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Piezoelectric Material Manufacturing Patents: Who Leads, Gaps 2026

Piezoelectric Material Manufacturing Patents: Who Leads, Gaps 2026
https://www.patsnap.com/resources/blog/rd-blog/piezoelectric-material-manufacturing-process-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Advanced Materials & Metallurgy
Piezoelectric Material Manufacturing Process Patents
  • Filing has cooled since a 2017 peak of 23 records, with the 2022 midpoint at just 9 — this is a maturing, not a growing, filing category.
  • No assignee in the recent-momentum list filed anything in the latest year, including Samsung, Panasonic, Seiko Epson and SOITEC — a signal the active edge has shifted to smaller or newer filers.
  • H10N and H01L together dominate the IPC mix (238 and 170 of 253 records), while C04B ceramics-specific claims sit far behind at only 21 — thin-film and device integration outpaces bulk ceramic process claims.
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253
Published Records
29%
Top-5 Share of All Records
0%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
Published byPatsnap Research··8 min readSourced from Patsnap Eureka
Overview

What this landscape covers

This landscape tracks 253 patent families published between 2015 and mid-2026 that claim piezoelectric material manufacturing steps — tape casting of piezoceramic, sputtered piezo film deposition, poling processes, and general manufacturing process claims — filtered against IPC classes covering electric solid-state devices, sputtering/coating, and piezoelectric-specific hardware. The scope spans both bulk ceramic routes (tape casting, sintering) and thin-film routes (sputtering, etching, poling), which is why the composition skews heavily toward device-level IPC codes like H10N and H01L rather than ceramics-only classification.

Filing activity peaked in 2017 and has trended down or flat since, with the 2022 midpoint at roughly a third of the peak. Because publication typically lags filing by around 18 months, the most recent one to two years in any trend understate true filing volume — but the multi-year decline predates that lag window and reflects a real slowdown in new filing, not a data artefact.

Annual filings, 2017-2026
  1. 1SOITEC SA20
  2. 2PANASONIC HOLDINGS CORP15
  3. 3SAMSUNG ELECTRONICS CO LTD15
  4. 4SEIKO EPSON CORP14
  5. 5IMACOR INC9
  6. 6ROBERT BOSCH GMBH8
  7. 7STMICROELECTRONICS SRL8
  8. 8MURATA MFG CO LTD8
  9. 9SHIN ETSU CHEMICAL CO LTD8
  10. 10WAYGATE TECHNOLOGIES USA LP8
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The data

Filing trend and technology composition

The two views below place filing volume against the IPC subclasses that actually carry the claims, so a reader can see not just how much was filed but where the claim density sits.

A filing peak that has not been repeated

23 records in 2017 remains the high-water mark for this search; by the 2022 midpoint annual output had fallen to 9, and the trend has not recovered. Read the final one to two years with the publication lag in mind rather than as a hard drop to zero.

A filing peak that has not been repeated061319252320172018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Device integration outweighs bulk ceramic process claims

H10N (238 records) and H01L (170) dominate, meaning most claims sit at the level of finished piezoelectric devices and semiconductor integration rather than the ceramic material itself. C04B, the ceramics-specific class, appears in only 21 records — bulk tape-casting and sintering process claims are comparatively sparse against thin-film and device claims.

Device integration outweighs bulk ceramic process claimsH10N · Other electric solid-state dev…23894.1%H01L · Semiconductor devices17067.2%H03H · Impedance networks & filters5521.7%H02N · Electric machines (other)3212.6%H04R · Loudspeakers & audio transduce…2911.5%B41J · Typewriters & printers259.9%C04B · Ceramics, cement & refractories218.3%B06B · Generating mechanical vibratio…207.9%Other12951.0%

Shares are the percentage of the 253 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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This page is one run against one query. Ask Eureka your own question about piezoelectric material manufacturing process and every answer comes back with the patent numbers behind it.

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Key patents

The most-cited prior art in this space

Representative filing
US20160365504A12016-12-15

Piezoelectric thin film element, method for manufacturing the same, and electronic device including piezoelectric thin film element

SUMITOMO CHEMICAL COMPANY

The filing describes a manufacturing sequence for an alkali-niobate-based piezoelectric thin film: forming a lower electrode film on a substrate, forming the piezoelectric thin film on that electrode, patterning an etching mask on the film, and dry-etching the film into the desired pattern — with the etching mask specified as an oxide layer adjacent to the piezoelectric film.Sumitomo Chemical, published 2016-12-15.

US20160365504A1 — patent drawing 1US20160365504A1 — patent drawing 2
View full record
Highest-citation records in the searched corpus
#Publication no.Patent titleCitations
1US20120055257A1Pressure sensing or force generating device240
2US20050185026A1Piezoelectric element, piezoelectric actuator, ink jet recording head, ink jet printer, surface acoustic wave…195
3US7275292B2Method for fabricating an acoustical resonator on a substrate156
4US6447887B1Electrostrictive and piezoelectric thin film assemblies and method of fabrication therefor120
5US8479585B2Pressure sensing or force generating device78
6US20080079333A1Energy harvesting device manufactured by print forming processes76
7US20180309426A1Surface acoustic wave device and associated production method67
8US6004500AMethods for producing novel ceramic composites62
9US20100058861A1Piezoelectric Transducers and Inertial Sensors using Piezoelectric Transducers57
10US6822376B2Method for making electrical connection to ultrasonic transducer57

Citation counts favour older filings simply because they have had longer to accumulate citations; treat this table as a map of influential prior art, not of current filing activity.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for filing strategy

Three patterns stand out once the trend and IPC data are read together: a shrinking filing pool, a device-heavy claim mix, and receiving-office concentration that does not match where ceramic manufacturing actually happens.

Filing momentum
23 → 9 → declining
peak-to-midpoint filings

The category has already crested

Annual filings fell from a 2017 peak of 23 to 9 by the 2022 midpoint, with no recovery visible since. Combined with zero recent-year filings across every assignee in the momentum list, this reads as a category where the core process claims were staked out early and few new entrants are contesting them.

Filing trend, 2017-2026
Claim concentration
238 of 253 in H10N
records tagged H10N

Most claims protect devices, not raw ceramic process

H10N and H01L cover 238 and 170 records respectively, against only 21 in C04B. A team working on bulk tape-casting or sintering chemistry is filing into comparatively open ceramics-class space, even though the overall field looks crowded from the device side.

IPC composition
Jurisdiction skew
US 132 vs China 14
receiving-office filings

US filing volume outpaces Asian manufacturing bases

The United States receives 132 filings against 14 for China, despite ceramic and thin-film piezoelectric manufacturing being heavily concentrated in East Asian supply chains. That gap suggests either under-filing in China relative to production volume or a preference for protecting downstream device claims in the US market.

Receiving office distribution
Collaboration pattern
9 co-assignee pairs
joint-filing relationships

Collaboration is rare and mostly corporate-inventor

Only nine co-assignee pairs appear across the full set, and the strongest links pair a corporate assignee with a named individual inventor rather than two companies. This is a field of largely independent filers, not one built on cross-licensing consortia.

Co-assignee analysis
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to piezoelectric material manufacturing process, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and who has gone quiet

The assignee base is fragmented rather than dominated by one or two firms, and the names with the largest historical footprints — Samsung, Panasonic, Seiko Epson, SOITEC — show zero filings in the latest tracked year, alongside smaller specialist filers.

Momentum
0 in latest year
across all listed leaders

Historic leaders have stopped filing

Every assignee named in the recent-momentum data, including large electronics manufacturers, shows zero filings in the most recent year. That does not necessarily mean exit from the technology — publication lag means the newest filings from any of these firms may simply not have surfaced yet — but it does mean the visible frontier has moved elsewhere.

Recent-year momentum
Collaboration
Strongest pair: 3 filings
Samsung + Kumoh National Institute

University-industry links are the exception, not the rule

The strongest co-assignee relationship in the dataset pairs a large electronics manufacturer with a university technology-transfer office, at three joint filings. Robert Bosch appears in two separate pairs with named individual inventors, suggesting inventor-driven rather than institutional collaboration.

Co-assignee pairs
Long tail
253 families, fragmented
no single dominant assignee share reported

A wide base of single- and few-filing entrants

With 253 families spread across a roster that includes ceramics specialists, semiconductor conglomerates, and individual inventors, ownership of core manufacturing claims is distributed rather than concentrated. New entrants filing one or two families still have room to stake defensible positions in specific process steps.

Assignee ranking
🔍
Under-claimed process sub-areas
Branches where filing density is thin relative to the overall corpus
low-temperature poling protocolsalkali-niobate lead-free thin filmstape-casting slurry rheology controldry-etch mask chemistry for piezo filmswafer-bonded piezo substrate transfer
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
SOITEC0
Panasonic Corporation (Japan)0
Samsung Electronics Co., Ltd. (Korea)0
Seiko Epson Corporation0
Amec LLC0
General Inspection Technologies0
Robert Bosch GmbH (Germany)0
Murata Manufacturing Co., Ltd.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this analysis

The trend and assignee data point to specific next steps depending on whether the goal is freedom-to-operate, white-space filing, or monitoring a competitor.

Check freedom-to-operate against the citation leaders

The five most-cited records anchor prior art in pressure-sensing devices, thin-film piezoelectric fabrication, and acoustic resonator manufacture. Any new filing in these areas should be checked against these documents specifically before drafting claims.

Explore prior art in Eureka

Model a claim in an under-claimed branch

Low-temperature poling and lead-free alkali-niobate thin-film routes show thinner claim density than the device-integration classes. Drafting around a specific process parameter in these areas avoids the densest prior art.

Draft a claim in Eureka

Track dormant leaders for re-entry

Firms with zero recent-year filings may resume once their next filing cohort publishes. Set a watch on the largest historical filers rather than assuming exit from the space.

Set up monitoring in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on piezoelectric manufacturing patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Piezoelectric Material Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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