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LPBF Machine Condition Monitoring Patent Snapshot

LPBF Machine Condition Monitoring Patent Snapshot
Evidence Snapshot
LPBF Machine Condition Monitoring Patent Snapshot in 2026

The patent corpus for LPBF machine condition monitoring is nascent and highly fragmented, with 9 patent families spread across more than a dozen distinct filers. Nikon SLM Solutions AG holds the only multi-family position, and annual activity has plateaued near its modest peak, leaving substantial room for differentiated entry.

9
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatsnap Insights Team··5 min readVerified by Patsnap Eureka data
Overview

Nikon SLM Solutions leads a fragmented, early-stage field

Nikon SLM Solutions AG is the sole applicant with more than one patent record, placing it at the top of the ranking in a corpus where the vast majority of filers hold a single record each.

The top five filers account for 26% of the ranked applicants visible in this query’ combined total, signalling a low-concentration field with no visible incumbent capable of blocking broad entry. There is no meaningful tier gap between second and lower-ranked applicants.

Leading applicants
#ApplicantPatent recordsShare
1Nikon SLM Solutions AG2
2K Tamilselvan1
3NANJING UNIV OF AERONAUTICS & ASTRONAUTICS1
4Shanghai Leimou Technology Co., Ltd.1
5K Sivaramakrishnan1
6Shafae Mohammed Saeed Abuelmakarm1
7U Sujan1
8V Skandhakumar1
9S Senthil Kumar1
10K Rajasuresh1
#ApplicantPatent recordsShare
11R Elakkiyadasan1
12A Sam Immanuel1
13M Shek Mubarak1
14Andrew Ezekiel Wessman1
15K Venkatesan1
16Virginia Tech Intellectual Properties Inc1
17R Saron1
18P Vijaykannan1
19Beihang University1
20N Sathishkumar1
↗ Hover a row · click a company to ask Eureka

Nikon SLM Solutions AG’s position as a machine OEM filing across both powder-metallurgy process classes and digital-data-processing subclasses suggests vertical integration of hardware and monitoring software, but the absolute volume is too small to confirm a sustained strategic moat.

The most recent 18–24 months of filings are subject to publication lag and likely under-represent current activity; the apparent plateau should be interpreted cautiously. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Activity plateaued after 2021; powder-metallurgy and additive-manufacturing classes dominate

The annual filing trend and the IPC class breakdown together show a field that activated in 2021, has held a low steady state, and remains anchored in core process classes with sensor and AI sub-classes sparsely represented.

Annual filing trend

Filings first appeared in 2021, reached a small cluster, then registered further activity in 2024–2025. The zero values for 2022–2023 and 2026 should be read with caution given publication lag; the lifecycle evidence characterises the field as plateaued near its peak rather than declining.

Annual filing trendAnnual values from 2017 to 2026, peaking at 3 in 2021.02017020180201902020320210202202023320243202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B22F (Powder metallurgy) and B33Y (Additive manufacturing) are visible in the IPC mix, reflecting the process-centric framing of most filings. G01N (Material analysis and testing), G06F (Electric digital data processing), G06N (AI models), and G01K (Temperature measurement) each appear in only one or two records, confirming that sensing, data-processing, and AI branches are currently under-served.

Technology compositionB22F · Powder metallurgy leads with 9; B33Y · Additive manufacturing (3D printing) 7.B22F · Powder metallurgy9B33Y · Additive manufact…7G01N · Material analysis…2G06F · Electric digital …2B29C · Shaping of plastics1G01K · Temperature measu…1G06N · Computing based o…1G06T · Image data proces…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20260124680A1Published 2026-05-07

Method for Predictive Control of Laser Powder Bed …

Northwestern University

A method for adaptive control of laser power during selective laser melting may include the steps of generating a toolpath for a part, calculating a mechanistic feature of the part, inputting a laser scanning speed and the calculated mechanistic feature of the part into a machine learning model, predicting meltpool temperature variations along the toolpath… (excerpt from the patent abstract)

Method for Predictive Control of Laser Powder Bed … — patent drawingMethod for Predictive Control of Laser Powder Bed … — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1一种具有原位监测功能的LPBF增材制造装置及方法9
2Systems and Methods6

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Nikon SLM Solutions AG

Nikon SLM Solutions AG

Nikon SLM Solutions AG holds 2 patent records, the highest count in the corpus, with technology emphasis spanning B22F 10 and B22F 12 (Powder metallurgy process and apparatus) and G06F 30 (Electric digital data processing). This cross-class coverage suggests an integrated approach combining machine hardware with computational monitoring. No momentum trend data was recorded for this applicant, meaning its filing trajectory within the observation window does not show a new acceleration.

patent records: 2
Challenger · Nanjing University of Aeronautics and Astronautics

Nanjing University of Aeronautics & Astronautics

Nanjing University of Aeronautics and Astronautics holds 1 patent record and is flagged as a new entrant in the applicant momentum data. Its technology focus covers B22F 10, B22F 12, and B33Y 40 (Additive manufacturing post-processing), indicating an interest in the full process chain. As an institution with established aerospace manufacturing research, its entry into LPBF monitoring IP may precede broader academic-industry collaboration activity.

patent records: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Virginia Tech Intellectual Properties IncBeihang University+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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