Book a demo

High-Entropy Alloy Microstructure Control Patent Landscape

High-Entropy Alloy Microstructure Control Patent Landscape
Competitive Landscape

High-Entropy Alloy Microstructure Control Patent Landscape in 2026

The high-entropy alloy microstructure control field is in a sustained growth phase, with 819 patent families on record and activity concentrated overwhelmingly among Chinese academic institutions. Beijing Institute of Technology leads the corpus with 55 patent families, and the five largest filers collectively account for 23% of the hundred largest filers’ combined output, signalling a fragmented but academically dominated competitive structure.

819
Patent families in scope
23%
Top-5 share of top-100 filers
+119%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
↗ Tap any metric to explore the underlying patents and uncover deeper insights in PatSnap Eureka
Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

Chinese universities dominate a fragmented but rapidly growing field

Beijing Institute of Technology holds the top position with 55 patent families, followed by Northwestern Polytechnical University (27), the Institute of Metal Research at the Chinese Academy of Sciences (24), University of Science and Technology Beijing (23), and Dalian University of Technology (23). The top five collectively represent 23% of the hundred largest filers’ combined total, indicating that no single player has established a decisive positional lock.

The leading tier is composed almost exclusively of Chinese research universities and national academies, with POSTECH Academy Industry Foundation (21 patent families) being the only non-Chinese institution in the top ten. This creates a pronounced single-nation concentration in the upper ranks and a thin secondary tier with limited industrial presence.

Leading applicants
#ApplicantPatent familiesShare
1Beijing Institute of Technology55
2Northwestern Polytechnical University27
3Institute of Metal Research, Chinese Academy of Sciences24
4UNIV OF SCI & TECH BEIJING23
5Dalian University of Technology23
6POSTECH Academy-Industry Foundation21
7Harbin Institute of Technology18
8Taiyuan University of Technology17
9Shanghai University16
10Jiangsu University of Technology13
#ApplicantPatent familiesShare
11Jiangsu University13
12NANJING UNIV OF SCI & TECH13
13Central South University12
14Shenyang University of Technology11
15Xi’an Jiaotong University10
16Southeast University10
17Northeastern University (China)9
18Shanghai Jiao Tong University9
19Hunan University8
20AVIC Beijing Institute of Aeronautical Materials8
↗ Hover a row · click a company to ask Eureka

The academic dominance of the leader board suggests that foundational IP is still being defined rather than consolidated by vertically integrated manufacturers. For industrial entrants, this creates an opening to file application-specific patents before incumbent universities solidify their coverage in processing routes and end-use domains.

The most recent 18–24 months are likely under-counted due to standard patent publication lags; actual activity in 2025 and 2026 is expected to be higher than current figures suggest. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Filings are growing strongly; alloy composition and thermal treatment dominate the technology mix

Annual filing volume and the distribution across IPC classes together reveal both the pace of competitive entry and which processing routes are currently attracting the most IP activity.

Annual filing trend

Filings grew from 38 in 2017 to a recorded peak of 157 in 2024, representing a 119% increase over the recent measurement window. The apparent dip in 2025 (144) and near-zero 2026 figure reflect publication lag rather than a real slowdown; the lifecycle evidence confirms annual filings are still rising. Readers should treat 2025–2026 data as materially incomplete.

Annual filing trendAnnual values from 2017 to 2026, peaking at 157 in 2024.3820174720185220194620208220211082022129202315720241442025162026↗ Hover for values · click a bar to ask Eureka

Technology composition

C22C (Alloys) and C22F (Non-ferrous metal treatment) account for the two largest branches by a wide margin, reflecting the field’s core focus on compositional design and thermomechanical processing. C21D (Heat treatment of metals) and B22F (Powder metallurgy) form a secondary cluster, while C23C (Coating and surface deposition), B21B (Metal rolling), and B33Y (Additive manufacturing) each represent smaller but technically distinct sub-areas. Branches below roughly 50 counts each point to under-served adjacent territories.

Technology compositionC22C · Alloys leads with 752; C22F · Non-ferrous metal treatment 712.C22C · Alloys752C22F · Non-ferrous metal…712C21D · Heat treatment of…177B22F · Powder metallurgy125C23C · Coating & surface…84B21B · Metal rolling55B33Y · Additive manufact…46B22D · Metal casting44↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2024172330A1Published 2024-08-22

Cr-fe-co-based high-entropy alloy with shape memor…

Pusan National University INDUSTRY-UNIVERSITY Cooperation Foundation

The present invention relates to a Cr-Fe-Co-based high-entropy alloy with shape memory characteristics at high temperatures, a method for predicting the composition range of the Cr-Fe-Co-based high-entropy alloy, and a high-entropy alloy manufactured by the method, wherein the high-entropy alloy can be easily manufactured through thermodynamic calculations… (excerpt from the patent abstract)

Cr-fe-co-based high-entropy alloy with shape memor… — patent drawingCr-fe-co-based high-entropy alloy with shape memor… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Precipitation Hardening High Entropy Alloy and Met…128
2AlCoCrFeNiTix高熵合金材料及其制备方法107
3一种多相高熵合金及其制备方法77
4一种超细晶高熵合金的制备方法68
5一种兼具高强度和高塑性的轻质高熵合金及其制备方法63
6一种兼具高强度和高塑性的轻质高熵合金及其制备方法57
7Medium-entropy alloy having excellent cryogenic pr…47
8一种基于高熵合金的WC基硬质合金材料及其制备方法45

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

Four structural observations — maturity stage, concentration level, collaboration patterns, and geographic reach — together define the strategic context for new entrants and incumbents alike.

Growth

Active Growth stage with rising annual volume

The lifecycle evidence classifies this field as Growth, with annual filings still rising and a 119% increase recorded over the recent measurement window. The peak year in the data is 2024 at 157 families, and the lifecycle evidence explicitly notes that apparent softness in 2025–2026 reflects publication lag, not a real deceleration. This is a field where IP positions are still being built, not harvested.

Growth stage
Concentration

Fragmented upper tier led by academic institutions

The top five filers hold 23% of the hundred largest filers’ combined total — a moderate concentration level that leaves the field open to disruption. All top-five positions are held by Chinese universities or national research institutes, with no dominant industrial patent holder in sight. A challenger entering with application-specific or processing-route IP can realistically compete for top-ten positioning.

Moderate concentration
Collaboration

Beijing Institute of Technology is the ecosystem hub

The most active co-filing pairs all involve Beijing Institute of Technology. Its strongest partnerships are with its own Tangshan Research Institute (4 joint filings), the China Institute of Atomic Energy (3), and the Northwestern Polytechnical University Shenzhen Research Institute (3). Collaboration is largely intra-institutional or between a flagship university and its affiliated research arms, with limited industry-academia joint filing visible in the top pairs.

Hub-and-spoke
Geography

China-dominant filing with thin international coverage

China accounts for 761 of the jurisdictional filings, with South Korea second at 23, the United States third at 14, and WIPO PCT filings at 13. Europe (EPO) records only 9 filings. This gap indicates that most IP holders are not yet seeking broad international protection, leaving non-Chinese jurisdictions relatively open for well-resourced entrants who file PCT or direct national applications.

China-centric
PatSnap Eureka · TRIZ Solution Agent
Facing a specific technical bottleneck in this field?

Go beyond the landscape: Eureka’s TRIZ Solution agent breaks down an R&D problem and returns patented concept solutions, each with a technical approach and cited patent & literature evidence.

Solve it in Eureka →
Top collaboration links
ApplicantCollaboratorCo-filings
Beijing Institute of TechnologyBeijing Institute of Technology Tangshan Research Institute4
Beijing Institute of TechnologyChina Institute of Atomic Energy3
Northwestern Polytechnical UniversityNorthwestern Polytechnical University Shenzhen Research Institute3
Beijing Institute of TechnologyXi’an Modern Control Technology Research Institute2
Beijing Institute of TechnologyXue Yunfei2
Beijing Institute of TechnologyWang Lu2
Beijing Institute of TechnologyWang Benpeng2
Beijing Institute of TechnologyWang Fuchi2
Beijing Institute of TechnologyChen Songshen1
Beijing Institute of TechnologyChongqing Hongyu Precision Industry Group Co., Ltd.1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Cards are grounded in applicant ranking, lifecycle, collaboration, and jurisdiction evidence.Explore insights →
Leaders

Beijing Institute of Technology leads; most major players show new-entrant momentum

The top two players share a similar technology focus on non-ferrous metal treatment and alloy composition but differ in scale and trajectory.

Leader · Beijing Institute of Technology

Beijing Institute of Technology

The field leader holds 55 patent families with a technology focus concentrated on non-ferrous metal treatment (C22F 1), alloy composition (C22C 30 and C22C 1). Recent-period momentum shows a +11% increase versus the prior three-year window, indicating a maturing but still active filing program. Its collaboration network — linking to the China Institute of Atomic Energy and Xi’an Modern Control Technology Research Institute — suggests a defense and advanced-materials orientation.

families: 55
Challenger · POSTECH Academy Industry Foundation

POSTECH Academy Industry Foundation

POSTECH is the only non-Chinese institution in the top ten, with 21 patent families. Its technology emphasis is notably distinct: C22C 38 (iron-based alloys) appears alongside C22C 30 and C22F 1, suggesting a broader alloy-system scope than the Chinese university leaders. Its recent-period trend is classified as a new entrant in the momentum data, meaning its filing base in this specific topic area is newly established — a signal of deliberate strategic entry rather than long-standing coverage.

families: 21
🔍
See the full applicant breakdown
Access ranked profiles for all top-100 filers, including technology focus and momentum scores.
Northwestern Polytechnical UniversityInstitute of Metal Research, Chinese Academy of Sciences+ more
Unlock full assignee analysis →
Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Beijing Institute of Technology20▲ +11%
Northwestern Polytechnical University13▲ new entrant
Institute of Metal Research, Chinese Academy of Sciences14▲ new entrant
Dalian University of Technology17▲ new entrant
University of Science and Technology Beijing14▲ new entrant
POSTECH Academy-Industry Foundation3▲ new entrant
Jiangsu University10▲ new entrant
Harbin Institute of Technology8▲ new entrant
Source: PatSnap Eureka. Family counts are from the applicant ranking; momentum and technology focus are from applicant-level evidence.Explore players →
Adjacent Branches

Under-served branches adjacent to the dominant processing core

Several IPC classes sit at measurably lower patent densities relative to the core alloy-composition and thermal-treatment branches; these represent areas where coverage is comparatively sparse and technical overlap with high-entropy alloy microstructure control is plausible.

B33Y · Additive Manufacturing (3D Printing)

Additive manufacturing carries 46 patent records in the corpus — a fraction of the counts in C22C and C22F — despite being a technically plausible and industrially relevant route for controlling solidification microstructures in high-entropy alloys. Layer-by-layer deposition enables spatial control of composition gradients and phase distributions that are difficult to achieve by conventional casting or rolling. The sparse coverage relative to the dominant branches, combined with growing industrial adoption of metal AM, makes this an adjacent branch worth monitoring for new filings. Entry via AM-specific process parameter or post-build heat-treatment claims could differentiate from the existing composition-focused portfolio.

Search this in Eureka →

C23C · Coating and Surface Deposition

Coating and surface deposition accounts for 84 patent records, placing it third in the secondary cluster but still well below the dominant branches. High-entropy alloy coatings for wear, oxidation, and corrosion resistance represent a commercially distinct application space from bulk alloy development, yet the IP coverage in C23C is comparatively thin. Thermal spray, physical vapor deposition, and cold spray routes each offer distinct microstructure control levers not captured in bulk-alloy claims. An entrant focusing on deposition-process parameters that govern coating microstructure — grain size, phase ratio, residual stress — would be operating in a less contested sub-space.

Search this in Eureka →
🔒
Unlock the full white-space map
See density scores and entry-path analysis for all adjacent IPC branches in the corpus.
B21B · Metal RollingH01F · Magnets, Inductors and Transformers+ more
Unlock full analysis →
Source: PatSnap Eureka. Branch counts are at the patent-record level from the technology composition data.Explore emerging →
Route Matrix

How leading institutions differ by technology route emphasis

Strength of each leader across the main technology routes.

PlayerC22F 1 · Non-ferrous metal treatmentC22C 30 · AlloysC22C 1 · AlloysC21D 1 · Heat treatment of metalsC21D 9 · Heat treatment of metals
Beijing Institute of TechnologyStrong · 54Strong · 37Moderate · 27Emerging · 2Absent
Dalian University of TechnologyStrong · 23Strong · 22Strong · 21Emerging · 3Emerging · 2
University of Science and Technology BeijingStrong · 22Strong · 23Strong · 19AbsentEmerging · 2
Northwestern Polytechnical UniversityStrong · 21Strong · 20Strong · 15Moderate · 8Absent
Institute of Metal Research, Chinese Academy of SciencesStrong · 23Strong · 21Strong · 16AbsentEmerging · 3
Harbin Institute of TechnologyStrong · 17Strong · 13Strong · 15AbsentEmerging · 3
Taiyuan University of TechnologyStrong · 16Strong · 17Strong · 15AbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
Frequently asked questions

Frequently asked questions

Still have questions? PatSnap Eureka answers them from patent and research data.Ask Eureka →
PatSnap Eureka

Ready to map your own high-entropy alloy IP landscape?

Join 18,000+ innovators using PatSnap Eureka to map any technology landscape: search 2B+ patents and papers, surface key assignees, and generate a report like this in minutes.

18,000+innovators worldwide
2B+patents & papers
< 5 minper landscape report

Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Explore in Eureka ↗
Powered by PatSnap Eureka

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.