https://www.patsnap.com/resources/blog/rd-blog/high-entropy-alloy-design-and-processing-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Metals & Alloys
High-Entropy Alloy Design and Processing Patents
  • Filing has cooled since its 2024 peak. 23 families filed in 2024 against 13 at the 2022 midpoint and just 3 so far in 2026 — a partial year, but the slope from 17 in 2017 is no longer climbing.
  • Composition claims dominate; processing is thinner. 168 of 169 families sit in C22C (alloys) versus 59 in B22F (powder metallurgy) and only 24 in B33Y (additive manufacturing), leaving processing-route claims comparatively open.
  • Filing is US- and China-led but not consolidated. United States (54) and China (42) lead receiving offices, yet co-assignee pairs are rare — only two pairs recur across the entire dataset, pointing to a fragmented, single-filer field rather than a cartel of a few labs.
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169
Published Records
38%
Top-5 Share of All Records
+92%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (12 records) with 2024 (23) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 169 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··8 min readSourced from Patsnap Eureka
Overview

What the filing record shows

High-entropy alloys (HEAs) and their medium-entropy and multi-principal-element variants moved from a materials-science curiosity to a patentable engineering category over the past decade. The filing record here, built from 169 patent families filed between 2017 and mid-2026, tracks that shift: composition claims under C22C cover nearly the entire corpus, while powder metallurgy (B22F), thermal and mechanical treatment (C22F) and additive manufacturing (B33Y) form a secondary tier of processing-route claims layered on top.

Filing activity rose from 17 families in 2017 to a peak of 23 in 2024, with 2022 sitting at 13 — a pattern of growth that has flattened rather than accelerated. Because publication typically lags filing by around 18 months, the 2025 and 2026 counts in any such trend understate real activity; the apparent slowdown at the very end of the window should be read with that lag in mind, not taken as a hard signal that interest has dropped.

Filings by year, 2017–2026
  1. 1PROTERIAL LTD31
  2. 2CITY UNIVERSITY OF HONG KONG13
  3. 3SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION8
  4. 4HONDA MOTOR CO LTD6
  5. 5POSTECH ACADEMY INDUSTRY FOUNDATION6
  6. 6UNIV OF SCI & TECH BEIJING4
  7. 7INDIAN INSTITUTE OF TECHNOLOGY4
  8. 8SOUTH CHINA UNIV OF TECH4
  9. 9THE IND & ACADEMIC COOP IN CHUNGNAM NAT UNIV (IAC)4
  10. 10OHIO STATE INNOVATION FOUND4
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Data

Filing trends and technology composition

Two views of the same 169-family corpus: how filing volume has moved year over year, and how those filings distribute across the IPC subclasses that define composition, powder processing, thermal treatment and additive routes.

A decade of uneven growth, now flattening

From 17 families in 2017 to a peak of 23 in 2024, with the 2022 midpoint at 13 — the trajectory is not a straight climb, and the most recent two years should be read against the usual 18-month publication lag rather than as a confirmed decline.

A decade of uneven growth, now flattening06131925172017201820192020202120222023232024202532026Most recent year is partial — publication lag means later filings are not yet visible.

Composition claims dwarf processing claims

C22C alloy-composition claims appear in nearly every family (168 of 169). B22F powder metallurgy (59), C22F treatment (41) and B33Y additive manufacturing (24) trail well behind, with coating (C23C, 18), casting (B22D, 10) and welding (B23K, 9) forming a long, thin tail of processing niches.

Composition claims dwarf processing claimsC22C · Alloys16899.4%B22F · Powder metallurgy5934.9%C22F · Non-ferrous metal treatment4124.3%B33Y · Additive manufacturing (3D pri…2414.2%C23C · Coating & surface deposition1810.7%F04D · Non-positive-displacement pumps148.3%B22D · Metal casting105.9%B23K · Welding, soldering & brazing95.3%Other5733.7%

Shares are the percentage of the 169 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

The most-cited records in this corpus

Representative recent filing
US20260176722A12026-06-25

High entropy based Cr-Cu-Mn-Ni alloy system and process for preparation thereof (US20260176722A1)

COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH

Filed by the Council of Scientific and Industrial Research, this application claims a Cr-Cu-Mn-Ni high-entropy alloy system defined by specific atomic-percent ranges for each element, along with a preparation process. It is one of the most recent publications in the dataset, dated mid-2026.Abstract lightly trimmed for length; composition ranges reproduced as filed.

US20260176722A1 — patent drawing 1US20260176722A1 — patent drawing 2
View full filing
Highest-citation families
#Publication no.Patent titleCitations
1US20170314097A1High-strength and ultra heat-resistant high entropy alloy (HEA) matrix composites and method of preparing the…307
2US20190024198A1Precipitation Hardening High Entropy Alloy and Method of Manufacturing the Same131
3CN104120325A低热膨胀系数NaMxAlySiz高熵合金及制备方法83
4US20180036840A1Multi-material component and methods of making thereof70
5US20170233855A1High entropy alloy having TWIP/trip property and manufacturing method for the same66
6US20180223417A1High entropy alloy thin film coating and method for preparing the same62
7WO2017098848A1High entropy alloy member, method for producing alloy member, and product using alloy member60
8US20200157663A1High entropy alloy structure and a method of prepating the same58
9US20210260704A1Multi component solid solution high-entropy alloys57
10US20190226058A1Alloy member, process for producing said alloy member, and product including said alloy member53

Citation counts inside a searched corpus skew toward older filings simply because they have had longer to accumulate citations — treat this table as a map of influence on later filers, not a ranking of current technical importance.

Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for a filing decision

Three patterns in the data matter more to a filing strategy than the raw counts on their own.

Filing pace
23 in 2024 vs. 13 in 2022
peak vs. midpoint year

Growth has flattened, not collapsed

The rise from 17 families in 2017 to a peak of 23 in 2024 shows sustained but decelerating interest. Given the roughly 18-month lag between filing and publication, the 2025-2026 figures are still filling in and should not be read as a genuine drop-off.

Filing trend, 2017-2026
Claim density
168 of 169 families in C22C
alloys subclass share

Composition space is crowded; process space less so

Almost every family touches core alloy-composition claims (C22C), but only a third reach powder metallurgy (B22F, 59) and roughly a seventh reach additive manufacturing (B33Y, 24). A new composition claim competes with nearly the whole corpus; a new processing-route claim has more room.

IPC composition table
Filing geography
US 54 · China 42 · India 24
top three receiving offices

Two anchor jurisdictions, a widening periphery

United States and China together account for over half of tracked filings, but India, Japan, EPO and South Korea each carry a meaningful share too. A single-jurisdiction filing strategy in this field leaves several active markets uncovered.

Receiving office counts
Collaboration
2 recurring co-assignee pairs
across 169 families

A fragmented field, not a consolidated one

Only two co-assignee pairings recur across the entire dataset, both involving the same automotive filer paired separately with two US research institutions. Most families are filed by a single assignee, which suggests white space is more often claimed by new entrants than defended jointly by incumbents.

Co-assignee pairs
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Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to high-entropy alloy design and processing, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Who's Filing

Assignee landscape and where the gate sits

Recent-year momentum in this corpus is muted across the board: the most active recent filer logged a single family in the latest year with flat year-over-year movement, and several previously active filers show zero recent output. That pattern — broad participation, little recent concentration — is consistent with a field still being staked out rather than one dominated by a handful of programs.

Momentum
1 filing, 0% YoY
latest-year leader

No single assignee is pulling away

The most active recent filer in this dataset added just one family in the latest tracked year with flat year-over-year change. Several other previously active assignees show zero filings in the same period, meaning current momentum is thin across the entire field rather than concentrated in one lab.

Recent-year momentum
Collaboration
2 pairs total
co-assignee filings

Joint filings are the exception

Cross-institution filing appears only twice in the dataset, both pairing the same automotive assignee with separate US university research foundations. Most of the corpus is filed solo, which lowers the bar for a new entrant to stake a composition or process claim without displacing an entrenched joint program.

Co-assignee pairs
Geography
6 receiving offices tracked
US, CN, IN, JP, EP, KR

Filing strategy spans six offices unevenly

United States and China lead, but India's 24 filings and Japan's 13 show this is not a two-jurisdiction race. A filer targeting only the top two offices misses a quarter of tracked activity sitting elsewhere.

Receiving office counts
🔍
Under-claimed branches worth checking before filing
Processing and application niches with comparatively thin IPC coverage relative to core alloy composition.
Additive-manufacturing process parameters for HEA powdersCorrosion-resistant HEA coatings (C23C)HEA welding and joining procedures (B23K)Precipitation-hardening heat-treatment schedulesCasting-route HEA production (B22D)
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Recent-year filing momentum by assignee
AssigneeRecent yearYoY
South China University of Technology10%
Boumalicheng Co., Ltd.0
City University of Hong Kong0
Hitachi, Ltd.0
SNU R&DB Foundation0
POSTECH Industry-Academic Cooperation Foundation0-100%
Honda Motor Co., Ltd.0
Council of Scientific and Industrial Research0-100%
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The dataset points to specific next steps depending on whether the goal is freedom-to-operate, portfolio strategy, or spotting an entry point.

Check freedom-to-operate against the cited core

The most-cited families in this corpus define the composition and processing baseline that later filings build on. Any new HEA composition or heat-treatment claim should be checked against these before drafting.

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Map the processing white space

With C22C composition claims nearly saturated but B33Y, C23C and B23K far thinner, processing-route claims tied to a specific alloy family are the more open filing target right now.

Run a white-space search in Eureka

Track momentum, not just rank

Recent-year filing counts are flat across almost every assignee in this dataset, including past leaders. A ranking built on lifetime totals alone will miss that the field's current leadership is unsettled.

Monitor assignee momentum in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about high-entropy alloy patents

Answers are grounded in the same dataset. Derived from a Patsnap search on High-Entropy Alloy Design and Processing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.