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MEMS Pressure Sensor QC Patents: Leaders, Trends & White Space 2026

MEMS Pressure Sensor QC Patents: Leaders, Trends & White Space 2026
https://www.patsnap.com/resources/blog/rd-blog/mems-pressure-sensor-quality-control-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Sensors & MEMS · Patent Landscape
MEMS Pressure Sensor Quality Control Patents: Calibration, Trimming and Wafer-Level Test
  • Filings have flattened, not grown. activity peaked in 2019 at 7 filings and had fallen to a single filing by 2022, with no sign of a rebound through the most recent full year.
  • The claim space is narrow and old. the most-cited records date back to implantable and capacitive RF sensor designs, and the dataset's top assignees show zero filings in the latest year — the core calibration approaches were staked out early.
  • Filing is split three ways geographically. the United States and Europe each carry roughly a third of receiving-office activity, with China, WIPO and India trailing well behind, so regional strategy still matters for anyone entering now.
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62
Published Records
53%
Top-5 Share of All Records
0%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (2 records) with 2024 (2) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 62 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

This dataset tracks patent families at the intersection of MEMS pressure sensing and the quality-control step that makes a raw die usable: wafer-level test, calibration, trimming and offset compensation. The search combines title/abstract language for MEMS and micromachined pressure sensors with claim/description language for the calibration step, and restricts to force-and-pressure and MEMS-manufacturing IPC classes. 62 patent families published between 2015 and mid-2026 make up the corpus.

Because publication trails filing by roughly 18 months, the most recent one or two years in any trend chart will always look thinner than they eventually turn out to be. That lag does not change the picture here, though: the peak was already several years ago, and the decline shows up well before the most recent, still-incomplete year.

Filing activity, 2017–2026
  1. 1AMS INTERNATIONAL AG13
  2. 2CALIFORNIA INST OF TECH6
  3. 3TEKNOLOGIAN TUTKIMUSKESKUS VTT OY5
  4. 4NXP USA INC5
  5. 5SENSATA TECHNOLOGIES INC4
  6. 6SCIOSENSE BV3
  7. 7INVENSENSE INC3
  8. 8Kunshan Lingke Sensing Technology Co., Ltd.2
  9. 9HONEYWELL INTERNATIONAL INC2
  10. 10COLLEGE OF ENG PUNE2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

Two views of the same 62-family corpus: how filing volume has moved year over year, and which IPC subclasses the claims actually sit in.

Filings rose to a 2019 peak, then fell

From 4 filings in 2017, activity climbed to a peak of 7 in 2019, then dropped sharply — by 2022 the corpus shows just 1 filing, and the latest year records none. This is a mature, contracting filing pattern rather than an emerging one.

Filings rose to a 2019 peak, then fell024684201720187201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Claims concentrate in force/pressure measurement

All 62 records touch G01L (force and pressure measurement), with meaningful secondary activity in B81C and B81B (MEMS manufacturing and microstructures) and a smaller footprint in general semiconductor-device classes (H10N, H01L, H10D). Battery and power-grid classes (H01M, H02J) appear only marginally, suggesting most calibration work is still framed as a sensor problem rather than a power-management one.

Claims concentrate in force/pressure measurementG01L · Force & pressure measurement62100.0%B81C · MEMS manufacturing914.5%B81B · Microstructural devices (MEMS)711.3%H10N · Other electric solid-state dev…69.7%H01L · Semiconductor devices46.5%H10D · Semiconductor devices (general)46.5%H01M · Batteries, cells & fuel cells23.2%H02J · Power supply & grid systems23.2%Other812.9%

Shares are the percentage of the 62 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key patents

The most-cited records anchor the field

Representative record
US7918138B22011-04-05

Wireless MEMS pressure sensor with built-in calibration (US7918138B2)

REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE

A wireless microelectromechanical system (MEMS) pressure sensor with built-in calibration. An actuator is coupled with a pressure sensing device to enable the pressure to be calibrated against the known pressure exerted by the actuator. The sensing component is configured to flex under the application of force to a pure bending condition, i.e., the sensing component flexes with no or insignificant shear forces in the sensing component.Filed by The Regents of the University of California; issued 2011.

US7918138B2 — patent drawing 1US7918138B2 — patent drawing 2
View full record
Most-cited patents in this corpus
#Publication no.Patent titleCitations
1US7252006B2Implantable mechanical pressure sensor and method of manufacturing the same110
2US6945115B1Micromachined capacitive RF pressure sensor105
3US20130118265A1MEMS capacitive pressure sensor, operating method and manufacturing method59
4US20160091378A1Microelectromechanical systems (MEMS) pressure sensor having a leakage path to a cavity57
5US20180313709A1MEMS pressure sensor with through-hole cap49
6US6782755B2Surface-micromachined pressure sensor and high pressure application42
7US20020053242A1Surface-micromachined pressure sensor and high pressure application33
8US10006824B2Microelectromechanical systems (MEMS) pressure sensor having a leakage path to a cavity25
9US9383282B2MEMS capacitive pressure sensor, operating method and manufacturing method25
10US20180172532A1Micromachined pressure sensor and method of making the same20

Citation counts reflect influence within this searched corpus and skew toward older filings; treat them as a map of foundational claims, not of current commercial activity.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers say about where this field stands

Three signals from the dataset matter more than the raw count of 62 families: the shape of the filing curve, the age of the most influential claims, and how thin the collaboration layer is.

Filing trajectory
7 → 0
peak year (2019) to latest year

A contracting filing curve, not a growing one

Filings peaked at 7 in 2019 and had fallen to a single filing by the 2022 midpoint, with the latest year showing none recorded so far. Even allowing for publication lag, this is a field where the core calibration approaches were largely staked out several years ago rather than one still attracting fresh filers.

Trend data, 2017–2026
Citation age
110 citations
top-cited record

The most-influential claims are the oldest

The two highest-cited records — an implantable mechanical pressure sensor and a capacitive RF pressure sensor — sit well above the rest of the corpus on citation count. New entrants are building on foundations laid down early, and citation counts here favour those older records by construction.

Most-cited records table
Collaboration density
7 pairs
co-assignee pairs identified

Co-filing is rare and concentrated around one institution

Only 7 co-assignee pairs appear across the whole corpus, and the strongest of them centres on a single academic assignee paired with an oilfield-services company and two individual inventors. Most filers in this space are working alone rather than in joint ventures or research consortia.

Co-assignee pair analysis
Geographic split
22 / 19 / 8
US / EPO / China receiving-office counts

Filing strategy is still US- and Europe-led

The United States and the European Patent Office between them account for the large majority of receiving-office activity, with China, WIPO and India well behind. A filer targeting only one of those two blocs is missing a comparable share of the documented prior art.

Receiving office breakdown
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to mems pressure sensor quality control, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the ground, and where it's still open

Filing has concentrated among a small set of established sensor and semiconductor names, but the current-year momentum figures tell the more useful story: even the most active historical filers show no filings in the latest year, which is consistent with a claim space that is occupied but not being actively contested.

Assignee concentration
62 families
total in ranking

A long tail behind a handful of repeat filers

The ranking spans established MEMS and semiconductor names alongside universities and individual inventors, with no single assignee dominating the corpus outright. That spread, combined with the flat recent-year trend, points to a field where positions were established rather than one still being actively fought over.

Assignee ranking, 62 families
Momentum check
0 in latest year
across leading historical assignees

Historical leaders have gone quiet

Every one of the most prominent assignees by historical count — spanning semiconductor, MEMS and instrumentation companies — recorded zero filings in the latest year tracked. That is a strong signal the calibration-and-trim claim space is settled rather than in active dispute.

Recent-year momentum by assignee
Collaboration pattern
7 pairs, 2 max
strongest co-assignee link

Academic-industry pairing is the exception, not the rule

The strongest co-assignee relationship in the corpus links one academic institution to an oilfield-services company, appearing twice; every other pairing appears once. Joint filing is not how this field typically moves.

Co-assignee pair analysis
🔍
Under-claimed sub-areas worth checking before filing
These branches show thin coverage relative to the core calibration claims and are worth a freedom-to-operate check before assuming the space is open.
Battery-integrated offset compensationPower-grid-linked self-calibrationThrough-hole cap leakage-path trimmingWireless built-in actuator calibrationSemiconductor-substrate trim circuitry
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
NXP Semiconductors N.V.0
California Institute of Technology (Caltech)0
AMS International AG0
VTT Technical Research Centre of Finland Ltd0
Freescale Semiconductor, Inc.0
InvenSense, Inc.0
Honeywell International Inc.0
Infineon Technologies AG0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this analysis

The dataset points to a settled but unevenly enforced claim space. Two directions make sense from here.

Map freedom-to-operate against the oldest high-citation patents

Before designing a new trim or offset-compensation approach, check it against the implantable and capacitive RF pressure sensor patents that anchor this corpus's citation graph — they are the claims most likely to have been licensed or litigated already.

Run a freedom-to-operate check in Eureka →

Watch for a re-acceleration tied to new sensor form factors

The battery- and power-grid-adjacent IPC classes are thin today but could pick up as pressure sensors move into new integrated power systems. A quarterly re-run of this search would catch that shift early.

Set up monitoring in Eureka →
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about this landscape

Answers are grounded in the same dataset. Derived from a Patsnap search on MEMS Pressure Sensor Quality Control covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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