Post CMP Cleaning Patents: Top Companies & Filing Trends 2026
Post CMP Cleaning Chemistry Patents: Filing Trends and Claim Concentration
41.7% of all 583 records sit with just five assignees, so most post-CMP cleaning claim space is already staked by a small group. Filings rose from 10 in 2017 to a peak of 34 in 2021, then declined to 23 by 2024, a 32% drop across that three-year span. 2025 and 2026 figures are still filling in as publication catches up with filing, so the apparent tail-off should not be read as the field cooling.
- 1ENTEGRIS INC79
- 2VERSUM MATERIALS US LLC46
- 3FUJIFILM ELECTRONIC MATERIALS U S A INC46
- 4BASF SE38
- 5LAM RES CORP34
See the full post cmp cleaning chemistry analysis in Eureka
- The complete ranking, not just the top five
- Every IPC branch with its share of the corpus
- The most-cited records, and where claim space is still thin
Common questions on post-CMP cleaning chemistry patents
Who holds the most patents in post-CMP cleaning chemistry?
One assignee leads the ranked field with 79 records, well ahead of the fifth-place holder at 34. The top five assignees combined hold 41.7% of all 583 records in scope, and the top ten hold 61.9%. This concentration means a new entrant should expect to file around, rather than into, the core composition claims those leaders already hold.
Is patent filing in post-CMP cleaning growing or shrinking?
Filings rose from 10 in 2017 to a peak of 34 in 2021, then fell to 23 by 2024, a 32% decline over that three-year span. Because publication lags filing by roughly 18 months, the very recent 2025-2026 counts are still incomplete and should not be read as evidence the field is continuing to shrink. 2024 is the most recent year in this dataset that can be treated as a complete count.
What technology areas dominate post-CMP cleaning patents?
H01L semiconductor-device claims appear in 63.1% of the 583 records, and C11D detergent and cleaning-composition claims appear in 43.4%, meaning most filings pair a device-level claim with a chemical formulation claim. C09K materials and H10P classifications each cover roughly 19-20% of records. Narrower bands like C09G polishing compositions, G03F photolithography and C23G metal-surface cleaning each sit in the 12-16% range, marking more specialised filing activity.
Disclaimer. This analysis is based on Patsnap Eureka data drawn from a limited snapshot of global patent records and is provided for general information and reference only. Patent data carries inherent limitations — recent filings are under-counted because of publication lag, counts may be on a record or family basis, classification and applicant-name data may contain errors or duplicates, and the underlying search query defines the scope shown — so the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing here is an exhaustive prior-art, novelty, freedom-to-operate or validity search, nor does it constitute legal, financial or professional advice, and it should not be relied upon as such. Verify independently and review with qualified patent and legal professionals before acting on it.
Method: Filing trend and technology composition. Derived from a Patsnap search on Post CMP Cleaning Chemistry covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish. Every share divides by all records in scope. Data: Patsnap Eureka. See the full landscape report.