Tungsten Plasma-Facing Component Patents: Leaders & Trends 2026
Filing growth compares 2021 (14 records) with 2024 (9) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 204 records in scope (CR5), not by the ranked leaders only.
What this landscape covers
Tungsten plasma-facing components sit at the intersection of fusion reactor engineering and materials science: tungsten’s high melting point and low sputtering yield make it the leading candidate for divertor and first-wall surfaces exposed directly to plasma. The search string behind this dataset captures 204 published records spanning 2015 to mid-2026, drawn from applicants that range from fusion-specific developers to materials and coating companies whose tungsten work originates in adjacent fields such as semiconductor CVD and drilling tool hardfacing.
Because publication trails filing by roughly 18 months, the 2025 and 2026 figures in any trend chart are still filling in and should not be read as a slowdown. The clearest complete-year comparison available is 2021 to 2024, and it shows filings down 36% over that span after the 2020 peak.
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Filing trends and technology composition
The record set spans multiple receiving offices and eight IPC subclasses, reflecting how tungsten plasma-facing work overlaps with coating science, semiconductor processing, drilling tools, alloy design, joining processes and battery materials.
Filing activity, 2017-2026
Filings rose from 3 in 2017 to a peak of 14 in 2020, held near that level through 2021, then declined 36% to 9 by 2024 — the last year with a largely complete publication count. Figures for 2025 and 2026 are understated because of publication lag and should not yet be read as a continued decline.
Technology composition by IPC subclass
Coating and surface deposition (C23C) covers 24.0% of the 204 records, the single largest technology grouping, followed by semiconductor devices (H01L) at 17.2% and earth and rock drilling (E21B) at 15.2% — a reminder that a meaningful share of tungsten plasma-facing filings originate from adjacent industrial uses of tungsten coatings rather than fusion reactors specifically. Fusion reactors (G21B) itself accounts for 11.3% of records, with alloys (C22C), welding/brazing (B23K) and battery materials (H01M) rounding out the remaining classes. Because records can carry multiple IPC codes, these shares add to more than 100% of the 204-record total.
Shares are the percentage of the 204 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
Go deeper on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape with Eureka
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Try EurekaRepresentative filing and most-cited prior art
US20020015466A1 — Plasma facing components of nuclear fusion reactors employing tungsten materials
In a plasma facing member exposed to a plasma beam of nuclear fusion reactors or the like, such as an electron beam, a tungsten layer is formed by the use of a CVD method and has a thickness of 500 micron meters or more. The tungsten layer may be overlaid on a substrate of molybdenum or tungsten and comprises included gases reduced to 2 ppm or less and impurities reduced to 2 ppm or less. The tungsten layer is specified by either a fine equi-axed grain structure or a columnar grain structure. Alternatively, the material of the substrate may be, for example, Cu alloy, stainless steel, Nb alloy, or V alloy.Filed by Japan Atomic Energy Research Institute; assignee and filing date are rendered separately above.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US6261648B1 | Plasma facing components of nuclear fusion reactors employing tungsten materials | 367 |
| 2 | US6610375B2 | Plasma facing components of nuclear fusion reactors employing tungsten materials | 363 |
| 3 | US5273588A | Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means | 242 |
| 4 | US5370739A | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD | 198 |
| 5 | US20090014056A1 | Micro concentrators elastically coupled with spherical photovoltaic cells | 169 |
| 6 | US20100129974A1 | Method for manufacturing a semiconductor integrated circuit devicecircuit device | 145 |
| 7 | US20110203791A1 | Coated sleeved oil and gas well production devices | 121 |
| 8 | US20110042069A1 | Coated sleeved oil and gas well production devices | 115 |
| 9 | US20110220348A1 | Coated Oil and Gas Well Production Devices | 112 |
| 10 | US20030183306A1 | Selected processing for non-equilibrium light alloys and products | 92 |
Citation counts reward older filings that have had more time to accumulate citations inside the searched corpus; treat them as a signal of influence on the field, not as a measure of current commercial relevance.
Each row carries its publication number; clicking a row searches Eureka by that number.
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Two of the five most-cited records in this landscape describe tungsten plasma-facing components directly; the other three trace back to semiconductor CVD reactor and photovoltaic art, showing how much of the tungsten deposition know-how in this space was established outside fusion before being pulled into it.
Filing is concentrated but not locked down
The leading assignee holds 18 records, with fifth place at 8 and tenth place at 6 — a fast drop-off that leaves most of the ranked field holding only a handful of filings each. That pattern is typical of a technology area still being staked out rather than one dominated by a single blocking portfolio.
Activity has cooled from its 2020 peak
Filings peaked at 14 in 2020, held near that level in 2021, then fell to 9 by 2024. Because 2025-2026 counts are still incomplete due to publication lag, this decline should be read as a real cooling from peak rather than continuing evidence of an ongoing fall.
Coating science, not reactor design, dominates the claims
Coating and surface deposition claims outnumber fusion-reactor-specific claims (G21B, 11.3%) by a wide margin, and semiconductor (17.2%) and drilling (15.2%) classes are also heavily represented — much of the patenting activity around tungsten plasma-facing surfaces originates in how to deposit and bond tungsten layers, a problem shared across industries.
Co-filing is limited and centred on a handful of inventors
Only 10 co-assignee pairs appear across the dataset, and the strongest links all involve the same corporate assignee paired with different named inventors. Most participants in this field file independently rather than through joint ventures or shared research programmes.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to fusion materials & components: tungsten plasma-facing components patent landscape, with the prior art for and against each one.
| Assignee | Co-assignee | Shared families |
|---|---|---|
| ExxonMobil Technology & Engineering Company | OZEKCIN ADNAN | 6 |
| ExxonMobil Technology & Engineering Company | JIN HYUNWOO | 6 |
| ExxonMobil Technology & Engineering Company | BAILEY JEFFREY R | 6 |
| OZEKCIN ADNAN | JIN HYUNWOO | 6 |
| OZEKCIN ADNAN | BAILEY JEFFREY R | 6 |
| ExxonMobil Technology & Engineering Company | ZHAO BO | 3 |
| ExxonMobil Technology & Engineering Company | WALKER TERRIS F | 3 |
| ExxonMobil Technology & Engineering Company | RAJAGOPALAN SRINIVASAN | 3 |
Co-assignee activity is thin and concentrated around one corporate applicant working with a small set of named inventors, rather than distributed across multiple industry partnerships.
Where to take this analysis
The figures above describe where filing has happened; deciding where to file next means testing a specific claim against the prior art directly.
Stress-test a claim against the most-cited prior art
Run a candidate claim on tungsten layer composition, thickness or substrate bonding against the most-cited records in this set before drafting, since several of the highest-citation documents originate outside fusion but still read on plasma-facing tungsten claims.
Open Patsnap EurekaTrack the under-claimed branches
Fusion-reactor-specific claims (G21B) sit well below coating and semiconductor-derived tungsten art in this dataset, suggesting room for claims that tie deposition methods explicitly to fusion divertor or first-wall geometry.
Explore with Patsnap EurekaCommon questions on tungsten plasma-facing component patents
The ranked leader in this dataset holds 18 of the 204 records in scope, with the field dropping off quickly after that — fifth place holds 8 and tenth place holds 6. That drop-off means no single assignee holds a blocking position across the whole technology; most of the ranked list holds only a handful of records each. Because the ranking covers 100 companies drawn from the full record set, it should be read as the ranked leaders rather than a top-50 or top-100 industry list.
Filings rose from 3 in 2017 to a peak of 14 in 2020, then fell 36% from 2021 (14) to 2024 (9), which is the most recent year with a reasonably complete publication count. Counts for 2025 and 2026 look lower still, but that reflects the roughly 18-month lag between filing and publication rather than an actual drop in activity. Based on the complete years available, the honest read is a cooling from a 2020 peak, not a currently collapsing field.
Coating and surface deposition (C23C) is the largest single class at 24.0% of the 204 records, followed by semiconductor devices (H01L) at 17.2% and earth and rock drilling (E21B) at 15.2%. Fusion reactors specifically (G21B) account for 11.3% of records, with alloys, welding/brazing and battery materials making up smaller shares. Records commonly carry more than one class, so these figures add up to more than 100% of the record total and should not be summed.
Tungsten CVD and coating methods developed for semiconductor wafer processing and for hardfacing drill tools use much of the same deposition and bonding science needed for plasma-facing surfaces, so patents filed for those industries often read on fusion-relevant claims. Several of the most-cited records in this dataset originate from semiconductor CVD reactor patents rather than fusion-specific filings. That overlap is a useful prior-art source when drafting new claims, since it broadens the pool of documents an examiner may cite against a fusion-labelled application.
Fusion-reactor-specific claims under G21B cover only 11.3% of the 204 records, a noticeably smaller share than the coating (24.0%), semiconductor (17.2%) and drilling (15.2%) classes that dominate the dataset. That gap suggests room for claims that tie tungsten deposition or bonding methods explicitly to fusion divertor or first-wall geometry rather than to generic coating processes. Co-assignee activity is also thin, with only 10 identified pairs, indicating limited joint filing that a new entrant with a fusion-specific angle could move into without crowding an existing partnership.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.