https://www.patsnap.com/resources/blog/rd-blog/high-frequency-and-rf-wafer-probing-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Wafer Test & Probe
High Frequency and RF Wafer Probing Patents: Who Leads and Where Filings Are Headed
  • Concentrated at the top. The five leading assignees hold 103 of 186 records in scope (55.4%), and the leading ten hold 71.0% — a field where a handful of players occupy most of the claim space.
  • Filings are accelerating, not cooling. Filings rose from 2 in 2021 to 5 in 2024, a +150% three-year climb, even before the reporting lag on 2025–2026 is accounted for.
  • Measurement and semiconductor classes dominate. G01R (electric & magnetic measurement) touches 57.0% of records and H01L (semiconductor devices) 21.5%, showing where the claim density actually sits.
Get a prior-art report on your approach
186
Published Records
55%
Top-5 Share of All Records
+150%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (2 records) with 2024 (5) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 186 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

High frequency and RF wafer probing sits at the intersection of test-and-measurement hardware and semiconductor process control: probe cards, ground-signal-ground contact geometries, on-wafer calibration substrates, and the de-embedding methods that separate a device's true response from the parasitics of the fixture around it. The scope here spans 186 published records between 2015 and mid-2026, drawn from filings that combine RF probing or high-frequency probe language with impedance matching, de-embedding, calibration substrates, crosstalk-between-probes, ground-signal-ground contact layouts, or loss compensation.

Because publication trails filing by roughly 18 months, the most recent one to two years in any trend chart will understate real activity — treat the tail as a floor, not a ceiling.

Filing activity and technology composition, 2015–2026
  1. 1MITSUBISHI ELECTRIC CORP28
  2. 2MPI CORP28
  3. 3BRILLIANT LIGHT POWER INC17
  4. 4HUGHES AIRCRAFT CO17
  5. 5NEWTEC CY NV13
  6. 6UNIV OF VIRGINIA PATENT FOUND9
  7. 7TRILUMINA CORP7
  8. 8THE DIRECTV GRP INC5
  9. 9WELLS FARGO BANK NA4
  10. 10FUJITSU LTD4
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

Two views of the same 186 records: how filing activity has moved year over year, and which IPC subclasses carry the underlying claim volume.

Filing trend: growth after a quiet stretch

Annual filings peaked so far at 17 in 2018, then eased before climbing again — 2021's 2 filings became 2024's 5, a +150% three-year rise. 2024 is the most recent year that can be read as complete; 2025 and 2026 will fill in as publications catch up.

Filing trend: growth after a quiet stretch0510152022017172018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Where the claims sit: measurement and semiconductor devices lead

G01R (electric & magnetic measurement) appears in 57.0% of the 186 records, well ahead of H01L semiconductor devices at 21.5% and A61B diagnosis & surgery at 16.1%. Waveguide and microwave hardware (H01P, 9.1%) and general material testing (G01N, 5.4%) are present but much thinner, which is consistent with most of the patenting effort going into measurement methodology and calibration rather than the RF hardware itself.

Where the claims sit: measurement and semiconductor devices leadG01R · Electric & magnetic measurement10657.0%H01L · Semiconductor devices4021.5%A61B · Diagnosis & surgery3016.1%H01P · Waveguides & microwave elements179.1%C01B · Non-metallic elements & inorga…168.6%H02S · Photovoltaic / solar power gen…158.1%H01S · Lasers & stimulated emission147.5%G01N · Material analysis & testing105.4%Other7942.5%

Shares are the percentage of the 186 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

Go deeper on High Frequency and RF Wafer Probing with Eureka

This page is one run against one query. Ask Eureka your own question about high frequency and rf wafer probing and every answer comes back with the patent numbers behind it.

Try Eureka
Key Patents

A representative filing and the most-cited prior art

Representative filing
US9535093B22017-01-03

US9535093B2 — High frequency probe card for probing photoelectric device

MPI CORPORATION

A high frequency probe card for probing a photoelectric device includes a substrate having a first opening and at least one first through hole, an interposing plate disposed on the substrate and having a second opening and at least one second through hole, a circuit board disposed on the interposing plate and having a third opening and at least one third through hole, and a probe module mounted to the substrate and having at least one ground probe and at least one high-frequency impedance matching probe having a signal transmitting structure and a grounding structure passing through the through holes and being electrically connected with a signal pad.Filed by MPI Corporation, published 2017-01-03.

US9535093B2 — patent drawing 1US9535093B2 — patent drawing 2
View full record
Most-cited records in this dataset
#Publication no.Patent titleCitations
1US6714165B2Ka/Ku dual band feedhorn and orthomode transduce (OMT)268
2US5148103AApparatus for testing integrated circuits236
3US20130266326A1Microlenses for Multibeam Arrays of Optoelectronic Devices for High Frequency Operation232
4US5623214AMultiport membrane probe for full-wafer testing162
5US20150340841A1Laser arrays for variable optical properties148
6US5642054AActive circuit multi-port membrane probe for full wafer testing137
7US6310483B1Longitudinal type high frequency probe for narrow pitched electrodes120
8US5313157AProbe for testing an electrical circuit chip117
9US20050081245A1Method and apparatus for determining channel to which a TV or VCR is tuned84
10US20040066181A1High-frequency probe tip84

Citation counts inside this corpus favour older filings that have had more time to accumulate citations — read them as a signal of influence on the field, not of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Run it yourself

Put your own technology through the same analysis


  
Where to run it
Fastest

Eureka on the web

When you want the answer in the next five minutes.

The agent works the prompt against patents and technical literature, citing every source.

Run your analysis now →
For builders

MCP server & REST API

When it has to run inside your own pipeline.

Patent search, landscape analysis and assignee resolution as MCP tools. Drop them into any agent framework, or call REST directly.

Browse MCP servers →
Insights

What the numbers mean for a filing decision

Three read-outs from the dataset that matter more than the raw counts on their own.

Concentration
55.4%
top 5 of 186 records

A small group holds most of the claim space

Five assignees account for 103 of the 186 records in scope, and the leading ten climb to 71.0%. That leaves a long tail of single- or low-count filers working around the edges of territory the leaders already occupy.

Top 5 / top 10 concentration
Momentum
+150%
2021 to 2024 filings

Recent growth is real, not an artefact of the peak year

The 2018 peak of 17 filings is past, but the more recent 2021→2024 climb from 2 to 5 filings is the growth figure worth tracking, since 2025–2026 data is still incomplete due to publication lag.

Three-year filing growth
Composition
57.0%
G01R share of 186 records

Measurement methodology, not RF hardware, drives volume

G01R (electric & magnetic measurement) touches well over half the records, more than double the share of H01P waveguide and microwave elements. Filing effort in this field concentrates on calibration and measurement technique rather than probe hardware design.

IPC subclass share
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to high frequency and rf wafer probing, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the field is thin

The leader holds 28 records; by fifth place that drops to 13, and by tenth place to 4 — a steep curve from a dominant leader to a broad field of occasional filers.

Leader
28 records
leading assignee

One assignee sets the pace

The top-ranked assignee holds 28 of the 186 records in scope, more than double the fifth-place count of 13, indicating a filer that has built a broad position across multiple probing sub-areas rather than a single narrow claim family.

Leader vs. fifth place
Mid-field
13 → 4
fifth to tenth place

A sharp drop-off after the top five

Record counts fall from 13 at fifth place to 4 by tenth, meaning the top-10 concentration of 71.0% is carried disproportionately by the first few names rather than spread evenly across the group.

Filing counts, ranked positions 5 and 10
Long tail
52 companies
ranked assignees

A broad field of low-volume filers

The ranking covers 52 companies in total across the 186 records — this is the complete ranked list the dataset returns, not a top-50 or top-100 cut, and most of those names sit well below the leading ten.

Full ranked assignee count
🔍
Under-claimed sub-areas worth a closer look
Branches where filing density is thin relative to the core measurement and semiconductor classes above.
Crosstalk-compensated multi-probe arraysCalibration substrates for sub-THz de-embeddingGround-signal-ground pitch scaling for photonic devicesLoss-compensation methods for flexible membrane probes
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Mitsubishi Electric Corporation0
Hughes Aircraft Company0
MPI Corporation0
Brilliant Light Power, Inc.0-100%
Newtec CY N.V.0
TriLumina Corporation0
University of Virginia Patent Foundation0
Hitachi, Ltd.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this analysis

The dataset points to concentration at the top and thin coverage in a few adjacent branches. Turning either observation into a filing or freedom-to-operate decision means going deeper into specific claim sets.

Map claim scope against the leading five

Before filing near ground-signal-ground contact geometries or calibration substrates, check what the leading assignee's 28 records actually claim, since a broad early position can narrow the room available for new filings.

Explore assignee claims in Eureka

Test the white space with a draft claim

Crosstalk-compensated multi-probe arrays and sub-THz calibration substrates show thin filing density in this dataset. Drafting a first claim against that gap is a faster way to test viability than reading abstracts alone.

Draft and check claims in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on High Frequency and RF Wafer Probing covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Research High Frequency and RF Wafer Probing in depth with Eureka

Go past this page: query the whole high frequency and rf wafer probing corpus yourself, in your own scope.
Every answer comes back with patent numbers you can open.

Try Eureka

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.