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MEMS Gas Sensor (Standalone) Patent Snapshot 2026

MEMS Gas Sensor (Standalone) Patent Snapshot 2026
Evidence Snapshot
MEMS Gas Sensor (Standalone) Patent Snapshot in 2026

The standalone MEMS gas sensor patent corpus is a small, moderately concentrated field in which Hefei Micro Nano Sensing Tech leads by filing volume, with the United States as the dominant grant jurisdiction. Annual filing activity peaked in 2020 and has since eased, placing this field in a declining phase on a recent-window basis, though several new entrants signal continued technical interest.

30
Patent families in scope
39%
Top visible applicants share
-36%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Hefei Micro Nano leads a fragmented but top-heavy field

Hefei Micro Nano Sensing Tech Co Ltd holds the top position among filers, followed closely by Honeywell International, Electronics & Telecomm Research Institute, and Infineon Technologies AG. The top five filers account for thirty-nine percent of the combined output of the ranked applicants visible in this query, indicating a moderately concentrated but still fragmented visible assignee structure.

The gap between the leader and the next tier is narrow — the top four applicants are separated by only one or two patent records — suggesting no single player has established an overwhelming positional advantage. Below rank five, filings drop to three or fewer records per applicant, confirming a long, thin tail of occasional filers including universities and individual inventors.

Leading applicants
#ApplicantPatent recordsShare
1Hefei Micro Nano Sensing Tech Co Ltd5
2Honeywell International Inc4
3ELECTRONICS & TELECOMM RES INST4
4Infineon Technologies AG4
5Figaro Engineering Inc3
6Nissha Printing Co Ltd3
7Nayoota Inc2
8HANOI UNIV OF SCI & TECH2
9Korea Electronics Technology Institute2
10NIPPON TELEGRAPH & TELEPHONE CORP2
#ApplicantPatent recordsShare
11National Yang Ming Chiao Tung University1
12Park Joon Shik1
13Qisi Semiconductor (Hangzhou) Co Ltd1
14Sun Yat-sen University1
15Xian Sanhuan Technology Development General1
16Dr K Karthikeyan1
17CNPC Tubular Goods Research Institute1
18China National Petroleum Corporation1
19HUAZHONG UNIV OF SCI & TECH1
20Omron Corporation1
↗ Hover a row · click a company to ask Eureka

This shallow hierarchy means the field remains contestable. An entrant with focused MEMS fabrication or novel sensing-material expertise could establish a credible position without displacing any incumbent outright, provided filing activity is sustained over multiple cycles.

Filings from roughly 2024 onward are subject to publication lag and likely under-represent true recent activity; competitive conclusions should weight earlier cohorts more heavily. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

A 2020 peak followed by easing volume; G01N analysis dominates the technology mix

The two charts below map how filing activity has evolved year by year and how the IPC technology branches are distributed across the corpus, providing a combined view of timing and technical focus.

Annual filing trend

Annual filings surged to a clear peak in 2020 and have been uneven since. The recent-window growth rate is negative, consistent with a post-peak decline phase. Years 2024 through 2026 should be read as provisional given publication lag — they do not yet reflect the full eventual filing count for those periods.

Annual filing trendAnnual values from 2017 to 2026, peaking at 10 in 2020.120172201842019102020020212202252023220243202512026↗ Hover for values · click a bar to ask Eureka

Technology composition

G01N (material analysis and testing) is by far the visible branch, reflecting the sensing and measurement core of the field. B81B (microstructural MEMS devices) and B81C (MEMS manufacturing) form a secondary cluster. All remaining branches — including nanotechnology, electric heating circuits, and separation processes — hold very small shares, pointing to limited cross-disciplinary diversification in the corpus to date.

Technology compositionG01N · Material analysis & testing leads with 40; B81B · Microstructural devices (MEMS) 10.G01N · Material analysis…40B81B · Microstructural d…10B81C · MEMS manufacturing6B82Y · Nanotechnology ap…2H05B · Electric heating …2B01D · Separation proces…1C01G · Compounds of othe…1C08G · Condensation poly…1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20220146445A1Published 2022-05-12

MEMS gas sensor mount body

Nissha CO., LTD.

A MEMS gas sensor mount body includes a MEMS gas sensor chip and a printed circuit board. The MEMS gas sensor chip includes a base having a cavity, an insulating film having an opening portion, a gas sensing unit, and a plurality of pads. The printed circuit board includes a gas introduction path, and a plurality of connection terminals. The MEMS gas sensor… (excerpt from the patent abstract)

MEMS gas sensor mount body — patent drawingMEMS gas sensor mount body — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Gas sensor and manufacturing method of the same18
2Micro gas sensor and manufacturing method thereof17
3Micro gas sensor17
4Fabricating method for micro gas sensor and the same12
5Micro gas sensor10
6Fabricating method for micro gas sensor and the same6
7一种MEMS气体传感器和CMOS芯片一体式封装结构及其制备方法4
8Micro-hotplate and MEMS gas sensor4

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Hefei Micro Nano Sensing Tech

Hefei Micro Nano Sensing Tech Co Ltd

The current corpus leader with five patent records, Hefei Micro Nano Sensing Tech focuses primarily on B81B microstructural MEMS devices, G01N material analysis and testing, and B81C MEMS manufacturing — a broad but coherent MEMS-fabrication profile. Momentum is flagged as a new entrant (▲ new entrant), indicating all filings have emerged recently from a zero prior base. This trajectory suggests an active, growth-oriented IP program rather than a legacy portfolio.

patent records: 5
Challenger · Korea Electronics Technology Institute

Korea Electronics Technology Institute

Holding two patent records, Korea Electronics Technology Institute is also classified as a new entrant (▲ new entrant), with a technology emphasis concentrated in G01N material analysis and testing alongside semiconductor device classification H01L. Its academic-industrial positioning and recent entry suggest potential for rapid portfolio scaling, particularly in integration of MEMS sensors with semiconductor read-out circuits.

patent records: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Honeywell International IncInfineon Technologies AG+ more
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Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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