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When you want the answer in the next five minutes.
The agent works the prompt against patents and technical literature, citing every source.
Run your analysis now →Filing growth compares 2021 (92 records) with 2024 (60) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 4,113 records in scope (CR5), not by the ranked leaders only.
Lead frames and power package substrates sit at the mechanical and thermal core of semiconductor packaging: the etched metal that carries current and heat away from a die, and the direct-bond-copper (DBC) substrates that do the same job in power modules. This dataset pulls records where the title or abstract names a lead frame, DBC substrate or power package substrate, and where claims touch thermal conductivity, solderability, etched lead frame geometry, warpage or creepage clearance — the properties that actually separate a working power package from a failed one.
The corpus spans 4,113 published families filed against IPC classes H01L23, C04B37 and H01L21 between 2015 and mid-2026. Because publication typically lags filing by around 18 months, the last one to two years in any trend understate real activity — treat the tail as a floor, not a ceiling.
Pick a task. Every answer cites the patents behind it.
Two views of the same 4,113-family corpus: how filing volume moved year over year, and which IPC subclasses the claims actually sit in.
Filings ran at 122 in 2017, the high point of the window tracked here, and had fallen to 68 by the 2022 midpoint — a flat-to-declining pattern rather than a growth curve. Nothing in the later years suggests a rebound, though the most recent year is partial and still filling in.
H01L (semiconductor devices) accounts for 4,013 of 4,113 records — effectively the entire corpus — with H10W (2,040) and H05K printed-circuit assemblies (298) as secondary clusters. C22C alloys (225), C09J adhesives (130), C25D electroplating (112) and H01B conductors (77) each cover a real but narrow slice, which is where claim density is lowest relative to the core.
Shares are the percentage of the 4,113 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
This page is one run against one query. Ask Eureka your own question about lead frames and power package substrates and every answer comes back with the patent numbers behind it.
Try EurekaFiled by Samsung Aerospace Industries and granted in 1999, this patent describes a two-stage photoresist masking process for etching a lead frame: a first pattern defines the actual etch region and a second, wider pattern acts as a buffer, preventing the sharp-edged burrs that form at the lateral ends of etched lead frame material during conventional single-mask etching.Grant date 1999-08-31. One of the earliest detailed etch-geometry solutions in the corpus, and a reference point for how later filings describe edge-quality control.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US4862245A | Package semiconductor chip | 684 |
| 2 | US6229200B1 | Saw-singulated leadless plastic chip carrier | 585 |
| 3 | US6242281B1 | Saw-singulated leadless plastic chip carrier | 416 |
| 4 | US4707724A | Semiconductor device and method of manufacturing thereof | 354 |
| 5 | US5221642A | Lead-on-chip integrated circuit fabrication method | 351 |
| 6 | US5604376A | Paddleless molded plastic semiconductor chip package | 342 |
| 7 | US6197615B1 | Method of producing lead frame having uneven surfaces | 335 |
| 8 | US5859471A | Semiconductor device having tab tape lead frame with reinforced outer leads | 325 |
| 9 | US5406124A | Insulating adhesive tape, and lead frame and semiconductor device employing the tape | 324 |
| 10 | US5744827A | Three dimensional stack package device having exposed coupling lead portions and vertical interconnection ele… | 319 |
Citation counts favour older filings simply because they have had longer to accumulate citations inside this searched set — read them as markers of influence on the field's vocabulary, not as current-relevance rankings.
Each row carries its publication number; clicking a row searches Eureka by that number.
When you want the answer in the next five minutes.
The agent works the prompt against patents and technical literature, citing every source.
Run your analysis now →When it has to run inside your own pipeline.
Patent search, landscape analysis and assignee resolution as MCP tools. Drop them into any agent framework, or call REST directly.
Browse MCP servers →Three patterns worth acting on before drafting claims or scoping freedom-to-operate in this space.
A 2017 peak followed by a decline to the 2022 midpoint, with the latest tracked year showing no filings from any of the major assignees, points to a field where the core claim space filled up early rather than one still being actively staked out. New filings now compete against a decade of prior art on the same etch and substrate geometries.
H01L's near-total share means the differentiating claims in this field are mostly fought inside semiconductor-device classification itself, not in adjacent material or process classes. C22C alloys, C09J adhesives and C25D electroplating are present but small, which is where narrower, less-contested claim scope tends to survive examination.
The United States and Japan together account for the large majority of receiving-office activity, with Europe, South Korea, China and WIPO trailing well behind. A filing strategy built only around US and Japanese offices will match where the existing art sits, but it also means those two offices carry the thickest prior-art search burden.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to lead frames and power package substrates, with the prior art for and against each one.
The recent-year momentum data is unusually consistent: every tracked major assignee — spanning Japanese, Korean and US filers — shows zero filings in the latest year, including a documented -100% year-over-year drop for one filer. That is not a sign the field is dead, since publication lag means the most recent year is always undercounted, but it does mean no single assignee is currently expanding claim coverage faster than the others.
Mitsubishi Electric, Texas Instruments, Hitachi, Toshiba, Panasonic and Micron all show zero filings in the latest tracked year. Combined with publication lag, this reads as a pause in disclosed activity rather than confirmed exit from the space.
The strongest co-assignee pairing links a parent electronics group with its semiconductor-equipment subsidiary, filed together 11 times; a second pairing between a major conglomerate and its electronic-components arm appears 10 times. This is internal IP structuring, not cross-company collaboration.
The most-cited record in the corpus dates back to early chip-packaging methods, well before the 2015 filing window begins. Current filers are building on, and designing around, claim language that has been in force and cited for a long time.
| Assignee | Recent year | YoY |
|---|---|---|
| Mitsubishi Electric Corporation | 0 | — |
| Texas Instruments Incorporated | 0 | -100% |
| Hitachi, Ltd. | 0 | — |
| Toshiba Corporation | 0 | — |
| Panasonic Corporation (Japan) | 0 | — |
| Micron Technology, Inc. | 0 | — |
| Furukawa Electric Co., Ltd. | 0 | — |
| Hitachi Cable, Ltd. | 0 | — |
The trend and assignee data point to specific next questions depending on whether you are scoping freedom-to-operate or looking for filing room.
C25D, C09J, H01B and C22C carry real claims but a fraction of H01L's volume — a faster path to a defensible position than competing directly in the core class.
Explore white space in EurekaZero recent filings from major assignees may reflect publication lag rather than withdrawal; a live search closes that 18-month gap.
Run a live assignee searchCo-assignee pairs show IP held jointly across parent and subsidiary entities — worth confirming before assuming a single owner controls a family.
Map assignee structures in EurekaA DBC (direct-bond-copper) substrate is a ceramic base with copper layers bonded directly to both faces, used in power modules to carry current while conducting heat away from the die. Patent claims in this area typically centre on the bonding process, the ceramic-copper interface, and thermal conductivity or creepage clearance performance. Because DBC substrates sit at the intersection of materials science (C04B37) and semiconductor packaging (H01L), claims often cross IPC boundaries, which is worth checking when scoping a search.
This dataset shows 122 filings in 2017, the high point of the tracked window, falling to 68 by the 2022 midpoint with no later recovery. The evidence here does not include the underlying market drivers, so treat the peak as a filing-activity fact rather than evidence of a specific industry event. What is clear is that the years since have not repeated that volume, and the most recent year shows zero filings across every major tracked assignee.
The corpus includes filings from Mitsubishi Electric, Texas Instruments, Hitachi, Toshiba, Panasonic and Micron among others, with Hitachi and Toshiba entities also appearing in co-assignee pairs with their own subsidiaries. None of these assignees show filings in the latest tracked year, which is likely a mix of genuine slowdown and publication lag rather than a clean ranking of current leaders — check a live search before relying on historic volume alone.
US5945259A, assigned to Samsung Aerospace Industries and granted in 1999, claims a two-mask photoresist etching method that adds a buffer pattern around the primary etch region to eliminate sharp edge burrs on lead frame material. It blocks processes that use this specific dual-pattern buffer approach to solve the same burr problem, but it does not cover lead frame etching generally — single-mask processes, different burr-mitigation techniques, or non-photoresist masking methods fall outside its claims. Anyone designing a new etch process should compare their masking sequence against this patent's specific method steps rather than assume all etched lead frame work is blocked by it.
The IPC composition shows H01L holding 4,013 of 4,113 records, while C25D electroplating (112), C09J adhesives (130), H01B conductors (77) and C22C alloys (225) are present but comparatively thin. These narrower classes are where claim density is lowest relative to the core semiconductor-device classification, making them a reasonable starting point for a freedom-to-operate check or a new filing aimed at less-contested ground.
Go past this page: query the whole lead frames and power package substrates corpus yourself, in your own scope.
Every answer comes back with patent numbers you can open.
Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.