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Process Safety Patents: Who Leads, Where the Gaps Are 2026

Process Safety Patents: Who Leads, Where the Gaps Are 2026
https://www.patsnap.com/resources/blog/rd-blog/process-safety-and-risk-patent-landscape-patent-landscape/ · Patsnap · data cut-off 2026-08-31 · downloaded from the live page
Patent Landscape · Process Safety & Risk
Process safety and chemical process risk patents: mapping who holds claim space and where it stays open
  • Filing peaked in 2021 at 246 records, then fell to 151 by 2024 — a 39% decline over that three-year span, the most recent period the data can call complete.
  • The leader holds 123 records, but the top 5 combined account for just 13.4% of all 3,677 records in scope — concentration is modest, not dominant.
  • B01J and C07C together anchor the field, at 21.3% and 18.8% of records respectively, while separation processes and refining chemistry sit well behind at single-digit-to-high-single-digit shares.
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3,677
Published Records
13%
Top-5 Share of All Records
-39%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (246 records) with 2024 (151) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 3,677 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

This dataset tracks 3,677 published records matched against process safety and chemical process risk terms combined with process-engineering concepts such as residence time, particle size, unit operation and chemical reactor design. That pairing captures patents where safety or risk language is tied to a concrete process step, rather than safety management documents in the abstract. The scope runs from 2015 through the 2026 data cut-off, with publication lagging filing by roughly 18 months — so the most recent one to two years understate real filing activity.

Reading the results by patent family rather than raw publication count is the fairer approach here, since a single invention can generate several continuation or multi-jurisdiction filings that inflate simple document tallies without adding new technical content.

Filing activity and technology composition, 2015–2026
  1. 1SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ BV123
  2. 2DOW GLOBAL TECHNOLOGIES LLC121
  3. 3LG CHEM LTD94
  4. 4BAYER PHARMA AG81
  5. 5APPLIED MATERIALS INC75
  6. 6BRACCO IMAGING SPA64
  7. 7CRYSTAPHASE INTERNATIONAL INC64
  8. 8F HOFFMANN LA ROCHE & CO AG62
  9. 9DSM IP ASSETS BV55
  10. 10ALMEX USA INC54
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The data

Filing trend and technology composition

Two views of the same 3,677-record corpus: how filing activity has moved year over year, and which IPC subclasses carry the technical weight.

Filing trend: a 2021 peak, then a pullback

Filings rose from 129 in 2017 to a peak of 246 in 2021, then declined to 151 by 2024 — a 39% drop over that three-year window. 2025 and 2026 figures are still incomplete because of publication lag and should not be read as a continued fall.

Filing trend: a 2021 peak, then a pullback063125188250129201720182019202024620212022202320242025272026Most recent year is partial — publication lag means later filings are not yet visible.

Where the claims sit

B01J (chemical/physical processes and catalysis) leads at 21.3% of records, with C07C (acyclic and carbocyclic compounds) close behind at 18.8%. C07D, B01D, C08F, C01B, C10G and A61K each account for a meaningful but smaller slice — each record can carry more than one class, so these shares sum above 100%.

Where the claims sitB01J · Chemical/physical processes & …78321.3%C07C · Acyclic & carbocyclic compounds69018.8%C07D · Heterocyclic compounds3489.5%B01D · Separation processes (filtrati…3168.6%C08F · Addition polymers (vinyl etc.)2917.9%C01B · Non-metallic elements & inorga…2847.7%C10G · Hydrocarbon oils & refining2436.6%A61K · Medicinal preparations2246.1%Other3,784102.9%

Shares are the percentage of the 3,677 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

A representative filing and the most-cited prior art

Representative filing
US20180334434A12018-11-22

Process for the preparation and particle size reduction of pirfenidone

LAURUS LABS LIMITED

The present invention relates to an improved process for the preparation of pure pirfenidone having a particular particle size distribution, a crystalline form of pirfenidone, and pharmaceutical compositions thereof, as well as methods for particle size reduction of pirfenidone, and methods for particle size reduction of pirfenidone by wet milling techniques using colloid mill, ultrasonicator, or high speed homogenizer devices.Filed by Laurus Labs, published 2018-11-22 as US20180334434A1.

US20180334434A1 — patent drawing 1US20180334434A1 — patent drawing 2
View full filing
Most-cited records in this corpus
#Publication no.Patent titleCitations
1US6329297B1Dilute remote plasma clean740
2US6602806B1Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film553
3US20030066482A1Lid cooling mechanism and method for optimized deposition of low-K dielectric using TRI methylsilane-ozone ba…551
4US20030077857A1Post-deposition treatment to enhance properties of SI-O-C low films534
5US7326657B2Post-deposition treatment to enhance properties of Si-O-C low k films523
6US8143174B2Post-deposition treatment to enhance properties of Si-O-C low K films520
7US5872065AMethod for depositing low K SI-O-F films using SIF4/oxygen chemistry451
8US6189482B1High temperature, high flow rate chemical vapor deposition apparatus and related methods451
9US20030008528A1Surface treatment of c-doped SiO2 film to enhance film stability during 02 ashing446
10US20040083964A1Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill439

Citation counts reward older filings that have had more time to accumulate citations within this searched corpus — treat them as a signal of influence on the field, not of current technical importance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for filing strategy

Four read-throughs from the trend, the technology mix and the citation record.

Filing momentum
246 → 151
2021 peak to 2024

The 2021 peak has cooled, not collapsed

Filings fell 39% from the 2021 peak of 246 to 151 in 2024, the last year the data can treat as complete. That is a real pullback from an unusually active year, not evidence that the field is winding down — 2025 and 2026 counts are still filling in under normal publication lag.

Read the drop against the 2021 peak, not as an ongoing slide.
Concentration
13.4% of 3,677
top 5 combined share

Modest concentration at the top

The leading assignee holds 123 records and the top 5 combined reach 13.4% of all 3,677 records in scope, rising to 21.6% for the top 10. That leaves most of the corpus outside the leading names — a long tail of single- and few-filing entrants rather than a field locked up by a handful of players.

Room exists outside the ranked leaders, not just around them.
Technology mix
21.3% B01J
largest IPC share

Catalysis and reaction chemistry carry the field

B01J (chemical/physical processes and catalysis) and C07C (acyclic and carbocyclic compounds) are the two largest classes at 21.3% and 18.8% of records respectively. Refining chemistry (C10G) and medicinal preparations (A61K) sit further back at 6-7%, suggesting the corpus is weighted toward core process chemistry rather than downstream pharmaceutical formulation.

Dense classes mean occupied claim space, not necessarily settled technology.
Citation pattern
740 citations
top-cited record

Citation leaders are older deposition-process patents

The most-cited records in this corpus, led by a filing cited 740 times, cluster around thin-film deposition and low-k dielectric process patents rather than recent process-safety-specific claims. That is typical of citation counts inside any searched corpus: older filings simply have had more time to accumulate citations.

Use citation rank as a map of influence, not of what matters now.
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Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to process safety & risk patent landscape, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the gaps sit

The ranking covers 100 companies counted in records — the full list the data endpoint returns, not a curated top-50 or top-100.

Leader
123 records
single largest filer

One clear leader, no runaway gap

The leading assignee's 123 records put it ahead of the field, but the gap to fifth place (75) and tenth place (54) narrows quickly — this is a led field, not a locked one.

Watch the leader's recent-year filings for direction, not just its total.
Recent momentum
2 filings
leader's latest-year count

Even the leader has slowed in the latest year

The leading assignee shows only 2 filings in the latest year on record, and several other major names in the ranking show none in that same window. Given publication lag, this understates true recent activity for all of them, but it means the latest-year figures should not be read as a ranking of current effort.

Latest-year counts are a lagging signal for everyone in this field.
Collaboration
10 pairs
co-assignee relationships

Co-filing is limited and mostly intra-group

Only 10 co-assignee pairs appear across the corpus, and the strongest ones look like related corporate entities filing jointly rather than arms-length collaboration between competitors. Cross-company technical partnerships are the exception here, not the norm.

Most invention in this space is being filed solo.
🔍
Under-claimed sub-areas worth a closer look
Branches where filing density is thin relative to the core process-safety claim space.
real-time reactor risk monitoringparticle-size control in continuous millingresidence-time optimisation in flow chemistryunit-operation-level hazard interlocksscale-up transfer from batch to continuous
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Shell Internationale Research Maatschappij BV2
Dow Global Technologies LLC0
LG Chem Ltd0
Bayer Pharma AG0
Applied Materials Inc0
Bracco Imaging SpA0
F. Hoffmann-La Roche AG0-100%
DSM IP Assets BV0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's next

Where to take this from here

The dataset points to a field with a modest leader, a wide tail of smaller filers, and technology concentrated in a few IPC classes. Turning that into a filing or freedom-to-operate decision means going deeper on specific claims and specific competitors.

Check freedom-to-operate before drafting

Dense classes like B01J and C07C carry real prior art risk for new reactor-chemistry claims — a targeted search against the leading assignees' recent filings is the first step before committing to a claim direction.

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Track the leader's next moves

A leader with only 2 filings in the latest year may be shifting strategy rather than slowing down entirely; monitoring its portfolio for new filing types is more informative than its aggregate count.

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Scope the under-claimed branches

Sub-areas such as continuous-flow residence-time control and unit-operation-level hazard interlocks show thinner filing density than the core classes and may be worth a dedicated novelty search.

Run a white-space search in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on process safety patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Process Safety & Risk Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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