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HEA Fatigue & Phase Stability Patent Landscape

HEA Fatigue & Phase Stability Patent Landscape
Competitive Landscape
HEA Fatigue & Phase Stability Patent Landscape in 2026

The HEA fatigue and phase stability patent field is in a growth stage, with 81 patent families in scope and activity concentrated heavily among academic institutions led by Seoul National University R&DB Foundation. China is the dominant filing jurisdiction, and alloy composition (C22C) accounts for the large majority of technology records, leaving adjacent processing and application branches comparatively sparse.

81
Patent families in scope
24%
Top-5 share of top-100 filers
+8%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

Academic institutions lead a fragmented but growing field

Seoul National University R&DB Foundation holds the top position with 6 patent records, followed by the University of Science & Technology Beijing and POSTECH Academy-Industry Foundation each with 5 patent records. The top five filers collectively account for 24% of the combined output of the hundred largest filers.

The competitive tier is shallow: the leading applicant’s count is only modestly ahead of several close followers, and no single player has established dominant breadth across processing routes. This fragmentation reflects the field’s academic origins and the absence of a clear industrial consolidator.

Leading applicants
#ApplicantPatent recordsShare
1SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION6
2UNIV OF SCI & TECH BEIJING5
3POSTECH Academy-Industry Foundation5
4THE IND & ACADEMIC COOP IN CHUNGNAM NAT UNIV (IAC)4
5Elmet Technologies LLC4
6KUNMING UNIV OF SCI & TECH4
7H.C. Starck Inc.2
8Soochow University2
9Jiangsu University of Technology2
10Harbin Institute of Technology2
#ApplicantPatent recordsShare
11National Institute of Technology Calicut2
12RTX Corporation2
13National Tsing Hua University2
14UT-Battelle LLC2
15Chinalco Luoyang Copper Processing Co., Ltd.2
16Commissariat a l’Energie Atomique et aux Energies Alternatives (CEA)2
17Dalian University of Technology2
18COUNCIL OF SCI & IND RES2
19Institute of Metal Research, Chinese Academy of Sciences2
20Zhejiang University of Technology1
↗ Hover a row · click a company to ask Eureka

The leaders’ positions imply that first-mover industrial applicants who can bridge alloy composition expertise with downstream processing—powder metallurgy, additive manufacturing, or surface treatment—could carve out defensible IP positions that academic filers have not yet claimed.

Filing counts for the most recent 18–24 months are likely understated due to standard patent publication lag and should not be interpreted as a slowdown. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Annual filings rising on a multi-year basis; alloy composition dominates the technology mix

The filing trend chart reveals irregular annual volumes with a notable peak in 2024, while the technology composition chart shows strong concentration in alloy composition classes alongside a spread of adjacent processing branches.

Annual filing trend

Annual filings show a growth trajectory with 2024 recording 19 patent records—the highest single-year volume in the dataset. The 2025 and 2026 counts are understated by publication lag and should not be read as a pullback from the 2024 peak. The multi-year direction remains upward, consistent with the field’s Growth lifecycle stage.

Annual filing trendAnnual values from 2017 to 2026, peaking at 19 in 2024.14201742018122019420208202132022420231920249202542026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) dominates with 89 patent records, establishing it as the core technical anchor. B22F (Powder metallurgy) at 26 records and C23C (Coating & surface deposition) at 17 records are secondary but substantially smaller branches. Additive manufacturing (B33Y, 16 records), non-ferrous metal treatment (C22F, 13 records), and welding (B23K, 9 records) represent emerging but still sparse adjacent areas.

Technology compositionC22C · Alloys leads with 89; B22F · Powder metallurgy 26.C22C · Alloys89B22F · Powder metallurgy26C23C · Coating & surface…17B33Y · Additive manufact…16C22F · Non-ferrous metal…13B23K · Welding, solderin…9B21C · Metal extrusion &…7C23F · Corrosion & metal…4↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20260085389A1Published 2026-03-26

High entropy alloy for bioimplant applications

King Fahd University Of Petroleum And Minerals

A non-equiatomic high entropy alloy (HEA) includes titanium in an amount of 33 to 37 atomic percent, zirconium in an amount of 33 to 37 atomic percent, niobium in an amount of 18 to 22 atomic percent, tantalum in an amount of 3 to 7 atomic percent, and silver in an amount of 3 to 7 atomic percent, wherein atomic percent is based on the total atom count of… (excerpt from the patent abstract)

High entropy alloy for bioimplant applications — patent drawingHigh entropy alloy for bioimplant applications — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1具有弥散纳米析出相强化效应的高熵合金及其制备方法121
2Multi-Component Solid Solution Alloys having High …72
3High entropy alloy having TWIP/trip property and m…66
4一种含难混溶元素的高熵合金制备方法49
5一种Ni‑Co‑Cr‑Al‑W‑Ta‑Mo系高熵高温合金及其制备方法43
6High-entropy alloy for ultra-low temperature42
7Multi-component solid solution alloys having high …40
8Thermo-mechanical processing of high entropy alloy…36

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment

The combination of a growth-stage lifecycle, academic-dominant applicant base, and alloy-centric technology mix creates specific strategic implications for industrial R&D teams evaluating entry or expansion in this space.

Growth

Growth stage with annual volume still rising

The field is classified as Growth, with annual filings still rising and the 2024 filing year recording the highest volume in the dataset. The multi-year growth rate stands at 8% for the recent window. Early-stage industrial IP positioning remains feasible before the competitive landscape consolidates.

Lifecycle: Growth
Concentration

Fragmented field with no dominant industrial owner

The top five filers hold 24% of the combined output of the hundred largest filers, and the gap between first and fifth place is narrow. Academic institutions—rather than large industrial manufacturers—occupy every top-5 slot. This fragmentation signals that IP position in downstream application areas remains largely unclaimed by industry.

Top-5 share: 24%
Collaboration

Limited co-filing activity; one active university pairing identified

The only co-filing relationship in evidence is between POSTECH Academy-Industry Foundation and the Chungnam National University Industry-Academic Cooperation Foundation, with 2 jointly filed records. Ecosystem collaboration remains sparse, which may reflect the early-stage, curiosity-driven nature of the research or the absence of industry consortia to fund joint programs.

Co-filer pairs: 1
Geography

China leads filings; US and India are secondary markets

China accounts for 39 patent records—the single largest jurisdiction—followed by the United States at 26 records and India at 11 records. Europe (EPO) has only 5 records and South Korea 4, suggesting that patent protection in those commercially significant markets is still thin relative to China and the US. Industrial entrants should evaluate whether EPO and Korean filings represent an accessible whitespace.

Lead office: China
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Top collaboration links
ApplicantCollaboratorCo-filings
POSTECH Academy-Industry FoundationChungnam National University Industry-Academic Cooperation Foundation2

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: Patsnap Eureka. Jurisdiction counts are at the patent-record level and reflect where protection has been sought.Explore insights →
Leaders

Seoul National University leads; POSTECH and UST Beijing challenge across alloy composition routes

The top applicants are uniformly academic, with alloy composition (C22C) as the shared technical anchor. Differentiation among leaders appears at the level of secondary processing routes—powder metallurgy, metal treatment, or additive manufacturing.

Leader · Seoul National University R&DB Foundation

Seoul National University R&DB Foundation

The top-ranked filer with 6 patent records, concentrated exclusively across alloy composition subclasses (C22C30, C22C1, C22C19). Its portfolio reflects depth in multi-principal-element alloy design without meaningful diversification into downstream processing branches. Momentum data does not flag a recent acceleration, suggesting a steady rather than surging output rate.

patent records: 6
Challenger · POSTECH Academy-Industry Foundation

POSTECH Academy-Industry Foundation

Tied for second at 5 patent records and differentiated by a broader alloy-class spread (C22C30, C22C38, C22C1), indicating coverage across multiple alloy sub-families including steel-adjacent compositions. POSTECH is also the sole co-filer on record, having jointly filed with Chungnam National University’s cooperation foundation. Its momentum trend is flagged as a new entrant in the most recent period, reflecting 1 recent record from a small prior base.

patent records: 5
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University of Science & Technology BeijingElmet Technologies LLC+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
POSTECH Academy-Industry Foundation1▲ new entrant
University of Science & Technology Beijing1▲ new entrant
Council of Scientific and Industrial Research (CSIR)1▲ new entrant
Source: Patsnap Eureka. Player counts and technology focus are derived from the applicant ranking and IPC focus data.Explore players →
Adjacent Branches

Under-served processing and application branches adjacent to the alloy-composition core

Five IPC branches sit at notably lower coverage relative to the dominant C22C alloy class. Two stand out for their combination of sparse coverage, plausible technical relevance to HEA fatigue and phase stability, and realistic entry paths for industrial applicants.

B33Y · Additive manufacturing (3D printing)

With 16 patent records and a 7% share of the IPC distribution, additive manufacturing is the most technically adjacent under-served branch. HEA fatigue performance is sensitive to solidification microstructure, and additive routes directly control that variable. The small number of records suggests that the intersection of AM process parameters and HEA phase stability has not been systematically covered. Industrial entrants with AM process IP could file in this space with relatively low prior-art density. Entry path: process parameter–microstructure–fatigue life linkage claims for specific alloy families.

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C23C · Coating & surface deposition

Surface and coating applications account for 17 patent records and an 8% share. HEA coatings for wear, oxidation, and fatigue crack initiation resistance are an active research area, yet the patent record remains thin. Jiangsu University of Technology’s portfolio already straddles C22C30 and C23C14, indicating this intersection is technically viable. The sparse coverage relative to the compositional core suggests room for coating-specific claims around fatigue-resistant HEA surfaces for turbine, bearing, or biomedical implant applications.

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C22F · Non-ferrous metal treatmentB23K · Welding, soldering & brazing+ more
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Source: Patsnap Eureka. Branch share figures are computed against the patent-record-level IPC distribution, not the family total.Explore emerging →
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This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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