Book a demo

Metalens Simulation Patents: Who Leads, Where the Gaps Are 2026

Metalens Simulation Patents: Who Leads, Where the Gaps Are 2026
https://www.patsnap.com/resources/blog/rd-blog/metalens-simulation-and-modeling-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Photonics & Optics · Patent Landscape
Metalens Simulation and Modeling Patents
  • Filing peaked in 2017 at 25 families and has declined since, with the midpoint year 2022 sitting at 11 — this is a maturing claim space, not a growing one.
  • G02B carries 82 of 98 records, meaning almost all activity sits inside core optical-element classification rather than spreading into adjacent fields like radar or imaging.
  • The most-cited record draws 184 citations, a concentration of influence in a small set of early dielectric-metasurface filings that later applicants have had to design around.
Get a prior-art report on your approach
98
Published Records
65%
Top-5 Share of All Records
+125%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (4 records) with 2024 (9) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 98 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

Metalens simulation and modeling covers the computational methods used to predict how a metasurface — an array of subwavelength nanostructures — bends, focuses, or filters light. That includes FDTD simulation, phase-profile modeling, and broader optical-response prediction workflows that let designers specify pillar geometry, spacing, and material before fabrication. The 98 patent families in this dataset span filings from 2015 through mid-2026, drawing on university, national-lab, and corporate assignees working across dielectric and metallic metasurface architectures.

Because publication lags filing by roughly 18 months, the most recent one or two years in the trend understate real activity — 2026's near-zero count reflects a data cut-off, not a stop in filing. The pattern that does hold across the full window is a 2017 peak followed by a slower, lower plateau, which is the shape of a field where the foundational claim territory got staked early.

Filing activity by year, 2017-2026
  1. 1UNIV OF WASHINGTON22
  2. 2PRESIDENT & FELLOWS OF HARVARD COLLEGE21
  3. 3CALIFORNIA INST OF TECH9
  4. 4THE TRUSTEES OF PRINCETON UNIV6
  5. 5IMAGIA INC6
  6. 6SAMSUNG ELECTRONICS CO LTD6
  7. 7THE RGT UNIV OF MICHIGAN4
  8. 8HESAI TECH CO LTD3
  9. 9YEDA RES & DEV CO LTD3
  10. 10MASSACHUSETTS INST OF TECH3
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Let an AI agent run this analysis on your own technology

Pick a task. Every answer cites the patents behind it.

10,000 free credits to start
The Data

Filing trend and technology composition

Two views of the same 98 families: how filing activity has moved over time, and which IPC subclasses carry the claim density.

A 2017 peak, then a decline

Filings ran at 25 in 2017, the high point of the series, and by the midpoint year 2022 had fallen to 11. That trajectory — high early, lower and flatter later — is typical of a subfield where the core simulation methods were claimed early and later work narrows into refinements rather than opening new ground.

A 2017 peak, then a decline061319252520172018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

G02B dominates; adjacent classes are thin

G02B (optical elements and systems) accounts for 82 of 98 records, dwarfing G02F (optical control and modulation, 12), G01J (radiation and light measurement, 11), and H01Q (antennas, 8). B82Y (nanotechnology), H04N (pictorial communication), G01N (material analysis) and G01S (radar/positioning) each carry single digits — these are the thinner branches worth checking before assuming G02B precedent controls.

G02B dominates; adjacent classes are thinG02B · Optical elements & systems8283.7%G02F · Optical control & modulation1212.2%G01J · Radiation & light measurement1111.2%H01Q · Antennas88.2%B82Y · Nanotechnology applications66.1%H04N · Pictorial communication (video…44.1%G01N · Material analysis & testing33.1%G01S · Radar, sonar & positioning33.1%Other1919.4%

Shares are the percentage of the 98 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

Go deeper on Metalens Simulation and Modeling with Eureka

This page is one run against one query. Ask Eureka your own question about metalens simulation and modeling and every answer comes back with the patent numbers behind it.

Try Eureka
Key Patents

The most-cited filings

Representative Filing
US11874476B12024-01-16

Metalens collimators and condensers (US11874476B1)

IMAGIA, INC.

A device combining an LED with a metalens positioned to reshape the LED's divergent, Lambertian emission profile into a modified transmission profile. The metalens is built from a two-dimensional array of passive pillars extending from a substrate in a radially symmetric pattern of varying diameters, spaced at a uniform subwavelength interval.Filed by IMAGIA, INC., granted January 2024 — illustrates how simulation-driven pillar-array design is being claimed for practical illumination-optics applications beyond imaging.

US11874476B1 — patent drawing 1US11874476B1 — patent drawing 2
View full filing
Highest-citation records in this dataset
#Publication no.Patent titleCitations
1US20160306079A1Multi-wavelength optical dielectric metasurfaces184
2WO2017176921A1Meta-lenses for sub-wavelength resolution imaging173
3US20190154877A1Meta-lenses for sub-wavelength resolution imaging163
4US20170212285A1Dispersionless and dispersion-controlled optical dielectric metasurfaces122
5WO2016168173A1Multi-wavelength optical dielectric metasurfaces75
6US20180246262A1Low-contrast silicon nitride-based metasurfaces59
7US10670782B2Dispersionless and dispersion-controlled optical dielectric metasurfaces56
8WO2018142339A1Multilayer optical element for controlling light54
9WO2018118984A1Ultra-compact, aberration corrected, visible chiral spectrometer with META-lenses54
10US20200284960A1Multilayer optical element for controlling light45

Citation counts reflect influence within this searched corpus and favor older filings; they are not a measure of current commercial relevance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Run it yourself

Put your own technology through the same analysis

 
Where to run it
Fastest

Eureka on the web

When you want the answer in the next five minutes.

The agent works the prompt against patents and technical literature, citing every source.

Run your analysis now →
For builders

MCP server & REST API

When it has to run inside your own pipeline.

Patent search, landscape analysis and assignee resolution as MCP tools. Drop them into any agent framework, or call REST directly.

Browse MCP servers →
Insights

What the numbers say about this field

Three read-throughs from the filing trend, classification spread, and citation concentration.

Filing trajectory
25 → 11
2017 peak vs. 2022 midpoint

The core methods were claimed early

A peak in 2017 followed by a decline to 11 filings by 2022 suggests the foundational FDTD and phase-modeling approaches were staked out in the field's first few years. Later filers are more likely narrowing existing claims than opening new simulation methods.

Filing trend, 2017-2026
Classification concentration
82 of 98
records classified under G02B

Claim density sits almost entirely in G02B

Optical elements and systems (G02B) accounts for the large majority of records. The thinner subclasses — G01S, G01N, H04N — show occasional crossover into radar, material testing, and video applications, but none carries meaningful density on its own.

IPC subclass distribution
Citation concentration
184 citations
top-cited record

Influence concentrates in a handful of early dielectric-metasurface filings

The top five most-cited records all date to the field's earlier years and cluster around dielectric metasurface design and sub-wavelength imaging resolution. New entrants building on dielectric pillar architectures are almost certainly citing, and designing around, this small set.

Most-cited records
Filing geography
US 47 · PCT 25
receiving office split

US and PCT filings dominate the venue mix

Nearly half of all records were filed at the US receiving office, with PCT applications a distant second and EPO filings smaller still. Filers seeking freedom-to-operate clearance should treat US prosecution history as the primary reference point, with PCT family members as secondary confirmation.

Receiving office counts
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to metalens simulation and modeling, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the ground, and where it's thin

Recent-year momentum across the leading assignees has flattened to zero across the board, which is consistent with the broader post-2017 decline rather than any single company pulling back.

Academic anchor
6 co-filings
strongest co-assignee pair

University-to-university collaboration anchors the field

The strongest co-assignee link in this dataset pairs University of Washington with Princeton University's board of trustees, at six shared filings — a signal of sustained joint metasurface research rather than a one-off collaboration.

Co-assignee pairs
Corporate entrant
0 in latest year
recent-year filing momentum

Samsung Electronics sits among the named leaders

Samsung Electronics (Korea) appears among the top assignees by family count, alongside university and national-lab groups, but shows no filings in the latest tracked year — consistent with the field-wide slowdown rather than a company-specific retreat.

Recent-year momentum
Applied-optics entrant
US11874476B1
representative granted filing

IMAGIA is pushing metalens design into illumination optics

IMAGIA, INC.'s granted filing on metalens collimators and condensers extends metasurface simulation techniques into LED illumination shaping — an application area distinct from the imaging-resolution focus of the earliest, most-cited filings.

Representative record, 2024
🔍
Sub-areas that remain under-claimed
Thinner branches of the IPC spread suggest room to file without crowding established claim territory.
Radar-integrated metasurface phase design (G01S overlap)Metasurface-based material analysis probes (G01N overlap)Video-sensor metalens integration (H04N overlap)Nanofabrication tolerance modeling for pillar arraysCross-wavelength dispersion co-simulation
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
University of Washington0
President and Fellows of Harvard College0
California Institute of Technology (Caltech)0
The Trustees of Princeton University0
Samsung Electronics Co., Ltd. (Korea)0
IMAGIA INC0
The Regents of the University of Michigan0-100%
King Abdullah University of Science and Technology (KAUST)0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The dataset points to a field with an early claim peak and a few thinly-populated adjacent branches. Two directions are worth pursuing before committing engineering or legal resources.

Check freedom-to-operate against the top-cited cluster

The five most-cited records concentrate around dielectric metasurface design filed early in the window. Any new dielectric pillar-array approach should be checked against this cluster before further development.

Explore citation mapping in Eureka

Scope the thinner IPC branches for filing room

G01S, G01N, and H04N each carry only a handful of records despite clear technical overlap with metalens simulation. These branches warrant a closer look for viable, less-crowded claim positions.

Run a white-space search in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about metalens simulation patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Metalens Simulation and Modeling covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

Research Metalens Simulation and Modeling in depth with Eureka

Go past this page: query the whole metalens simulation and modeling corpus yourself, in your own scope.
Every answer comes back with patent numbers you can open.

Try Eureka

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

Help us improve this page

Found incorrect or outdated information? Let us know and we'll get it fixed.