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Integrated Laser Manufacturing Process Patents: Leaders & Trends 2026

Integrated Laser Manufacturing Process Patents: Leaders & Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/integrated-laser-manufacturing-process-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Photonics & Optics · Patent Landscape
Integrated Laser Manufacturing Process Patents: Who Is Filing and Where
  • Flat filing curve. activity peaked at 4 families in 2022 and has not broken higher since — this is a narrow, still-open field rather than a crowded one.
  • No dominant recent filer. every tracked assignee shows zero filings in the latest year, so momentum has stalled across the board rather than concentrating in one lab.
  • Filing is US/EPO-heavy. 18 US and 17 EPO filings dwarf China's 3, suggesting the commercial center of gravity for this process work still sits in North America and Europe.
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46
Published Records
46%
Top-5 Share of All Records
US
Leading Jurisdiction
27
Active Filers Ranked
Published byPatsnap Research··6 min readSourced from Patsnap Eureka
Overview

What this dataset covers

This landscape tracks 46 patent families published between 2015 and mid-2026 that combine integrated, heterogeneous or on-chip laser claims with process-specific language: wafer bonding, quantum dot epitaxy, flip-chip assembly, and general manufacturing process claims, filtered against core laser and semiconductor IPC classes. It is a narrow, process-focused slice of the broader integrated photonics field rather than a survey of laser devices generally.

Because publication typically lags filing by around 18 months, the 2025-2026 figures in any trend line understate real activity — recent applications are still working through the pipeline.

Filing activity, 2015-2026
  1. 1HEWLETT PACKARD CO7
  2. 2AGILENT TECHNOLOGIES INC4
  3. 3HIKARI KEISOKU GIJUTSU KAIHATSU4
  4. 4OPNEXT JAPAN INC3
  5. 5AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE LTD3
  6. 6COMPOUNDTEK PTE LTD3
  7. 7NEC CORP3
  8. 8TRIO METAL (GZ) CO LTD2
  9. 9ZEN TECH LTD2
  10. 10GM GLOBAL TECHNOLOGY OPERATIONS LLC2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

Two views of the same 46 families: how filing volume has moved year over year, and which IPC subclasses the claims actually sit in.

A flat curve, not a growing one

Filings rose from zero in 2017 to a peak of 4 in 2022, then the midpoint check shows no clear acceleration afterward. Read this as a technology area with steady, low-volume interest rather than a race to file.

A flat curve, not a growing one0123402017201820192020202142022202342024202512026Most recent year is partial — publication lag means later filings are not yet visible.

Concentrated in H01S, with process spillover

Every record touches H01S (lasers and stimulated emission), the anchor class for this search. Secondary weight sits in G02B (optical elements), with smaller counts in H01L (semiconductor devices), G01S and H04B, plus a handful in metal casting and metal treatment classes — evidence that some filers are protecting the assembly and packaging steps, not just the optical device itself.

Concentrated in H01S, with process spilloverH01S · Lasers & stimulated emission46100.0%G02B · Optical elements & systems817.4%H01L · Semiconductor devices48.7%G01S · Radar, sonar & positioning36.5%H04B · Transmission (general)36.5%B22D · Metal casting24.3%H10P24.3%C22F · Non-ferrous metal treatment12.2%Other24.3%

Shares are the percentage of the 46 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key patents

Representative filing and most-cited prior art

Representative record
US11936159B22024-03-19

Integrated laser driver circuit for switching a pulse current for a laser diode (US11936159B2, IC-HAUS GMBH, 2024-03-19)

IC-HAUS GMBH

The patent describes an integrated laser driver circuit built from parallel sub-switching units, each pulsing its own partial current and each carrying its own integrated energy accumulator to supply the switching energy, so the combined outputs form the total pulse current delivered to the laser diode.Claims center on circuit architecture for pulse-current generation, not on the optical or epitaxial structure of the laser itself.

US11936159B2 — patent drawing 1US11936159B2 — patent drawing 2
View full record
Most-cited records in this corpus
#Publication no.Patent titleCitations
1US4318058ASemiconductor diode laser array237
2US5835514ALaser-based controlled-intensity light source using reflection from a convex surface and method of making same94
3US5809050AIntegrated controlled intensity laser-based light source using diffraction, scattering and transmission81
4US5771254AIntegrated controlled intensity laser-based light source65
5US5084894AOptical semiconductor device48
6US5761229AIntegrated controlled intensity laser-based light source45
7US5764842ASemiconductor guided-wave optical device and method of fabricating thereof44
8US5208878AMonolithically integrated laser-diode-waveguide combination40
9EP0665446A2Light beam scanner and integrated laser arrangement used for the scanner35
10EP0786838A2Laser based light source using diffraction, scattering or transmission32

Citation counts favour older filings simply because they have had more time to be cited — treat this table as a map of influential prior art, not of current filing leadership.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

Reading the trend line and the citation base

The filing history and the most-cited prior art tell different parts of the same story: a technology that has never surged, sitting on top of some genuinely foundational device patents.

Filing pace
Peak 4 (2022)
families in the peak year

Volume has stayed low throughout

A peak of just 4 families in a single year, against a total of 46 across more than a decade, points to a specialised process niche rather than a race that any single filer is winning on volume.

2017-2026
Jurisdictions
US 18 / EPO 17
filings by receiving office

Filing is Western-centered

US and European receiving offices together account for the large majority of filings, with China, India, Japan and PCT filings each in single digits. Freedom-to-operate work should prioritize US and EP prosecution history first.

Receiving office split
Prior art age
237 citations (US4318058A)
top citation count

The most-cited art predates the current wave

The most-cited record in this corpus is a foundational semiconductor diode laser array patent, with the next four most-cited also from the 1990s. High citation counts here mark influence on the field, not current claim risk.

Citation leaders
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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds filings, and where the gate sits

No assignee in this dataset shows filings in the most recent tracked year — recent-year momentum is flat across every party checked. That makes this a field defined more by who filed historically than by who is actively pushing new claims right now.

Filing pattern
0 latest-year filings
across tracked assignees

Momentum has stalled, not shifted

Every assignee checked for recent-year activity — spanning corporate labs and specialist optics firms — shows zero filings in the latest year. This is not one company overtaking another; it is the whole tracked set going quiet at once, likely reflecting the 18-month publication lag as much as any real pullback.

Latest-year check
Geography
US 18 / EPO 17 / CN 3
top receiving offices

Filing strategy leans Western

With US and EPO offices absorbing the bulk of filings and China, India and Japan each in single digits, assignees pursuing global coverage in this space have so far treated North America and Europe as the priority jurisdictions.

Receiving office split
Corpus size
46 families
total tracked

A small, specialised field

At 46 total families across more than a decade, this is a tightly scoped technology area. New entrants are not competing against thousands of prior filings — but the small base also means each individual grant carries more relative weight.

2015-2026
🔍
Under-claimed process branches
Sub-areas where the IPC composition shows thin coverage relative to the core H01S claims — worth checking before assuming the space is closed.
Flip-chip laser die bonding tolerancesQuantum dot epitaxy defect controlMetal casting for laser package housingsNon-ferrous alloy treatment in laser mountsWafer-level laser-to-waveguide alignment
Rank all filers by momentum →
Recent-year filing momentum
AssigneeRecent yearYoY
Hewlett-Packard Company0
Nippon Koshin Co., Ltd.0
Optical Measurement Technology Development Co., Ltd.0
NEC Corporation0
Compontek Pte. Ltd.0
GM Global Technology Operations LLC0
Guangzhou Zhongshan New Materials Co., Ltd.0
ZEN TECH LTD0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this from here

The trend and assignee data point to specific next checks rather than a single conclusion.

Check the packaging and assembly branches

Secondary IPC weight in metal casting and metal treatment suggests some filers are protecting the mechanical and thermal packaging around the laser die, not just the optical design. This is worth a dedicated search.

Explore packaging claims in Eureka

Watch for the publication-lag catch-up

Zero latest-year filings across all tracked assignees is partly an artefact of the roughly 18-month gap between filing and publication. Re-check this trend in six to twelve months before concluding the field has cooled.

Set a monitoring alert in Eureka

Map citation leaders against current claims

The most-cited records date from the 1990s. Confirming which of their claims have expired versus which descendants remain in force is a prerequisite for any freedom-to-operate opinion in this space.

Run a citation analysis in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about integrated laser manufacturing process patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Integrated Laser Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Go past this page: query the whole integrated laser manufacturing process corpus yourself, in your own scope.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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