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HEA Mechanical & Microstructure Testing Patent Snapshot

HEA Mechanical & Microstructure Testing Patent Snapshot
Evidence Snapshot
HEA Mechanical & Microstructure Testing Patent Snapshot in 2026

The HEA mechanical and microstructure testing patent space is a small but growing field in its Growth stage, with 15 patent families distributed across more than a dozen applicants and no single filer holding a dominant share. Annual filings are still rising, and a wave of new entrants — including Xiamen Tungsten, Xiamen Golden Egret, and Oerlikon AM Europe — signals broadening industrial interest beyond academic origins.

15
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Fragmented field with no runaway leader — top five share the majority among the largest filers

H C Starck Inc, Suzhou University, Xiamen Golden Egret Special Alloy, and Xiamen Tungsten Co Ltd each hold 2 patent families and jointly occupy the top tier. No applicant has pulled away from the pack, making this an unusually flat visible assignee structure for an early-stage technical field.

The top five filers together account for 53% of the combined total across the ranked applicants visible in this query — a moderate concentration level that reflects the field’s nascency rather than deliberate market control. A second tier of single-family filers (Jilin University, Zhejiang University, Oerlikon AM Europe, and others) is large relative to the top tier, reinforcing the fragmented picture.

Leading applicants
#ApplicantPatent familiesShare
1H C Starck Inc2
2Suzhou University2
3Xiamen Golden Egret Special Alloy Co Ltd2
4Xiamen Tungsten Co Ltd2
5UNIV OF SCI & TECH BEIJING1
6Amrita Vishwa Vidyapeetham1
7Jilin University1
#ApplicantPatent familiesShare
8Zhejiang University1
9HC Starck Solutions Coldwater LLC1
10Oerlikon AM Europe GmbH1
11SECRETARY DEFENCE RESEARCH & DEVELOPMENT ORGANISAT…1
12National Institute of Technology Warangal1
13King Fahd University of Petroleum and Minerals1
↗ Hover a row · click a company to ask Eureka

The near-parity among leaders means no incumbent has built a blocking position. Entrants with focused prosecution strategies in underrepresented process branches could establish differentiated positions quickly given the current low filing volumes.

Filings from approximately the last 18–24 months are likely under-counted due to standard patent publication lag; the apparent slowdown in 2023 and 2025–2026 data points should not be read as real demand decline. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Annual volume up 75% in the recent window; alloy composition dominates but process branches are gaining

Two charts together tell the story of an accelerating, process-diversifying field: the filing trend shows a 75% recent-window growth rate, while the technology composition chart reveals that C22C alloy patents are the plurality but additive manufacturing and powder metallurgy are closing the gap.

Annual filing trend

Filing volume rose from 2 families in 2017 to a visible 2024 peak of 4, with a 75% recent-window growth rate confirming the upward trajectory. The 2023 and 2025–2026 troughs reflect publication lag rather than a genuine retreat; readers should treat recent-period counts as floors, not ceilings.

Annual filing trendAnnual values from 2017 to 2026, peaking at 4 in 2024.22017120182201902020220213202202023420241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) is the visible branch with 13 records, followed by B22F (Powder metallurgy) at 9 and B33Y (Additive manufacturing) at 7. The meaningful presence of B33Y and B22F alongside C22C signals that applicants are patenting not just alloy compositions but also the manufacturing routes used to realize them — a pattern consistent with industrialisation of HEA processing.

Technology compositionC22C · Alloys leads with 13; B22F · Powder metallurgy 9.C22C · Alloys13B22F · Powder metallurgy9B33Y · Additive manufact…7B23K · Welding, solderin…4B21C · Metal extrusion &…3B29C · Shaping of plastics2C03B · Glass manufacture…2C03C · Glass & enamel co…2↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20260085389A1Published 2026-03-26

High entropy alloy for bioimplant applications

King Fahd University Of Petroleum And Minerals

A non-equiatomic high entropy alloy (HEA) includes titanium in an amount of 33 to 37 atomic percent, zirconium in an amount of 33 to 37 atomic percent, niobium in an amount of 18 to 22 atomic percent, tantalum in an amount of 3 to 7 atomic percent, and silver in an amount of 3 to 7 atomic percent, wherein atomic percent is based on the total atom count of… (excerpt from the patent abstract)

High entropy alloy for bioimplant applications — patent drawingHigh entropy alloy for bioimplant applications — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1FeCrCuTiV High-entropy Alloy Powder for Laser Melt…9
2High-entropy alloy for use as a base material in a…5
3Fabrication of high-entropy alloy wire and multi-p…3
4揭示多相高熵合金的微纳米尺度界面机制的方法3
5一种高通量制备高熵合金的方法2
6Fabrication of high-entropy alloy wire and multi-p…1

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · H C Starck Inc

H C Starck Inc

H C Starck Inc holds 2 patent families, with a related entity (H C Starck Place) concentrating on metal extrusion and drawing (B21C) and powder metallurgy (B22F) — manufacturing-process routes that complement alloy-composition claims. A further related entity, HC Starck Solutions Coldwater LLC, contributes 1 additional family. The H C Starck group’s emphasis on downstream processing differentiates it from the composition-focused academic filers.

families: 2
Challenger · Xiamen Tungsten Co Ltd

Xiamen Tungsten Co Ltd

Xiamen Tungsten Co Ltd enters the ranking as a new entrant with 2 recent patent families, co-filed with Xiamen Golden Egret Special Alloy. Their shared focus spans powder metallurgy (B22F9), shaping of plastics (B29C33), and glass manufacture (C03B23) — an unusual combination that may reflect proprietary tooling or mold materials used in HEA fabrication. The new-entrant trajectory signals an intent to build a position rapidly.

families: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Suzhou UniversityOerlikon AM Europe GmbH+ more
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Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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