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Laser Beam Shaping Patent Landscape 2026

Laser Beam Shaping Patent Landscape 2026
Competitive Landscape

Laser Beam Shaping Patent Landscape in 2026

The laser beam shaping patent field encompasses 712 patent families, led by Bystronic Laser AG with the largest block of patent records among ranked applicants, and is concentrated in optical elements and laser-material processing. Annual filing volume has been easing back from its 2017 peak, signalling a field past its highest-growth phase with selective pockets of activity persisting in adjacent branches.

712
Patent families in scope
15%
Top-5 share of top-100 filers
-20%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

Bystronic Laser AG leads a moderately fragmented field

Bystronic Laser AG holds the top position in the top five filers together account for 15% of the combined total for the hundred largest filers, indicating meaningful concentration at the apex but a long competitive tail below it.

The gap between the leader (40 patent records) and the fifth-ranked applicant (25 patent records) is modest — less than a two-to-one ratio — suggesting no single entity has achieved decisive dominance. The field below the top tier fragments rapidly, with applicants ranked sixth through twentieth each holding between 15 and 24 patent records.

Leading applicants
#ApplicantPatent recordsShare
1Bystronic Laser AG40
2MicroVision Inc35
3Danmarks Tekniske Universitet (Technical University of Denmark)34
4Eastman Kodak Co27
5Fraunhofer Gesellschaft25
6Meta Platforms Technologies LLC24
7Fujitsu Ltd23
8Council for Scientific and Industrial Research (CSIR)23
9Coherent Inc21
10Magic Leap Inc20
#ApplicantPatent recordsShare
11Viavi Solutions Inc20
12Candela Corporation20
13WBC Photonics Inc20
14Mitsubishi Electric Corporation19
15Hamamatsu Photonics K.K.18
16Blue 425 LLC17
17Bank of Canada16
18University of Toronto16
19Sumitomo Electric Industries Ltd16
20General Electric Co15
↗ Hover a row · click a company to ask Eureka

Bystronic Laser AG’s position is anchored in laser-material processing (B23K), while challengers such as Danmarks Tekniske Universitet and Meta Platforms Technologies LLC concentrate heavily in optical elements (G02B). This divergence in technical emphasis means that no single applicant simultaneously dominates both the processing and display/optics application segments.

Figures for 2024 and 2025 are subject to publication lag and should be treated as underestimates of actual filing activity; all trend readings account for this effect. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

Filings have eased from a 2017 peak; optical elements dominate the technology mix

The annual filing trend and IPC class composition together reveal a field that peaked around 2017 and has since contracted, while remaining broadly diversified across optical, processing, and display sub-domains.

Annual filing trend

Annual filings reached their highest recorded level in 2017 (106 patent records) and have trended downward since, reaching 84 in 2022 before declining further. Figures for 2023–2025 reflect publication lag and should be read as underestimates; the apparent sharp drop in 2025 (41) and 2026 (5) is a data-completeness artefact, not confirmed market exit.

Annual filing trendAnnual values from 2017 to 2026, peaking at 106 in 2017.1062017104201888201985202081202184202256202362202441202552026↗ Hover for values · click a bar to ask Eureka

Technology composition

G02B (Optical elements and systems) dominates the IPC mix by a wide margin, followed by B23K (Welding, soldering and brazing) and H01S (Lasers and stimulated emission). Lower-volume classes — including H04N (Pictorial communication), G02F (Optical control and modulation), and H01L (Semiconductor devices) — each represent around 3% of records among the top hundred filers, marking them as adjacent rather than core branches.

Technology compositionG02B · Optical elements & systems leads with 1,216; B23K · Welding, soldering & brazing 564.G02B · Optical elements …1,216B23K · Welding, solderin…564H01S · Lasers & stimulat…310H04N · Pictorial communi…111G02F · Optical control &…108H01L · Semiconductor dev…108G01N · Material analysis…68G03B · Photographic appa…68↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20220126397A1Published 2022-04-28

Laser beam shaping device, laser processing system…

Industrial Technology Research Institute

A laser beam shaping device includes a multi-zone structure lens and a focusing lens. The multi-zone structure lens includes a lens body and a refractive structure. The lens body has an incident plane and an emission plane, and one of the incident plane and the emission plane is furnished with the refractive structure. The light source passing through the… (excerpt from the patent abstract)

Laser beam shaping device, laser processing system… — patent drawingLaser beam shaping device, laser processing system… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Laser angioplasty435
2Scanning endoscope412
3Gaussian beam profile shaping apparatus, method th…297
4Optical beam homogenizer294
5Substrate-guided display with improved image quality243
6Laser beam shaping device and process including a …203
7Method and apparatus for stable laser drive167
8Laser radiating apparatus and methods for manufact…164

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

Four structural observations — maturity, concentration, collaboration, and geography — directly bear on where new R&D investment is most or least exposed to existing IP.

Decline

Past-peak field with selective residual activity

The lifecycle stage is classified as Decline, with annual filings easing back from the 2017 peak. A –20% recent-window growth figure confirms the contraction is real rather than a lag artefact in the multi-year aggregate. New entrants such as Bystronic Laser AG and Danmarks Tekniske Universitet are still adding records, suggesting that selective sub-domains remain active even as the overall envelope contracts.

Lifecycle: Decline
Concentration

Moderate apex concentration, long competitive tail

The top five filers account for 15% of the hundred largest filers’ combined total, and the leader-to-fifth gap is under two-to-one. This structure means no applicant can realistically block the entire space, but freedom-to-operate analysis remains essential in optical elements (G02B) and laser processing (B23K), where the leading applicants are most active. The fragmented tail offers more freedom in adjacent classes.

Moderate concentration
Collaboration

MicroVision–Seiko Epson partnership is the most active co-filing pair

MicroVision Inc and Seiko Epson Corporation are the most active co-filers, with five joint patent records. Fraunhofer Gesellschaft has collaborated with Maschinenfabrik Karl H Arnold GmbH & Co KG (three records) and with RWTH Aachen University (one record). Co-filing activity overall is sparse, indicating that the field is dominated by independent, proprietary R&D programmes rather than consortium-driven innovation.

Low collaboration intensity
Geography

US-centric filing with broad EPO, China, and PCT coverage

The United States leads jurisdiction coverage with 528 patent records, followed by EPO (276), China (231), WIPO/PCT (190), and Japan (185). Germany, Canada, and Austria each carry notable secondary coverage. The broad multi-jurisdiction footprint of leading applicants means that any challenger must assess freedom-to-operate in at least the US, EPO, and Chinese jurisdictions simultaneously.

US-led, multi-regional
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Top collaboration links
ApplicantCollaboratorCo-filings
MicroVision IncSeiko Epson Corporation5
Fraunhofer GesellschaftMASCHFAB KARL H ARNOLD GMBH & CO KG3
Fraunhofer GesellschaftRWTH Aachen University1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Jurisdiction counts are at the patent-record level and reflect the coverage strategy of applicants in the corpus.Explore insights →
Leaders

Bystronic Laser AG in processing vs. MicroVision Inc in display optics

The top two ranked applicants occupy distinct technical lanes, limiting head-to-head collision but also limiting any single incumbent’s ability to control the full beam-shaping value chain.

Leader · Bystronic Laser AG

Bystronic Laser AG

Bystronic Laser AG holds 40 patent records — the largest block among ranked applicants — concentrated overwhelmingly in B23K 26 (laser-based welding and cutting, 38 records) with secondary coverage in control systems (G05B 19, 7 records) and general welding fixtures (B23K 37, 6 records). Momentum data classifies Bystronic as a new entrant in the recent filing window, with 24 recent records, indicating active and accelerating prosecution in laser-material processing.

patent records: 40
Challenger · MicroVision Inc

MicroVision Inc

MicroVision Inc holds 35 patent records and focuses on display and scanning optics, with its strongest concentration in G02B 27 (optical beam shaping elements, 21 records) and G02B 26 (scanning optics, 18 records), plus a notable position in surgical diagnostics (A61B 1, 10 records). MicroVision is the most active co-filer in the dataset, partnering with Seiko Epson on five joint records, and its technology profile spans both consumer display and medical imaging applications.

patent records: 35
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Fraunhofer GesellschaftCoherent Inc+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Bystronic Laser AG24▲ new entrant
Danmarks Tekniske Universitet (Technical University of Denmark)3▲ new entrant
Fraunhofer Gesellschaft1▲ new entrant
Nuburu Inc2▼ -89%
Meta Platforms Technologies LLC6▼ -60%
Source: PatSnap Eureka. Patent record counts reflect each applicant’s position in the ranked corpus; family-level consolidation is reported separately.Explore players →
Adjacent Branches

Under-served branches at the intersection of beam shaping and imaging or semiconductor processing

Several IPC classes sit at plausible technical intersections with beam shaping but carry comparatively low patent-record counts relative to the dominant G02B and B23K classes, suggesting reduced prior-art density in those sub-domains.

H04N · Pictorial communication and structured-light display

H04N accounts for 111 patent records — roughly 3% of the top-ranked filers’ combined total — despite the strong functional link between beam shaping and laser projection, structured-light sensing, and computational imaging. Eastman Kodak Co is the primary incumbent in this branch (H04N 1, 11 records focused on printing). Teams working on laser-based pico-projectors, LiDAR illumination patterns, or structured-light 3D sensing may find comparatively lower prior-art density here than in the core G02B space. Entry would require differentiation from Eastman Kodak’s legacy printing IP and MicroVision’s display scanning portfolio.

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H01L · Semiconductor device fabrication and beam-shaping integration

H01L (Semiconductor devices) carries 108 patent records at the same relative share as H04N, despite the critical role of precise beam shaping in lithography, laser annealing, and chip-scale packaging. The low record count suggests that much semiconductor-process beam-shaping IP may be filed under G03F (photolithography) or held as trade secret. R&D teams targeting advanced-node laser annealing or direct-write lithography could explore this branch, though they must assess overlap with the G03F and G02B clusters held by incumbents such as Carl Zeiss SMT GmbH and KLA Tencor.

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See branch-level density, applicant overlap, and entry-path analysis across all IPC classes in the corpus.
G02F · Optical control & modulationG01N · Material analysis & testing+ more
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Source: PatSnap Eureka. Branch counts are at the patent-record level; a record can appear under multiple IPC classes.Explore emerging →
Route Matrix

How leading applicants differ by technology route

Strength of each leader across the main technology routes.

PlayerG02B 27 · Optical elements & systemsB23K 26 · Welding, soldering & brazingG02B 26 · Optical elements & systemsH01S 3 · Lasers & stimulated emissionG02B 5 · Optical elements & systems
MicroVision IncStrong · 21AbsentStrong · 18AbsentModerate · 8
Bystronic Laser AGAbsentStrong · 38AbsentAbsentAbsent
Sumitomo Electric Industries LtdStrong · 16Strong · 12AbsentAbsentStrong · 9
MTT Innovation IncStrong · 18AbsentStrong · 18AbsentAbsent
Magic Leap IncStrong · 20AbsentAbsentAbsentStrong · 14
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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