Book a demo

HEA Compositional & CALPHAD Optimization Patent Snapshot

HEA Compositional & CALPHAD Optimization Patent Snapshot
Evidence Snapshot
HEA Compositional / CALPHAD Optimization Patent Snapshot in 2026

The patent corpus for HEA compositional design and CALPHAD optimization is nascent, comprising only 7 patent families concentrated almost entirely in academic and university-affiliated filers, with China as the dominant filing jurisdiction. Activity peaked briefly in 2018 and has been sporadic since, signaling an early-stage, lightly contested field where academic IP predominates and commercial coverage remains thin.

7
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
China
Leading jurisdiction
↗ Tap any metric to explore the underlying patents and uncover deeper insights in Patsnap Eureka
Published byPatsnap Insights Team··5 min readVerified by Patsnap Eureka data
Overview

City University of Hong Kong and Zhuzhou Jinwei lead a highly concentrated, university-dominated field

With only 7 patent families in scope, this technology domain is at a very early stage of IP formation. City University of Hong Kong and Zhuzhou Jinwei Hard Alloy Co. Ltd. each hold 2 patent families, placing them jointly at the top of the ranking, followed by Northeast Dianli University, Tianjin University of Technology, and Xinjiang University, each with 1 family.

The top five filers account for 100% of the ranked applicants visible in this query’ combined total — an extreme concentration that reflects both the immaturity of the field and its academic character. There is no discernible tier gap between the leader and the rest; the ranking is essentially flat beyond the top two.

Leading applicants
#ApplicantPatent familiesShare
1City University of Hong Kong2
2Zhuzhou Jinwei Hard Alloy Co. Ltd.2
3Northeast Dianli University1
4Tianjin University of Technology1
5Xinjiang University1
↗ Hover a row · click a company to ask Eureka

The dominance of universities and one materials-processing company suggests that foundational, process-oriented IP is being generated in academic settings, while industrial application of CALPHAD-guided HEA design has yet to attract broad corporate patent activity. This creates an open window for industrial players to establish early IP positions.

The most recent one to two filing years are likely under-represented due to standard publication lag; the apparent absence of 2026 filings should not be read as a cessation of activity. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

A 2018 filing spike followed by years of silence, with tentative re-emergence since 2023

The filing trend and technology composition charts together reveal an episodic, academically driven field: a single burst of activity in 2018 gave way to a multi-year gap before isolated filings resumed in 2023–2025. The IPC class mix confirms that alloy composition and powder metallurgy are visible in, while computational chemistry remains a minor but meaningful branch.

Annual filing trend

Four of the 7 patent families were filed in 2018, accounting for the corpus’s only meaningful cluster of annual activity. Filings then fell to zero for four consecutive years before single filings appeared in 2023, 2024, and 2025. The 2025 and 2026 data points are subject to publication lag and likely undercount actual activity; the tentative post-2022 re-emergence should be monitored rather than concluded upon.

Annual filing trendAnnual values from 2017 to 2026, peaking at 4 in 2018.02017420180201902020020210202212023120241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) is the visible IPC class with 6 patent records, followed closely by B22F (Powder metallurgy) with 5. G16C (Computational chemistry) appears in 2 records, confirming that CALPHAD-linked computational framing is present but not yet the primary claim anchor. C22F (Non-ferrous metal treatment) and G06V (Image/video recognition) each appear in just 1 record, marking them as sparse adjacent branches.

Technology compositionC22C · Alloys leads with 6; B22F · Powder metallurgy 5.C22C · Alloys6B22F · Powder metallurgy5G16C · Computational che…2C22F · Non-ferrous metal…1G06V · Image/video recog…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20190352743A1Published 2019-11-21

Method for the fabrication of architected 3D high …

City University Of Hong Kong

A method for the fabrication of architected 3D high entropy alloy structures includes deriving a 3D architecture based on at least one physical property of a high entropy alloy; preparing a fabrication powder including a mixture of two or more metallic powders of nearly equal quantities; arranging a first layer of the fabrication powder on a platform… (excerpt from the patent abstract)

Method for the fabrication of architected 3D high … — patent drawingMethod for the fabrication of architected 3D high … — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Method for the fabrication of architected 3D high …13
2一种保径环及其制备方法和应用10
3一种高耐蚀高强韧的双相高熵合金材料的热轧工艺设计优化方法1
4Method for the fabrication of architected 3D high …1

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · City University of Hong Kong

City University of Hong Kong

City University of Hong Kong holds 2 patent families, focused on B22F powder metallurgy (both B22F 1 and B22F 3 sub-classes) and C22C 1 alloy composition — a process-plus-composition pairing characteristic of additive-manufacturing-oriented HEA research. No momentum data is available for this filer in the recent-vs-prior window, suggesting its filing activity predates the recent re-emergence period. Its position as the only non-mainland China academic leader gives it distinct international visibility.

families: 2
Challenger · Tianjin University of Technology

Tianjin University of Technology

Tianjin University of Technology holds 1 patent family, concentrated in B22F 9 (powder preparation), C22C 26 (diamond-related alloys), and C22C 30 (alloys of other metals) — a niche materials-processing profile distinct from the leaders. Its applicant momentum is flagged as a new entrant in the most recent filing window, indicating it entered this specific IP domain only recently. This entry, alongside Northeast Dianli University’s parallel new-entrant status, suggests growing interest from second-tier Chinese technical universities.

families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Xinjiang UniversityNortheast Dianli University+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

Still have questions? Patsnap Eureka answers them from patent and research data.Ask Eureka →

Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Explore in Eureka ↗
Powered by Patsnap Eureka

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.