GaN-on-Si 8-Inch Manufacturing Patent Snapshot
The defined corpus for GaN-on-Si 8-inch manufacturing is extremely nascent, with only 2 patent families indexed and activity split evenly between IQE and Narvellux Tech (Shenzhen). Annual filings have plateaued near their 2019 peak, signaling that this narrowly scoped search captures an early-stage niche rather than a broad competitive field.
Two applicants share all indexed activity equally
The corpus contains 2 patent families, with IQE and Narvellux Tech (Shenzhen) each holding 1 patent family — a perfectly balanced, two-player field at the top of the ranking.
The top five filers account for 100% of the ranked applicants visible in this query’ combined total, reflecting near-total concentration in a corpus this small. There is no meaningful tier gap — both applicants are co-leaders by default.
| # | Applicant | Patent families | Share |
|---|---|---|---|
| 1 | IQE plc | 1 | |
| 2 | Narvellux Tech (Shenzhen) Co., Ltd. | 1 |
China-based third-generation semiconductor firm suggests that patent activity in this precise topic is emerging from two distinct geographic and strategic angles simultaneously.
Patent publication lags of 18–24 months mean filings from 2024 onward are likely under-represented; the corpus size should be interpreted cautiously as a snapshot rather than a definitive measure of competitive intensity.
Isolated filing spikes and a semiconductor-dominant technology mix
The annual filing trend and technology composition charts together reveal a field with minimal sustained activity and a technology focus concentrated in semiconductor device classifications.
Annual filing trend
A single filing appeared in 2019 and another in 2022, with no activity recorded in surrounding years. This sparse, non-consecutive pattern is consistent with a very early-stage or narrowly defined topic rather than an established filing wave. The most recent years (2024–2026) should be treated as under-counted due to publication lag.
↗ Hover for values · click a bar to ask EurekaTechnology composition
H01L (Semiconductor devices) covers both families, confirming that device-level integration — rather than process equipment or materials handling — is the primary patent focus. H01S (Lasers and stimulated emission) and H10D (Semiconductor devices, general) each appear once, indicating secondary interest in optoelectronic and general device structures.
↗ Hover for values · click a bar to ask EurekaHighly cited patent families surfaced by the query
Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.
Stress Management Layer for GaN HEMT
A high electron mobility transistor comprising a nucleation layer having a first lattice constant, a back-barrier layer having a second lattice constant and a stress management layer having a third lattice constant which is larger than both first and second lattice constants. The stress management layer compensates some or all of the stress due to the… (excerpt from the patent abstract)


| # | Patent | Citations |
|---|---|---|
| 1 | 一种GaN基激光器和AlGaN/GaN HEMT集成器件制备方法 | 6 |
| 2 | Stress Management Layer for GaN HEMT | 2 |
Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.
Assignee snapshot from the current evidence set
The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.
IQE
IQE holds 1 patent family, focused on H01L 29 (semiconductor devices), H10D 30, and H10D 62 (general semiconductor device structures). Their momentum is flagged as a new entrant in the recent filing window, suggesting this is an early-stage position in the 8-inch GaN-on-Si space for a company otherwise well established in compound semiconductor epitaxy.
patent families: 1Narvellux Tech (Shenzhen)
Narvellux Tech (Shenzhen) — operating under the Shenzhen Research Institute for Third-Generation Semiconductors identity in the technology focus data — holds 1 patent family spanning H01L 27, H01L 29, and H01S 5, indicating a broader device-integration approach that includes laser and stimulated-emission structures alongside standard transistor device work.
patent families: 1Frequently asked questions
The defined corpus contains 2 patent families. This reflects a very narrowly scoped search topic, and the small corpus size should be interpreted alongside broader GaN-on-Si landscape data for full context.
IQE and Narvellux Tech (Shenzhen) each hold 1 patent family, making them co-leaders by count. No other applicants appear in the indexed corpus.
The evidence classifies this field as Maturity, with annual filings having plateaued near their peak. The single filing years were 2019 and 2022, and recent-window growth is zero.
H01L (Semiconductor devices) covers both families. H01S (Lasers and stimulated emission) and H10D (Semiconductor devices, general) each appear once, indicating secondary optoelectronic and general-device coverage.
One patent record is filed in China and one in the United States. No European, Japanese, Korean, or other jurisdictions appear in the current corpus.
No co-applicant or collaborative filing relationships are recorded in this corpus. Both IQE and Narvellux Tech (Shenzhen) have filed independently.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.