Book a demo

Geopolymer 3D Printing & Automation Patent Snapshot

Geopolymer 3D Printing & Automation Patent Snapshot
Evidence Snapshot
Geopolymer 3D Printing & Automation Patent Snapshot in 2026

The patent corpus for geopolymer 3D printing and automation is nascent, with only 2 families on record held by two separate academic and research institutions. The field is effectively open: concentration is absolute among the current filers, yet the minuscule absolute total signals a pre-assignee snapshot with substantial room for new entrants.

2
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
India
Leading jurisdiction
↗ Tap any metric to explore the underlying patents and uncover deeper insights in Patsnap Eureka
Published byPatsnap Insights Team··4 min readVerified by Patsnap Eureka data
Overview

Two institutions define a near-empty field

Instituto Politécnico de Leiria and the Indian Institute of Science each hold 1 patent family, together accounting for all indexed activity in geopolymer 3D printing and automation. No corporate players appear in the current ranking.

The top five filers’ share of the ranked applicants visible in this query stands at 100%, but this figure reflects a corpus of just 2 patent families — concentration is technically absolute only because activity has barely started.

Leading applicants
#ApplicantPatent familiesShare
1Instituto Politécnico de Leiria1
2Indian Institute of Science1
↗ Hover a row · click a company to ask Eureka

The absence of large industrial assignees implies that the field has not yet attracted sustained corporate R&D investment; both leading positions are held by research institutions, suggesting the technology remains at an exploratory, proof-of-concept stage.

The most recent filing visible in the dataset (2025) is subject to standard publication lag and may undercount activity from the past 18–24 months; the true current corpus could be modestly larger than indexed. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Sporadic filings and a core additive-manufacturing technology base

The annual filing trend and technology composition together characterise geopolymer 3D printing as an early-stage field with isolated activity spikes rather than sustained growth. The IPC class mix confirms that additive manufacturing is the defining technological framework, with adjacent materials and shaping classes in supporting roles.

Annual filing trend

Filings were zero from 2017 through 2021, with a single family appearing in 2022 and another in 2025; no year shows more than one filing. The 2025 data point is subject to publication lag and may not represent a trend. No multi-year growth trajectory can be inferred from two isolated data points.

Annual filing trendAnnual values from 2017 to 2026, peaking at 1 in 2022.02017020180201902020020211202202023020241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B33Y (Additive manufacturing / 3D printing) is the only class present in both patent records, confirming it as the field’s technological anchor. B22F (Powder metallurgy), B28B (Shaping of clay and cement products), B29C (Shaping of plastics), and C04B (Ceramics, cement and refractories) each appear once, reflecting the materials-science breadth of geopolymer formulation work adjacent to the printing process.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 2; B22F · Powder metallurgy 1.B33Y · Additive manufact…2B22F · Powder metallurgy1B28B · Shaping clay & ce…1B29C · Shaping of plastics1C04B · Ceramics, cement …1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2022265529A1Published 2022-12-22

Powder deposition system configured for the manufa…

Instituto POLITÉCNICO De Leiria

The invention relates to a powder deposition system for the manufacturing of objects by additive manufacturing comprising powder deposition devices (1), which include a powder deposition nozzle; a deposition chamber (3), which comprises limiting walls and a printing table; and a curing and hardening fluid addition subsystem (8) to add the curing and… (excerpt from the patent abstract)

Powder deposition system configured for the manufa… — patent drawingPowder deposition system configured for the manufa… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Powder deposition system configured for the manufa…2

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Instituto Politécnico de Leiria

Instituto Politécnico de Leiria

Holds 1 patent family with technology emphasis on powder metallurgy process steps (B22F) and clay/cement product shaping (B28B), indicating a focus on the deposition and forming mechanics of geopolymer printing. Momentum is flagged as a new entrant, meaning the institution entered the indexed corpus for the first time in the recent period from a zero prior base.

families: 1
Challenger · Indian Institute of Science

Indian Institute of Science

Holds 1 patent family with emphasis on additive manufacturing output specifications (B33Y 80) and ceramics/cement chemistry (C04B 22, C04B 28), reflecting a materials-science approach centred on geopolymer binder composition and cured-product properties. No prior-period baseline is available for momentum comparison.

families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Instituto Politécnico de LeiriaIndian Institute of Science+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

Still have questions? Patsnap Eureka answers them from patent and research data.Ask Eureka →

Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Explore in Eureka ↗
Powered by Patsnap Eureka

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.