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Gallium Oxide Power Device Patent Landscape 2026

Gallium Oxide Power Device Patent Landscape 2026
Competitive Landscape

Gallium Oxide Power Device Patent Landscape in 2026

Gallium oxide (Ga₂O₃) power devices remain an early-stage, research-dominated field with 39 patent families on record, led by Cornell University and concentrated heavily in semiconductor device structures. The field is still expanding on a multi-year basis, though annual volume has eased from its 2023 peak, and the competitive landscape is fragmented across universities and early-stage commercial entrants.

39
Patent families in scope
41%
Top-5 share of top-100 filers
+136%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Cornell University leads a fragmented, research-dominated field

Cornell University holds the top position with 6 patent families, followed by Power CubeSemi Inc. with 5 and Xidian University with 4. The top five filers together account for 41% of the hundred largest filers’ combined total, indicating moderate concentration at the top but a long tail of single-family contributors.

The tier gap between the leader and mid-tier applicants is narrow — the top three are separated by only two families — which suggests no single actor has yet established a commanding IP fortress. Most applicants hold only one or two patent families, consistent with a field still in early, exploratory R&D.

Leading applicants
#ApplicantPatent familiesShare
1Cornell University6
2Power CubeSemi Inc.5
3Xidian University4
4The Government of the United States of America2
5Sun Yat-sen University2
6Institute of Microelectronics, Chinese Academy of Sciences2
7PDPM INDIAN INST OF INFORMATION TECH DESIGN & MFG …2
8UNIV OF ELECTRONICS SCI & TECH OF CHINA2
9Mitsubishi Electric Corporation1
10TOYOTA MOTOR ENG & MFG NORTH AMERICA INC1
#ApplicantPatent familiesShare
11AGENCY FOR SCI TECH & RES1
12UNIV OF SCI & TECH OF CHINA1
13Foshan Institute of Sun Yat-sen University1
14Kyushu University1
15KING ABDULLAH UNIV OF SCI & TECH1
16Ohio State Innovation Foundation1
17Toyota Motor Corporation1
18Beijing Microelectronics Technology Institute1
19Beijing Mxtronics Corp.1
20Southeast University1
↗ Hover a row · click a company to ask Eureka

The presence of Cornell and multiple Chinese and Indian universities as the dominant filers, rather than established power semiconductor manufacturers, signals that industrialization of the technology is still nascent. Commercial entrants such as Power CubeSemi Inc. are beginning to appear, but the field remains largely pre-competitive.

The most recent 18–24 months of filings are systematically under-counted due to publication lag; the apparent slowdown after 2023 should not be read as a real decline. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Filing activity surged in 2023; semiconductor device structures dominate the technology mix

Two patterns define this landscape: a multi-year growth trajectory driven by a sharp 2023 spike, and an overwhelming concentration of filings in semiconductor device structure classes with only thin coverage of adjacent enabling technologies.

Annual filing trend

Annual filings were negligible before 2019, rose erratically through 2022, then peaked sharply at 14 families in 2023 before easing to 9 in 2024. The 2024 and 2025 figures are understated due to publication lag and should not be interpreted as a structural decline. The three-year recent window is up 136% versus the prior three-year window, confirming the field is still expanding on a multi-year basis.

Annual filing trendAnnual values from 2017 to 2026, peaking at 14 in 2023.020171201852019120205202132022142023920241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

H01L (Semiconductor devices) accounts for all 39 families, confirming the field is tightly defined around device architecture. H10D (Semiconductor devices, general) appears as a secondary class in 9 families. C30B (Crystal growth) covers only 5 families despite being a critical enabling step, and all remaining branches — H10W, B08B, G01R, H05K, H10P — each appear in 2 or fewer families, pointing to thin coverage of packaging, measurement, and substrate preparation.

Technology compositionH01L · Semiconductor devices leads with 39; H10D · Semiconductor devices (general) 9.H01L · Semiconductor dev…39H10D · Semiconductor dev…9C30B · Crystal growth5H10W2B08B · Cleaning (general)1G01R · Electric & magnet…1H05K · Printed circuits …1H10P1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20230326984A1Published 2023-10-12

Vertical gallium oxide (GA2O3) power fets

Cornell University

A vertical gallium oxide (Ga2O3) device having a substrate, an n-type Ga<sub>2</sub>O<sub>3 </sub>drift layer on the substrate, an, n-type semiconducting channel extending from the n-type Ga<sub>2</sub>O<sub>3 </sub>drift layer, the channel being one of fin-shaped or nanowire shaped, an n-type source layer disposed on the channel; the source layer has a… (excerpt from the patent abstract)

Vertical gallium oxide (GA2O3) power fets — patent drawingVertical gallium oxide (GA2O3) power fets — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Vertical gallium oxide (GA2O3) power fets39
2VERTICAL GALLIUM OXIDE (Ga 2O 3) POWER FETS26
3一种氧化镓衬底的表面处理方法及大尺寸氧化镓功率器件7
4Ga<sub>2</sub>O<sub>3</sub>薄膜材料及其柔性器件的制备方法7
5(AlxGa1-x)2O3/Ga2O3器件的外延层转移方法6
6基于超临界CO<sub>2</sub>处理的Ga<sub>2</sub>O<sub>3</sub>金…5
7一种优化横向氧化镓功率器件表面电场的结构及制备方法4
8Plurality of heat sinks for a semiconductor package2

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the IP structure means for R&D investment decisions

The combination of early lifecycle stage, fragmented ownership, and thin coverage outside core device structures creates both risk (uncertain IP freedom-to-operate in the dominant class) and opportunity (adjacent enabling technologies are largely unclaimed).

Growth

Growth stage — multi-year expansion with a 2023 peak

The field is classified as Growth. Recent three-year filings are 136% above the prior three-year window, confirming sustained multi-year expansion. Annual volume has eased from its 2023 peak, but publication lag means 2024–2025 data is not yet complete. Investors entering now are in an early-growth window, not a mature one.

Growth stage
Concentration

Moderate top-five share; no dominant incumbent

The top five filers account for 41% of the hundred largest filers’ combined total, and the gap between first and third place is only two patent families. No single applicant holds a blocking portfolio. This structure means freedom-to-operate risk is lower than in mature semiconductor fields, but first-mover advantage is still available to early commercial actors.

Fragmented
Collaboration

Xidian University anchors China’s collaborative cluster

Four collaboration pairs are on record. Xidian University (Xidian Univ) co-files with its Guangzhou Research Institute, with Beijing Mxtronics Corp, and with Beijing Microelectronics Technology Institute — forming a vertically integrated Chinese R&D cluster. Sun Yat-sen University similarly co-files with its Foshan Institute. No cross-border or industry-university collaborations involving non-Chinese entities are recorded, leaving international partnership opportunities open.

China-cluster
Geography

US leads filings; China is a strong second

The United States is the lead jurisdiction with 20 patent records, followed by China with 14. India and WIPO (PCT) each account for 2 records, and Singapore holds 1. The US advantage reflects Cornell’s and the US Government’s activity; China’s share is driven by multiple universities and institutes. PCT coverage is minimal, suggesting most filers are not yet pursuing broad international protection.

US + China
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Top collaboration links
ApplicantCollaboratorCo-filings
Xidian UniversityXidian University Guangzhou Research Institute1
Xidian UniversityBeijing Mxtronics Corp.1
Xidian UniversityBeijing Microelectronics Technology Institute1
Sun Yat-sen UniversityFoshan Institute of Sun Yat-sen University1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Cards are grounded in applicant ranking, collaboration pairs, jurisdiction records, and lifecycle data.Explore insights →
Leaders

Cornell University leads on fundamentals; Power CubeSemi Inc. is the top commercial filer

The two front-runners represent distinct strategic postures: an academic institution building foundational IP in device physics and crystal growth, and a commercial startup concentrated on manufacturable device structures.

Leader · Cornell University

Cornell University

Cornell holds 6 patent families and is a new entrant on the recent momentum measure, meaning its filings are concentrated in the most recent window. Its technology focus spans H01L 29 (semiconductor device structures), H10D 64 (general semiconductor devices), and C30B 29 (crystal growth) — a breadth that covers both device architecture and substrate fundamentals. This positioning makes Cornell a key licensor to watch as the field commercializes.

families: 6
Challenger · Power CubeSemi Inc.

Power CubeSemi Inc.

Power CubeSemi Inc. holds 5 patent families and is also a new entrant, with all filings in the recent window. Its focus is tightly on H01L 21 (semiconductor fabrication processes) and H01L 29 (device structures), with secondary coverage in H10D 62 — indicating a process-and-device orientation consistent with a commercial product development agenda rather than basic research. It is the only pure-play commercial Ga₂O₃ power device company in the top tier.

families: 5
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Xidian UniversityU.S. Government (HHS)+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Cornell University2▲ new entrant
Power CubeSemi Inc.5▲ new entrant
Xidian University2▲ new entrant
The Government of the United States of America (as represented by the Secretary of Health and Human Services)2▲ new entrant
University of Electronic Science and Technology of China2▲ new entrant
Sun Yat-sen University1▲ new entrant
PDPM INDIAN INST OF INFORMATION TECH DESIGN & MFG …2▲ new entrant
King Abdullah University of Science and Technology1▲ new entrant
Source: PatSnap Eureka. Player cards cite family counts from the applicant ranking and momentum from the recent-versus-prior filing window.Explore players →
Adjacent Branches

Crystal growth, packaging, and measurement are under-served adjacent branches

Several IPC classes that are technically necessary for a mature Ga₂O₃ power device supply chain show very sparse patent coverage relative to the dominant H01L device-structure class, suggesting these areas have received less focused IP attention to date.

C30B · Crystal growth

With only 5 patent families, crystal growth — a fundamental enabler for high-quality Ga₂O₃ substrates — is sparsely covered relative to device structures. Substrate quality directly determines breakdown voltage and defect density in finished devices. An entrant with proprietary bulk or epitaxial growth methods could establish a supply-chain chokepoint. Cornell’s presence here is notable but leaves room for specialized substrate suppliers.

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H05K · Printed circuits and assemblies / packaging

Only 1 patent family falls under H05K, despite thermal management and packaging being critical bottlenecks for wide-bandgap power devices operating at high temperatures. The near-absence of packaging IP is an observation of relative sparsity; given that Ga₂O₃’s thermal conductivity limitations are a known engineering challenge, this branch warrants monitoring as the technology approaches commercialization.

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See branch-level gap analysis across all IPC classes represented in this landscape.
G01R · Electrical measurement and characterizationH10W · Power semiconductor devices (heterojunction)+ more
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Source: PatSnap Eureka. Adjacent branch identification is based on low family counts in IPC classes relative to the dominant H01L class.Explore emerging →
Route Matrix

How leaders differ by technology route across IPC classes

Strength of each leader across the main technology routes.

PlayerH01L 21 · Semiconductor devicesH01L 29 · Semiconductor devicesH01L 23 · Semiconductor devicesC30B 29 · Crystal growthH10D 64 · Semiconductor devices (general)
Cornell UniversityAbsentStrong · 6AbsentStrong · 4Strong · 5
Power CubeSemi Inc.Strong · 5Strong · 3AbsentAbsentAbsent
Xidian UniversityStrong · 4Strong · 3AbsentAbsentAbsent
Sun Yat-sen UniversityStrong · 2Strong · 2Moderate · 1AbsentAbsent
PDPM Indian Institute of Information Technology, Design and Manufacturing JabalpurStrong · 2Strong · 2AbsentAbsentAbsent
Institute of Microelectronics, Chinese Academy of SciencesStrong · 2AbsentStrong · 2AbsentAbsent
The Government of the United States of America (as represented by the Secretary of Health and Human Services)Strong · 2Strong · 2AbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

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