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Machine Vision Inspection Patents: Who Leads, Where the Gaps Are 2026

Machine Vision Inspection Patents: Who Leads, Where the Gaps Are 2026
https://www.patsnap.com/resources/blog/rd-blog/machine-vision-inspection-systems-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Sensors & Instrumentation
Machine Vision Inspection System Patents: Filing Trends and Technology Ownership
  • Filing has cooled since a 2019 peak of 10. the midpoint year 2022 shows only 2 filings, and the trend through 2026 stays flat rather than resuming growth.
  • Image processing outweighs raw optics two to one. G06T image data processing appears in 37 of 65 records versus 7 for G02B optical elements, showing where claim activity actually concentrates.
  • The United States dominates filing venue by a wide margin. 35 of the tracked records were filed there against 9 at the EPO and single digits everywhere else, including China at just 4.
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65
Published Records
51%
Top-5 Share of All Records
-100%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (4 records) with 2024 (0) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 65 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Field Overview

What the machine vision inspection patent record shows

Machine vision inspection covers the hardware and algorithms used to detect defects, verify assembly and calibrate optical measurement on a production line. This dataset tracks 65 patent families published between 2015 and mid-2026, filtered to records that combine machine vision or automated optical inspection terminology with specific technical claims around lighting design, defect detection rate, false reject handling, line scan cameras or calibration. The IPC scope spans G01N21 material analysis, G06T7 image processing and G06V10 image recognition, which is where inspection-specific claims typically get classified.

The filing curve is not a growth story. A peak of 10 families in 2019 gave way to a much thinner midpoint year, and the most recent years stay low even allowing for the roughly 18-month lag between filing and publication that always understates the newest data. Read the composition and assignee sections below as a map of where claim space is already dense and where it is not, rather than as evidence of an expanding market.

Filing activity by year, 2017–2026
  1. 1MITUTOYO CORP12
  2. 2PRESSCO TECH INC7
  3. 3UTECHZONE CO LTD5
  4. 4DECA TECH USA INC5
  5. 5GLOBALWAFERS CO LTD4
  6. 6DECA TECH INC3
  7. 7ELECTRO SCI IND INC3
  8. 8AJUHITEK2
  9. 9TATA CONSULTANCY SERVICES LTD2
  10. 10ORBOTECH LTD2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Filing Data

Trend and technology composition

Two views of the same 65-family dataset: filing activity over time, and how those families split across the IPC subclasses that define the technical approach.

A peak year behind, a flat present

Filings rose to a peak of 10 in 2019, fell to 2 by the 2022 midpoint, and have not recovered since. Treat the final one or two years as undercounted rather than as a genuine drop-off, since publication lags filing.

A peak year behind, a flat present03581022017201810201920202021202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

Image processing carries more weight than optics hardware

G06T (image data processing) leads at 37 records and G01N (material analysis and testing) follows at 32, together accounting for most of the corpus. Optical hardware classes like G02B (7) and pure recognition classes like G06V (6) are comparatively thin, and AI-specific classification under G06N sits at only 8.

Image processing carries more weight than optics hardwareG06T · Image data processing & genera…3756.9%G01N · Material analysis & testing3249.2%H04N · Pictorial communication (video…1116.9%G06F · Electric digital data processi…1015.4%G06K · Data recognition & presentation913.8%G06N · Computing based on AI models812.3%G02B · Optical elements & systems710.8%G06V · Image/video recognition69.2%Other3452.3%

Shares are the percentage of the 65 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

Most-cited records and a representative filing

Representative Filing
US20120268732A12012-10-25

Automated optical inspection device and calibration method thereof

SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Discloses an automated optical inspection device with a machine table holding a first fixing base for the product plate and a second fixing base above it for a standard plate. A camera moves upward a set distance at a set time and scans the standard plate to perform calibration, automating a process that was previously manual.Filed by Shenzhen China Star Optoelectronics Technology Co., Ltd., dated 2012-10-25.

US20120268732A1 — patent drawing 1US20120268732A1 — patent drawing 2
View full filing
Highest-citation records in the corpus
#Publication no.Patent titleCitations
1US5095204AMachine vision inspection system and method for transparent containers205
2US20050109959A1Systems and methods for rapidly automatically focusing a machine vision inspection system126
3US5791497AMethod of separating fruit or vegetable products83
4US20190197679A1Automated optical inspection method using deep learning and apparatus, computer program for performing the me…76
5US20170078549A1Machine vision inspection system and method for obtaining an image with an extended depth of field58
6US20230125477A1Defect detection using one or more neural networks55
7US9830694B2Multi-level image focus using a tunable lens in a machine vision inspection system48
8US20170061601A1Multi-level image focus using a tunable lens in a machine vision inspection system43
9US7567713B2Method utilizing intensity interpolation for measuring edge locations in a high precision machine vision insp…43
10US7084970B2Inspection of TFT LCD panels using on-demand automated optical inspection sub-system38

Citation counts reflect influence within the searched corpus and skew toward older filings; they are not a measure of current technical relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Signal Check

What the numbers mean for a filing decision

Three read-outs from the trend, classification and venue data that matter more than the headline family count.

Filing Momentum
10 → 2
peak (2019) vs. midpoint (2022)

Growth has stalled, not accelerated

The 2019 peak of 10 families was not sustained; by 2022 annual filing had dropped to 2. That pattern argues against treating this as a fast-growing field when scoping budget or freedom-to-operate work.

Interpret 2025-2026 counts as understated given publication lag.
Technology Split
37 vs. 7
G06T records vs. G02B records

Software claims outnumber optics hardware claims

Image data processing (G06T) accounts for more than half the corpus while optical elements and systems (G02B) sit at just 7. Claim density has shifted toward algorithmic defect detection rather than lens or lighting hardware.

G01N21 material-analysis claims remain a close second at 32.
Filing Venue
35 of 65
records filed in the United States

US filing dominates; China filing is thin

The United States accounts for more than half of all tracked records, with Europe a distant second at 9. China sits at only 4 filings and South Korea at 3, a venue imbalance worth checking before assuming global coverage.

WIPO/PCT filings (3) suggest limited multi-jurisdiction strategy in this set.
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Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to machine vision inspection systems, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Assignee Landscape

Who holds the claim space, and where it thins out

Assignee activity in this corpus is spread across a handful of named entities with no single filer showing recent-year momentum, alongside a small set of co-filing pairs that suggest joint development work.

Concentration
0
records in latest year across leading assignees

No leading assignee is currently active

Every top-ranked assignee in the recent-momentum data, including Mitutoyo, PARISCO, DEK, UTechzone, GlobalWafers and Photon Dynamics, shows zero filings in the most recent tracked year, consistent with the broader flat trend.

Absence of recent filings does not mean abandonment; check for continuations separately.
Co-filing
4 pairs
co-assignee relationships identified

Joint filings are rare and small-scale

Only 4 co-assignee pairs appear in the dataset, the strongest linking Photon Dynamics with individual inventors. This is not a field defined by consortium or joint-venture filing.

Co-filing pairs each appear once, so none represents a sustained partnership.
Venue Mix
6 offices
receiving offices represented

Filing is US-centred with a long tail of venues

Beyond the US and EPO, filings appear singly or in small numbers across Israel, China, South Korea and WIPO/PCT routes, indicating most applicants protect a home or lead market rather than filing broadly.

Israel's 6 filings are notable given its small overall share of global patent volume.
🔍
Under-claimed sub-areas worth checking before filing
Branches of the corpus with thin coverage relative to the core imaging and calibration claims.
extended depth-of-field autofocusline scan camera calibration workflowsdeep-learning false-reject reductiontransparent/reflective container inspectionlighting design for defect contrast
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Mitutoyo Corporation0
PARISCO Technologies0
DEK USA0
UTechzone Co., Ltd.0
GlobalWafers Co., Ltd.0
Photon Dynamics, Inc.0
NVIDIA Corporation0
Kentix Limited0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this analysis

The trend and assignee data point to specific follow-up work depending on whether you are scoping freedom-to-operate, evaluating an acquisition target, or planning where to file next.

Map claims against your own defect-detection pipeline

Cross-reference the G06T and G01N claim clusters against the specific detection algorithms and calibration steps your product uses, rather than relying on the topic-level search alone.

Run a claim comparison in Eureka

Watch venue gaps before you file

With China at just 4 filings and South Korea at 3 against 35 in the US, a China-first or Korea-first filing strategy may face less prior art than a US filing would.

Check venue coverage in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about machine vision inspection patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Machine Vision Inspection Systems covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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