Ion Beam Sputtering Optical Coatings 2026 — PatSnap Eureka
Ion Beam Sputtering Optical Coating Patents 2026
IBS optical coatings deliver the lowest optical losses and highest environmental stability of any thin-film deposition method. This dataset spans 1995–2025 across EUV lithography, mid-IR laser optics, and gravitational wave detector mirrors.
IBS Optical Coatings: From Laboratory to Precision Industry
Ion beam sputtering (IBS) uses collimated ion beams — typically argon at 1–5 keV — directed at a target at 55°–70° oblique angles to deposit dense, ultra-low-loss optical thin films. The resulting coatings exhibit high packing density, low porosity, minimal water uptake, and extremely low optical absorption — properties unattainable by magnetron or thermal evaporation methods.
The technology spans direct IBS deposition of dielectric multilayer stacks (SiO₂, Ta₂O₅, TiO₂, HfO₂, ZnS, Al₂O₃), dual ion beam sputtering (DIBS) with a secondary assist source, reactive IBS using oxygen or nitrogen to form oxide or nitride films, and ion-assisted deposition (IAD) combining evaporation with IBS assist beams.
Application domains covered in this dataset include EUV lithography mask blank fabrication at 13.5 nm, VUV/EUV semiconductor wafer inspection optics, high-power mid-IR laser coatings on ZnGeP₂ substrates, gravitational wave detector mirror coatings at 1550 nm, X-ray and space telescope multilayers, and large-aperture laser optics over 300 mm diameter.
In this dataset, filing activity spans 1995 to 2025 with approximately 8 distinct assignees identifiable across US, WO, KR, JP, EP, CA, and GB jurisdictions. The most recent active filings in this dataset are from AGC Inc., KLA Corporation, and Korea Ceramic Technology Institute, representing the current active IP frontier.
Filing Activity and Technology Cluster Distribution
The IBS optical coating dataset spans three decades of innovation across process fundamentals, EUV precision deposition, and scalable architectures. Filing activity clusters around foundational US patents in 1995–2002, EUV-focused activity in 2007–2009, and a renewed push in 2022–2025 for semiconductor inspection and IR defense optics.
IBS Patent Technology Cluster Distribution (Dataset Snapshot)
In this dataset, EUV/XUV multilayer deposition and scatter reduction each account for the largest patent clusters, with IAD/DIBS dense-film architectures representing the most recent active innovation zone.
↗ Click bars to exploreIBS Optical Coating Filing Activity by Era (Dataset Snapshot)
In this dataset, patent filing activity shows a foundational burst in 1995–2002, a focused EUV cluster in 2007–2009, and a renewed active-filing phase from 2022–2025 driven by KLA Corporation and Korea Ceramic Technology Institute.
↗ Click bars to exploreKey IBS Optical Coating Application Zones Across Sectors
IBS optical coatings are deployed across demanding spectral and precision environments — from sub-13.5 nm EUV lithography and semiconductor wafer inspection to mid-IR laser crystals and gravitational wave detector mirrors. Each domain imposes distinct requirements on film density, stress, absorption, and laser damage threshold.
EUV Lithography Mask Blank Optics
AGC Inc. holds multiple active US patents (2007, 2009) specifying IBS at 35°–80° incidence angle with substrate rotation to planarize concave defects in Mo/Si EUV mask blank multilayers for 13.5 nm lithography. In this dataset, this is the most patent-protected IBS application, with 4 filings from 2 assignees. KLA Corporation’s 2022 filings further target VUV/EUV wafer inspection optics where conventional porous films fail under intense short-wavelength illumination.
Semiconductor LithographyMid-IR Laser Optics on ZnGeP₂
Three literature papers from 2022–2023 establish IBS as viable for selenide and fluoride materials on ZnGeP₂ substrates for mid-IR laser applications up to 5 µm. ZnSe/Al₂O₃ AR coatings achieved a laser-induced damage threshold (LIDT) of 3.51 J/cm² at 2097 nm, while ZnS/Al₂O₃ coatings increased optical breakdown threshold by ~55% versus uncoated substrates. No corresponding patents were identified in this dataset, representing a potential first-mover patent opportunity.
High-Power Laser OpticsGravitational Wave Detector Mirrors
Literature from 2014 documents Si/SiO₂ IBS multilayers characterized by photothermal methods for next-generation laser-interferometric gravitational wave detectors, targeting sub-ppm optical absorption at 1550 nm. Future GWD configurations require test mass mirror coatings with sub-ppm optical absorption, with crystalline silicon explored as a low-absorption high-index material. Stress-optimized multilayer IP around 1550 nm DIBS processes appears underprotected in this dataset.
Quantum OptomechanicsKorea ZnS IR Defense Lens Coatings
The Korea Ceramic Technology Institute filed two active KR patents in 2024 and 2025 on high-transmittance ZnS lenses combining IBS-deposited AR coatings with diamond-like carbon (DLC) overcoats for IR imaging applications. This dual-function hard-coating approach addresses both optical and mechanical performance for IR sensors in harsh environments. These are the most recent active filings in this dataset, representing a new application template for ruggedized defense and thermal imaging optics.
IR Imaging and DefenseKey Patent Assignees in IBS Optical Coatings (Retrieved Records)
In this dataset, AGC Inc. and KLA Corporation hold the only currently active IBS-specific optical coating patents, with AGC Inc. focused on EUV mask blank multilayer geometry and KLA Corporation on IAD-based VUV/EUV inspection optics. Filing activity in retrieved records is concentrated among a small number of specialized semiconductor and precision optics organizations.
Top Assignees by IBS Optical Coating Patent Count in Retrieved Records (Dataset Snapshot)
↗ Click bars to exploreAGC Inc.
AGC Inc. holds 3 identified patents in this dataset — 2 active US patents filed in 2007 and 2009, plus a WO companion — covering IBS deposition of Mo/Si multilayer films for EUV lithography mask blanks at 13.5 nm. The 2007 US patent specifies oblique IBS incidence at 35°–80° with substrate rotation to correct concave substrate defects; the 2009 US patent extends the method to capping layer deposition. Both US patents are currently active, making AGC Inc. the assignee with the most active IBS-specific optical coating patents in this dataset.
Japan / United StatesKLA Corporation
KLA Corporation filed 2 co-filed patents in 2022 — one US pending and one WO — covering ion-assisted deposition (IAD) of optical coatings for VUV/EUV semiconductor wafer inspection tools, where conventional porous films fail under intense short-wavelength irradiation. The technical claim is that IAD produces contamination-resistant, high-density films directly tied to sub-3 nm node EUV lithography ramp requirements. These are the most recent major assignee entries in this dataset, representing the leading edge of IBS/IAD integration for next-generation semiconductor metrology.
United StatesSix Emerging Directions in IBS Optical Coating Innovation
The most recent records in this dataset (2018–2025) point to six distinct frontier directions: chalcogenide/fluoride material expansion for mid-IR lasers, VUV/EUV dense-film IAD for semiconductor inspection, stress engineering in DIBS coatings, large-aperture uniformity algorithms, dual-function AR/DLC hard coatings for IR defense, and magnetic field guided material switching.
Mid-IR IBS on Nonlinear Crystals (2022–2023)
Three literature papers in 2022–2023 establish IBS as viable for selenide and fluoride materials — ZnSe, YbF₃ — on ZnGeP₂ substrates for mid-IR laser applications up to 5 µm. ZnSe/Al₂O₃ AR coatings achieved LIDT of 3.51 J/cm² at 2097 nm, and ZnS/Al₂O₃ coatings increased optical breakdown threshold by ~55% versus uncoated substrates. No corresponding patents were identified in this dataset, representing a potential first-mover patent opportunity for firms active in IR laser optics.
VUV/EUV Dense-Film IAD for Semiconductor Inspection (2022)
KLA Corporation’s dual 2022 filings (US pending + WO) represent the leading edge of IBS/IAD integration for next-generation semiconductor metrology optics at wavelengths below 200 nm. The technical claim is that IAD produces contamination-resistant, high-density films where conventional porous CVD or evaporation methods fail under VUV irradiation — directly tied to the EUV lithography ramp for sub-3 nm node chipmaking. This is the only active patent cluster in IAD-for-inspection in this dataset.
IBS vs. Magnetron Sputtering for Optical Coating Applications
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| Dimension | Ion Beam Sputtering (IBS) | Magnetron Sputtering |
|---|---|---|
| Film Density | High packing density, low porosity, minimal water uptake | Lower density; more susceptible to porosity and water absorption |
| Optical Absorption | Extremely low optical absorption; lowest optical losses of any deposition method | Higher optical absorption compared to IBS |
| Scatter Performance | Low scatter; dedicated patents address nodular defect management (JDS Uniphase 1997, Optical Coating Lab 1997/1999) | Higher scatter risk in thick coatings |
| EUV/VUV Capability | Primary method for EUV mask blank Mo/Si multilayers (AGC Inc. active patents 2007–2009) and VUV inspection optics (KLA 2022) | Not identified in this dataset as primary method for EUV mask blank deposition |
| Throughput | Historically low; ribbon-beam IBS (White 2015 WO) and meter-scale linear systems (2017 literature) extend throughput to magnetron-comparable levels | Higher throughput; standard industrial production method |
| Film Stress Control | DIBS Ta₂O₅ films: ~160 MPa compressive as-deposited; annealing at 591 K achieves near-zero stress (2018 literature) | Stress control less precisely documented in this dataset for optical applications |
| Substrate Scale | Up to 300 mm+ diameter with dwell-time correction algorithms (2020 literature) | Suitable for large-area industrial substrates |
| Environmental Stability | Most stable environmentally; noted in California Institute of Technology 2001 patent | Less stable than IBS under environmental cycling |
Frequently Asked Questions: Ion Beam Sputtering Optical Coatings
According to the California Institute of Technology’s 2001 patent in this dataset, optical coatings made by ion beam sputtering have the lowest optical losses and are the most stable environmentally. IBS produces high packing density, low porosity, minimal water uptake, and extremely low optical absorption — properties described in CONTENT as unattainable by magnetron or thermal evaporation.
In this dataset, the assignees with currently active IBS optical coating patents are AGC Inc. (2 active US patents from 2007 and 2009 on EUV mask blank Mo/Si multilayer deposition), KLA Corporation (1 US pending and 1 WO filed in 2022 on IAD for VUV/EUV inspection optics), and Korea Ceramic Technology Institute (2 active KR patents from 2024 and 2025 on ZnS IR AR coatings with DLC overcoats).
DIBS uses a secondary ion source to simultaneously bombard the growing film, increasing density and reducing porosity. Literature from 2018 in this dataset reports that DIBS Ta₂O₅ films exhibit approximately 160 MPa compressive stress as-deposited, and annealing at 591 K achieves a near-zero stress condition — critical for mirror wavefront control in gravitational wave detectors and high-power laser mirrors.
AGC Inc.’s active US patents (2007, 2009) specify IBS at 35°–80° incidence angle with substrate rotation to planarize concave substrate defects in Mo/Si EUV reflective mask blanks for 13.5 nm lithography. A companion WO filing by Ikuta Yoshiaki (2007) establishes the geometric angular control methodology. In this dataset, this is the most patent-protected IBS application, with 4 identified filings from 2 assignees.
Three literature papers from 2022–2023 in this dataset report IBS deposition on ZnGeP₂ substrates. ZnSe/Al₂O₃ AR coatings achieved a laser-induced damage threshold (LIDT) of 3.51 J/cm² at 2097 nm. YbF₃/ZnS multilayers exceeded 2 J/cm² LIDT for mid-IR applications. ZnS/Al₂O₃ coatings increased the optical breakdown threshold by approximately 55% compared to uncoated substrates.
All foundational IBS process patents from 1995–2002 identified in this dataset are now inactive. These include patents from Optical Coating Laboratory, JDS Uniphase Corporation, National Research Council of Canada, Goodrich Corporation, and California Institute of Technology. According to CONTENT, this creates considerable freedom to operate in baseline IBS process configurations, while active claims cluster around specific application configurations such as EUV lithography, VUV inspection, and IR military optics.
Data and insights on this page are based on a limited patent and literature dataset and are for reference only. Figures may not represent the complete technology landscape.