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The agent works the prompt against patents and technical literature, citing every source.
Run your analysis now →Filing growth compares 2021 (12 records) with 2024 (23) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 169 records in scope (CR5), not by the ranked leaders only.
High-entropy alloys (HEAs) and their medium-entropy and multi-principal-element variants moved from a materials-science curiosity to a patentable engineering category over the past decade. The filing record here, built from 169 patent families filed between 2017 and mid-2026, tracks that shift: composition claims under C22C cover nearly the entire corpus, while powder metallurgy (B22F), thermal and mechanical treatment (C22F) and additive manufacturing (B33Y) form a secondary tier of processing-route claims layered on top.
Filing activity rose from 17 families in 2017 to a peak of 23 in 2024, with 2022 sitting at 13 — a pattern of growth that has flattened rather than accelerated. Because publication typically lags filing by around 18 months, the 2025 and 2026 counts in any such trend understate real activity; the apparent slowdown at the very end of the window should be read with that lag in mind, not taken as a hard signal that interest has dropped.
Two views of the same 169-family corpus: how filing volume has moved year over year, and how those filings distribute across the IPC subclasses that define composition, powder processing, thermal treatment and additive routes.
From 17 families in 2017 to a peak of 23 in 2024, with the 2022 midpoint at 13 — the trajectory is not a straight climb, and the most recent two years should be read against the usual 18-month publication lag rather than as a confirmed decline.
C22C alloy-composition claims appear in nearly every family (168 of 169). B22F powder metallurgy (59), C22F treatment (41) and B33Y additive manufacturing (24) trail well behind, with coating (C23C, 18), casting (B22D, 10) and welding (B23K, 9) forming a long, thin tail of processing niches.
Shares are the percentage of the 169 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
This page is one run against one query. Ask Eureka your own question about high-entropy alloy design and processing and every answer comes back with the patent numbers behind it.
Try EurekaFiled by the Council of Scientific and Industrial Research, this application claims a Cr-Cu-Mn-Ni high-entropy alloy system defined by specific atomic-percent ranges for each element, along with a preparation process. It is one of the most recent publications in the dataset, dated mid-2026.Abstract lightly trimmed for length; composition ranges reproduced as filed.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US20170314097A1 | High-strength and ultra heat-resistant high entropy alloy (HEA) matrix composites and method of preparing the… | 307 |
| 2 | US20190024198A1 | Precipitation Hardening High Entropy Alloy and Method of Manufacturing the Same | 131 |
| 3 | CN104120325A | 低热膨胀系数NaMxAlySiz高熵合金及制备方法 | 83 |
| 4 | US20180036840A1 | Multi-material component and methods of making thereof | 70 |
| 5 | US20170233855A1 | High entropy alloy having TWIP/trip property and manufacturing method for the same | 66 |
| 6 | US20180223417A1 | High entropy alloy thin film coating and method for preparing the same | 62 |
| 7 | WO2017098848A1 | High entropy alloy member, method for producing alloy member, and product using alloy member | 60 |
| 8 | US20200157663A1 | High entropy alloy structure and a method of prepating the same | 58 |
| 9 | US20210260704A1 | Multi component solid solution high-entropy alloys | 57 |
| 10 | US20190226058A1 | Alloy member, process for producing said alloy member, and product including said alloy member | 53 |
Citation counts inside a searched corpus skew toward older filings simply because they have had longer to accumulate citations — treat this table as a map of influence on later filers, not a ranking of current technical importance.
Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Each row carries its publication number; clicking a row searches Eureka by that number.
When you want the answer in the next five minutes.
The agent works the prompt against patents and technical literature, citing every source.
Run your analysis now →When it has to run inside your own pipeline.
Patent search, landscape analysis and assignee resolution as MCP tools. Drop them into any agent framework, or call REST directly.
Browse MCP servers →Three patterns in the data matter more to a filing strategy than the raw counts on their own.
The rise from 17 families in 2017 to a peak of 23 in 2024 shows sustained but decelerating interest. Given the roughly 18-month lag between filing and publication, the 2025-2026 figures are still filling in and should not be read as a genuine drop-off.
Almost every family touches core alloy-composition claims (C22C), but only a third reach powder metallurgy (B22F, 59) and roughly a seventh reach additive manufacturing (B33Y, 24). A new composition claim competes with nearly the whole corpus; a new processing-route claim has more room.
United States and China together account for over half of tracked filings, but India, Japan, EPO and South Korea each carry a meaningful share too. A single-jurisdiction filing strategy in this field leaves several active markets uncovered.
Only two co-assignee pairings recur across the entire dataset, both involving the same automotive filer paired separately with two US research institutions. Most families are filed by a single assignee, which suggests white space is more often claimed by new entrants than defended jointly by incumbents.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to high-entropy alloy design and processing, with the prior art for and against each one.
Recent-year momentum in this corpus is muted across the board: the most active recent filer logged a single family in the latest year with flat year-over-year movement, and several previously active filers show zero recent output. That pattern — broad participation, little recent concentration — is consistent with a field still being staked out rather than one dominated by a handful of programs.
The most active recent filer in this dataset added just one family in the latest tracked year with flat year-over-year change. Several other previously active assignees show zero filings in the same period, meaning current momentum is thin across the entire field rather than concentrated in one lab.
Cross-institution filing appears only twice in the dataset, both pairing the same automotive assignee with separate US university research foundations. Most of the corpus is filed solo, which lowers the bar for a new entrant to stake a composition or process claim without displacing an entrenched joint program.
United States and China lead, but India's 24 filings and Japan's 13 show this is not a two-jurisdiction race. A filer targeting only the top two offices misses a quarter of tracked activity sitting elsewhere.
| Assignee | Recent year | YoY |
|---|---|---|
| South China University of Technology | 1 | 0% |
| Boumalicheng Co., Ltd. | 0 | — |
| City University of Hong Kong | 0 | — |
| Hitachi, Ltd. | 0 | — |
| SNU R&DB Foundation | 0 | — |
| POSTECH Industry-Academic Cooperation Foundation | 0 | -100% |
| Honda Motor Co., Ltd. | 0 | — |
| Council of Scientific and Industrial Research | 0 | -100% |
The dataset points to specific next steps depending on whether the goal is freedom-to-operate, portfolio strategy, or spotting an entry point.
The most-cited families in this corpus define the composition and processing baseline that later filings build on. Any new HEA composition or heat-treatment claim should be checked against these before drafting.
Explore citation chains in EurekaWith C22C composition claims nearly saturated but B33Y, C23C and B23K far thinner, processing-route claims tied to a specific alloy family are the more open filing target right now.
Run a white-space search in EurekaRecent-year filing counts are flat across almost every assignee in this dataset, including past leaders. A ranking built on lifetime totals alone will miss that the field's current leadership is unsettled.
Monitor assignee momentum in EurekaPatent drafters generally define a high-entropy alloy (HEA) as a composition of four or more principal elements in near-equiatomic or specified atomic-percent ranges, distinguishing it from traditional alloys built around one dominant base metal. Medium-entropy and multi-principal-element alloy terminology is used interchangeably in claims, which is why a search string needs to capture all three phrases to be comprehensive. In this dataset, the search combined those title terms with process and property terms like solid solution strengthening, phase stability, arc melting and corrosion resistance to focus on families that go beyond a bare composition claim. Practitioners should expect claim language to specify exact atomic-percent ranges for each element rather than nominal ratios.
C22C, the core alloys classification, appears in nearly the entire corpus (168 of 169 families) and covers composition claims. B22F, powder metallurgy, is the next most common at 59 families and covers powder-based production routes including those feeding additive manufacturing. C22F, non-ferrous metal treatment, and B33Y, additive manufacturing, follow at 41 and 24 families respectively, with smaller counts in coating (C23C), casting (B22D) and welding (B23K). A comprehensive prior-art or freedom-to-operate search in this space should not stop at C22C alone, since processing claims are increasingly filed under these secondary classes.
The trend in this dataset rose from 17 families in 2017 to a peak of 23 in 2024, passing through 13 at the 2022 midpoint, which shows growth but not a steep or steady one. The final one to two years of any patent trend are understated because publication lags filing by roughly 18 months, so the apparent softening in 2025 and 2026 should not be read as a confirmed slowdown yet. Taken together, the honest read is that filing activity has been flat-to-modestly-growing over the tracked period rather than in a clear upward or downward trend.
The dataset shows a fragmented field: recent-year momentum is thin across almost every assignee, with the most active recent filer adding only a single family in the latest tracked year and showing flat year-over-year change. Several previously active assignees, including university and corporate research arms, show zero filings in the most recent period. Co-assignee collaboration is also rare, with only two recurring pairs in the entire corpus, both involving the same automotive filer paired separately with US university research foundations. This points to a field led by activity rather than by a small number of dominant, consolidated programs.
The clearest gap sits between composition and processing: while C22C composition claims cover almost every family in the corpus, additive manufacturing (B33Y, 24 families), coating and surface deposition (C23C, 18), casting (B22D, 10) and welding or joining (B23K, 9) are comparatively thin. That imbalance suggests processing-route claims tied to a specific alloy composition, such as a defined heat-treatment schedule or powder-feedstock specification for a named HEA system, are less contested than a new composition claim on its own. Geographically, India (24 filings), Japan (13) and South Korea (10) receive meaningfully less filing volume than the US and China, which may leave regional coverage gaps for a global filing strategy.
Go past this page: query the whole high-entropy alloy design and processing corpus yourself, in your own scope.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.