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Run your analysis now →https://www.patsnap.com/resources/blog/rd-blog/rf-power-delivery-and-matching-networks-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Semiconductor Equipment & ComponentsRF Power Delivery and Matching Network Patents
- Concentrated but not locked up. the top 5 assignees hold 32.3% of all 4,265 records in scope, and the top 10 hold 44.0% — leaving more than half the field to a long tail of single- and few-filing entrants.
- Filing has cooled from its peak. activity peaked in 2018 at 266 records and ran 2021's 257 down to 115 by 2024, a -55% move over that span, though 2025-2026 counts are still filling in as publications catch up to filings.
- Discharge-tube and filter classes dominate. H01J (electron & discharge tubes) touches 31.3% of records and H03H (impedance networks & filters) touches 16.3%, together anchoring most of the claim space around plasma delivery and match circuits.
4,265
Published Records
32%
Top-5 Share of All Records
-55%
Filing Growth 2021→2024
US
Leading Jurisdiction
Filing growth compares 2021 (257 records) with 2024 (115) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 4,265 records in scope (CR5), not by the ranked leaders only.
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Field Overview
What this landscape covers
RF power delivery and matching network patents cover the hardware and control methods that get radio-frequency power from a generator into a plasma or antenna load cleanly: impedance matching networks, arc detection, reflected-power handling, pulsing synchronization, and the harmonic content of the delivered waveform. The search spans records published between 2015 and the 2026-07-31 cut-off, pulling in both semiconductor processing equipment and adjacent RF delivery contexts such as wireless power transfer and RF ablation.
Because the underlying search terms sit across plasma processing, power electronics and RF amplifier design, the dataset mixes semiconductor fab equipment with medical RF delivery and wireless charging records that share the same matching-network vocabulary. Reading the IPC composition alongside the assignee ranking helps separate genuine fab-equipment claim density from adjacent fields using the same terms.
Filing activity and technology composition, 2015-2026
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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The Data
Filing trend and technology composition
The trend line and the IPC breakdown below are drawn from the same 4,265 records; a record can carry more than one IPC class, so the class shares add up to more than the record total.
A growth phase, then a pullback
Filings rose from 175 in 2017 to a peak of 266 in 2018, then eased. The clearest complete-year comparison in the data is 2021's 257 records falling to 115 in 2024, a -55% move; 2025 and 2026 counts are still partial because publication typically lags filing by roughly 18 months.
Discharge tubes and filters carry the most claim density
H01J (electron & discharge tubes) appears in 31.3% of records and H03H (impedance networks & filters) in 16.3%. H02J, H05H, H04B and H01L each sit near the 10% mark, with H03F (amplifiers) and H05B (heating & lighting circuits) close behind — a spread that shows the field is not confined to one circuit type but recurs across generator, match and load-side classes.
Shares are the percentage of the 4,265 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.
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A representative recent filing
Representative Filing
System and method for enhanced RF power delivery using harmonic waveform synthesis (US20250191879A1)
HORIBA STEC CO., LTD.
The application describes delivering RF power to a plasma load by generating a harmonically distorted sinusoidal waveform derived from a predetermined harmonic signature tied to a desired plasma state, amplifying that waveform under high-reflected-power conditions, interfacing it with a non-linear plasma load impedance, and measuring the resulting RF power spectrum at the output.Filed by HORIBA STEC CO., LTD., published 2025-06-12 — one of the most recent published filings in this dataset.
Most-cited records in this landscape
| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US6409722B1 | Apparatus and method for creating, maintaining, and controlling a virtual electrode used for the ablation of … | 1,103 |
| 2 | US6537272B2 | Apparatus and method for creating, maintaining, and controlling a virtual electrode used for the ablation of … | 1,026 |
| 3 | US20100277121A1 | Wireless energy transfer between a source and a vehicle | 1,008 |
| 4 | US10405914B2 | Thermally adjustable surgical system and method | 739 |
| 5 | US5576629A | Plasma monitoring and control method and system | 739 |
| 6 | US20100164296A1 | Wireless energy transfer using variable size resonators and system monitoring | 690 |
| 7 | US20100237709A1 | Resonator arrays for wireless energy transfer | 618 |
| 8 | US20090284156A1 | Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power delivery | 615 |
| 9 | US20120256494A1 | Tunable wireless energy transfer for medical applications | 611 |
| 10 | US20110115378A1 | Plasma source design | 601 |
Citation counts favour older records simply because they have had longer to accumulate citations inside this corpus; read them as a signal of influence, not of current technical importance.
Each row carries its publication number; clicking a row searches Eureka by that number.
Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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What the numbers mean for a filing decision
Three patterns matter more than any single ranking: how concentrated ownership actually is, where the trend really stands once the lag is accounted for, and which classes carry the claim density.
Concentration
32.3% / 44.0%
top 5 / top 10 share of 4,265 records
Ownership is real but not total
The leader holds 342 records and the field drops to 213 by fifth place and 91 by tenth — a steep but not runaway gradient. With the top 10 covering 44.0% of all records, the remaining 56% is spread across a long tail of the other 90 ranked assignees plus unranked filers, which is where freedom-to-operate work tends to find gaps.
Assignee ranking, 100 companies
Momentum
-55%
2021 (257) to 2024 (115)
The post-peak pullback is measurable, not assumed
2018's peak of 266 records was followed by a multi-year decline that is confirmed by the 2021-to-2024 comparison. Treat 2025 and 2026 figures as undercounts rather than evidence of a further drop, since publication lag means recent filings are still arriving in the record.
Filing trend, 2017-2026
Technology mix
31.3% / 16.3%
H01J share / H03H share of records
Discharge tubes and filters anchor the field
H01J and H03H are the two classes with the widest reach across records, but H02J, H05H, H04B, H01L, H03F and H05B all sit in the 7-10% band, meaning power supply, plasma, transmission, semiconductor device and amplifier claims all overlap the same delivery and matching problem from different angles.
IPC composition, 8 subclasses shown
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Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to rf power delivery and matching networks, with the prior art for and against each one.
Co-filing is narrow and concentrated among individuals
| Assignee | Co-assignee | Shared families |
|---|---|---|
| KESLER MORRIS P | HALL KATHERINE L | 108 |
| KESLER MORRIS P | KUSNDRE B | 98 |
| HALL KATHERINE L | KUSNDRE B | 96 |
| KUSNDRE B | SOLJACIC MARIN | 85 |
| KUSNDRE B | KARALIS ARISTEIDIS | 85 |
| KESLER MORRIS P | SOLJACIC MARIN | 84 |
| KESLER MORRIS P | KARALIS ARISTEIDIS | 84 |
| HALL KATHERINE L | SOLJACIC MARIN | 84 |
Only 10 co-assignee pairs appear in the data, and the strongest links are between named individual inventors rather than corporate co-assignees, suggesting most corporate filers in this space patent independently rather than jointly.
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Who's Filing
Leaders and the shape of the field below them
The ranking lists the assignees with the most records in scope; it is not a curated top-10 list but the full 100-company ranking the dataset returns.
Leader
342
records
One assignee sets the pace
The leading assignee's 342 records sit well ahead of fifth place at 213 and tenth place at 91, giving it the clearest single-company claim density in the dataset. That gap is worth checking against product lines before assuming broad blocking coverage, since raw record counts include continuations and multiple jurisdictions of the same family.
Assignee ranking
Recent momentum
-50% to -100%
YoY, latest complete year
Even leaders are filing less in the most recent tracked year
Every assignee with visible recent-year momentum in this dataset shows a year-on-year decline, from a leader down 50% to several major names at zero filings in the latest year. This tracks with the broader 2021-2024 pullback rather than signalling any single company's retreat.
Recent-year momentum by assignee
Long tail
56.0%
share held outside the top 10
Most of the field sits outside the top 10
With the top 10 assignees holding 44.0% of all 4,265 records, the majority of filings belong to the other 90 ranked companies and unranked entrants. That spread is where narrower, more specific claims are more likely to have survived unopposed.
Concentration figures
Recent-year filing momentum by assignee
| Assignee | Recent year | YoY |
|---|---|---|
| MKS Instruments, Inc. | 2 | -50% |
| Lam Research Corp. | 1 | -95% |
| Applied Materials, Inc. | 0 | -100% |
| WiTricity Corp. | 0 | -100% |
| NXP USA, Inc. | 0 | -100% |
| ParkerVision, Inc. | 0 | — |
| Advanced Energy Industries, Inc. | 0 | -100% |
| KESLER MORRIS P | 0 | — |
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next
Where to take this analysis
The dataset points to a field with real concentration at the top and real thinning at the edges. Turning that into a filing or freedom-to-operate position means going deeper than the aggregate view shown here.
Check family status, not just record counts
Raw record counts mix continuations, divisionals and multiple jurisdictions of the same underlying invention. Before treating any assignee's count as a blocking position, pull the family view for the specific claims that matter to your product.
Explore assignee families in EurekaMap claims against the under-claimed sub-areas
Pulsing synchronization, arc detection and harmonic waveform synthesis show thinner coverage than the core discharge-tube classes. A claim-level search in those specific branches will tell you more than the aggregate IPC shares can.
Run a white-space search in EurekaSource: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ
Common questions about this landscape
The dataset's leading assignee holds 342 records, noticeably ahead of fifth place at 213 and tenth place at 91. That said, the top 10 assignees together account for only 44.0% of all 4,265 records in scope, so no single company or small group controls the field outright. The remaining 56% is spread across a long tail of the other 90 ranked companies plus unranked filers, which matters for anyone assuming a clear leader has already blocked the space.
Filings peaked in 2018 at 266 records and had fallen to 115 by 2024, down from 257 in 2021 — a -55% move over that three-year span. It is fair to call this a pullback from peak activity rather than a field in early growth. However, 2025 and 2026 figures should not be read as confirming a further decline, because publication typically lags actual filing by around 18 months, so the most recent years are still incomplete.
H01J (electron & discharge tubes) is the widest-reaching class, touching 31.3% of the 4,265 records in scope, followed by H03H (impedance networks & filters) at 16.3%. A second tier — H02J, H05H, H04B and H01L — each sits near 10%, with H03F (amplifiers) and H05B (heating & lighting circuits) close behind. Because a single record can carry multiple IPC classes, these shares add up to more than 100%, reflecting how delivery, matching and load-side circuitry overlap in most filings.
The clearest under-claimed branches sit inside narrower functional problems rather than whole IPC classes: pulsing synchronization control loops, arc detection specifically for non-linear plasma loads, harmonic waveform synthesis tied to match tuning, and power repeatability across repeated match cycles. These sit underneath the dominant H01J and H03H classes but are not saturated the way the core discharge-tube and filter claims are, making them reasonable places to start a freedom-to-operate or white-space search.
US20250191879A1, filed by HORIBA STEC and published 2025-06-12, claims an RF power delivery method that generates a harmonically distorted waveform tied to a desired plasma state and amplifies it under high-reflected-power conditions before interfacing with a non-linear plasma load. It is a useful marker of where recent filings are focusing: harmonic content and reflected-power tolerance rather than basic match-network topology. As a single recent filing it should not be read as representative of the whole field's direction, but it does align with the under-claimed harmonic waveform synthesis area noted above.
Answers are grounded in the same dataset. Derived from a Patsnap search on RF Power Delivery and Matching Networks covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company's registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.