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GAA Wafer Bonding Patent Snapshot 2026

GAA Wafer Bonding Patent Snapshot 2026
Evidence Snapshot
GAA Wafer Bonding Patent Snapshot in 2026

GAA wafer bonding is a concentrated, early-growth field dominated by Université Catholique de Louvain, with a small cluster of major semiconductor companies entering as new filers in the most recent cycle. Filing activity has accelerated sharply from a near-zero base, though the absolute corpus remains limited, leaving meaningful room for new entrants to establish position.

6
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatSnap Insights Team··5 min readVerified by PatSnap Eureka data
Overview

Université Catholique de Louvain leads a tightly held, nascent field

The patent evidence snapshot for GAA wafer bonding is highly concentrated: Université Catholique de Louvain sits at the top of the applicant ranking, followed by Intel Corporation and a set of individual inventors and large-cap semiconductor firms each holding a single patent record.

The top five filers collectively account for 76% of the combined total across the ranked applicants visible in this query, signalling a steep tier gap between the academic leader and the rest of the field. No commercial incumbent has yet assembled a portfolio of meaningful depth.

Leading applicants
#ApplicantPatent recordsShare
1Université Catholique de Louvain7
2Intel Corporation3
3NEVE DE MEVERGNIES AMAURY1
4IBM (International Business Machines Corporation)1
5RASKINS JEAN PIERRE1
6DE MEVERGNIES AMAURY NEVE1
7Taiwan Semiconductor Manufacturing Co. (TSMC)1
8Tokyo Electron Ltd.1
9RASKIN JEAN PIERRE1
↗ Hover a row · click a company to ask Eureka

The leading position of an academic institution rather than a chip manufacturer suggests that foundational IP is still being established, and industrial players entering now — Intel, IBM, TSMC, and Tokyo Electron — are at an early stage of staking claims rather than defending mature positions.

Patent publication typically lags filing by 18–24 months, so the most recent period is likely under-represented in the current counts. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

Filing activity is rising sharply from a near-zero base, concentrated in semiconductor device classes

Two charts below capture the pace of activity and the technology composition of the corpus. Together they show a field in early growth with a narrow but deepening IPC footprint.

Annual filing trend

Activity was negligible from 2017 through 2021, registered its first meaningful cluster in 2022, and showed the highest single-year count in 2024. The 400% recent-window growth figure reflects acceleration from a very small base. The 2025 and 2026 bars should be treated as understated owing to publication lag.

Annual filing trendAnnual values from 2017 to 2026, peaking at 3 in 2024.02017020181201902020020212202202023320240202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

The corpus is overwhelmingly concentrated in H01L (semiconductor devices), confirming that filings address core device fabrication and integration rather than peripheral process equipment or materials. A single record appears under H10D (semiconductor devices, general), representing an adjacent but sparsely populated branch.

Technology compositionH01L · Semiconductor devices leads with 14; H10D · Semiconductor devices (general) 1.H01L · Semiconductor dev…14H10D · Semiconductor dev…1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US12057491B2Published 2024-08-06

Self-aligned gate endcap (SAGE) architectures with…

Intel Corporation

Self-aligned gate endcap (SAGE) architectures with gate-all-around devices above insulator substrates, and methods of fabricating self-aligned gate endcap (SAGE) architectures with gate-all-around devices above insulator substrates, are described. In an example, an integrated circuit structure includes a semiconductor nanowire above an insulator substrate… (excerpt from the patent abstract)

Self-aligned gate endcap (SAGE) architectures with… — patent drawingSelf-aligned gate endcap (SAGE) architectures with… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Fabrication method of so1 semiconductor devices316
2Fabrication method of so1 semiconductor devices8
33D single crystal silicon transistor design integr…7
4Fabrication method of SOI semiconductor devices5

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Université Catholique de Louvain

Université Catholique de Louvain

The institution holds 7 patent records — the largest portfolio in this corpus by a wide margin — focused entirely on H01L semiconductor device fabrication and transistor design. All co-filings involve individual researchers affiliated with the institution, indicating a faculty-led IP generation model. No momentum trend is reported for the leader, consistent with an established base position rather than a recent surge.

patent records: 7
Challenger · Intel Corporation

Intel Corporation

Intel holds 3 patent records and is classified as a new entrant with an upward momentum trend. Its technical focus spans H01L 21, H01L 27, and H01L 29 — covering semiconductor processing, integrated circuits, and transistor structures — signalling a broad-based rather than narrow entry into GAA wafer bonding IP. Given Intel’s scale and process-technology investment cycle, this new-entrant position could escalate rapidly.

patent records: 3
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Taiwan Semiconductor Manufacturing Co. (TSMC)Tokyo Electron Ltd.+ more
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Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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