https://www.patsnap.com/resources/blog/rd-blog/hexagonal-boron-nitride-advanced-materials-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Advanced Materials & Metallurgy · Patent Landscape
Hexagonal boron nitride patents: who holds the claim space in CVD, exfoliation and thermal filler routes
  • Filing has cooled since its 2019 peak of 18 families, with the 2022 midpoint down to a single filing — a mature, largely settled claim map rather than a growing one.
  • C01B (non-metallic elements and inorganic compounds) covers 118 of 169 records, meaning most protected ground sits in core h-BN chemistry, not in downstream polymer or semiconductor integration.
  • The five most-cited records date back to the early 1990s through 2016, so the foundational membrane and exfoliation art is old enough that new entrants are filing around it, not into open ground.
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169
Published Records
33%
Top-5 Share of All Records
US
Leading Jurisdiction
68
Active Filers Ranked
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What the h-BN patent record actually shows

Hexagonal boron nitride sits at the intersection of ceramics, coatings and thermal management, and the patent record reflects that spread: 169 families published between 2015 and mid-2026 touch eight distinct IPC subclasses, from C01B non-metallic inorganic chemistry through C23C coating deposition to H01L semiconductor devices. The bulk of the filing activity is concentrated in core material composition and processing claims rather than in end-device integration.

Filing volume rose through the late 2010s, peaked in 2019, and has since declined toward a single-digit annual pace — a pattern consistent with a technology whose foundational claim space is largely staked out, with incremental filings layering on top rather than opening new territory. Publication lag means the last one to two years understate real filing activity.

Annual filing trend, 2017-2026
  1. 1MITSUBISHI CHEM CORP14
  2. 2PEPSICO INC12
  3. 3ONALBA PTY LTD11
  4. 4SAINT GOBAIN CERAMICS & PLASTICS INC10
  5. 5MOMENTIVE PERFORMANCE MATERIALS INC9
  6. 6TOSHIBA TUNGALOY CO LTD7
  7. 7NANYANG TECH UNIV5
  8. 8STC UNM5
  9. 9NOVELLUS SYSTEMS INC5
  10. 10OTSUKA CHEMICAL CO LTD5
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

Two views of the same 169-family dataset: how filing volume has moved year over year, and how that volume splits across the IPC subclasses that h-BN claims touch.

A peak-then-plateau filing curve

Filings climbed from 14 in 2017 to a peak of 18 in 2019, then fell back sharply — the 2022 midpoint sits at just 1 family. That is the signature of a field where early entrants staked claims and later filers are working narrower, more defensive angles rather than broad composition-of-matter claims.

A peak-then-plateau filing curve05101520142017201818201920202021202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

Concentrated in core inorganic chemistry

C01B alone accounts for 118 of 169 records, well ahead of C08K (polymer additives, 45), C23C (coating deposition, 40) and C04B (ceramics and refractories, 35). H01L semiconductor claims (21) and B01J catalysis claims (19) are the smallest groups, suggesting device-level integration is comparatively lightly claimed against the core material itself.

Concentrated in core inorganic chemistryC01B · Non-metallic elements & inorga…11869.8%C08K · Use of additives in polymers4526.6%C23C · Coating & surface deposition4023.7%C04B · Ceramics, cement & refractories3520.7%C09K · Materials for misc. applicatio…3420.1%C08L · Polymer compositions3218.9%H01L · Semiconductor devices2112.4%B01J · Chemical/physical processes & …1911.2%Other14686.4%

Shares are the percentage of the 169 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key patents

The records other filings build on

Representative filing
US10781351B12020-09-22

US10781351B1 — Hexagonal boron nitride thermal conductivity enhancing materials and method of making

LOUISIANA TECH RESEARCH CORPORATION

A porous hexagonal boron nitride (h-BN) material with thermally conductive properties, includes a network of interconnected struts and nodes. The porous h-BN material is formed by depositing h-BN onto a catalyst foam using chemical vapor deposition at atmospheric pressure. The catalyst foam with the h-BN layer deposited thereon is then encapsulated with an insulating material. After the insulating material layer is cured, the h-BN structure is cut on an edge and then wet-etched to at least partially remove the catalyst foam.Filed by Louisiana Tech Research Corporation, published 2020-09-22.

US10781351B1 — patent drawing 1US10781351B1 — patent drawing 2
View full filing
Most-cited records in the dataset
#Publication no.Patent titleCitations
1US5270125ABoron nutride membrane in wafer structure253
2US6951583B2Highly delaminated hexagonal boron nitride powders, process for making, and uses thereof100
3US20110045223A1Method for Exfoliation of Hexagonal Boron Nitride72
4US20160325994A1High aspect boron nitride, methods, and composition containing the same55
5US5066533ABoron nitride membrane in wafer structure and process of forming the same49
6US6319602B1Boron nitride and process for preparing the same42
7US20140349105A1Agglomerated boron nitride particles, composition containing said particles, and three-dimensional integrated…40
8US5330611ACubic boron nitride carbide films32
9WO2015103525A1High aspect boron nitride, methods, and composition containing the same31
10US6660241B2Highly delaminated hexagonal boron nitride powders, process for making, and uses thereof29

Citation counts favour older records simply because they have had longer to accumulate citations inside this corpus; treat them as a map of influence, not a ranking of current relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for a filing decision

Four read-outs from the dataset that matter more for a filing or freedom-to-operate decision than the raw counts alone.

Filing momentum
18 → 1
peak year (2019) vs. 2022 midpoint

The growth phase has passed

Annual filings dropped from a 2019 peak of 18 to a single family at the 2022 midpoint. New filings since then are narrower in scope, consistent with entrants working around established composition and process claims rather than staking new broad ground.

Read against the 18-month publication lag, not as a hard stop.
IPC concentration
118 / 169
records tagged C01B

Core chemistry, not integration, is the crowded zone

Seven in ten records sit in C01B non-metallic inorganic compound claims. Downstream integration classes — H01L semiconductor devices (21) and B01J catalysis (19) — carry far fewer filings, which is where device-level application claims remain comparatively open.

Composition-of-matter density does not equal technology maturity.
Citation age
1990s-2016
publication dates of the five most-cited records

Foundational art predates most current filers

The most influential records in this corpus, including the wafer-membrane and delamination patents, were published well before the 2017-2026 filing window this dataset tracks. Anyone filing new h-BN composition or exfoliation claims today is filing in the shadow of art that is two to three decades old.

Older citation weight is a corpus artefact, not a sign these claims are the only ones that matter now.
Collaboration signal
4
co-assignee pairs identified

Co-filing is rare in this field

Only four co-assignee pairs appear across the dataset, the strongest being a university-industry pairing. Most h-BN patent activity is filed by single assignees working independently rather than through joint ventures or shared research programmes.

Sparse co-filing suggests limited formal cross-licensing infrastructure to date.
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to hexagonal boron nitride advanced materials, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the activity has gone quiet

Recent-year momentum across the tracked assignees is flat: none of the leading filers in this dataset recorded a filing in the most recent year, reinforcing the picture of a plateaued rather than accelerating field.

Momentum check
0
latest-year filings across leading assignees

No leading filer is active in the most recent year

Every one of the top assignees tracked in this dataset — spanning Japanese chemical manufacturers, US materials firms, ceramics specialists and university research groups — shows zero filings in the latest year. That is consistent with the broader plateau seen in the filing trend rather than any single company stepping back.

Publication lag means the most recent year is always the least complete.
Assignee mix
169
families across the ranking

A broad base of single-digit filers

The assignee ranking spans specialty chemical companies, ceramics and refractories manufacturers, a beverage company (packaging or barrier applications), and academic research institutions. No single entity dominates the full 169-family set, pointing to a fragmented rather than consolidated ownership structure.

Fragmentation favours licensing-in over acquisition of a dominant portfolio.
Collaboration pattern
4 pairs
co-assignee filings identified

University-industry pairing is the strongest link

The strongest co-assignee relationship pairs a university with an industrial partner, appearing twice in the dataset; the remaining pairs are single instances tying a materials company to named individual inventors. This is a field where formal joint-filing structures are the exception, not the norm.

Direct licensing discussions with individual assignees are more likely than negotiating a joint portfolio.
🔍
Under-claimed sub-areas worth checking before filing
Branches where filing density is thin relative to the core chemistry classes
h-BN/polymer interface bondingwet-etch catalyst-foam removal process controlh-BN thermal filler loading in composite formulationssemiconductor-grade h-BN dielectric integrationscalable atmospheric-pressure CVD foam templating
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Mitsubishi Chemical Corporation0
PepsiCo, Inc. (USA)0
The University of Western Australia0
Momentive Performance Materials Inc.0
Saint-Gobain Ceramics & Plastics, Inc.0
Toshiba Tungaloy Co., Ltd.0
Onalba Pty Ltd0
General Electric Company0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this

The filing trend and claim map point to specific next steps depending on whether the goal is freedom-to-operate, licensing or new filing.

Map freedom-to-operate against the C01B core

With 118 of 169 records sitting in core inorganic composition claims, any new h-BN material filing should be checked against this subclass first, not against downstream integration classes where the claim density is far lower.

Run a freedom-to-operate check

Watch the semiconductor and catalysis integration classes

H01L and B01J carry the fewest filings of the eight tracked subclasses, which is where new device-level or process-integration claims have the most room to stand without colliding with prior art.

Explore under-claimed branches

Revisit the foundational membrane and exfoliation art

The most-cited records in this corpus predate most of the 2017-2026 filing window covered here. Any new composition or exfoliation claim should be tested directly against that older art rather than against recent filings alone.

Review the cited prior art
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about h-BN patent activity

Answers are grounded in the same dataset. Derived from a Patsnap search on Hexagonal Boron Nitride Advanced Materials covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.