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Photopolymer Resin Formulation Patents: Leaders & Trends 2026

Photopolymer Resin Formulation Patents: Leaders & Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/photopolymer-resin-formulation-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Additive Manufacturing Materials
Photopolymer resin formulation patents: mapping who holds the vat photopolymerization chemistry
  • A three-way field. the assignee ranking returns just three companies against 13 published records — a small, tightly held corpus rather than a crowded one.
  • Carbon nanotube dispersions dominate the citation table. the three most-cited records all describe the same discrete carbon nanotube dispersion technology across WIPO, Canadian and US filings.
  • Filing peaked in 2022 at 10 records then evidence thins toward the present, which — given the roughly 18-month publication lag — likely understates recent activity rather than reflecting a real slowdown.
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13
Published Records
WO
Leading Jurisdiction
2022
Peak Filing Year
B29C
Lead IPC Subclass

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

Photopolymer resin formulation sits at the intersection of vat photopolymerization hardware and materials chemistry: photoinitiator selection, cure depth control, green strength before post-cure, shrinkage management, toughening additives and shelf stability all show up as claim elements in the same small set of records. This dataset draws on 13 published records spanning 2015 to the 2026 cut-off, searched against terms that pair formulation concepts with vat photopolymerization and photoinitiator-specific language.

The corpus is small enough that a handful of families set the tone for the whole field, and the IPC composition shows formulation claims consistently paired with additive manufacturing process classes rather than filed as standalone chemistry.

Filing activity and technology composition, 2015-2026
  1. 1Mechnano, LLC11
  2. 2Virginia Tech (Virginia Polytechnic Institute and State University)2
  3. 3Arizona Board of Regents on behalf of the University of Arizona2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The data

Filing trend and technology composition

Two views of the same 13 records: how filings moved year over year, and which IPC subclasses the claims sit in.

Filing trend, 2017-2026

Filings were absent in 2017, built toward a peak of 10 records in 2022, and taper toward the 2026 cut-off. Because publication typically lags filing by around 18 months, the most recent years in this trend are understated rather than a genuine drop-off in activity.

Filing trend, 2017-202603581002017201820192020202110202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

IPC subclass distribution

B29C (shaping of plastics) and B33Y (additive manufacturing) each cover the large majority of the 13 records, at 76.9% and 69.2% respectively, with C01B and C08K each present in 61.5%. Because a single record can carry several IPC classes, these shares add up to well over 100% of the record total — they describe how claims overlap process and materials classes, not a partition of the corpus.

IPC subclass distributionB29C · Shaping of plastics1076.9%B33Y · Additive manufacturing (3D pri…969.2%C01B · Non-metallic elements & inorga…861.5%C08K · Use of additives in polymers861.5%B29K · Plastics moulding materials (i…323.1%B82Y · Nanotechnology applications323.1%C08F · Addition polymers (vinyl etc.)17.7%C08G · Condensation polymers17.7%Other17.7%

Shares are the percentage of the 13 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key patents

The most-cited records in this corpus

Representative filing
US20230202108A12023-06-29

Dispersions and Manufacturing Technologies for Additive Manufacturing Comprising Discrete Carbon Nanotubes

MECHNANO, LLC

The present invention is directed to additive manufacturing compositions and methods for producing additive manufacturing composite blends with oxidized discrete carbon nanotubes with dispersion agents bonded to at least one sidewall of the oxidized discrete carbon nanotubes. Such compositions are especially useful when radiation cured, sintered or melt fused.Filed by Mechnano, LLC and published 2023-06-29; related family members extend to WIPO and Canadian filings.

US20230202108A1 — patent drawing 1US20230202108A1 — patent drawing 2
View full filing
Most-cited records
#Publication no.Patent titleCitations
1WO2022204423A1Dispersions and manufacturing technologies for additive manufacturing comprising discrete carbon nanotubes5
2CA3213294A1Dispersions and manufacturing technologies for additive manufacturing comprising discrete carbon nanotubes3
3US20230202108A1Dispersions and Manufacturing Technologies for Additive Manufacturing Comprising Discrete Carbon Nanotubes1

Citation counts inside a searched corpus like this one skew toward older filings that have had more time to accumulate citations — read them as a signal of influence within this dataset, not as a ranking of current technical importance.

Publication numbers are shown where the record carries one (3 of 3 rows); clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the evidence supports

Three observations that follow directly from the record set, without extrapolating beyond what the data shows.

Concentration
3 assignees ranked
in the full ranking

A narrow field, not a crowded one

The assignee ranking returns only three companies against 13 published records. That is too small a base to describe as fragmented or consolidated in percentage terms, but it does mean a new entrant is not fighting through dozens of incumbents to find open claim territory.

Ranking is a complete return, not a top-N cut.
Citation cluster
5 citations
on the lead record

One dispersion technology anchors the citation table

The three most-cited records in this corpus — spanning WIPO, Canadian and US filings — all describe the same discrete carbon nanotube dispersion approach for additive manufacturing resins. That repetition across jurisdictions suggests the underlying technology was filed as a coordinated family rather than independently reinvented.

Citation signal favours earlier filings in any searched corpus.
Peak year
10 records
filed in 2022

Activity peaked in 2022, then thins toward 2026

Filings built from zero in 2017 to a peak of 10 in 2022. The falloff toward the present is expected given an 18-month publication lag rather than evidence that interest has genuinely cooled.

Most recent years are always understated in any filing trend.
Claim overlap
76.9% / 69.2%
B29C / B33Y share of records

Formulation claims are filed as process claims

B29C (shaping of plastics) and B33Y (additive manufacturing) each appear in the large majority of the 13 records, meaning photopolymer resin chemistry in this dataset is almost never claimed on its own — it rides alongside a specific printing or moulding process.

Shares exceed 100% because records carry multiple IPC classes.
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Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to photopolymer resin formulation, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is active, and where the gaps sit

With only three assignees in the ranking, this is a field defined by a small number of research groups and one materials company rather than a broad competitive set.

Leader
11 records
attributed to the leading assignee

One assignee accounts for the bulk of the corpus

The leading assignee in the ranking holds 11 of the records in scope, with the remaining ranked assignees holding the rest. That leaves the field close to single-assignee dominance within this dataset, even though the underlying corpus of 13 records is small.

Recent-year momentum for all ranked assignees sits at zero, consistent with publication lag rather than withdrawal.
Co-filing
1 pair
co-assignee pairing identified

A single academic co-filing relationship

The only co-assignee pairing in this dataset links two university research bodies, appearing together twice. That is the sole sign of collaborative filing in an otherwise single-assignee-per-record corpus.

No cross-company joint filings appear in this record set.
Momentum
0 in latest year
for every ranked assignee

Latest-year activity reads flat across the board

All three ranked assignees show zero filings in the most recent year captured. Given the roughly 18-month gap between filing and publication, this is more likely a reporting artefact of the data cut-off than a genuine stop in R&D.

Treat latest-year momentum figures as provisional until the lag clears.
🔍
Under-claimed branches worth checking before filing
Sub-areas that surface in the search terms but carry thin representation in the IPC composition above.
Post-cure shrinkage compensation additivesShelf-stable dual-cure initiator packagesToughening additives for brittle vat-polymerized partsGreen-strength enhancers for support-free printingCondensation-polymer photoresin backbones (C08G)
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Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Mechnano, LLC0
Virginia Tech (Virginia Polytechnic Institute and State University)0
Arizona Board of Regents on behalf of the University of Arizona0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this analysis

The dataset points to a narrow, citation-anchored field with process claims dominating over standalone chemistry claims.

Check freedom-to-operate on dispersion chemistry

The carbon nanotube dispersion family anchors the citation table and spans three jurisdictions. Any formulation using conductive or reinforcing nanotube additives in a vat-polymerized resin should be checked against this family specifically.

Explore the citation network in Eureka

Probe the under-claimed branches directly

Shelf stability, toughening additives and post-cure shrinkage compensation each appear in the search terms but are thin in the IPC composition. A targeted claim search on those terms alone would confirm how open they really are.

Run a targeted search in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about photopolymer resin formulation patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Photopolymer Resin Formulation covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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