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Run your analysis now →Hexagonal boron nitride sits at the intersection of ceramics, coatings and thermal management, and the patent record reflects that spread: 169 families published between 2015 and mid-2026 touch eight distinct IPC subclasses, from C01B non-metallic inorganic chemistry through C23C coating deposition to H01L semiconductor devices. The bulk of the filing activity is concentrated in core material composition and processing claims rather than in end-device integration.
Filing volume rose through the late 2010s, peaked in 2019, and has since declined toward a single-digit annual pace — a pattern consistent with a technology whose foundational claim space is largely staked out, with incremental filings layering on top rather than opening new territory. Publication lag means the last one to two years understate real filing activity.
Two views of the same 169-family dataset: how filing volume has moved year over year, and how that volume splits across the IPC subclasses that h-BN claims touch.
Filings climbed from 14 in 2017 to a peak of 18 in 2019, then fell back sharply — the 2022 midpoint sits at just 1 family. That is the signature of a field where early entrants staked claims and later filers are working narrower, more defensive angles rather than broad composition-of-matter claims.
C01B alone accounts for 118 of 169 records, well ahead of C08K (polymer additives, 45), C23C (coating deposition, 40) and C04B (ceramics and refractories, 35). H01L semiconductor claims (21) and B01J catalysis claims (19) are the smallest groups, suggesting device-level integration is comparatively lightly claimed against the core material itself.
Shares are the percentage of the 169 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
This page is one run against one query. Ask Eureka your own question about hexagonal boron nitride advanced materials and every answer comes back with the patent numbers behind it.
Try EurekaA porous hexagonal boron nitride (h-BN) material with thermally conductive properties, includes a network of interconnected struts and nodes. The porous h-BN material is formed by depositing h-BN onto a catalyst foam using chemical vapor deposition at atmospheric pressure. The catalyst foam with the h-BN layer deposited thereon is then encapsulated with an insulating material. After the insulating material layer is cured, the h-BN structure is cut on an edge and then wet-etched to at least partially remove the catalyst foam.Filed by Louisiana Tech Research Corporation, published 2020-09-22.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US5270125A | Boron nutride membrane in wafer structure | 253 |
| 2 | US6951583B2 | Highly delaminated hexagonal boron nitride powders, process for making, and uses thereof | 100 |
| 3 | US20110045223A1 | Method for Exfoliation of Hexagonal Boron Nitride | 72 |
| 4 | US20160325994A1 | High aspect boron nitride, methods, and composition containing the same | 55 |
| 5 | US5066533A | Boron nitride membrane in wafer structure and process of forming the same | 49 |
| 6 | US6319602B1 | Boron nitride and process for preparing the same | 42 |
| 7 | US20140349105A1 | Agglomerated boron nitride particles, composition containing said particles, and three-dimensional integrated… | 40 |
| 8 | US5330611A | Cubic boron nitride carbide films | 32 |
| 9 | WO2015103525A1 | High aspect boron nitride, methods, and composition containing the same | 31 |
| 10 | US6660241B2 | Highly delaminated hexagonal boron nitride powders, process for making, and uses thereof | 29 |
Citation counts favour older records simply because they have had longer to accumulate citations inside this corpus; treat them as a map of influence, not a ranking of current relevance.
Each row carries its publication number; clicking a row searches Eureka by that number.
When you want the answer in the next five minutes.
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Browse MCP servers →Four read-outs from the dataset that matter more for a filing or freedom-to-operate decision than the raw counts alone.
Annual filings dropped from a 2019 peak of 18 to a single family at the 2022 midpoint. New filings since then are narrower in scope, consistent with entrants working around established composition and process claims rather than staking new broad ground.
Seven in ten records sit in C01B non-metallic inorganic compound claims. Downstream integration classes — H01L semiconductor devices (21) and B01J catalysis (19) — carry far fewer filings, which is where device-level application claims remain comparatively open.
The most influential records in this corpus, including the wafer-membrane and delamination patents, were published well before the 2017-2026 filing window this dataset tracks. Anyone filing new h-BN composition or exfoliation claims today is filing in the shadow of art that is two to three decades old.
Only four co-assignee pairs appear across the dataset, the strongest being a university-industry pairing. Most h-BN patent activity is filed by single assignees working independently rather than through joint ventures or shared research programmes.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to hexagonal boron nitride advanced materials, with the prior art for and against each one.
Recent-year momentum across the tracked assignees is flat: none of the leading filers in this dataset recorded a filing in the most recent year, reinforcing the picture of a plateaued rather than accelerating field.
Every one of the top assignees tracked in this dataset — spanning Japanese chemical manufacturers, US materials firms, ceramics specialists and university research groups — shows zero filings in the latest year. That is consistent with the broader plateau seen in the filing trend rather than any single company stepping back.
The assignee ranking spans specialty chemical companies, ceramics and refractories manufacturers, a beverage company (packaging or barrier applications), and academic research institutions. No single entity dominates the full 169-family set, pointing to a fragmented rather than consolidated ownership structure.
The strongest co-assignee relationship pairs a university with an industrial partner, appearing twice in the dataset; the remaining pairs are single instances tying a materials company to named individual inventors. This is a field where formal joint-filing structures are the exception, not the norm.
| Assignee | Recent year | YoY |
|---|---|---|
| Mitsubishi Chemical Corporation | 0 | — |
| PepsiCo, Inc. (USA) | 0 | — |
| The University of Western Australia | 0 | — |
| Momentive Performance Materials Inc. | 0 | — |
| Saint-Gobain Ceramics & Plastics, Inc. | 0 | — |
| Toshiba Tungaloy Co., Ltd. | 0 | — |
| Onalba Pty Ltd | 0 | — |
| General Electric Company | 0 | — |
The filing trend and claim map point to specific next steps depending on whether the goal is freedom-to-operate, licensing or new filing.
With 118 of 169 records sitting in core inorganic composition claims, any new h-BN material filing should be checked against this subclass first, not against downstream integration classes where the claim density is far lower.
Run a freedom-to-operate checkH01L and B01J carry the fewest filings of the eight tracked subclasses, which is where new device-level or process-integration claims have the most room to stand without colliding with prior art.
Explore under-claimed branchesThe most-cited records in this corpus predate most of the 2017-2026 filing window covered here. Any new composition or exfoliation claim should be tested directly against that older art rather than against recent filings alone.
Review the cited prior artThe assignee ranking in this dataset spans specialty chemical manufacturers, ceramics and refractories companies, a semiconductor materials firm, and university research groups, without a single entity dominating the full 169-family set. Ownership is fragmented rather than consolidated, which matters for licensing strategy: there is no single dominant portfolio to negotiate against. None of the leading assignees tracked here show filings in the most recent year, which is consistent with the broader plateau in the filing trend rather than a company-specific pullback.
Filing peaked in 2019 at 18 families and had fallen to a single filing by the 2022 midpoint, indicating a plateaued rather than growing field. That said, publication typically lags actual filing by around eighteen months, so the most recent one to two years in any dataset understate real activity. The honest read is that the foundational claim space around core h-BN composition and processing is largely staked out, and new activity is incremental.
US10781351B1, held by Louisiana Tech Research Corporation, claims a porous h-BN material formed by depositing h-BN onto a catalyst foam via atmospheric-pressure chemical vapor deposition, then encapsulating and wet-etching to partially remove the foam. It blocks that specific combination of foam-templated CVD deposition followed by encapsulation and edge wet-etch, not h-BN thermal fillers generally. Work using different templating methods, different deposition pressures, or different catalyst removal chemistry sits outside its literal claim scope, though a careful claim-chart comparison is needed for any specific process.
The clearest gaps sit in the subclasses with the lowest filing density relative to core chemistry: semiconductor-grade dielectric integration (H01L, 21 records) and catalysis-related process claims (B01J, 19 records), both well below the 118 records concentrated in core C01B composition claims. Specific under-claimed branches include h-BN/polymer interface bonding chemistry, thermal filler loading optimisation in composite formulations, and scalable atmospheric-pressure CVD foam templating beyond the single patented example in this dataset. These are the areas where a first claim is less likely to collide with dense prior art.
Highly concentrated in core inorganic chemistry: C01B (non-metallic elements and inorganic compounds) accounts for 118 of the 169 tracked records, more than double the next largest class, C08K polymer additives at 45. Coating deposition (C23C, 40), ceramics (C04B, 35), and miscellaneous materials applications (C09K, 34) form a middle tier, while semiconductor devices (H01L, 21) and catalysis (B01J, 19) are the smallest. This distribution shows that most protected ground is in the material itself rather than in how it is deposited, formulated into polymers, or integrated into devices.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.