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Laser Cleaning System Patent Landscape 2026

Laser Cleaning System Patent Landscape 2026
Competitive Landscape

Laser Cleaning System Patent Landscape in 2026

The laser cleaning system patent space is moderately concentrated, with the top five filers accounting for 40% of the hundred largest filers’ combined records and Cauldron holding a clear lead. Activity peaked in 2020 and has since eased, placing the field in a decline stage — though adjacent branches in semiconductor and photolithography applications remain comparatively sparse.

108
Patent families in scope
40%
Top-5 share of top-100 filers
-58%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Cauldron leads a moderately concentrated field

Cauldron sits at the top of the top five filers — Cauldron, G C Laser Systems, Lockheed Martin, Potomac Photonics, and Automation Innovation — together hold 40% of the combined records of the hundred largest filers, indicating moderate but not extreme concentration.

A visible tier gap separates the top three applicants from the remainder: Potomac Photonics enters Below rank five, individual counts drop to single digits, suggesting that the competitive core is narrow.

Leading applicants
#ApplicantPatent recordsShare
1Cauldron28
2G C Laser Systems20
3Lockheed Martin Corporation16
4Potomac Photonics Inc8
5Automation Innovation Pty Ltd7
6Trustees of Boston University5
7Engelsberg Audrey C4
8UVTech Systems4
96684327 Canada Inc3
10ATS Industrial Automation Inc3
#ApplicantPatent recordsShare
11Siemens Mobility Pty Ltd3
12Hubei Baiyi Technology Development Co Ltd3
13Dehais Joseph A3
14Surclean Inc3
15Illinois Tool Works Inc2
16Institute of Semiconductors, Chinese Academy of Sciences2
17Duignan Michael T2
18Chongqing Kaiwoode Optoelectronic Automation Equipment Co Ltd2
19Innovaneer Inc2
20Beijing University of Technology2
↗ Hover a row · click a company to ask Eureka

Cauldron’s lead, spread evenly across cleaning, welding, and photolithography IPC classes, points to a platform strategy rather than a single-application focus. This breadth gives it structural resilience but also signals that no single applicant has staked out dominance in any one sub-application.

Filing counts for 20242026 are expected to rise as pending applications publish; treat recent-period figures as under-counted rather than indicative of further decline. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

Activity peaked in 2020; technology mix centres on laser-material interaction

The two charts below show annual filing volume from 2017 onward and the distribution of IPC technology classes across the corpus. Together they reveal a field that expanded sharply to a 2020 peak and is now contracting, while remaining anchored in core laser-material interaction classes.

Annual filing trend

Filings rose from 10 in 2017 to a peak of 25 in 2020, then declined to 9 in 2022 and continued lower. Figures for 2024–2026 reflect publication lag and should be treated as incomplete; the apparent drop in those years does not confirm further structural decline beyond the post-2020 trend.

Annual filing trendAnnual values from 2017 to 2026, peaking at 25 in 2020.1020171820181220192520201620219202282023520243202522026↗ Hover for values · click a bar to ask Eureka

Technology composition

B23K (Welding, soldering & brazing) and B08B (Cleaning, general) are the two dominant classes, reflecting the core laser-ablation and surface-preparation use cases. G03F (Photolithography) and H01L (Semiconductor devices) appear at lower but notable levels, indicating that microelectronics applications form a distinct secondary cluster. Optical systems (G02B), heat treatment (C21D), and laser physics (H01S) each occupy smaller shares, pointing to enabling-technology coverage rather than application-specific depth.

Technology compositionB23K · Welding, soldering & brazing leads with 172; B08B · Cleaning (general) 122.B23K · Welding, solderin…172B08B · Cleaning (general)122G03F · Photolithography …37H01L · Semiconductor dev…34G02B · Optical elements …20C21D · Heat treatment of…14H01S · Lasers & stimulat…11H10P10↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20210138514A1Published 2021-05-13

Laser cleaning system

Institute Of Semiconductors

A laser cleaning system including a laser source, an energy-transferring optical fiber, a laser cleaning head, a coreless motor, a connection lens barrel, and a mirror. (excerpt from the patent abstract)

Laser cleaning system — patent drawingLaser cleaning system — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Photoreactive surface processing331
2Removal of surface contaminants by irradiation fro…174
3Removal of surface contaminants by irradiation usi…128
4Removal of surface contaminants by irradiation fro…124
5Removal of surface contaminants by irradiation fro…100
6Systems and methods of laser texturing of material…74
7Laser system for removal of graffiti70
8Material delivery system for miniature structure f…59

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the patent structure means for R&D positioning

The combination of a post-peak lifecycle, a narrow competitive core, limited co-filing activity, and a US-led filing geography shapes where new entrants can most efficiently deploy R&D resources.

Decline

Field is in decline after a 2020 peak

Annual filings eased back from the 2020 peak of 25 records and have continued lower, placing the field in a decline stage. This suggests that foundational system architectures are largely established and that incremental differentiation — rather than broad platform patents — is the more viable near-term strategy. Researchers should focus on specific sub-applications or enabling subsystems where white space persists.

Lifecycle: Decline
Concentration

Top three applicants dominate; mid-tier is thin

Cauldron, G C Laser Systems, and Lockheed Martin collectively account for a disproportionate share of records among the leading filers, and the drop-off after rank five is steep. A new entrant faces established IP in core cleaning and welding applications but will encounter much lighter coverage in adjacent semiconductor and optical-control branches. Targeting those branches reduces freedom-to-operate risk.

Concentration: Moderate
Collaboration

Co-filing is sparse; Automation Innovation and Siemens are the most active pair

The most active co-filing relationship is between Automation Innovation Pty Ltd and Siemens Mobility Pty Ltd, with two jointly filed records; Automation Innovation and Siemens Industry Inc share one additional joint filing. Engelsberg Audrey C and Cauldron (listed as the large limited partnership entity) also share two co-filed records. Overall ecosystem collaboration is limited, indicating that the field has developed largely through independent, parallel efforts rather than consortia or open-innovation partnerships.

Collaboration: Low
Geography

US leads; China and Europe are material secondary markets

The United States accounts for the largest filing count at the jurisdiction level, followed by China and Europe (EPO). Australia appears notably higher than typical for an advanced-manufacturing topic, reflecting the presence of Automation Innovation Pty Ltd. WIPO (PCT) filings indicate some degree of international prosecution strategy. Japan and South Korea show limited coverage despite being major laser-equipment manufacturing hubs, which may signal an enforcement gap or a commercial opportunity in those markets.

Lead Office: US
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Top collaboration links
ApplicantCollaboratorCo-filings
Automation Innovation Pty LtdSiemens Mobility Pty Ltd2
Engelsberg Audrey CCauldron LP2
Automation Innovation Pty LtdSiemens Industry Inc1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Jurisdiction counts are at the patent-record level and reflect filing office designations.Explore insights →
Leaders

Cauldron and Lockheed Martin lead, with diverging recent trajectories

The top two non-individual applicants by patent records differ markedly in recent activity: Cauldron holds the largest portfolio and spans multiple technology classes, while Lockheed Martin’s recent filing rate has declined sharply from its prior period.

Leader · Cauldron

Cauldron

Cauldron leads the ranking with 28 patent records, covering B08B (Cleaning), B23K (Welding/brazing), and G03F (Photolithography) at equal depth — a platform spread unusual among peers. This cross-class breadth suggests a systems integrator posture that addresses cleaning, surface preparation, and fine-feature processing within a single IP portfolio. No momentum data is provided in evidence for Cauldron directly; the breadth of its coverage is the primary competitive signal.

patent records: 28
Challenger · Lockheed Martin

Lockheed Martin Corporation

Lockheed Martin holds 16 patent records, concentrated in B23K (Welding/brazing), B08B (Cleaning), and G02B (Optical elements). Its recent filing trend is sharply down at minus 83% versus the prior period, with only 2 recent records, indicating that laser cleaning is no longer a priority filing area for the company. The existing portfolio remains relevant for defense and aerospace cleaning applications, but new competitive pressure from this applicant appears limited in the near term.

patent records: 16
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Potomac Photonics IncAutomation Innovation Pty Ltd+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Lockheed Martin Corporation2▼ -83%
Trustees of Boston University5▲ new entrant
Source: PatSnap Eureka. Applicant counts are patent records; momentum compares the most recent period to the prior equivalent period.Explore players →
Adjacent Branches

Semiconductor and photolithography branches are under-served relative to their technical relevance

Several IPC branches appear in the corpus at low share levels despite having plausible technical overlap with laser cleaning. These are observations of relative sparsity; whether they represent viable entry points depends on each organisation’s technical roadmap and existing portfolio.

H01L · Semiconductor Devices

H01L accounts for 7% of IPC branch records in the corpus, a low figure given the established use of laser cleaning in wafer and die processing for particle removal and oxide stripping. The sparse coverage may reflect that semiconductor-grade laser cleaning is prosecuted under process or equipment claims outside this class, or that dedicated application filings have not yet been made. Organisations with existing semiconductor process IP may find adjacency value in filing H01L-anchored claims that tie laser cleaning to device fabrication steps.

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H01S · Lasers & Stimulated Emission

H01S represents only 2% of branch records, suggesting that source-level laser physics — pulse shaping, wavelength selection, and beam quality optimisation specific to cleaning applications — is rarely claimed in this corpus. As ultrashort-pulse and high-repetition-rate sources become standard in precision cleaning, claims grounded in the laser source itself (rather than the cleaning process outcome) may offer differentiation with limited prior-art density. Entry would require combining laser-physics expertise with surface-interaction evidence.

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See all adjacent IPC branches ranked by sparsity, technical overlap score, and filing velocity.
G03F · Photolithography & photomechanicsC21D · Heat treatment of metals+ more
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Source: PatSnap Eureka. Branch share figures are at the patent-record level relative to total IPC branch assignments in the corpus.Explore emerging →
Route Matrix

How leading applicants differ across technology routes

Strength of each leader across the main technology routes.

PlayerB23K 26 · Welding, soldering & brazingB08B 7 · Cleaning (general)G03F 7 · Photolithography & photomechanicsH01L 21 · Semiconductor devicesB23K 37 · Welding, soldering & brazing
Cauldron LPStrong · 26Strong · 26Strong · 26Strong · 20Absent
G C Laser SystemsStrong · 20Moderate · 10AbsentAbsentAbsent
Lockheed Martin CorporationStrong · 16Strong · 10AbsentAbsentAbsent
Engelsberg Audrey CStrong · 6Strong · 6Strong · 6Strong · 6Absent
UVTech SystemsStrong · 5Strong · 5Strong · 5Strong · 5Absent
McRaney BrianStrong · 9AbsentAbsentAbsentStrong · 7
McRaney GregoryStrong · 9AbsentAbsentAbsentStrong · 7
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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