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Nano-Modified CFRP Patent Snapshot 2026

Nano-Modified CFRP Patent Snapshot 2026
Evidence Snapshot
Nano-Modified CFRP Patent Snapshot in 2026

Nano-modified CFRP is an early-growth field with a small but rapidly expanding patent corpus dominated by a handful of academic and specialist industrial filers, with Texas A&M University holding a clear lead. China accounts for the majority of filing activity, while nanotechnology and polymer-additive classifications anchor the technology mix.

12
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
China
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

Texas A&M leads a concentrated, nascent field

Texas. A&M University holds the top position with 4 patent records, followed by Ningbo Institute of Materials Technology & Engineering (Chinese Academy of Sciences) and CGN Juner New Materials, each with 2 records.

The top five filers account for 63% of the combined total across the ranked applicants visible in this query, signaling a highly concentrated visible assignee structure where a single academic institution commands a disproportionate share.

Leading applicants
#ApplicantPatent recordsShare
1TEXAS A&M UNIVERSITY4
2NINGBO INST OF MATERIALS TECH & ENG CHINESE ACAD O…2
3CGN Juner New Materials Co., Ltd.2
4Zhejiang Baojing Carbon Materials Co., Ltd.1
5South China University of Technology1
6Xuchang University1
#ApplicantPatent recordsShare
7Nissin Kogyo Co., Ltd.1
8Shenzhen Distinta Interfacial Technology Co., Ltd.1
9Zhuji Woken Zhongzhi New Materials Co., Ltd.1
10Toray Industries, Inc.1
11Yantai Aosen Brake Materials Co., Ltd.1
↗ Hover a row · click a company to ask Eureka

The leaders’ positions reflect early-stage academic and state-linked industrial activity rather than entrenched commercial portfolios, which means the competitive hierarchy is still fluid and accessible to new entrants with targeted research programs.

The most recent 18–24 months of data are subject to publication lag and are likely understated; figures for 20242026 should be treated as provisional. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

A 600% multi-year surge anchored in nanotechnology and polymer additives

Filing activity accelerated sharply in the recent three-year window relative to the prior period, while the technology mix is heavily concentrated in nanotechnology applications and polymer-additive classifications with notable adjacent branches emerging.

Annual filing trend

Annual filings were negligible from 2019 through 2021, then climbed to a 2023 peak of 4 records before easing; the 2024 and 2025 figures are provisionally low due to publication lag, and the single 2026 record is early-stage only. The field is still expanding on a multi-year basis — the recent three-year window sits 600% above the prior three-year window — though annual volume has eased from its 2023 peak.

Annual filing trendAnnual values from 2017 to 2026, peaking at 4 in 2023.22017120180201902020120211202242023220240202512026↗ Hover for values · click a bar to ask Eureka

Technology composition

B82Y (Nanotechnology applications) leads with 9 records, followed by C08K (Use of additives in polymers) at 6 and B82B (Nanostructures) at 5, confirming that nanomaterial integration at the fiber-matrix interface is the visible technical route; lower-frequency branches such as H01M (batteries/fuel cells) and B33Y (additive manufacturing) signal diversification into functional and 3D-printed CFRP applications.

Technology compositionB82Y · Nanotechnology applications leads with 9; C08K · Use of additives in polymers 6.B82Y · Nanotechnology ap…9C08K · Use of additives …6B82B · Nanostructures5B01J · Chemical/physical…4C08L · Polymer compositi…4C08J · Polymer processin…3H01M · Batteries, cells …3B33Y · Additive manufact…2↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2023141299A1Published 2023-07-27

Manufacturing of multifunctional nanostructures us…

The Texas A&M University System

In an embodiment, the present disclosure pertains to a method of deposition of nanostructures with engineered patterns. In an additional embodiment, the present disclosure pertains to a method of preparing colloidal suspensions of hybrid nanoparticle systems (HNMS). In a further embodiment, the present disclosure pertains to a method of making a cellulose… (excerpt from the patent abstract)

Manufacturing of multifunctional nanostructures us… — patent drawingManufacturing of multifunctional nanostructures us… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1尼龙/石墨烯/碳纤维复合粉末及其制备方法和在选择性激光烧结技术中的应用17
2一种碳纳米管-过渡金属-碳纤维复合材料及其制备方法与应用11
3镶嵌型合金/二氧化铈片/碳纤维复合纳米材料的制备方法及其应用研究6
4一种芳纶纤维/石墨烯复合增强碳纤维树脂预浸料3
5一种硅/石墨烯/碳纤维复合负极材料及其制备方法1

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Texas A&M University

Texas A&M University

Texas A&M University holds 4 patent records — the largest share in the corpus — concentrated in B01J (chemical/physical processes), B82B (nanostructures), reflecting a focus on fundamental nano-synthesis and surface modification routes applicable to CFRP matrices. Its momentum is flagged as a new entrant in the recent window, indicating that all 4 records arrived in the most recent active filing period, making its lead both visible and freshly established.

patent records: 4
Challenger · CGN Juner New Materials

CGN Juner New Materials

CGN Juner New Materials holds 2 patent records, tied with the Ningbo Institute of Materials Technology & Engineering, and co-files with that institute in both cases. Its technology emphasis sits in B33Y (additive manufacturing / 3D printing) and C08K (use of additives in polymers), pointing to process-integration rather than materials-synthesis leadership. No momentum signal beyond the collaboration pair is available in the evidence.

patent records: 2
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Toray Industries Inc.South China University of Technology+ more
Unlock full assignee analysis →
Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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