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Run your analysis now →This landscape covers 29 published records matching redistribution layer (RDL) process claims for advanced packaging — spanning line-and-space scaling, photosensitive dielectric materials, seed layer etch undercut control, adhesion and reliability, and panel-versus-wafer-level RDL approaches. The scope is defined by IPC classes H01L23, H01L21 and H05K3, filtered to claim text and description language specific to RDL process integration rather than general packaging.
Filings run from 2015 through the 2026-07-31 cut-off, with United States filings dominating the receiving-office mix and a small tail through China, Taiwan and the WIPO PCT route. Because publication typically lags filing by around 18 months, the most recent year understates real filing activity and should be read as a floor, not a ceiling.
Pick a task. Every answer cites the patents behind it.
Two views of the same 29-record set: how filing activity has moved year over year, and how those records distribute across IPC subclasses. Because a single record can carry several IPC classes, the composition shares add up to more than 100% of the record total.
Filings rose to a peak of 8 records in 2021, then fell back toward the 2022 midpoint of 3 records and have continued to soften since. The 2026 figure is partial because of publication lag, so the true trajectory for the last one to two years will only become visible in later data pulls.
H01L (semiconductor devices) appears in 96.6% of the 29 records, confirming that RDL process claims are overwhelmingly filed as semiconductor-device art rather than as printed-circuit art — H05K accounts for just 10.3%. H10W appears in 48.3% of records, while photolithography-specific claims under G03F and other solid-state device claims under H10N each appear in only a single record, marking them as thin, specialised branches rather than crowded ones.
Shares are the percentage of the 29 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
This page is one run against one query. Ask Eureka your own question about redistribution layer processes for advanced packaging and every answer comes back with the patent numbers behind it.
Try EurekaThe patent describes an encapsulating composition combining a photosensitive dielectric material with a polarizable compound suspended within it. Under an external stimulus, the compound aligns uniformly through the thickness direction to form a conductive path through the dielectric, and the resulting semiconductor package incorporates this composition alongside first and second redistribution layers.Filed by Powertech Technology Inc., published 2019-01-08.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US20200126923A1 | Chip package and method of forming the same | 34 |
| 2 | US20200118989A1 | Light emitting device package structure and manufacturing method thereof | 26 |
| 3 | US20180005931A1 | Circuit redistribution structure unit and method for manufacturing circuit redistribution structure | 12 |
| 4 | US20170278779A1 | Package substrate with embedded circuit | 9 |
| 5 | US20200027833A1 | Electronic Component Package | 8 |
| 6 | US11322450B2 | Chip package and method of forming the same | 8 |
| 7 | US20220375844A1 | Inorganic redistribution layer on organic substrate in integrated circuit packages | 3 |
| 8 | CN110085558A | 密封材料组合物、半导体封装及其制造方法 | 3 |
| 9 | US10177058B1 | Encapsulating composition, semiconductor package and manufacturing method thereof | 2 |
| 10 | US20220336333A1 | Package structure and manufacturing method thereof | 1 |
Citation counts reflect influence within this searched corpus and skew toward older filings; treat them as a signal of prior importance, not current commercial relevance.
Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Each row carries its publication number; clicking a row searches Eureka by that number.
When you want the answer in the next five minutes.
The agent works the prompt against patents and technical literature, citing every source.
Run your analysis now →When it has to run inside your own pipeline.
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Browse MCP servers →Three patterns stand out once the ranking, trend and IPC composition are read together: a concentrated leadership group, a cooling filing curve, and a technology mix that is almost entirely semiconductor-device art rather than PCB-style claims.
Five assignees account for 26 of the 29 records in scope, with the leader alone holding 11. A newcomer entering fine-line RDL process claims is filing directly against a small group of well-established holders rather than into open, fragmented territory.
Activity rose to 8 records in 2021, then fell back to 3 at the 2022 midpoint, and none of the ranked leaders show any filings in the latest year. That flat-to-declining pattern is consistent with claim space that has been substantially staked out, not one still in an early land-grab phase.
Almost every record in scope sits under H01L, confirming RDL process innovation is claimed predominantly as semiconductor-device manufacturing rather than printed-circuit assembly (H05K, 10.3%). Thin branches under G03F and H10N — each a single record — mark where photolithography-specific and alternative solid-state device claims remain largely unclaimed.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to redistribution layer processes for advanced packaging, with the prior art for and against each one.
The ranked leaders hold the overwhelming majority of records in scope, but the momentum data shows none of them have filed in the latest year — a sign the current claim map may already be substantially fixed pending the next wave of filings.
The top-ranked assignee holds 11 of the 29 records in scope, more than a third of the entire dataset on its own, with the next four holders combining to bring the top-five share to 89.7%.
The entire assignee ranking for this scope contains 7 companies, and together they account for all 29 records — there is no long tail of single-filing entrants beyond this group in the current data.
Every one of the ranked assignees shows zero filings in the latest year of the dataset. Combined with the post-2021 decline in overall filing volume, this suggests either a genuine slowdown in new RDL process filings or a publication-lag gap that has yet to clear.
| Assignee | Recent year | YoY |
|---|---|---|
| Unimicron Technology Corporation | 0 | — |
| Samsung Electronics Co., Ltd. | 0 | — |
| Taiwan Semiconductor Manufacturing Company (TSMC) | 0 | — |
| Intel Corporation | 0 | — |
| Powertech Technology Inc. | 0 | — |
| HU DYI CHUNG | 0 | — |
| Chengdu Yicheng Integrated Circuit Co., Ltd. | 0 | -100% |
The dataset points to a concentrated but cooling field with a few specific thin branches. The next steps depend on whether the goal is freedom-to-operate, competitive tracking, or identifying a defensible filing position.
With 89.7% of records held by five assignees, any new RDL process filing should be checked claim-by-claim against this group's granted claims before development proceeds further.
Run a claims comparisonG03F and H10N each carry only a single record in this scope, and H05K sits at 10.3% — these are the places most likely to still have room for a novel independent claim.
Explore white spaceEvery ranked assignee shows zero filings in the latest year, which publication lag can partly explain; tracking filings as they clear the lag window will show whether the 2021 peak was a high point or a plateau.
Set up monitoringWithin this scope of 29 records, a small group of assignees dominates: the top five together hold 26 records, or 89.7% of everything in scope, and the single leading assignee holds 11 records on its own. The full ranking closes at seven companies, who together account for all 29 records, meaning there is no long tail of minor filers beyond this group in the current data. Anyone assessing competitive position in fine-line RDL should treat this small group as the reference set, not a broader industry-wide survey.
The trend has already cooled from its high point: filings peaked at 8 records in 2021 and fell back to 3 by the 2022 midpoint, with none of the ranked assignees showing filings in the most recent year. Publication lags real filing activity by roughly 18 months, so the last one to two years understate true activity and should not yet be read as a hard stop. Even accounting for that lag, the shape of the curve since 2021 points to a maturing rather than an accelerating field.
US10177058B1, assigned to Powertech Technology Inc., covers an encapsulating composition built from a photosensitive dielectric material with a polarizable compound suspended in it, which aligns under an external stimulus to form a conductive path through the dielectric's thickness. The resulting semiconductor package pairs this composition with first and second redistribution layers. It is a materials-and-structure claim rather than a pure process claim, so it primarily constrains encapsulant formulation choices for anyone building an RDL stack with a photosensitive dielectric layer rather than blocking RDL patterning methods generally.
The IPC composition data shows photolithography-specific claims under G03F and other solid-state device claims under H10N each appear in only one of the 29 records, and H05K printed-circuit-style claims sit at just 10.3%. These thin branches — alongside specific process details like seed layer etch undercut control and panel-versus-wafer-level RDL transitions — carry far less claim density than the H01L semiconductor-device category, which sits at 96.6% of records. That does not guarantee an open claim, but it does mark where a freedom-to-operate search is more likely to find room.
Concentration at 89.7% of 29 records among five assignees means a new filing in the core H01L semiconductor-device claim space will likely run into prior art from those holders, so a claims-comparison review against their granted patents is a sensible first step. High filing density in that core area signals occupied claim space, not that the underlying technology is exhausted. The more promising path is usually the thinner branches — G03F, H10N and H05K in this dataset — where representation is low enough that a well-drafted independent claim has a realistic chance of standing apart from existing filings.
Go past this page: query the whole redistribution layer processes for advanced packaging corpus yourself, in your own scope.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.