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LPBF Digital Twin Patent Snapshot 2026

LPBF Digital Twin Patent Snapshot 2026
Evidence Snapshot
LPBF Digital Twin Patent Snapshot in 2026

The LPBF digital twin field is highly concentrated, with RTX Corp alone holding nearly half of all patent families in scope and the top five filers accounting for a majority of the hundred largest filers’ combined output. The field is in a Growth stage on a multi-year basis, with annual volume easing from its 2023 peak while remaining well above pre-2023 levels, and meaningful white space persists in process-control, AI-model, and materials characterization branches.

34
Patent families in scope
53%
Top visible applicants share
+450%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

RTX Corp leads a nascent, heavily concentrated field

RTX Corp ranks first by a wide margin, holding 16 patent families — more than all other filers combined — making it the unambiguous technology leader in LPBF digital twin IP.

The top five filers collectively account for 53% of the ranked applicants visible in this query’ combined total, signaling extreme concentration for a field this size. Bull SA is the only clear second-tier player at 2 patent families; every other named filer holds exactly 1, leaving a pronounced tier gap between RTX Corp and the rest of the evidence snapshot.

Leading applicants
#ApplicantPatent familiesShare
1RTX Corp16
2Bull SA2
3Carnegie Mellon University1
4HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES LLC1
5Wisconsin Alumni Research Foundation1
6Siemens AG1
7Northwestern Polytechnical University1
8Beijing Power Machinery Institute1
9The Research Foundation for the State University of New York1
10Ansys Digital Engine (Hangzhou) Information Technology Services Co., Ltd.1
#ApplicantPatent familiesShare
11BEIJING AERONAUTIC SCI & TECH RES INST OF COMAC1
12AECC Optimal Materials (Zhenjiang) Additive Manufacturing Co., Ltd.1
13Mangalam College of Engineering1
14Guizhou Honglin Machinery1
15Wuhan Institute of Technology1
16HEBEI UNIV OF SCI & TECH1
17Wuxi Shichao Intelligent Manufacturing Technology Co., Ltd.1
18Hubei Sanjiang Aerospace Group Hongyang Electromechanical Co., Ltd.1
19University of Virginia Patent Foundation1
20Commercial Aircraft Corporation of China Ltd.1
↗ Hover a row · click a company to ask Eureka

RTX Corp’s visible position implies that any new entrant or challenger seeking freedom to operate or a licensing position will need to navigate a dense core portfolio held by a single aerospace incumbent, while the long tail of single-family filers suggests the field remains open to early movers in adjacent technical branches.

Filing counts for 2024 and 2025 are likely understated due to the standard 18–24 month publication lag; the apparent plateau in those years should not be read as a demand signal. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

A 2023 inflection point anchors multi-year growth; process and data-science branches dominate

Annual filings were minimal before 2023, then surged sharply, reflecting the field’s transition from exploratory research to active IP building. The technology mix is anchored in powder-metallurgy and additive-manufacturing process classes, with a secondary cluster in digital and AI branches.

Annual filing trend

Filings were negligible from 2017 through 2022, then jumped to 11 in 2023 before settling at 10 in 2024 and 7 in 2025 — the latter two years are further understated by publication lag, so the apparent easing from the 2023 peak should be treated cautiously rather than as a confirmed decline.

Annual filing trendAnnual values from 2017 to 2026, peaking at 11 in 2023.0201712018020192202022021120221120231020247202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B22F (powder metallurgy) and B33Y (additive manufacturing) are co-visible, reflecting the core LPBF process layer; G06F (digital data processing) forms the primary computational branch, while G05B (control systems) and G06N (AI models) are present but sparse — precisely the branches where digital-twin simulation and closed-loop control logic would be expected to appear.

Technology compositionB22F · Powder metallurgy leads with 29; B33Y · Additive manufacturing (3D printing) 29.B22F · Powder metallurgy29B33Y · Additive manufact…29G06F · Electric digital …13B29C · Shaping of plastics8G05B · Control & regulat…4G06N · Computing based o…4C21D · Heat treatment of…1C22C · Alloys1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2024112718A1Published 2024-05-30

System and method for local PORE detection in lase…

University Of Virginia Patent Foundation

In one aspect, the disclosure relates to detection of pore defects in laser powder bed fusion additive manufacturing. A convolutional neural network is trained based upon a training data set. The training data set can be generated using simulations or experiments performed on a metal sample by capturing side-view x-ray imagery as well as top-view thermal… (excerpt from the patent abstract)

System and method for local PORE detection in lase… — patent drawingSystem and method for local PORE detection in lase… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Method for automatically preventing defects potent…25
2一种基于选区激光熔化工艺的航空叶片拓扑优化设计方法17
3整流罩零件及激光选区熔化成形薄壁整流罩零件的方法16
4Thermal stress and substrate damage reducing addit…8
5基于有限元及轨迹追踪的增材制造场量宏观特性预测方法7
6选区激光熔化优化成型质量三元耦合调控方法4
7一种航空零部件的增材制造方法3
8Predicting system in additive manufacturing proces…3

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · RTX Corp

RTX Corp

RTX Corp holds 16 patent families and entered the LPBF digital twin space as a new entrant in the recent period, with a trend of new entrant momentum across 15 recent families. Its technology focus is concentrated in additive manufacturing process control (B33Y50, B33Y10) and powder metallurgy (B22F10), indicating a strategy of protecting the core LPBF process layer rather than the surrounding simulation or AI software stack.

patent families: 16
Challenger · Honeywell Federal Manufacturing & Technologies

Honeywell Federal Manufacturing & Technologies

Honeywell Federal Manufacturing & Technologies holds 1 patent family as a new entrant in the recent window, but its significance lies in being the sole co-filing hub, with joint filings alongside Carnegie Mellon University, Wisconsin Alumni Research Foundation, and the University of Virginia Patent Foundation. Its technical focus spans powder metallurgy (B22F10, B22F3) and plastics shaping (B29C64), suggesting a cross-material digital-twin approach developed with academic simulation expertise.

patent families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Bull SASiemens AG+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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