Book a demo

HEA Alloy Design ML Patent Landscape 2026

HEA Alloy Design ML Patent Landscape 2026
Competitive Landscape
HEA Alloy Design ML Patent Landscape in 2026

The machine-learning-driven high-entropy alloy design space is in a clear growth phase, with filings expanding roughly 90% over the recent window and Chinese academic institutions holding the dominant positions. Activity is concentrated in China but fragmented across many applicants, leaving meaningful white space in processing and application branches adjacent to the core computational chemistry cluster.

135
Patent families in scope
16%
Top-5 share of top-100 filers
+90%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
↗ Tap any metric to explore the underlying patents and uncover deeper insights in PatSnap Eureka
Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Chinese universities lead a still-fragmented field

Shanghai University holds the top position among ranked applicants, followed by Zhengzhou University and Zhejiang Weixiang Materials Technology Co., Ltd., each with 5 patent families, and a cluster of institutions at 4 patent families including the University of Science and Technology Beijing, Central South University, Harbin University of Science and Technology, Seoul National University R&DB Foundation, and Lehigh University.

The top five filers account for only 16% of the combined total of the hundred largest filers, indicating a highly fragmented competitive structure with no single organization holding a commanding share. The tier gap between the leader and the second tier is narrow — one or two families — so rankings are fluid and could shift quickly with a single filing burst.

Leading applicants
#ApplicantPatent familiesShare
1Shanghai University7
2Zhengzhou University5
3Zhejiang Weixiang Materials Technology Co., Ltd.5
4UNIV OF SCI & TECH BEIJING4
5Central South University4
6HARBIN UNIV OF SCI & TECH4
7SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION4
8Lehigh University4
9Hamilton Sundstrand Corporation3
10Hunan University3
#ApplicantPatent familiesShare
11Beijing Institute of Technology3
12Northwestern Polytechnical University3
13City University of Hong Kong3
14Guizhou University3
15POSTECH Academy-Industry Foundation3
16Dalian University of Technology3
17Northeastern University (China)2
18Soochow University2
19Indian Institute of Technology Kharagpur2
20Xi’an Jiaotong University2
↗ Hover a row · click a company to ask Eureka

The dominance of universities across the top tier signals that IP in this field is still largely being generated by academic research groups rather than industrial players, with Hamilton Sundstrand Corp being a notable exception as the highest-ranked industrial assignee. This creates an acquisition and licensing opportunity for manufacturers seeking foundational ML-for-HEA patents.

The most recent 18–24 months of data are understated due to patent publication lag; 2025 and 2026 figures should be read as floor estimates, not final counts. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Filings are accelerating and the technology mix spans alloy composition to AI infrastructure

The annual trend chart illustrates the field’s growth trajectory from 2017 onward, while the technology composition chart reveals how activity is distributed across alloy, computational, and processing branches.

Annual filing trend

Activity was minimal through 2018, then stepped up from 2019 onward, with a pronounced acceleration from 2022 to 2024. The 2025 and 2026 bars are understated due to publication lag and should not be interpreted as a plateau or decline — they represent incomplete counts for those years.

Annual filing trendAnnual values from 2017 to 2026, peaking at 41 in 2025.42017420181120198202010202119202215202321202441202522026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) is the dominant branch, reflecting the core alloy-composition claims, followed by G16C (Computational chemistry) and the paired G06F/G06N digital-processing and AI-models branches. B22F (Powder metallurgy) and C23C (Coating and surface deposition) represent the largest secondary clusters, confirming that ML is being applied not just to composition prediction but also to processing routes. Downstream application branches such as B33Y (Additive manufacturing), B22D (Metal casting), and A61F (Implants and prostheses) each carry very low counts, signaling underserved territory.

Technology compositionC22C · Alloys leads with 87; G16C · Computational chemistry 62.C22C · Alloys87G16C · Computational che…62G06F · Electric digital …36G06N · Computing based o…36B22F · Powder metallurgy24C23C · Coating & surface…15C22F · Non-ferrous metal…11B33Y · Additive manufact…9↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20230041431A1Published 2023-02-09

Efficient High-Entropy Alloys Design Method Includ…

University Of Virginia Patent Foundation

Embodiments relate to a system for predicting thermodynamic phase of a material. The system includes a phase diagram image scanning processing module configured to scan a binary phase diagram for each material to be used as a component of a high-entropy alloy (HEA). The system includes a feature computation processing module configured to generate a primary… (excerpt from the patent abstract)

Efficient High-Entropy Alloys Design Method Includ… — patent drawingEfficient High-Entropy Alloys Design Method Includ… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1一种基于机器学习的高熵合金硬度预测方法50
2High-entropy multielement alloy matrixcoating comp…41
3一种CrFeCoNiNbx高熵合金及其制备方法39
4High-entropy alloy foam and manufacturing method f…37
5High entropy alloy doped with boron and method for…24
6Efficient High-Entropy Alloys Design Method Includ…22
7基于扩散多元节技术的沉淀强化高熵合金成分设计和制备方法21
8基于扩散多元节技术的沉淀强化高熵合金成分设计和制备方法20

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment

Four structural factors shape the risk and opportunity profile for teams entering or expanding in ML-driven HEA design: the field’s lifecycle stage, its fragmentation, the collaboration patterns visible in the data, and the geographic concentration of filings.

Growth

Growth stage — annual filings still rising

The lifecycle evidence classifies this field as Growth, with annual filings still rising and the most recent years understated by publication lag. A 90% growth rate over the recent window confirms that foundational IP is still being staked. Teams entering now can still establish meaningful positions, but the window for low-competition claim space is narrowing as academic output accelerates.

Lifecycle: Growth
Concentration

Fragmented top tier — no entrenched incumbent

With the top five filers holding only 16% of the combined total of the hundred largest filers, no single entity has locked up the space. The leading applicant, Shanghai University, holds 7 patent families — a margin easily bridged by a focused filing campaign. Industrial entrants with engineering resources can realistically compete with the current academic leaders in a short time horizon.

HHI: Low
Collaboration

University–industry and cross-institutional pairs are emerging

The most active co-filing pair is Shanghai University and Zhejiang Weixiang Materials Technology Co., Ltd., with 2 joint filings. Central South University has co-filed with AECC Beijing Institute of Aeronautical Materials, signaling aerospace-sector engagement. In the Korean ecosystem, Seoul National University R&DB Foundation has co-filed with both the Korea Institute of Science and Technology and the University of Ulsan Industry-Academic Cooperation Foundation, suggesting a coordinated national research effort. These collaborations highlight access points for licensing or consortium entry.

Ecosystem: Forming
Geography

China-dominant filing base; US and EPO underweighted

China accounts for the overwhelming majority of filing activity, with the United States and Europe (EPO) each carrying substantially fewer records. India also appears with a notable presence. The thin US and EPO coverage relative to China means that many Chinese-origin inventions may not yet be protected in key commercial markets, creating freedom-to-operate opportunities for Western manufacturers — but also risk if Chinese filers begin pursuing international prosecution more aggressively.

Lead office: China
PatSnap Eureka · TRIZ Solution Agent
Facing a specific technical bottleneck in this field?

Go beyond the landscape: Eureka’s TRIZ Solution agent breaks down an R&D problem and returns patented concept solutions, each with a technical approach and cited patent & literature evidence.

Solve it in Eureka →
Top collaboration links
ApplicantCollaboratorCo-filings
Shanghai UniversityZhejiang Weixiang Materials Technology Co., Ltd.2
Central South UniversityAECC Beijing Institute of Aeronautical Materials1
Seoul National University R&DB FoundationKorea Institute of Science and Technology1
Seoul National University R&DB FoundationUniversity of Ulsan Industry-Academic Cooperation Foundation1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Collaboration data reflects co-applicant pairs found in the patent corpus.Explore insights →
Leaders

Shanghai University leads on computational chemistry; Lehigh University anchors Western alloy-composition work

The top tier is dominated by Chinese academic institutions with a strong computational focus, while Lehigh University stands out as the leading Western research university and Hamilton Sundstrand Corp is the only industrial player in the upper ranks.

Leader · Shanghai University

Shanghai University

Shanghai University leads with 7 patent families and is classified as a new entrant in momentum terms, with 4 recent families — indicating that its position is built on recent activity rather than a long legacy. Its technology emphasis falls squarely on G16C Computational chemistry and C22C Alloys, reflecting a strategy centered on ML-driven property prediction and composition optimization. Its active co-filing relationship with Zhejiang Weixiang Materials Technology Co., Ltd. suggests a commercialization pathway beyond pure academic output.

families: 7
Challenger · Lehigh University

Lehigh University

Lehigh University holds 4 patent families and is also classified as a new entrant in momentum terms, with 4 recent families, meaning its entire current portfolio has been filed in the recent window. Its technology focus spans C22C Alloys and B22F Powder metallurgy, distinguishing it from the computationally oriented Chinese leaders and positioning it at the synthesis and processing end of the ML-for-HEA pipeline — a differentiated niche with relatively few competing filers.

families: 4
🔍
See the full applicant breakdown
Access ranked profiles for all top-100 filers, including technology emphasis and filing trajectory for each.
Central South UniversityHamilton Sundstrand Corp+ more
Unlock full assignee analysis →
Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Shanghai University4▲ new entrant
Northwestern Polytechnical University1▲ new entrant
Zhejiang Weixiang Materials Technology Co., Ltd.4▲ new entrant
Lehigh University4▲ new entrant
Harbin University of Science and Technology3▲ new entrant
University of Science and Technology Beijing4▲ new entrant
Central South University3▲ new entrant
Source: PatSnap Eureka. Patent family counts are drawn from the ranked applicant list; momentum reflects recent filing activity versus the prior period.Explore players →
Adjacent Branches

Under-served branches where ML-for-HEA coverage is thin relative to technical potential

Several processing and application branches sit adjacent to the dominant alloy-composition and computational-chemistry core but carry disproportionately low patent counts. These observations of relative sparsity are worth evaluating against technical feasibility and commercial entry paths.

B33Y · Additive manufacturing (3D printing)

B33Y holds only 9 records in a corpus of 135 patent families, representing roughly 3% of the technology composition. ML-guided process-parameter optimization for HEA additive manufacturing — where the compositional and thermal space is vast and experimental iteration is expensive — is a plausible technical application of the same predictive models used for composition design. The low count suggests that the intersection of ML, HEA, and AM process control is not yet well staked. Teams with existing AM expertise and ML tooling could extend their HEA composition models into process-parameter claims with incremental investment.

Search this in Eureka →

C23C · Coating and surface deposition

C23C carries 15 records, representing roughly 5% of composition. HEA coatings are an established application area for wear, corrosion, and high-temperature resistance, yet the integration of ML for coating composition and deposition-parameter optimization remains sparsely protected. Given the clear industrial demand from aerospace and tooling sectors — and the presence of Hamilton Sundstrand Corp in the broader corpus — this branch has a plausible commercial pull. Entry would involve coupling existing ML property-prediction frameworks to coating-specific performance targets such as hardness gradients and oxidation resistance.

Search this in Eureka →
🔒
Unlock the full white-space map
See detailed branch-level gap analysis across all 29 IPC classes identified in the corpus, with filing-rate benchmarks and suggested claim angles.
B22D · Metal castingA61F · Implants and prostheses+ more
Unlock full analysis →
Source: PatSnap Eureka. White-space branches are IPC classes with low patent-record counts relative to their technical adjacency to the dominant cluster.Explore emerging →
Route Matrix

How leading applicants differ by technology route

Route coverage across the main technology branches in the current evidence set.

PlayerC22C 30 · AlloysC22C 1 · AlloysG16C 20 · Computational chemistryG16C 60 · Computational chemistryG06N 3 · Computing based on AI models
Northwestern Polytechnical UniversityStrong · 3Strong · 3AbsentStrong · 2Strong · 2
Zhejiang Weixiang Materials Technology Co., Ltd.AbsentAbsentStrong · 3Strong · 4Strong · 3
Shanghai UniversityAbsentAbsentStrong · 4Strong · 3Moderate · 2
Harbin University of Science and TechnologyAbsentAbsentModerate · 2Strong · 4Strong · 3
Lehigh UniversityStrong · 4Strong · 4AbsentAbsentAbsent
Zhengzhou UniversityStrong · 4Strong · 4AbsentAbsentAbsent
Seoul National University R&DB FoundationStrong · 4Strong · 3AbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
Frequently asked questions

Frequently asked questions

Still have questions? PatSnap Eureka answers them from patent and research data.Ask Eureka →
PatSnap Eureka

Ready to map your own HEA alloy ML landscape?

Join 18,000+ innovators using PatSnap Eureka to map any technology landscape: search 2B+ patents and papers, surface key assignees, and generate a report like this in minutes.

18,000+innovators worldwide
2B+patents & papers
< 5 minper landscape report

Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Explore in Eureka ↗
Powered by PatSnap Eureka

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.