR0
The Provost, Fellows, Foundation Scholars and the other Members of Board of the College of the Holy and Undivided Trinity of Queen Elizabeth near Dublin0
Magnetic Peripherals Inc.0
Ultra Small Fibers LLC0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this next

The landscape points to specific questions worth running against the live dataset rather than against this snapshot.

Track the 2025–2026 filing gap

Several leading assignees show no filings in the latest tracked year. Re-running the trend in a few quarters, once publication catches up, will show whether that is a real pullback or just the reporting lag.

Explore filing trends in Eureka

Map the automation sub-claims in detail

G06T's 6.7% share is thin next to H01J's 51.4%. A finer breakdown of which specific automation and image-processing claims exist would clarify how open that space really is.

Search IPC subclasses in Eureka

Watch the top assignee's continuation pattern

With 120 of 360 records, the leading filer's family structure is worth tracing directly to see how claims have narrowed or broadened over successive continuations.

Trace assignee families in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on FIB sample preparation patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Focused Ion Beam Sample Preparation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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