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Pseudocapacitor Electrode Material Patent Landscape 2026

Pseudocapacitor Electrode Material Patent Landscape 2026
Competitive Landscape
Pseudocapacitor Electrode Material Patent Landscape in 2026

The pseudocapacitor electrode material field is a relatively fragmented, maturing niche: 58 patent families are distributed across academic institutions, specialty chemical firms, and industrial players, with no single applicant controlling more than a small share. Activity peaked in 2018 and has plateaued since, with a positive multi-year growth window driven by sustained university-led research rather than concentrated industry push.

58
Patent families in scope
25%
Top-5 share of top-100 filers
+25%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

Fragmented field with academic institutions and industrial players sharing the lead

LG Chem and the University College of Southeast Norway co-lead the applicant ranking, each with 6 patent records, followed by Intel and Rensselaer Polytechnic Institute at 5 patent records each. The top tier is unusually mixed, with corporate and academic filers holding equivalent positions.

The top five filers collectively account for 25% of the hundred largest filers’ combined total — a moderate concentration level indicating that no single organization dominates the technical agenda. The gap between the top tier and the mid-tier (4–3 patent records) is narrow, reinforcing the fragmented character of this space.

Leading applicants
#ApplicantPatent recordsShare
1LG Chem Ltd6
2University College of Southeast Norway6
3Intel Corporation5
4Rensselaer Polytechnic Institute5
5ADA Technologies Inc4
6Nanyang Technological University3
7Southwest University3
8Rhodia Operations SAS3
9South China University of Technology3
10French National Centre for Scientific Research (CNRS)3
#ApplicantPatent recordsShare
11University of Nantes3
12KOREA ADVANCED INST OF SCI & TECH3
13The Regents of the University of Colorado3
14Cellmo Materials Innovation Inc3
15Greatbatch Ltd3
16Dharmendra2
17Nesscap Co Ltd2
18Sutar Kumar Alekha2
19IBM Corporation2
20Indian Institute of Technology Kanpur2
↗ Hover a row · click a company to ask Eureka

LG Chem’s presence signals commercial interest in electrode materials for energy storage applications, while the strong academic representation from Southeast Norway, Rensselaer, and multiple universities suggests that fundamental materials science is still the primary driver of new filings.

The most recent 18–24 months of filings are subject to publication lag and will appear more sparse than they ultimately prove to be; recent-year counts should not be read as a slowdown. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

A 2018 filing spike dominates the trend; H01G capacitor classification anchors the technology mix

The annual filing chart reveals a sharp 2018 spike followed by a multi-year plateau, while the technology composition chart shows overwhelming concentration in capacitor-class IPC codes with thin coverage of adjacent processing and nanomaterial branches.

Annual filing trend

Annual filings peaked sharply in 2018 and have since settled into a lower but steady range through 2025. The field is still expanding on a multi-year basis — the recent-window growth is positive — though annual volume has eased from its 2018 peak. Counts for 2024–2026 are likely understated due to publication lag and should not be read as a further decline.

Annual filing trendAnnual values from 2017 to 2026, peaking at 20 in 2018.420172020183201972020220215202252023520244202532026↗ Hover for values · click a bar to ask Eureka

Technology composition

H01G (Capacitors) dominates the IPC distribution, confirming that filings are tightly scoped to electrochemical capacitor device architecture. H01M (Batteries, cells and fuel cells) appears as a secondary branch, reflecting hybrid energy-storage concepts. Nanotechnology (B82Y), coating processes (C23C), and nanostructures (B82B) each carry very limited coverage, pointing to under-served adjacent branches.

Technology compositionH01G · Capacitors leads with 91; H01M · Batteries, cells & fuel cells 16.H01G · Capacitors91H01M · Batteries, cells …16B82Y · Nanotechnology ap…7C23C · Coating & surface…3B82B · Nanostructures2C01B · Non-metallic elem…2B23K · Welding, solderin…1C25B · Electrolytic prod…1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US6510042B1Published 2003-01-21

Metal oxide electrochemical pseudocapacitor having…

Maxwell Technologies Korea CO., LTD.

Disclosed are a conducting polymer coated electrode of a metal oxide electrochemical pseudocapacitor having an improved performance and a method of manufacturing the same. The electrode includes a current collector and an active material coated on the current collector. The active material includes metal oxide and is coated with a conducting polymer on a… (excerpt from the patent abstract)

Metal oxide electrochemical pseudocapacitor having… — patent drawingMetal oxide electrochemical pseudocapacitor having… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Method for preparation of a thermal spray coated s…51
2Metal oxide electrochemical pseudocapacitor having…45
3Supercapacitor Devices Having Composite Electrodes…34
4一种CoNiO2/MXene复合材料及其制备方法和应用26
5High energy density hybrid pseudocapacitors and me…23
6Pseudocapacitive electrodes and methods of forming20
7一种氮掺杂碳纳米纤维负载钴酸镍复合电极材料的制备方法18
8A composite material and method of preparation the…18

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for electrode material R&D investment

The combination of moderate concentration, an academic-heavy applicant base, and a maturing filing curve shapes the risk and entry calculus for new participants. Four structural observations follow.

Maturity

Field has plateaued near its peak — foundational IP window mostly closed

The lifecycle stage is Maturity: annual filings have plateaued near their 2018 peak. A new entrant cannot easily plant broad foundational claims but can still pursue incremental improvements in specific material compositions, hybrid architectures, or processing routes. The positive multi-year growth window indicates sustained, if quieter, technical activity.

Lifecycle: Mature
Concentration

No dominant fortress — top five hold only 25% of the leading hundred filers’ total

With the top five filers accounting for 25% of the hundred largest filers’ combined total, and the leading applicant holding just 6 patent records, there is no single company whose IP position is strong enough to block a well-targeted entrant. The field rewards depth in a specific material class or processing method over broad portfolio building.

Low-moderate concentration
Collaboration

Three active co-filing clusters, led by a US university pair and a French consortium

The most active co-applicant pair is the University of Colorado Board of Regents and Rensselaer Polytechnic Institute, which share 5 joint patent records. Rhodia Operations, the French National Centre for Scientific Research (CNRS), and the University of Nantes form a three-way European consortium with 3 joint records on each bilateral link. These clusters suggest that collaborative academic-industrial routes are an established entry path for new electrode material IP.

Collaborative clusters
Geography

China leads on filing volume; the United States is the primary commercial validation market

China accounts for the highest number of patent records among all jurisdictions, followed by the United States and India. Europe (EPO) and WIPO (PCT) filings indicate selective international protection by a subset of applicants. India’s third-place position reflects active university filing from institutions such as IIT Kanpur. A robust US presence alongside China suggests the two markets are the critical battlegrounds for commercialization.

CN · US · IN lead
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Top collaboration links
ApplicantCollaboratorCo-filings
The Regents of the University of ColoradoRensselaer Polytechnic Institute5
Rhodia Operations SASFrench National Centre for Scientific Research (CNRS)3
Rhodia Operations SASUniversity of Nantes3
French National Centre for Scientific Research (CNRS)University of Nantes3

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Cards are grounded in applicant ranking, collaboration pairs, lifecycle stage, and jurisdiction distribution from the analyzed corpus.Explore insights →
Leaders

LG Chem and Southeast Norway University co-lead; Colorado–Rensselaer alliance drives academic depth

The leading positions are held by one industrial chemist and one specialist university, both focused squarely on H01G capacitor claims. The mid-tier is populated by a mix of US research universities, a defense-oriented materials company, and specialty chemical firms.

Leader · LG Chem

LG Chem

LG Chem holds 6 patent records — the joint-highest count in the corpus — concentrated entirely in H01G 11 (electrochemical capacitors), with one additional record in B82Y nanotechnology applications. As a large-scale battery and chemical manufacturer, LG Chem’s position signals commercial-stage interest in pseudocapacitive electrode formulations. No momentum data is available in evidence for LG Chem specifically.

6 patent records
Challenger · University College of Southeast Norway

University College of Southeast Norway

The University College of Southeast Norway also holds 6 patent records, all in H01G 11, matching LG Chem in total count. Its portfolio is narrowly specialized in capacitor electrode claims without the nanotechnology crossover seen in LG Chem’s filings. As an academic institution, its IP is likely available for licensing or collaborative development, making it a potential partner for industrial entrants seeking foundational electrode claims.

6 patent records
🔍
See the full applicant breakdown
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Intel CorporationADA Technologies Inc+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Southwest University1▲ new entrant
Source: PatSnap Eureka. Player cards cite patent record counts from the applicant ranking; technology emphasis is drawn from IPC focus data.Explore players →
Adjacent Branches

Coating processes and nanostructure engineering are under-served relative to their technical relevance

Beyond the dominant H01G capacitor branch, several IPC classes carry very low coverage despite clear relevance to electrode material performance. These are observations of relative sparsity; they may represent addressable gaps for applicants with the right technical capabilities.

C23C · Coating and surface deposition

Only 3 patent records sit in C23C, representing 2% of the IPC distribution, even though surface deposition techniques — atomic layer deposition, sputtering, chemical vapor deposition — are central to achieving the thin-film pseudocapacitive layers described in highly cited work on thermal spray coatings and metal oxide electrodes. An applicant with deposition process expertise could file claims here that are orthogonal to existing H01G device claims and potentially broad in scope given the low prior-art density.

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B82B · Nanostructures

B82B carries only 2 patent records — the lowest share among the white-space branches with identified technical value. Nanostructured electrode architectures (nanowires, nanosheets, porous frameworks) are a well-documented route to enhancing pseudocapacitive charge storage by maximizing active surface area, as evidenced by cited work on MXene composites and nitrogen-doped carbon nanofibers. The sparsity here suggests that inventors have filed structural claims under H01G rather than under the nanostructure classification, leaving room for process- and morphology-focused claims in B82B.

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🔒
Unlock the full white-space map
PatSnap Eureka maps all adjacent IPC branches and highlights where prior-art density is lowest relative to technical activity.
C01B · Non-metallic elements and inorganic compoundsB82Y · Nanotechnology applications+ more
Unlock full analysis →
Source: PatSnap Eureka. White-space branches are identified by low patent-record count and share within the analyzed corpus; technical value is inferred from cited prior art.Explore emerging →
Route Matrix

How leading applicants differ across technology routes

Route coverage across the main technology branches in the current evidence set.

PlayerH01G 11 · CapacitorsH01G 9 · CapacitorsH01M 4 · Batteries, cells & fuel cellsH01M 10 · Batteries, cells & fuel cellsB82Y 30 · Nanotechnology applications
LG Chem LtdStrong · 6AbsentAbsentAbsentEmerging · 1
University College of Southeast NorwayStrong · 6AbsentAbsentAbsentAbsent
University of NantesStrong · 3AbsentStrong · 3AbsentAbsent
Rensselaer Polytechnic InstituteStrong · 5AbsentAbsentAbsentAbsent
The Regents of the University of ColoradoStrong · 5AbsentAbsentAbsentAbsent
IBM CorporationStrong · 3Strong · 2AbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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