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LPBF In-Situ Characterization Patent Snapshot 2026

LPBF In-Situ Characterization Patent Snapshot 2026
Evidence Snapshot
LPBF In-Situ Characterization Patent Snapshot in 2026

LPBF in-situ characterization remains a nascent, highly concentrated field with only 7 patent families on record, dominated by Nikon SLM Solutions AG holding 4 of those families. Activity peaked in 2021 and has eased, leaving substantial room for new entrants to establish defensible positions in adjacent sensing and AI-driven analysis branches.

7
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatsnap Insights Team··5 min readVerified by Patsnap Eureka data
Overview

Nikon SLM Solutions AG leads a highly concentrated, early-stage field

Nikon SLM Solutions AG holds the visible position with 4 patent families, followed by Nanjing University of Aeronautics and Astronautics, Virginia Tech Intellectual Properties Inc., and Beihang University, each with 1 patent family.

The top five filers account for 100% of the ranked applicants visible in this query’ combined total, signaling extreme concentration. The gap between the leader (4 families) and the three challengers (1 family each) is substantial relative to the total corpus size.

Leading applicants
#ApplicantPatent familiesShare
1Nikon SLM Solutions AG4
2NANJING UNIV OF AERONAUTICS & ASTRONAUTICS1
3Virginia Tech Intellectual Properties Inc.1
4Beihang University1
↗ Hover a row · click a company to ask Eureka

Nikon SLM Solutions AG’s commanding share suggests it has laid the broadest process-monitoring IP foundation in this space; the three academic institutions occupy narrow but distinct technical niches, leaving the commercial tier largely uncontested beyond the leader.

The most recent filings (20242025) may not yet be fully published; figures for those years should be treated as provisional minimums. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Activity spiked in 2021 then eased; powder metallurgy and additive manufacturing classes dominate

The annual filing trend reveals a single pronounced burst of activity in 2021 followed by a sharp retreat, while the technology composition chart shows that B22F and B33Y classes account for the overwhelming majority of coverage.

Annual filing trend

Filing volume was negligible through 2020, surged to 5 families in 2021, then fell to isolated single-family filings in 2024 and 2025. The 2024–2025 bars are subject to publication lag and likely undercount actual activity; the 2021 spike remains the defining event in this corpus.

Annual filing trendAnnual values from 2017 to 2026, peaking at 5 in 2021.02017020180201902020520210202202023120241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B22F (Powder metallurgy) and B33Y (Additive manufacturing) together cover virtually the entire corpus, reflecting process-centric patent drafting. G06F (Electric digital data processing), G01K (Temperature measurement), G01N (Material analysis and testing), and G06N (AI models) each appear in only one or two families, indicating that sensing and data-analytics dimensions of in-situ characterization remain sparsely covered.

Technology compositionB22F · Powder metallurgy leads with 7; B33Y · Additive manufacturing (3D printing) 6.B22F · Powder metallurgy7B33Y · Additive manufact…6G06F · Electric digital …2G01K · Temperature measu…1G01N · Material analysis…1G06N · Computing based o…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20260042147A1Published 2026-02-12

Machine learning thermal management system for add…

Virginia Tech Intellectual PROPERTIES, INC.

A thermal measurement system enables high-resolution sub-surface temperature monitoring during additive manufacturing processes through machine learning demodulation of chirped fiber Bragg grating (C-FBG) sensors. An optical sensing subsystem includes a C-FBG sensor that encodes spatial temperature information in wavelength for high-temperature operation. A… (excerpt from the patent abstract)

Machine learning thermal management system for add… — patent drawingMachine learning thermal management system for add… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1一种具有原位监测功能的LPBF增材制造装置及方法9
2Systems and methods9
3Systems and Methods6

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Nikon SLM Solutions AG

Nikon SLM Solutions AG

Nikon SLM Solutions AG holds 4 patent families, the largest position in this corpus by a wide margin. Its technology emphasis spans B22F 10 (Powder metallurgy process), B33Y 50 (Additive manufacturing data and controls), and G06F 30 (Digital data processing), indicating a systems-level approach that integrates process parameters with digital monitoring. No momentum trend data is available for this applicant in the recent period, but its accumulated position gives it first-mover breadth in process-integrated monitoring claims.

families: 4
Challenger · Nanjing University of Aeronautics and Astronautics

Nanjing University of Aeronautics and Astronautics

Nanjing University of Aeronautics and Astronautics holds 1 patent family, with a technology focus across B22F 10, B22F 12, and B33Y 40, suggesting coverage of process parameters and materials handling in an additive manufacturing context. Its momentum is flagged as a new entrant in the recent period, indicating this institution has only recently entered the space. As an aerospace-affiliated research university, its work likely targets process qualification for structural components.

families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Virginia Tech Intellectual Properties Inc.Beihang University+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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