https://www.patsnap.com/resources/blog/rd-blog/gan-on-silicon-buffer-and-stress-engineering-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Semiconductors
GaN on Silicon Buffer and Stress Engineering Patents
  • 24.5% concentration. The five most active assignees hold 158 of 645 records in scope, but the remaining three-quarters are spread across a long tail of single- and few-filing entrants.
  • Filing has cooled since 2018. Annual filings peaked at 48 in 2018 and had fallen to 12 by 2026 (a partial year), with the 2022 midpoint of 27 confirming a flat-to-declining trend rather than a temporary dip.
  • Crystal growth is a distinct cluster. 16.3% of records carry a C30B crystal-growth classification alongside core H01L semiconductor-device claims, marking buffer and substrate engineering as a separable filing strategy from device claims.
Get a prior-art report on your approach
645
Published Records
24%
Top-5 Share of All Records
-13%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (32 records) with 2024 (28) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 645 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

GaN-on-silicon buffer and stress engineering addresses a specific, well-known problem: gallium nitride and silicon have mismatched lattice constants and thermal expansion coefficients, so growing crack-free, low-dislocation GaN on a silicon wafer requires graded buffer layers, nucleation control and stress management to avoid wafer bow and breakdown failure. This dataset covers 645 published records filed between 2015 and mid-2026 that combine gallium nitride, composition-graded AlGaN or AlN nucleation-layer language with claims touching wafer bow, crack-free thickness, vertical breakdown, carbon doping, dislocation-density reduction or layer compatibility.

Because publication typically lags filing by around 18 months, the most recent filing year in any trend line understates real activity; treat the last one to two years as a floor rather than a ceiling. The picture below uses patent families rather than raw document counts where possible, since families are the fairer unit for comparing filing strategies across jurisdictions.

Filing activity and technology composition, 2015–2026
  1. 1NORTH CAROLINA STATE UNIV51
  2. 2QROMIS INC41
  3. 3NICHIA CORP23
  4. 4TEXAS INSTRUMENTS INC22
  5. 5MICRON TECHNOLOGY INC21
  6. 6SOITEC SA19
  7. 7RFHIC CORP17
  8. 8VEECO INSTRUMENTS INC16
  9. 9WOLFSPEED INC14
  10. 10AKASH SYSTEMS INC13
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Let an AI agent run this analysis on your own technology

Pick a task. Every answer cites the patents behind it.

10,000 free credits to start
The Numbers

Filing trend and technology composition

Two views of the same 645 records: how filing activity has moved year over year, and how those records distribute across IPC subclasses. Because a single record can carry several IPC classes, the composition shares add up to more than 100% of the record total.

Filings rose to a 2018 peak, then declined

Annual filings climbed to 48 in 2018 from 45 in 2017, held near the 2022 midpoint of 27, and fell to 12 by 2026 — a partial year that will revise upward as later publications land, but the multi-year direction is down rather than flat.

Filings rose to a 2018 peak, then declined0132538504520174820182019202020212022202320242025122026Most recent year is partial — publication lag means later filings are not yet visible.

H01L dominates; crystal growth is a real secondary cluster

H01L (semiconductor devices) appears on 83.7% of the 645 records, as expected for a device-heavy topic. Beneath it, H10D and H10P device sub-classes and C30B crystal growth (16.3%) show that a meaningful share of filers are claiming the substrate and growth process itself, not just the finished transistor or LED structure.

H01L dominates; crystal growth is a real secondary clusterH01L · Semiconductor devices54083.7%H10D · Semiconductor devices (general)18027.9%H10P11618.0%C30B · Crystal growth10516.3%H01S · Lasers & stimulated emission416.4%C23C · Coating & surface deposition385.9%H10W365.6%G11C · Static & digital memories213.3%Other20231.3%

Shares are the percentage of the 645 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

Go deeper on GaN on Silicon Buffer and Stress Engineering with Eureka

This page is one run against one query. Ask Eureka your own question about gan on silicon buffer and stress engineering and every answer comes back with the patent numbers behind it.

Try Eureka
Representative Filing

A representative claim in this space

Representative Record
US9608103B22017-03-28

High electron mobility transistor with periodically carbon doped gallium nitride (US9608103B2, Toshiba, 2017-03-28)

TOSHIBA CORPORATION

The patent covers a HEMT device built from a channel layer stack of alternating undoped and periodically carbon-doped GaN layers beneath a barrier layer, with the doping pattern used to manage trap states and buffer resistivity through the growth stack.Carbon doping is one of the named search terms behind this dataset because it is a common route to increasing vertical breakdown voltage without adding dislocations — this record shows how that mechanism gets reduced to a specific layer structure in claim language.

US9608103B2 — patent drawing 1US9608103B2 — patent drawing 2
View full record
Most-cited records in the dataset
#Publication no.Patent titleCitations
1US6046464AIntegrated heterostructures of group III-V nitride semiconductor materials including epitaxial ohmic contact …747
2US5679965AIntegrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact,…603
3US5670798AIntegrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact …582
4US20160155629A1Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations474
5US9929011B2Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations462
6US6447604B1Method for achieving improved epitaxy quality (surface texture and defect density) on free-standing (aluminum…353
7US6261929B1Methods of forming a plurality of semiconductor layers using spaced trench arrays318
8US6255198B1Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelec…285
9US6521514B1Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on sapphire substrates246
10US5585648AHigh brightness electroluminescent device, emitting in the green to ultraviolet spectrum, and method of makin…237

Ranked by citation count within this corpus. Older foundational filings accumulate more citations simply by being available longer, so treat this as a signal of influence on the field rather than of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Run it yourself

Put your own technology through the same analysis


  
Where to run it
Fastest

Eureka on the web

When you want the answer in the next five minutes.

The agent works the prompt against patents and technical literature, citing every source.

Run your analysis now →
For builders

MCP server & REST API

When it has to run inside your own pipeline.

Patent search, landscape analysis and assignee resolution as MCP tools. Drop them into any agent framework, or call REST directly.

Browse MCP servers →
Analysis

What the filing pattern tells a decision-maker

The numbers point to a field with an established core, cooling overall activity, and secondary claim clusters that are less crowded than the headline device claims.

Concentration
24.5%
of 645 records held by top 5

Leadership is real but not dominant

The leading assignee holds 51 records and the fifth-ranked holder 21, with the top five together accounting for 24.5% of the 645 records in scope. That leaves roughly three-quarters of filings spread across a long tail, so freedom-to-operate work cannot stop at the largest few names.

Based on the 100-company ranking returned by the dataset
Momentum
48 → 12
peak-year to latest-year filings

Activity has slowed from its 2018 peak

Filings rose to 48 in 2018, sat at 27 by the 2022 midpoint, and had fallen to 12 by 2026, a partial year. Recent-year momentum by individual assignee shows most of the historically active filers recording zero filings in the latest year, with only one showing continued activity.

2026 figure is a partial year and will revise upward
Technology mix
16.3%
of records carry C30B crystal growth

Substrate and growth claims form a distinct cluster

Beyond the dominant H01L device classification, C30B crystal growth appears on 105 of 645 records and C23C coating/deposition on 38, indicating that buffer and nucleation-layer process claims are pursued as a filing strategy separate from finished-device claims.

IPC shares sum above 100% because records carry multiple classes
Filing geography
332
US-office records

Filing is US-centred with meaningful PCT and EPO activity

The United States receives the largest share of filings at 332 records, ahead of the EPO at 80, WIPO/PCT at 68, China at 56, India at 31 and Singapore at 20 — a distribution consistent with a technology whose commercial device manufacturing and litigation exposure both concentrate in the US.

Counts are receiving-office totals, not unique families per office
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to gan on silicon buffer and stress engineering, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Assignee Landscape

Who holds the claim space, and where it thins out

The ranked leaders span universities, pure-play GaN foundries, IDMs and equipment makers, reflecting a field where both device houses and materials/equipment suppliers file. Recent-year momentum has dropped to near zero for most of the historically active names.

Rank 1
51
records

A university-anchored core

The leading assignee's 51 records, combined with strong co-assignee pairings with individual named inventors, point to a long-running academic research program that has been a foundational source of buffer and nucleation-layer IP rather than a single commercial filer.

Strongest co-assignee pairs each recur 5 times
Momentum
2
latest-year filings, highest of tracked assignees

Most historic leaders have gone quiet

Of the assignees tracked for recent-year momentum, only one recorded filings in the latest year; the others, including several ranked among the most active historically, show zero. This is consistent with the broader decline from the 2018 peak rather than a single company's retreat.

Momentum reflects the most recent tracked filing year
Tail
36.7%
of 645 records held by top 10

A long tail beyond the ranked leaders

The top 10 combined account for 36.7% of the 645 records in scope, meaning the majority of filings sit with entities outside the most active ten — a pattern typical of a mature, widely practiced process technology rather than one locked up by a handful of players.

Based on the 100-company ranking returned by the dataset
🔍
Under-claimed sub-areas worth checking before filing
These branches show thinner representation in the IPC composition relative to the core H01L device cluster, based on the classes and search terms in scope.
Carbon-doped buffer resistivity controlComposition-graded AlGaN transition schemesCrack-free thickness threshold claimsWafer bow compensation for large-diameter siliconDislocation-density reduction via rapid thermal processing
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Texas Instruments Inc.2
North Carolina State University0
Qromis Inc.0
Micron Technology Inc.0
Nichia Corporation0
Soitec SA0
Veeco Instruments Inc.0
PGT International Inc.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this analysis

The dataset points to specific questions worth running deeper diligence on before committing engineering or legal resources.

Map freedom-to-operate against the long tail

With three-quarters of records held outside the top five assignees, a freedom-to-operate check needs to cover the ranked tail, not just the most visible names.

Explore assignee detail in Eureka

Test claim scope on the under-claimed branches

Crack-free thickness and wafer-bow compensation claims are thinner in this dataset than core device claims, which may leave room for a well-drafted first claim.

Run a claim-scope search in Eureka

Watch for renewed filing activity

Filing has declined from its 2018 peak, but the most recent year is a partial one; a fresh pull closer to 2027 will show whether activity is stabilising or continuing to fall.

Set up monitoring in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on GaN on Silicon Buffer and Stress Engineering covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Research GaN on Silicon Buffer and Stress Engineering in depth with Eureka

Go past this page: query the whole gan on silicon buffer and stress engineering corpus yourself, in your own scope.
Every answer comes back with patent numbers you can open.

Try Eureka

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.