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Tungsten Plasma-Facing Component Patents: Leaders & Trends 2026

Tungsten Plasma-Facing Component Patents: Leaders & Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/fusion-materials-and-components-tungsten-plasma-facing-components-patent-landscape-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Fusion Materials & Components
Tungsten Plasma-Facing Component Patents: Who Files, Where the Claims Sit
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204
Published Records
27%
Top-5 Share of All Records
-36%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (14 records) with 2024 (9) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 204 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

Tungsten plasma-facing components sit at the intersection of fusion reactor engineering and materials science: tungsten’s high melting point and low sputtering yield make it the leading candidate for divertor and first-wall surfaces exposed directly to plasma. The search string behind this dataset captures 204 published records spanning 2015 to mid-2026, drawn from applicants that range from fusion-specific developers to materials and coating companies whose tungsten work originates in adjacent fields such as semiconductor CVD and drilling tool hardfacing.

Because publication trails filing by roughly 18 months, the 2025 and 2026 figures in any trend chart are still filling in and should not be read as a slowdown. The clearest complete-year comparison available is 2021 to 2024, and it shows filings down 36% over that span after the 2020 peak.

Filing activity and technology composition, 2015-2026
  1. 1EXXONMOBIL UPSTREAM RESEARCH COMPANY(US)18
  2. 2TOKAMAK ENERGY11
  3. 3ENERGY RELATED DEVICES INC9
  4. 4IHI HAUZER TECH COATING BV9
  5. 5KONDEX CORP8
  6. 6MATERIALS RES CORP7
  7. 7MT AEROSPACE7
  8. 8EXXONMOBIL TECHNOLOGY & ENGINEERING CO6
  9. 9BAILEY JEFFREY R6
  10. 10JIN HYUNWOO6
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The Data

Filing trends and technology composition

The record set spans multiple receiving offices and eight IPC subclasses, reflecting how tungsten plasma-facing work overlaps with coating science, semiconductor processing, drilling tools, alloy design, joining processes and battery materials.

Filing activity, 2017-2026

Filings rose from 3 in 2017 to a peak of 14 in 2020, held near that level through 2021, then declined 36% to 9 by 2024 — the last year with a largely complete publication count. Figures for 2025 and 2026 are understated because of publication lag and should not yet be read as a continued decline.

Filing activity, 2017-202604811153201720182019142020142021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Technology composition by IPC subclass

Coating and surface deposition (C23C) covers 24.0% of the 204 records, the single largest technology grouping, followed by semiconductor devices (H01L) at 17.2% and earth and rock drilling (E21B) at 15.2% — a reminder that a meaningful share of tungsten plasma-facing filings originate from adjacent industrial uses of tungsten coatings rather than fusion reactors specifically. Fusion reactors (G21B) itself accounts for 11.3% of records, with alloys (C22C), welding/brazing (B23K) and battery materials (H01M) rounding out the remaining classes. Because records can carry multiple IPC codes, these shares add to more than 100% of the 204-record total.

Technology composition by IPC subclassC23C · Coating & surface deposition4924.0%H01L · Semiconductor devices3517.2%E21B · Earth & rock drilling (wells)3115.2%H01J · Electron & discharge tubes2713.2%G21B · Fusion reactors2311.3%C22C · Alloys209.8%B23K · Welding, soldering & brazing167.8%H01M · Batteries, cells & fuel cells146.9%Other15977.9%

Shares are the percentage of the 204 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

Representative filing and most-cited prior art

Representative Filing
US20020015466A12002-02-07

US20020015466A1 — Plasma facing components of nuclear fusion reactors employing tungsten materials

JAPAN ATOMIC ENERGY RESEARCH INSTITUTE

In a plasma facing member exposed to a plasma beam of nuclear fusion reactors or the like, such as an electron beam, a tungsten layer is formed by the use of a CVD method and has a thickness of 500 micron meters or more. The tungsten layer may be overlaid on a substrate of molybdenum or tungsten and comprises included gases reduced to 2 ppm or less and impurities reduced to 2 ppm or less. The tungsten layer is specified by either a fine equi-axed grain structure or a columnar grain structure. Alternatively, the material of the substrate may be, for example, Cu alloy, stainless steel, Nb alloy, or V alloy.Filed by Japan Atomic Energy Research Institute; assignee and filing date are rendered separately above.

US20020015466A1 — patent drawing 1US20020015466A1 — patent drawing 2
View full filing
Most-cited records in this landscape
#Publication no.Patent titleCitations
1US6261648B1Plasma facing components of nuclear fusion reactors employing tungsten materials367
2US6610375B2Plasma facing components of nuclear fusion reactors employing tungsten materials363
3US5273588ASemiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means242
4US5370739ARotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD198
5US20090014056A1Micro concentrators elastically coupled with spherical photovoltaic cells169
6US20100129974A1Method for manufacturing a semiconductor integrated circuit devicecircuit device145
7US20110203791A1Coated sleeved oil and gas well production devices121
8US20110042069A1Coated sleeved oil and gas well production devices115
9US20110220348A1Coated Oil and Gas Well Production Devices112
10US20030183306A1Selected processing for non-equilibrium light alloys and products92

Citation counts reward older filings that have had more time to accumulate citations inside the searched corpus; treat them as a signal of influence on the field, not as a measure of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the concentration and citation data suggest

Two of the five most-cited records in this landscape describe tungsten plasma-facing components directly; the other three trace back to semiconductor CVD reactor and photovoltaic art, showing how much of the tungsten deposition know-how in this space was established outside fusion before being pulled into it.

Concentration
27.0%
of 204 records held by the top 5 assignees

Filing is concentrated but not locked down

The leading assignee holds 18 records, with fifth place at 8 and tenth place at 6 — a fast drop-off that leaves most of the ranked field holding only a handful of filings each. That pattern is typical of a technology area still being staked out rather than one dominated by a single blocking portfolio.

Top 10 combined reach 42.6% of the 204 records in scope.
Filing trend
-36%
2021 to 2024 filing change

Activity has cooled from its 2020 peak

Filings peaked at 14 in 2020, held near that level in 2021, then fell to 9 by 2024. Because 2025-2026 counts are still incomplete due to publication lag, this decline should be read as a real cooling from peak rather than continuing evidence of an ongoing fall.

Peak year: 2020 at 14 filings.
Technology mix
24.0%
of records classed under C23C (coating & surface deposition)

Coating science, not reactor design, dominates the claims

Coating and surface deposition claims outnumber fusion-reactor-specific claims (G21B, 11.3%) by a wide margin, and semiconductor (17.2%) and drilling (15.2%) classes are also heavily represented — much of the patenting activity around tungsten plasma-facing surfaces originates in how to deposit and bond tungsten layers, a problem shared across industries.

Eight IPC subclasses appear across the 204-record set.
Collaboration
10
co-assignee pairs identified

Co-filing is limited and centred on a handful of inventors

Only 10 co-assignee pairs appear across the dataset, and the strongest links all involve the same corporate assignee paired with different named inventors. Most participants in this field file independently rather than through joint ventures or shared research programmes.

Strongest pairs each recur across 6 shared records.
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Co-filing patterns
AssigneeCo-assigneeShared families
ExxonMobil Technology & Engineering CompanyOZEKCIN ADNAN6
ExxonMobil Technology & Engineering CompanyJIN HYUNWOO6
ExxonMobil Technology & Engineering CompanyBAILEY JEFFREY R6
OZEKCIN ADNANJIN HYUNWOO6
OZEKCIN ADNANBAILEY JEFFREY R6
ExxonMobil Technology & Engineering CompanyZHAO BO3
ExxonMobil Technology & Engineering CompanyWALKER TERRIS F3
ExxonMobil Technology & Engineering CompanyRAJAGOPALAN SRINIVASAN3

Co-assignee activity is thin and concentrated around one corporate applicant working with a small set of named inventors, rather than distributed across multiple industry partnerships.

Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The figures above describe where filing has happened; deciding where to file next means testing a specific claim against the prior art directly.

Stress-test a claim against the most-cited prior art

Run a candidate claim on tungsten layer composition, thickness or substrate bonding against the most-cited records in this set before drafting, since several of the highest-citation documents originate outside fusion but still read on plasma-facing tungsten claims.

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Track the under-claimed branches

Fusion-reactor-specific claims (G21B) sit well below coating and semiconductor-derived tungsten art in this dataset, suggesting room for claims that tie deposition methods explicitly to fusion divertor or first-wall geometry.

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Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on tungsten plasma-facing component patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Fusion Materials & Components: Tungsten Plasma-Facing Components Patent Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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