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High-Entropy Alloy Corrosion Resistance Patent Landscape

High-Entropy Alloy Corrosion Resistance Patent Landscape
Competitive Landscape
High-Entropy Alloy Corrosion Resistance Patent Landscape in 2026

The high-entropy alloy corrosion resistance field is in a Growth stage, with annual filings rising and a 90% increase over the recent multi-year window — though the most recent period is understated by publication lag. The competitive landscape is heavily concentrated in Chinese academic institutions, with Xiangtan University holding the top position and alloy composition (C22C) forming the dominant technology branch.

974
Patent families in scope
21%
Top-5 share of top-100 filers
+90%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

Chinese universities dominate a moderately concentrated field

Xiangtan University leads the applicant ranking with 45 patent families, followed by the Institute of Metal Research of the Chinese Academy of Sciences at 32 and Kunming University of Science and Technology at 27. The top five filers collectively account for 21% of the combined output of the hundred largest filers, indicating moderate but meaningful concentration at the top tier.

A clear tier gap separates the top three institutions from the remainder of the top ten, where counts range from 14 to 22 patent families. Below rank ten, applicants cluster tightly in the single digits, suggesting a long tail of smaller contributors rather than a compact group of challengers.

Leading applicants
#ApplicantPatent familiesShare
1Xiangtan University45
2Institute of Metal Research, Chinese Academy of Sciences32
3KUNMING UNIV OF SCI & TECH27
4UNIV OF SCI & TECH BEIJING22
5Nanchang Hangkong University19
6Xi’an Jiaotong University17
7Harbin Institute of Technology16
8POSTECH Academy Industry Foundation16
9Dalian University of Technology16
10Zhengzhou University14
#ApplicantPatent familiesShare
11Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences13
12Central South University12
13Guangdong Institute of New Materials12
14Taiyuan University of Technology12
15Shanghai University11
16Jiangsu University OF SCI & TECH10
17NANJING UNIV OF AERONAUTICS & ASTRONAUTICS10
18Wuhan Supor Cookware Co., Ltd.10
19Sichuan University10
20Wuhan University9
↗ Hover a row · click a company to ask Eureka

The dominance of universities and public research institutes — rather than industrial or commercial entities — signals that the field remains largely in a translational phase, with foundational alloy design and surface treatment know-how concentrated in academic hands. Industrial players such as Wuhan Supor Cookware and POSTECH Academy Industry Foundation (the latter being the sole non-Chinese institution in the top ten) represent early signs of applied and international interest.

Filings from the most recent 18–24 months are subject to publication lag and will be understated relative to their eventual totals; trend reads for 20252026 should be treated as provisional. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Sustained filing growth paired with a composition-dominated technology mix

Annual filing data and the technology branch breakdown together reveal a field that has grown rapidly since 2017 and is anchored in alloy composition work, with secondary clusters in coatings and powder metallurgy pointing to active process diversification.

Annual filing trend

Filings grew from 31 in 2017 to a recorded high of 176 in 2025, reflecting 90% growth over the recent multi-year window. The apparent dip in 2026 (19 records) is a publication-lag artifact and should not be read as a reversal; the field remains in a Growth stage. The steepest acceleration occurred between 2021 and 2022, when annual volume jumped from 86 to 141.

Annual filing trendAnnual values from 2017 to 2026, peaking at 176 in 2025.3120176620187720197220208620211412022145202316120241762025192026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) dominates with 802 records, more than double the second branch C23C (Coating and surface deposition) at 421, underscoring that bulk alloy composition design remains the primary research vector. B22F (Powder metallurgy) at 279 and B33Y (Additive manufacturing) at 65 indicate growing interest in net-shape and layer-by-layer fabrication routes. Lower-density branches such as H01M (Batteries and fuel cells), G21C (Nuclear reactors), and C25D (Electroplating) point to emerging application verticals with limited current coverage.

Technology compositionC22C · Alloys leads with 802; C23C · Coating & surface deposition 421.C22C · Alloys802C23C · Coating & surface…421B22F · Powder metallurgy279C22F · Non-ferrous metal…107C21D · Heat treatment of…67B33Y · Additive manufact…65B23K · Welding, solderin…42C22B · Metal extraction …40↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20220259706A1Published 2022-08-18

High-entropy alloy film and manufacturing method t…

Ming Chi University Of Technology

A high-entropy alloy film, the composition of which includes titanium, zirconium, niobium, tantalum and iron. The high-entropy alloy film is made with a combination of elements with high biocompatibility, and its formation of non-crystalline structure is further improved by adding iron. Furthermore, as the content of titanium in the high-entropy alloy film… (excerpt from the patent abstract)

High-entropy alloy film and manufacturing method t… — patent drawingHigh-entropy alloy film and manufacturing method t… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1激光熔覆用高熵合金粉末和高熵合金涂层的制备方法132
2Precipitation Hardening High Entropy Alloy and Met…128
3一种喷涂用高熵合金粉末82
4一种多相高熵合金及其制备方法77
5一种铝电解惰性阳极64
6AlxCrFeNiCuVTi高熵合金材料及其制备方法57
7激光熔覆用高熵合金粉末及熔覆层制备方法56
8Alloy member, method for producing alloy member, a…50

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

The combination of a Growth-stage lifecycle, academic concentration, and a broad but shallow technology tail creates both entry opportunities and crowding risks that vary sharply by technical route.

Growth

Growth stage: rising volume, not yet consolidated

The field is classified as Growth, with annual filings still rising and the recent multi-year window showing 90% expansion. Foundational composition patents (C22C) are accumulating rapidly, which will progressively narrow freedom to operate in core alloy design. Teams entering now should prioritize differentiated composition spaces or process-layer innovations rather than broad alloy claims.

Lifecycle: Growth
Concentration

Moderate top-tier concentration; long challenger tail

The top five filers hold 21% of the hundred largest filers’ combined output, with Xiangtan University at 45 patent families setting a clear benchmark. The drop-off after rank three is steep, and ranks 6–20 are tightly bunched between 9 and 17 patent families. This structure means a focused entrant could realistically build a top-ten position within a few years by concentrating on an underserved branch.

HHI: moderate
Collaboration

Bilateral university–industry pairs signal early tech transfer

Collaboration is sparse but visible. Xiangtan University co-files with Yongzhou City Product Quality Supervision and Inspection Institute (2 joint families); the University of Science and Technology Beijing pairs with two water-sector bodies — the Ministry of Water Resources Product Quality Standards Research Institute and Ningxia Yellow River Hydropower Qingtongxia Power Generation Co., Ltd. — each at 2 families. POSTECH Academy Industry Foundation co-files with Korea Institute of Materials Science and with Chungnam National University’s industry-academic cooperation foundation (2 families each). These dyads suggest early applied pilots in water infrastructure and Korean steel sectors.

Co-filing: bilateral
Geography

China-centric filing; international coverage thin

China accounts for 951 of the jurisdiction records, with the United States and WIPO (PCT) each at 17 and South Korea at 10. Europe (EPO) and Japan each register 6 records. The gap between China and all other jurisdictions is extreme, meaning most IP is currently protected only domestically. Organizations seeking global freedom to operate — or intending to license into aerospace, energy, or marine markets outside China — face minimal blocking risk from existing filings but also an open field to establish early international positions.

Lead office: China
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Top collaboration links
ApplicantCollaboratorCo-filings
Xiangtan UniversityYongzhou City Product Quality Supervision and Inspection Institute2
University of Science and Technology BeijingMinistry of Water Resources Product Quality Standards Research Institute2
University of Science and Technology BeijingNingxia Yellow River Hydropower Qingtongxia Power Generation Co., Ltd.2
Nanchang Hangkong UniversityJiangxi Hengda High-Tech Co., Ltd.2
POSTECH Academy Industry FoundationKorea Institute of Materials Science2
POSTECH Academy Industry FoundationChungnam National University Industry-Academic Cooperation Foundation2
Lanzhou Institute of Chemical Physics, Chinese Academy of SciencesQingdao Research Center for Resource Chemistry and New Materials2
Institute of Metal Research, Chinese Academy of SciencesLiaoning Zhongke Boyan Technology Co., Ltd.1
Institute of Metal Research, Chinese Academy of SciencesNanchang Hangkong University1
Kunming University of Science and TechnologyYunnan Xuecuo Technology Co., Ltd.1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Insight cards are grounded in applicant ranking, lifecycle, collaboration, and jurisdiction evidence from the corpus.Explore insights →
Leaders

Xiangtan University leads in volume; Institute of Metal Research and Nanchang Hangkong show the strongest recent momentum

The top applicants are all academic institutions, each anchored in core alloy composition work but diverging in their secondary process routes — a differentiation that matters for licensing and partnership targeting.

Leader · Xiangtan University

Xiangtan University

Xiangtan University holds 45 patent families, the largest portfolio in the corpus. Its technical focus is split between alloy composition (C22C 1 and C22C 30, 40 records each) and powder metallurgy (B22F 3, 12 records), indicating a strong emphasis on bulk alloy design backed by forming process know-how. Recent momentum shows a 17% decline versus the prior period, suggesting the institution’s filing pace may be moderating after an earlier buildup.

families: 45
Challenger · Nanchang Hangkong University

Nanchang Hangkong University

Nanchang Hangkong University holds 19 patent families and is classified as a new entrant in momentum terms, with 17 of those families filed in the recent period — the highest recent-window count among the challengers tracked. Its technical emphasis spans alloy composition (C22C 30, 16 records), powder metallurgy via additive routes (B22F 10, 11 records), and 3D printing (B33Y 10, 10 records), making it one of the few top applicants with a clear additive manufacturing orientation, a less crowded branch within this corpus.

families: 19
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Institute of Metal Research, Chinese Academy of SciencesKunming University of Science and Technology+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Xiangtan University10▼ -17%
Institute of Metal Research, Chinese Academy of Sciences20▲ new entrant
Kunming University of Science and Technology12▲ new entrant
University of Science and Technology Beijing12▲ new entrant
Nanchang Hangkong University17▲ new entrant
Xi’an Jiaotong University7▲ new entrant
POSTECH Academy Industry Foundation2▲ new entrant
Dalian University of Technology8▲ new entrant
Source: PatSnap Eureka. Player cards cite patent family counts from the applicant ranking and technology focus from IPC-level applicant data.Explore players →
Adjacent Branches

Under-served branches adjacent to the dominant composition core

Several IPC branches appear at low density relative to the core C22C cluster yet have plausible technical relevance and realistic entry paths for teams already working on HEA corrosion resistance.

B33Y · Additive manufacturing (3D printing)

With 65 records against 802 in C22C, additive manufacturing represents roughly 3% of the branch mix — sparse given that AM routes enable complex geometries and controlled microstructures that directly influence corrosion behavior. Nanchang Hangkong University is the only top-ten applicant with notable AM activity (B33Y 10, 10 records), suggesting the sub-space is not yet crowded. An entry path exists for teams combining HEA powder design (B22F) with AM process parameter optimization, targeting applications such as marine hardware or chemical plant components where geometry-driven corrosion protection is valued.

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G21C · Nuclear reactors

Only 12 records appear under G21C (Nuclear reactors) across the entire corpus, making this one of the sparsest application-domain branches relative to the known technical need: reactor structural materials face simultaneous corrosion, radiation damage, and elevated-temperature oxidation — a multi-stressor environment where HEAs’ configurational entropy and phase stability offer genuine potential advantages. The near-absence of filing activity leaves international patent space largely open, and the presence of China Nuclear Power Technology Research Institute Co., Ltd. in the broader applicant list confirms institutional awareness of the application. Entry requires demonstrating radiation tolerance alongside corrosion performance, which raises the experimental bar but also the defensibility of resulting claims.

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H01M · Batteries, cells and fuel cellsC25D · Electroplating and electroforming+ more
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Source: PatSnap Eureka. Adjacent branch observations are based on relative IPC record density within the corpus and do not constitute validated commercial opportunity assessments.Explore emerging →
Route Matrix

How leading applicants differ by technology route

Route coverage across the main technology branches in the current evidence set.

PlayerC22C 30 · AlloysC22C 1 · AlloysC23C 24 · Coating & surface depositionB22F 9 · Powder metallurgyC22C 38 · Alloys
Xiangtan UniversityStrong · 40Strong · 40AbsentEmerging · 6Absent
Institute of Metal Research, Chinese Academy of SciencesStrong · 27Strong · 24AbsentAbsentAbsent
Kunming University of Science and TechnologyStrong · 22Moderate · 9Strong · 17AbsentAbsent
University of Science and Technology BeijingStrong · 17Strong · 13Emerging · 3AbsentModerate · 7
Nanchang Hangkong UniversityStrong · 16AbsentModerate · 7Emerging · 3Absent
POSTECH Academy Industry FoundationStrong · 9AbsentAbsentAbsentStrong · 16
Dalian University of TechnologyStrong · 12Strong · 11AbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

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